JP2004311511A5 - - Google Patents
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- JP2004311511A5 JP2004311511A5 JP2003099350A JP2003099350A JP2004311511A5 JP 2004311511 A5 JP2004311511 A5 JP 2004311511A5 JP 2003099350 A JP2003099350 A JP 2003099350A JP 2003099350 A JP2003099350 A JP 2003099350A JP 2004311511 A5 JP2004311511 A5 JP 2004311511A5
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Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003099350A JP4233908B2 (ja) | 2003-04-02 | 2003-04-02 | 基板処理システム |
| CNB2004800153980A CN100539064C (zh) | 2003-04-02 | 2004-03-26 | 基板处理系统 |
| KR1020057018481A KR100994856B1 (ko) | 2003-04-02 | 2004-03-26 | 기판 처리 시스템 |
| US10/551,225 US7729798B2 (en) | 2003-04-02 | 2004-03-26 | Substrate processing system, and method of control therefor, control program, and storage medium |
| PCT/JP2004/004383 WO2004090972A1 (ja) | 2003-04-02 | 2004-03-26 | 基板処理システムおよびその制御方法、制御プログラム、記憶媒体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003099350A JP4233908B2 (ja) | 2003-04-02 | 2003-04-02 | 基板処理システム |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004311511A JP2004311511A (ja) | 2004-11-04 |
| JP2004311511A5 true JP2004311511A5 (ja) | 2005-12-02 |
| JP4233908B2 JP4233908B2 (ja) | 2009-03-04 |
Family
ID=33156695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003099350A Expired - Lifetime JP4233908B2 (ja) | 2003-04-02 | 2003-04-02 | 基板処理システム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7729798B2 (ja) |
| JP (1) | JP4233908B2 (ja) |
| KR (1) | KR100994856B1 (ja) |
| CN (1) | CN100539064C (ja) |
| WO (1) | WO2004090972A1 (ja) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8078311B2 (en) * | 2004-12-06 | 2011-12-13 | Tokyo Electron Limited | Substrate processing apparatus and substrate transfer method adopted in substrate processing apparatus |
| JP2008034746A (ja) * | 2006-07-31 | 2008-02-14 | Tokyo Electron Ltd | 塗布、現像装置、その方法及び記憶媒体 |
| KR100887011B1 (ko) * | 2007-06-25 | 2009-03-04 | 주식회사 동부하이텍 | 반도체 제조 공정에서의 수율 분석 시스템 및 방법 |
| JP5006122B2 (ja) | 2007-06-29 | 2012-08-22 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置 |
| KR101012249B1 (ko) * | 2007-07-10 | 2011-02-08 | 다이닛뽕스크린 세이조오 가부시키가이샤 | 기판처리장치의 스케줄작성방법 및 그 프로그램 |
| JP5022302B2 (ja) * | 2007-07-10 | 2012-09-12 | 大日本スクリーン製造株式会社 | 基板処理装置のスケジュール作成方法及びそのプログラム |
| JP5128918B2 (ja) | 2007-11-30 | 2013-01-23 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置 |
| JP5318403B2 (ja) * | 2007-11-30 | 2013-10-16 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置 |
| JP4886669B2 (ja) * | 2007-12-12 | 2012-02-29 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP5179170B2 (ja) * | 2007-12-28 | 2013-04-10 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置 |
| JP5001828B2 (ja) | 2007-12-28 | 2012-08-15 | 株式会社Ｓｏｋｕｄｏ | 基板処理装置 |
| JP5294681B2 (ja) * | 2008-04-28 | 2013-09-18 | 東京エレクトロン株式会社 | 基板処理装置及びその基板搬送方法 |
| JP4640469B2 (ja) | 2008-08-11 | 2011-03-02 | 東京エレクトロン株式会社 | 塗布、現像装置、その方法及び記憶媒体 |
| JP2010045190A (ja) * | 2008-08-12 | 2010-02-25 | Tokyo Electron Ltd | 加熱システム、塗布、現像装置及び塗布、現像方法並びに記憶媒体 |
| DE102009013353B3 (de) * | 2009-03-16 | 2010-10-07 | Siemens Aktiengesellschaft | Verfahren zur Bestimmung von Rüstungen für konstante Tische von Bestückautomaten |
| US8655472B2 (en) * | 2010-01-12 | 2014-02-18 | Ebara Corporation | Scheduler, substrate processing apparatus, and method of transferring substrates in substrate processing apparatus |
| JP2014067910A (ja) * | 2012-09-26 | 2014-04-17 | Tokyo Electron Ltd | 塗布膜形成装置、塗布膜形成方法、塗布、現像装置、塗布、現像方法及び記憶媒体 |
| JP6003859B2 (ja) | 2013-09-18 | 2016-10-05 | 東京エレクトロン株式会社 | 塗布、現像装置、塗布、現像方法及び記憶媒体 |
| NZ739103A (en) | 2015-08-07 | 2019-05-31 | Ericsson Telefon Ab L M | Differentiated positioning |
| US10698392B2 (en) * | 2018-06-22 | 2020-06-30 | Applied Materials, Inc. | Using graphics processing unit for substrate routing and throughput modeling |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2918464B2 (ja) * | 1994-04-08 | 1999-07-12 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| KR100198477B1 (ko) * | 1994-04-08 | 1999-06-15 | 이시다 아키라 | 기판처리장치 및 방법 |
| JP3544262B2 (ja) * | 1995-12-26 | 2004-07-21 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP3824743B2 (ja) * | 1997-07-25 | 2006-09-20 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| US6122566A (en) | 1998-03-03 | 2000-09-19 | Applied Materials Inc. | Method and apparatus for sequencing wafers in a multiple chamber, semiconductor wafer processing system |
| JP2001345241A (ja) * | 2000-05-31 | 2001-12-14 | Tokyo Electron Ltd | 基板処理システム及び基板処理方法 |
| JP2001351848A (ja) * | 2000-06-07 | 2001-12-21 | Tokyo Electron Ltd | 基板処理システム及び基板処理方法 |
| US6535784B2 (en) * | 2001-04-26 | 2003-03-18 | Tokyo Electron, Ltd. | System and method for scheduling the movement of wafers in a wafer-processing tool |
-
2003
- 2003-04-02 JP JP2003099350A patent/JP4233908B2/ja not_active Expired - Lifetime
-
2004
- 2004-03-26 US US10/551,225 patent/US7729798B2/en active Active
- 2004-03-26 KR KR1020057018481A patent/KR100994856B1/ko active IP Right Grant
- 2004-03-26 CN CNB2004800153980A patent/CN100539064C/zh not_active Expired - Lifetime
- 2004-03-26 WO PCT/JP2004/004383 patent/WO2004090972A1/ja active Application Filing