JP2004296201A5 - - Google Patents

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Publication number
JP2004296201A5
JP2004296201A5 JP2003085417A JP2003085417A JP2004296201A5 JP 2004296201 A5 JP2004296201 A5 JP 2004296201A5 JP 2003085417 A JP2003085417 A JP 2003085417A JP 2003085417 A JP2003085417 A JP 2003085417A JP 2004296201 A5 JP2004296201 A5 JP 2004296201A5
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JP
Japan
Prior art keywords
vapor deposition
source according
deposition source
container
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003085417A
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Japanese (ja)
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JP2004296201A (en
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Publication date
Application filed filed Critical
Priority to JP2003085417A priority Critical patent/JP2004296201A/en
Priority claimed from JP2003085417A external-priority patent/JP2004296201A/en
Priority to TW093107925A priority patent/TW200423809A/en
Priority to KR1020040020632A priority patent/KR20040085002A/en
Publication of JP2004296201A publication Critical patent/JP2004296201A/en
Publication of JP2004296201A5 publication Critical patent/JP2004296201A5/ja
Pending legal-status Critical Current

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Claims (13)

有機化合物を蒸着材料とし、該蒸着材料を収容する容器と該容器内の前記蒸着材料を加熱する加熱手段を備えると共に、前記蒸着材料を前記容器内で流動させる流動手段を備えることを特徴とする蒸着源。  An organic compound is used as a vapor deposition material, and includes a container that stores the vapor deposition material, a heating unit that heats the vapor deposition material in the container, and a flow unit that causes the vapor deposition material to flow in the container. Deposition source. 前記流動手段によって、前記蒸着材料を前記容器内で中央部から周辺部分に向けて流動させることを特徴とする請求項１に記載の蒸着源。  The vapor deposition source according to claim 1, wherein the vapor deposition material is caused to flow from a central portion toward a peripheral portion in the container by the flow means. 前記流動手段は、前記容器内に設けられる撹拌手段によって構成されることを特徴とする請求項１又は２に記載の蒸着源。  The vapor deposition source according to claim 1, wherein the flow unit is configured by a stirring unit provided in the container. 前記撹拌手段は、磁石型撹拌子からなることを特徴とする請求項３に記載の蒸着源。  The vapor deposition source according to claim 3, wherein the stirring unit includes a magnetic stirring bar. 前記撹拌手段は、軸流型撹拌翼からなることを特徴とする請求項３に記載の蒸着源。  The vapor deposition source according to claim 3, wherein the stirring unit includes an axial flow type stirring blade. 前記撹拌手段は、輻流型撹拌翼からなることを特徴とする請求項３に記載の蒸着源。The vapor deposition source according to claim 3, wherein the agitation unit includes a radial- type agitation blade. 前記撹拌手段は、縦軸方向に複数設けられた多段翼であることを特徴とする請求項３〜６のいずれかに記載の蒸着源。  The vapor deposition source according to any one of claims 3 to 6, wherein a plurality of the stirring means are multistage blades provided in the vertical axis direction. 前記容器を中心軸周りに回転させることを特徴とする請求項１〜７に記載の蒸着源。  The vapor deposition source according to claim 1, wherein the container is rotated around a central axis. 前記容器の内壁面に上下方向に沿って突起部を設けたことを特徴とする請求項８に記載の蒸着源。  The vapor deposition source according to claim 8, wherein a protrusion is provided on the inner wall surface of the container along the vertical direction. 収容された前記蒸着材料が零れない程度に前記容器を傾斜させていることを特徴とする請求項１〜９のいずれかに記載の蒸着源。  The vapor deposition source according to any one of claims 1 to 9, wherein the container is inclined to such an extent that the stored vapor deposition material does not spill. 請求項１〜１０のいずれかに記載された蒸着源を蒸着対象の基板に対向させて真空槽内に設置したことを特徴とする蒸着装置。  A vapor deposition apparatus, wherein the vapor deposition source according to claim 1 is placed in a vacuum chamber so as to face a substrate to be vapor deposited. 請求項１〜１０のいずれかに記載の蒸着源からの蒸着流によって成膜された有機機能層を少なくとも一層備えることを特徴とする有機ＥＬ素子。  An organic EL device comprising at least one organic functional layer formed by a vapor deposition flow from the vapor deposition source according to claim 1. 基板上に下部電極を形成し、該下部電極上に少なくとも発光機能層を備えた有機機能層を形成し、該有機機能層の上に上部電極を形成する有機ＥＬ素子の製造方法であって、
前記有機機能層は、蒸着材料を容器内で中央部分から周辺部分に流動させる流動手段を備えた蒸着源からの真空蒸着によって成膜されることを特徴とする有機ＥＬ素子の製造方法。A method for producing an organic EL device, comprising forming a lower electrode on a substrate, forming an organic functional layer having at least a light emitting functional layer on the lower electrode, and forming an upper electrode on the organic functional layer,
The organic functional layer is formed by vacuum vapor deposition from a vapor deposition source having a flow means for flowing a vapor deposition material from a central portion to a peripheral portion in a container.
JP2003085417A 2003-03-26 2003-03-26 Deposition source, deposition device, organic el element, and manufacturing method of organic el element Pending JP2004296201A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003085417A JP2004296201A (en) 2003-03-26 2003-03-26 Deposition source, deposition device, organic el element, and manufacturing method of organic el element
TW093107925A TW200423809A (en) 2003-03-26 2004-03-24 Vapor deposition source, vapor deposition apparatus, organic EL device, and method of manufacturing organic EL device
KR1020040020632A KR20040085002A (en) 2003-03-26 2004-03-26 Vapor deposition source, vapor deposition apparatus, organic el device, and method of manufacturing organic el device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003085417A JP2004296201A (en) 2003-03-26 2003-03-26 Deposition source, deposition device, organic el element, and manufacturing method of organic el element

Publications (2)

Publication Number Publication Date
JP2004296201A JP2004296201A (en) 2004-10-21
JP2004296201A5 true JP2004296201A5 (en) 2005-10-27

Family

ID=33400347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003085417A Pending JP2004296201A (en) 2003-03-26 2003-03-26 Deposition source, deposition device, organic el element, and manufacturing method of organic el element

Country Status (3)

Country Link
JP (1) JP2004296201A (en)
KR (1) KR20040085002A (en)
TW (1) TW200423809A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100689189B1 (en) * 2004-12-28 2007-03-09 동부일렉트로닉스 주식회사 A vessel for particle deposition system and particle deposition system using the same
KR20090041316A (en) * 2007-10-23 2009-04-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Deposition method and method for manufacturing light emitting device
KR20150026011A (en) * 2013-08-30 2015-03-11 삼성디스플레이 주식회사 Deposition source
CN103687240B (en) 2013-12-17 2016-03-30 深圳市华星光电技术有限公司 Over-voltage over-current protection circuit and electronic installation
CN103757591B (en) * 2013-12-31 2016-03-30 深圳市华星光电技术有限公司 A kind of Crucible equipment and the application in liquid crystal panel is produced thereof
CN105590869A (en) * 2014-10-24 2016-05-18 中芯国际集成电路制造(上海)有限公司 Semiconductor device and manufacturing method thereof
KR101746956B1 (en) * 2015-10-29 2017-06-14 주식회사 포스코 Particle generation apparatus and coating system including the same
GB2586634B (en) * 2019-08-30 2022-04-20 Dyson Technology Ltd Multizone crucible apparatus
WO2021058093A1 (en) * 2019-09-24 2021-04-01 Applied Materials, Inc. Evaporation apparatus for evaporating a material to be evaporated, evaporation source, and evaporation method

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