CN209568138U - A kind of evaporation source retaining device and evaporated device - Google Patents
A kind of evaporation source retaining device and evaporated device Download PDFInfo
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- CN209568138U CN209568138U CN201920211876.9U CN201920211876U CN209568138U CN 209568138 U CN209568138 U CN 209568138U CN 201920211876 U CN201920211876 U CN 201920211876U CN 209568138 U CN209568138 U CN 209568138U
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- evaporation source
- pedestal
- baffle
- retaining device
- overhead gage
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Abstract
The utility model provides a kind of evaporation source retaining device and evaporated device, the retaining device from top to bottom sequentially connected overhead gage, extend baffle and pedestal；The angle for extending baffle and pedestal is β, 0 ° < β≤90 °；The overhead gage and the angle for extending baffle are θ, 90 ° of 180 ° of < θ <；Evaporation source retaining device has the advantages of simple structure and easy realization, and on the one hand can effectively prevent material in evaporation source evaporation process and deposits to outside evaporation source, prevents evaporation source surface contaminated, on the other hand convenient for the recycling purification and recycling of evaporation source material；The evaporated device can be effectively reduced production cost, and wherein the recycling rate of waterused of evaporation source material is up to 55%.
Description
Technical field
The utility model belongs to vapor deposition field more particularly to a kind of evaporation source retaining device and evaporated device.
Background technique
OLED (Organic Light-Emitting Diode, Organic Light Emitting Diode) display device is good because having
Picture quality, can self-luminous, without visual angle obstacle, operating temperature range is big the advantages that, have been considered as after liquid crystal display device it
The most display device of new generation of market value afterwards.Usual OLED is made of evaporation process, is deposited according to demand on substrate
Different organic materials and inorganic material, to form organic luminescent device.The cavity wall of evaporation process chamber, which will use, prevents plate
It is protected, prevents that plate for stopping to unused evaporation material, prevents it from adhering in cavity wall and is difficult to clean off, causes
Part of appliance damage.
At present mainly using vaporizing-source system and line vaporizing-source system in OLED evaporation coating technique.Using evaporation source
In OLED deposition system, the effective rate of utilization of material is only 5%, remaining 95% material is largely evaporated to cavity surrounding
Prevent on plate；Since cavity area is big, it is attached to cavity surrounding and prevents that the film layer on plate is very thin, and is attached in order to increase material
Property, prevent plate be typically all use surface sand-blasting process, so evaporation after material be difficult Collection utilization again；Point at present
Evaporation source baffle is generally a cylindrical design, covers on outside evaporation source, and effect is to prevent from depositing in material evaporation process adding
Outside heat source, evaporation source surface is prevented to be contaminated.
A cavity configures 8-10 evaporation source and is used to that different OLED materials to be deposited in point evaporation source deposition system, due to
Multiple material is deposited in the same cavity, so the material for depositing to cavity surrounding is a variety of mixing, even if a small amount of collect
Also it is difficult to be purified again afterwards.
Therefore it provides a kind of retaining device convenient for evaporation source material recovery utilization rate is highly desirable.
Utility model content
The purpose of this utility model is to provide a kind of evaporation source retaining device and evaporated device, apparatus structure letters
It is single, it on the one hand can effectively prevent and deposited to outside evaporation source in evaporation source evaporation process, prevent evaporation source surface contaminated, it is another
Aspect purifies convenient for the recycling of evaporation source material and recycling；The evaporated device can be effectively reduced production cost, wherein
The recycling rate of waterused of evaporation source material is up to 55%.
To reach this purpose of utility model, the utility model uses following technical scheme:
One of the purpose of this utility model is to provide a kind of evaporation source retaining device, the retaining device include from up to
Under sequentially connected overhead gage, extend baffle and pedestal；The baffle and the angle of pedestal of extending is β, 0 ° of β≤90 ° <；Institute
Stating overhead gage and extending the angle of baffle is θ, 90 ° of 180 ° of < θ <.
Evaporation source retaining device includes sequentially connected overhead gage from top to bottom, extension baffle and bottom in the utility model
Seat, the connection type between them are to be detachably connected, and can also be non-dismountable connection, and the mode being detachably connected can be card
Button connection, or welding, specific connection type those skilled in the art can be adjusted according to actual needs.
In the utility model, the angle for extending baffle and pedestal is β, and occurrence those skilled in the art of angle are according to reality
Border needs to be adjusted, and the angle for preferably extending over baffle and pedestal is 90 °, is convenient for industrial production and application.
The utility model in the base can be cylindrical shape, or other shapes, or plate etc., specifically
Shape and material those skilled in the art can be adjusted according to actual needs, its purpose is to prevent evaporation source, avoid
Because of the waste and destruction of evaporation source caused by other uncontrollable factors.
In the present invention, the baffle and the angle of pedestal of extending is 90 °.
In the present invention, the extension baffle is arc；The a length of C of the circumference of the pedestal, the extension baffle
Arc length is l, l≤0.5C.
In the utility model, it can be circular arc, or elliptic arc, concrete condition this field that extension baffle, which is arc,
Technical staff can be adjusted according to actual needs；Extend baffle can be radian and the adjustable extension baffle of arc length, can also
Think uncontrollable；Specific radian and arc length those skilled in the art can be adjusted according to actual needs.
In the present invention, described to extend the extension baffle that baffle is high temperature resistant or vacuum-resistant material.
In the utility model, extend the extension baffle that baffle is high temperature resistant or vacuum-resistant material, on the one hand the temperature of vapor deposition
Higher, extending baffle at relatively high temperatures will not be destroyed, and will not react with evaporation material, on the other hand, be easy to steam
Plate removing, recycling and the recycling of material.
In the present invention, the overhead gage is the overhead gage of high temperature resistant or vacuum-resistant material.
In the utility model, overhead gage is the overhead gage of high temperature resistant or vacuum-resistant material, and on the one hand the temperature of vapor deposition is higher,
Overhead gage will not be destroyed at relatively high temperatures, will not be reacted with evaporation material, on the other hand, be easy to evaporation material
Removing, recycling and recycling.
In the present invention, the length of the overhead gage is L, and vertical range of the overhead gage on pedestal is a, a=L
cos(θ-90°)；The radius of the pedestal (3) is R；A≤the R.
In the utility model, a≤R will affect evaporation source to the vapor deposition process of substrate, to influence to be deposited if a > R
Effect.
Overhead gage can be arc in the utility model, or non-arc, those skilled in the art can be according to reality
It needs to be adjusted.
In the utility model, the overhead gage surface is additionally provided with partition.
In the utility model, the effect of partition is to increase material bond area, and material is made more effectively to be attached to overhead gage
Device, if it's not true, material may cause material from edge spilling or material upper when a large amount of evaporations
It falls off to fall back in evaporation source when baffle adds up blocked up, causes crucible plug-hole etc..
The two of the purpose of this utility model are to provide a kind of evaporated device, and the evaporated device includes evaporation source, substrate
And baffle；Evaporation source retaining device described in one of for the purpose of the baffle.
In the present invention, the axis of the evaporation source and the axial location of pedestal are identical；The substrate and evaporation source
The vertical range of the base bottom of retaining device is H, and the height of evaporation source retaining device is h, the h < H.
In the present invention, the vertical range at evaporation source (4) center to substrate (5) center is S；The evaporation source
(4) radius is r；The radius of the pedestal (3) is R；The r < R < S.
In the utility model, evaporation source retaining device is aside arranged when to substrate evaporation source for evaporation material in evaporation source,
The chassis of one side evaporation source retaining device can place evaporation source, avoid because other uncontrollable factors cause evaporation source
It destroys, on the other hand pollution and waste can effectively prevent and deposit to outside evaporation source in evaporation source evaporation process, prevent from steaming
Surface of rising is contaminated, and convenient for the recycling of evaporation source material purification and recycling, so that production cost be effectively reduced.
Compared with the existing technology, the utility model has the following beneficial effects:
Evaporation source retaining device provided by the utility model has the advantages of simple structure and easy realization, and on the one hand can effectively prevent evaporation
It is deposited to outside evaporation source in the evaporation process of source, prevents evaporation source surface contaminated, on the other hand returning convenient for evaporation source material
Receive purification and recycling；The evaporated device can be effectively reduced production cost, wherein the recycling rate of waterused of evaporation source material
Up to 55%.
Detailed description of the invention
Fig. 1 is the schematic diagram of evaporation source retaining device in the utility model embodiment 1；
Fig. 2 is the main view of evaporated device in the utility model embodiment 1.
Specific embodiment
The technical solution of the utility model is further illustrated below by specific embodiment.Those skilled in the art answer
This is illustrated, and the embodiment, which is only to aid in, understands the utility model, is not construed as the concrete restriction to the utility model.
Embodiment 1
The present embodiment provides a kind of evaporation source retaining devices, as shown in Figure 1, on retaining device is sequentially connected from top to bottom
Baffle 1 extends baffle 2 and pedestal 3, and the angle for extending baffle 2 and pedestal 3 is 90 °；Overhead gage 1 and the angle for extending baffle 2
It is 135 ° for θ, θ；Pedestal 3 is cylindrical shape, for placing evaporation source；The radius R of pedestal 3 is 45mm, Zhou Changwei 282.6mm；Prolong
Stretching baffle 2 is arc, and the arc length for extending baffle is the half of pedestal perimeter, as 141.3mm；The material for extending baffle 2 is SUS
Material；The vertical range a and R of overhead gage 1 on the base 3 are equal, are 45mm, then the length L=a/cos (θ -90 °) of overhead gage 1
=63.6mm；The material of overhead gage 1 is SUS material；Overhead gage surface is additionally provided with partition.
The present embodiment also provides a kind of evaporated device, as shown in Fig. 2, evaporated device include evaporation source 4, substrate 5 and on
State the evaporation source retaining device；The axis of the evaporation source and the axial location of pedestal are identical；Substrate (5) and evaporation source gear
The vertical range of pedestal (3) bottom of panel assembly is H, and H 750mm, the height of evaporation source retaining device is h, h 285mm；It steams
The vertical range of origin centre to substrate center is S, S 440mm；Evaporation source radius is r, r 30mm.
In the present embodiment, evaporation source is placed into crucible, crucible is placed in the pedestal of evaporation source retaining device,
The axis of middle evaporation source and the axial location of pedestal are identical；Evaporation source evaporation source for evaporation material on substrate is opened, vapor deposition terminates
Afterwards, the evaporation source material on evaporation source retaining device, the rate of recovery 50%, the rate of recovery=recycling evaporation source material/steaming are recycled
The evaporation source material of plating, then the utilization rate of evaporation source material is 55%, wherein the utilization rate of evaporation source material=point source evaporation source
Effective rate of utilization+rate of recovery of material, wherein the effective rate of utilization of point source evaporation source material is 5%.
Embodiment 2
The present embodiment provides a kind of evaporation source retaining device, retaining device sequentially connected overhead gage, extension from top to bottom
Baffle and pedestal, the angle for extending baffle and pedestal is 90 °；Overhead gage and the angle for extending baffle are θ, and θ is 150 °；Pedestal
For cylindrical shape, for placing evaporation source；The radius R of pedestal is 45mm, Zhou Changwei 282.6mm；Extension baffle is arc, extends gear
The arc length of plate is the one third of pedestal perimeter, as 94.2mm；The material for extending baffle is SUS material；Overhead gage is in pedestal
On vertical range a and R it is equal, be 45mm, then length L=a/cos (θ -90 °)=90mm of overhead gage；The material of overhead gage
For SUS material；Overhead gage surface is additionally provided with partition.
The present embodiment also provides a kind of evaporated device, and evaporated device includes evaporation source, substrate and evaporation described above
Source retaining device；The axis of the evaporation source and the axial location of pedestal are identical；The pedestal bottom of substrate and evaporation source retaining device
The vertical range in portion is H, and H 750mm, the height of retaining device is h, h 317.9mm；Substrate center is arrived at evaporation source center
Vertical range is S, S 440mm；The radius of evaporation source is r, r 30mm.
In the present embodiment, evaporation source is placed into crucible, crucible is placed in the pedestal of evaporation source retaining device,
The axis of middle evaporation source and the axial location of pedestal are identical；Evaporation source evaporation source for evaporation material on substrate is opened, vapor deposition terminates
Afterwards, the evaporation source material on evaporation source retaining device is recycled, the rate of recovery 42%, then the utilization rate of evaporation source material is 47%.
Embodiment 3
The present embodiment provides a kind of evaporation source retaining device, retaining device sequentially connected overhead gage, extension from top to bottom
Baffle and pedestal, the angle for extending baffle and pedestal is 90 °；Overhead gage and the angle for extending baffle are θ, and θ is 120 °；Pedestal
For cylindrical shape, for placing evaporation source；The radius R of pedestal is 45mm, Zhou Changwei 282.6mm；Extension baffle is arc, extends gear
The arc length of plate is 2/5ths of pedestal perimeter, as 113mm；The material for extending baffle is SUS material；Overhead gage is on pedestal
Vertical range a and R it is equal, be 45mm, then length L=a/cos (θ -90 °)=52mm of overhead gage；The material of overhead gage is
SUS material；Overhead gage surface is additionally provided with partition.
The present embodiment also provides a kind of evaporated device, and evaporated device includes evaporation source, substrate and evaporation described above
Source retaining device；The axis of the evaporation source and the axial location of pedestal are identical；The pedestal bottom of substrate and evaporation source retaining device
The vertical range in portion is H, and H 750mm, the height of retaining device is h, h 266mm；It hangs down to substrate center at evaporation source center
Straight distance is S, S 440mm；The radius of evaporation source is r, r 30mm.
In the present embodiment, evaporation source is placed into crucible, crucible is placed in the pedestal of evaporation source retaining device,
The axis of middle evaporation source and the axial location of pedestal are identical；Evaporation source evaporation source for evaporation material on substrate is opened, vapor deposition terminates
Afterwards, the evaporation source material on evaporation source retaining device is recycled, the rate of recovery 43%, then the utilization rate of evaporation source material is 48%.
Embodiment 4
The present embodiment provides a kind of evaporation source retaining device, retaining device sequentially connected overhead gage, extension from top to bottom
Baffle and pedestal, the angle for extending baffle and pedestal is 80 °；Overhead gage and the angle for extending baffle are θ, and θ is 130 °；Pedestal
For cylindrical shape, for placing evaporation source；The radius R of pedestal is 45mm, Zhou Changwei 282.6mm；Extension baffle is arc, extends gear
The arc length of plate is the half of pedestal perimeter, as 141.3mm；The material for extending baffle is SUS material；Overhead gage is on pedestal
Vertical range a and R is equal, is 45mm, then length L=a/cos (θ -90 °)=58mm of overhead gage；The material of overhead gage is SUS
Material；Overhead gage surface is additionally provided with partition.
The present embodiment also provides a kind of evaporated device, and evaporated device includes evaporation source, substrate and evaporation described above
Source retaining device；The axis of the evaporation source and the axial location of pedestal are identical；The pedestal bottom of substrate and evaporation source retaining device
The vertical range in portion is H, and H 750mm, the height of retaining device is h, h 256mm；It hangs down to substrate center at evaporation source center
Straight distance is S, S 440mm；The radius of evaporation source is r, r 30mm.
In the present embodiment, evaporation source is placed into crucible, crucible is placed in the pedestal of evaporation source retaining device,
The axis of middle evaporation source and the axial location of pedestal are identical；Evaporation source evaporation source for evaporation material on substrate is opened, vapor deposition terminates
Afterwards, the evaporation source material on evaporation source retaining device is recycled, the rate of recovery 50%, then the utilization rate of evaporation source material is 55%.
Embodiment 5
Difference with embodiment 1 is only that vertical range a of the overhead gage on pedestal is 20mm, lower than the radius R of pedestal,
Remaining structure and parameter are same as Example 1.
The rate of recovery of evaporation material is 30.7% (overhead gage area reduces about 55%) in the present embodiment, then evaporation source material
Utilization rate be 35.7%, when vertical range of the overhead gage on pedestal be lower than pedestal radius when, overhead gage area reduce, from
And the material that overhead gage is collected can also be reduced accordingly, will cause the waste of evaporation source material.
Embodiment 6
Difference with embodiment 1 is only that the arc length for extending baffle is 1/5th, as 56.5mm of pedestal perimeter,
Remaining structure and parameter are same as Example 1.
The rate of recovery of evaporation material is 37% in the present embodiment, then the utilization rate of evaporation source material is 42%, is kept off when extending
When the arc length of plate is lower, will cause substantial portion of evaporation material can not be collected on extension baffle, only the energy on overhead gage
Some materials are collected into, will cause the waste significantly of evaporation source material.
Embodiment 7
Difference with embodiment 1 is only that the arc length for extending baffle is 1/10th, as 28.3mm of pedestal perimeter,
Remaining structure and parameter are same as Example 1.
The rate of recovery of evaporation material is 32% in the present embodiment, then the utilization rate of evaporation source material is 37%, is kept off when extending
When the arc length of plate is lower, will cause substantial portion of evaporation material can not be collected on extension baffle, only the energy on overhead gage
Some materials are collected into, will cause the waste significantly of evaporation source material.
Comparative example 1
It is 90 ° that difference with embodiment 1, which is only that overhead gage and extends the angle of baffle, remaining structure and parameter with reality
It is identical to apply example 1.
The rate of recovery of evaporation material is 50% in this comparative example, then the utilization rate of evaporation source material is 55%, works as overhead gage
It is 90 ° with the angle for extending baffle, there will be part evaporation source materials in the case where the reflection of overhead gage is used, and former road returns to evaporation source
In, it will cause the pollution of evaporation source.
Comparative example 2
It is 180 ° that difference with embodiment 1, which is only that overhead gage and extends the angle of baffle, remaining structure and parameter with
Embodiment 1 is identical.
The rate of recovery of evaporation material is 15% in this comparative example, then the utilization rate of evaporation source material is 20%, works as overhead gage
It is 180 ° with the angle for extending baffle, then can not be evaporated to side for being only capable of being collected on evaporation source material vapor deposition to overhead gage
Some materials.
Comparative example 3
Difference with embodiment 1 is only that extending the angle of baffle and pedestal is 135 °, remaining structure and parameter with reality
It is identical to apply example 1.
The rate of recovery of evaporation material is 15.7% in this comparative example, then the utilization rate of evaporation source material is 20.7%, when prolonging
When the angle for stretching baffle and pedestal is 135 °, it will cause very big a part of evaporation material and can not be collected into and extend baffle and overhead gage
On, it will cause the waste significantly of evaporation source material.
The Applicant declares that the foregoing is merely specific embodiment of the present utility model, but the protection model of the utility model
It encloses and is not limited thereto, it should be clear to those skilled in the art, any to belong to those skilled in the art and exist
In the technical scope that the utility model discloses, any changes or substitutions that can be easily thought of, all falls within the protection scope of the utility model
Within the open scope.
Claims (10)
1. a kind of evaporation source retaining device, which is characterized in that the retaining device includes sequentially connected overhead gage from top to bottom
(1), extend baffle (2) and pedestal (3)；
Baffle (2) and the angle of pedestal (3) of extending are β, 0 ° of β≤90 ° <；
The overhead gage (1) and the angle for extending baffle (2) are θ, 90 ° of 180 ° of < θ <.
2. evaporation source retaining device according to claim 1, which is characterized in that the pedestal (3) is cylindrical shape, for putting
Set evaporation source.
3. evaporation source retaining device according to claim 2, which is characterized in that baffle (2) and the pedestal (3) of extending
Angle is 90 °.
4. evaporation source retaining device according to claim 2, which is characterized in that the extension baffle (2) is arc；
The a length of C of circumference of the pedestal (3), the arc length for extending baffle (2) is l, l≤0.5C.
5. evaporation source retaining device according to claim 1, which is characterized in that the extension baffle (2) be high temperature resistant or
The extension baffle of vacuum-resistant material；
The overhead gage (1) is the overhead gage of high temperature resistant or vacuum-resistant material.
6. evaporation source retaining device according to claim 2, which is characterized in that the length of the overhead gage (1) is L, on
Vertical range of the baffle (1) on pedestal (3) is a, a=L cos (θ -90 °)；The radius of the pedestal (3) is R；The a≤
R。
7. evaporation source retaining device according to claim 1, which is characterized in that overhead gage (1) surface is additionally provided with
Partition.
8. a kind of evaporated device, which is characterized in that the evaporated device includes evaporation source (4), substrate (5) and baffle；It is described
Baffle is the described in any item evaporation source retaining devices of claim 1-7.
9. evaporated device according to claim 8, which is characterized in that the axis of the evaporation source (4) and the axis of pedestal (3)
Line position is identical；
The vertical range of pedestal (3) bottom of the substrate (5) and evaporation source retaining device is H, the height of evaporation source retaining device
Degree is h；The h < H.
10. evaporated device according to claim 9, which is characterized in that evaporation source (4) center to substrate (5) center
Vertical range be S；The radius of the evaporation source (4) is r；The radius of the pedestal (3) is R；The r < R < S.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920211876.9U CN209568138U (en) | 2019-02-19 | 2019-02-19 | A kind of evaporation source retaining device and evaporated device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920211876.9U CN209568138U (en) | 2019-02-19 | 2019-02-19 | A kind of evaporation source retaining device and evaporated device |
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| Publication Number | Publication Date |
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| CN209568138U true CN209568138U (en) | 2019-11-01 |
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ID=68335311
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| CN201920211876.9U Active CN209568138U (en) | 2019-02-19 | 2019-02-19 | A kind of evaporation source retaining device and evaporated device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113061847A (en) * | 2021-03-19 | 2021-07-02 | 云谷（固安）科技有限公司 | Display device evaporation device and evaporation method |
-
2019
- 2019-02-19 CN CN201920211876.9U patent/CN209568138U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113061847A (en) * | 2021-03-19 | 2021-07-02 | 云谷（固安）科技有限公司 | Display device evaporation device and evaporation method |
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