JP2004343092A5 - - Google Patents

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Publication number
JP2004343092A5
JP2004343092A5 JP2004123396A JP2004123396A JP2004343092A5 JP 2004343092 A5 JP2004343092 A5 JP 2004343092A5 JP 2004123396 A JP2004123396 A JP 2004123396A JP 2004123396 A JP2004123396 A JP 2004123396A JP 2004343092 A5 JP2004343092 A5 JP 2004343092A5
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JP
Japan
Prior art keywords
scanning
mirror
irradiated object
irradiated
beam irradiation
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JP2004123396A
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English (en)
Japanese (ja)
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JP4503343B2 (ja
JP2004343092A (ja
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Priority claimed from JP2004123396A external-priority patent/JP4503343B2/ja
Publication of JP2004343092A publication Critical patent/JP2004343092A/ja
Publication of JP2004343092A5 publication Critical patent/JP2004343092A5/ja
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Publication of JP4503343B2 publication Critical patent/JP4503343B2/ja
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JP2004123396A 2003-04-21 2004-04-19 ビーム照射装置、ビーム照射方法、及び薄膜トランジスタの作製方法 Expired - Fee Related JP4503343B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004123396A JP4503343B2 (ja) 2003-04-21 2004-04-19 ビーム照射装置、ビーム照射方法、及び薄膜トランジスタの作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003116391 2003-04-21
JP2004123396A JP4503343B2 (ja) 2003-04-21 2004-04-19 ビーム照射装置、ビーム照射方法、及び薄膜トランジスタの作製方法

Publications (3)

Publication Number Publication Date
JP2004343092A JP2004343092A (ja) 2004-12-02
JP2004343092A5 true JP2004343092A5 (enrdf_load_stackoverflow) 2007-05-24
JP4503343B2 JP4503343B2 (ja) 2010-07-14

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ID=33543087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004123396A Expired - Fee Related JP4503343B2 (ja) 2003-04-21 2004-04-19 ビーム照射装置、ビーム照射方法、及び薄膜トランジスタの作製方法

Country Status (1)

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JP (1) JP4503343B2 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8598588B2 (en) 2005-12-05 2013-12-03 The Trustees Of Columbia University In The City Of New York Systems and methods for processing a film, and thin films

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG195515A1 (en) * 2012-06-11 2013-12-30 Ultratech Inc Laser annealing systems and methods with ultra-short dwell times

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02181419A (ja) * 1989-01-06 1990-07-16 Hitachi Ltd レーザアニール方法
JP3390603B2 (ja) * 1995-05-31 2003-03-24 株式会社半導体エネルギー研究所 レーザー処理方法
JPH10199809A (ja) * 1997-01-09 1998-07-31 Sony Corp シリコン膜の結晶化方法
JP5057619B2 (ja) * 2001-08-01 2012-10-24 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4974425B2 (ja) * 2001-09-10 2012-07-11 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4035019B2 (ja) * 2002-08-23 2008-01-16 シャープ株式会社 半導体装置の製造方法
JP2004241421A (ja) * 2003-02-03 2004-08-26 Toshiba Matsushita Display Technology Co Ltd 半導体膜の結晶化方法およびその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8598588B2 (en) 2005-12-05 2013-12-03 The Trustees Of Columbia University In The City Of New York Systems and methods for processing a film, and thin films

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