CN206244867U - Evaporated device - Google Patents
Evaporated device Download PDFInfo
- Publication number
- CN206244867U CN206244867U CN201621421395.3U CN201621421395U CN206244867U CN 206244867 U CN206244867 U CN 206244867U CN 201621421395 U CN201621421395 U CN 201621421395U CN 206244867 U CN206244867 U CN 206244867U
- Authority
- CN
- China
- Prior art keywords
- shutter
- pallet
- crucible
- evaporated device
- ratchet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model is related to display preparing technical field, discloses a kind of evaporated device, is used to reduce the generation that the organic material on shutter enters phenomenon in evaporation source and crucible, improves the quality of material in the service life and crucible of evaporation source.Evaporated device, including：Evaporation chamber, the evaporation source in evaporation chamber, the crucible in evaporation source, positioned at the rotating shaft being deposited with chamber and can be rotated around own axes, the shutter being fixedly connected with rotating shaft, shutter can rotate to the top of evaporation source；Also include：Positioned at shutter towards the side of crucible ratchet mechanism, the ratchet in ratchet mechanism is fixedly connected with rotating shaft, and the ratchet cover plate in ratchet mechanism is installed in rotating shaft；The pallet being fixedly connected with the ratchet cover plate of ratchet mechanism.
Description
Technical field
The utility model is related to display preparing technical field, more particularly to a kind of evaporated device.
Background technology
Current Organic Electricity laser display (Organic Light-Emitting Diode, OLED) in the preparation, typically
Film layer is formed using vacuum evaporation technology, i.e., using evaporator, under vacuum conditions, intensification heating material waves melt material
Hair is distilled, and organic material from level to level is deposited on the glass substrate, forms OLED.
Need to control evaporation rate when organic material is deposited with, to control the thickness of the evaporation layer to be formed, steamed in point source formula
In plating cavity, there is certain gap between the heater strip and crucible of point source, when the speed to organic material is controlled, hide
Baffle plate needs reciprocally swinging, and to prevent evaporation material evaporation to glass substrate, so, evaporation material can be steamed on shutter,
With the continuous growth of material, buildup of material becomes many, and under the influence of gravity and shutter swing generation vibrations repeatedly, evaporation is arrived
Material on shutter can be dropped in point source and in crucible, and pollution can be thus produced to point source and crucible, influence point source
The quality of material in life-span and crucible.
Utility model content
The utility model provides a kind of crucible and evaporated device, is used to reduce the organic material on shutter and enters evaporation
The generation of phenomenon in source and crucible, improves the quality of material in the service life and crucible of evaporation source.
To reach above-mentioned purpose, the utility model provides following technical scheme：
The utility model provides a kind of evaporated device, including：Evaporation chamber, the evaporation in the evaporation chamber
Source, the crucible in the evaporation source is and described in the evaporation chamber and the rotating shaft that can be rotated around own axes
The shutter that rotating shaft is fixedly connected, the shutter can rotate to the top of the evaporation source；Also include：
Positioned at the shutter towards the side of the crucible ratchet mechanism, ratchet in the ratchet mechanism with it is described
Rotating shaft is fixedly connected, and the ratchet cover plate in the ratchet mechanism is installed in the rotating shaft；
The pallet being fixedly connected with the ratchet cover plate of the ratchet mechanism.
The evaporated device that the utility model is provided, the organic material being deposited with shutter can be collected by the pallet for setting
Material, shutter reciprocally swinging in the angle of setting, by the ratchet mechanism for setting so that during shutter rotate counterclockwise, spine
Pawl can promote ratchet cover plate rotate counterclockwise, and pallet can be with slowly rotating, and shutter, when turning clockwise, ratchet is in the ratchet cover plate
Upper slip, the ratchet cover plate will not rotate, and pallet will not also rotate, and after shutter swings, pallet can be located at shutter moving region
Interior lower section, athletic meeting produces vibration to shutter repeatedly, and the organic material being now deposited with shutter can be fallen on pallet by shaking,
The generation that the organic material on shutter is vibrated phenomenon in evaporation source and crucible is reduced, treats that shutter swings several times repeatedly again
Afterwards, pallet may proceed to rotate counterclockwise, rotate through the top of crucible, thus can on substrate plated film.
Therefore, the evaporated device that the utility model is provided, it is possible to reduce the organic material on shutter enters evaporation source and earthenware
The generation of phenomenon in crucible, improves the quality of material in the service life and crucible of evaporation source.
In some optional implementation methods, the pallet is the reeded fan trays of tool.The edge of groove can stop
The organic material that pallet is connected to slides.
In some optional implementation methods, the bottom surface of the pallet and the shutter towards the crucible one side it
Between distance be more than or equal to 50 millimeters.When can so prevent the organic material of evaporation on shutter thicker, the pallet with lower section
Produce interference, influence pallet rotation.
In some optional implementation methods, the shutter is circular shutter.
In some optional implementation methods, orthographic projection of the shutter in the plane where the bottom surface of the pallet
Orthographic projection of the relatively described pallet of the first center line in the plane where its bottom surface the first side rotate counterclockwise angle
More than or equal to 0 degree less than or equal to the half of the shutter full swing angle, wherein first center line and the rotating shaft
Axis intersect, first side is near orthographic projection of the shutter in the plane where the bottom surface of the pallet.So
When shutter returns to initial position after the completion of a reciprocally swinging, pallet just can be in shutter length in the first direction
Shutter projection thereon is covered on (i.e. the distance between side of the shutter away from pallet and the side near pallet).
In some optional implementation methods, the radius of the diameter less than or equal to the pallet of the circular shutter.This
Sample when shutter returns to initial position after the completion of a reciprocally swinging, pallet just can shutter in a second direction
Shutter is covered in length (the distance between the one end of one end that i.e. shutter is connected with rotating shaft to shutter away from rotating shaft) to exist
Projection thereon.
In some optional implementation methods, the angle of the pallet is more than or equal to most putting on for n times of the shutter
Move angle and less than or equal to the first set angle, wherein n is more than or equal to 2, and first set angle is equal to 360 degree with the screening
The difference of baffle plate full swing angle.When such setting can cause shutter at least reciprocally swinging twice, shutter is in support
The orthographic projection in plane where the bottom surface of disk is fully located in pallet.
In some optional implementation methods, the angle of the pallet is 180 degree or 270 degree.180 degree and 270 sector
Pallet is easy to prepare.
In some optional implementation methods, one side and the crucible towards the support of the pallet towards the crucible
The distance between one side of disk is more than 20 millimeters.Pallet is avoided to be collided with the upper surface of crucible when rotated abrasion.
In some optional implementation methods, the pallet is provided with for the pallet of metal material, and the surface of the pallet
Sandblasting layer.The setting of metal material and sandblasting layer can prevent the organic material collected from corrosion is caused to pallet, improve pallet
Service life.
Brief description of the drawings
Accompanying drawing described herein is used for providing being further understood to of the present utility model, constitutes of the present utility model one
Point, schematic description and description of the present utility model is used to explain the utility model, does not constitute to of the present utility model
Improper restriction.In the accompanying drawings：
A kind of view of the evaporated device that Fig. 1 is provided for the utility model embodiment；
The structural representation of the ratchet mechanism in evaporated device that Fig. 2 is provided for the utility model embodiment；
Fig. 3 is the A of the evaporated device shown in Fig. 1 to structural representation；
Another structural representation of the evaporation setting that Fig. 4 is provided for the utility model embodiment；
Shutter and pallet relative position variable condition schematic diagram that Fig. 5 a and Fig. 5 b are provided for the utility model embodiment.
In figure：
1- evaporation source 2- crucibles
3- rotating shaft 4- shutters
The 5- ratchet mechanism 51- ratchet cover plates
52- ratchet 6- pallets
Specific embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is carried out
Clearly and completely describe, it is clear that described embodiment is only a part of embodiment of the utility model, rather than whole
Embodiment.
As shown in Figure 1, Figure 2, shown in Fig. 3, Fig. 4, Fig. 5 a and Fig. 5 b, wherein：The steaming that Fig. 1 is provided for the utility model embodiment
A kind of view of coating apparatus；The structure of the ratchet mechanism 5 in the evaporated device that Fig. 2 is provided for the utility model embodiment
Schematic diagram；Fig. 3 is the A of the evaporated device shown in Fig. 1 to structural representation；The evaporation that Fig. 4 is provided for the utility model embodiment
Another structural representation of setting；Shutter and pallet relative position that Fig. 5 a and Fig. 5 b are provided for the utility model embodiment
Variable condition schematic diagram.
The utility model provides a kind of evaporated device, including：Evaporation chamber, the evaporation source 1 in evaporation chamber, position
In the crucible 2 in evaporation source 1, positioned at the rotating shaft 3 being deposited with chamber and can be rotated around own axes, it is fixedly connected with rotating shaft 3
Shutter 4, shutter 4 can rotate to the top of evaporation source 1；Also include：
Positioned at shutter 4 towards the side of crucible 2 ratchet mechanism 5, the ratchet 52 in ratchet mechanism 5 fixes with rotating shaft 3
Connection, the ratchet cover plate 51 in ratchet mechanism 5 is installed in rotating shaft 3；
The pallet 6 being fixedly connected with the ratchet cover plate 51 of ratchet mechanism 5.
The evaporated device that the utility model is provided, the organic material being deposited with shutter 4 can be collected by the pallet 6 for setting
Material, the reciprocally swinging in the angle of setting of shutter 4, by the ratchet mechanism 5 for setting so that during 4 rotate counterclockwise of shutter,
Ratchet 52 can promote the rotate counterclockwise of the ratchet cover plate 51, and pallet 6 can be with slowly rotating, and shutter 4 is when turning clockwise, ratchet
52 slide on the ratchet cover plate 51, and the ratchet cover plate will not rotate, and pallet 6 will not also rotate, as shown in Figure 5 a, when shutter 4 start it is inverse
When hour hands swing, also with the rotate counterclockwise of shutter 4, when shutter 4 back swings, pallet 6 begins to collect and hides pallet 6
Organic material on baffle plate, as shown in Figure 5 b, with the continuous swing of shutter 4, pallet 6 can be located at the moving region of shutter 4
Interior lower section, athletic meeting produces vibration to shutter 4 repeatedly, and the organic material being now deposited with shutter 4 can be shaken and fall pallet 6
On, the generation that the organic material on shutter 4 is vibrated phenomenon in evaporation source 1 and crucible 2 is reduced, treat shutter 4 again repeatedly
Swing several times after, pallet 6 may proceed to rotate counterclockwise, rotate through the top of crucible 2, thus can on substrate plated film.
Therefore, the evaporated device that the utility model is provided, it is possible to reduce the organic material on shutter 4 enters the He of evaporation source 1
The generation of phenomenon in crucible 2, improves the quality of material in the service life and crucible 2 of evaporation source 1.
Ratchet mechanism (ratchet and pawl), a kind of one-way intermittent motion mechanism being made up of ratchet and pawl.Spine
The wheel gear teeth generally use unidirectional tooth, ratchet to be articulated with rocking bar, when rocking bar counterclockwise swings, drive ratchet just to insert ratchet
Tooth is rotate in same direction with promoting ratchet；When rocking bar swings clockwise, ratchet is slipped on ratchet, and ratchet stops operating.
The concrete shape of above-mentioned pallet 6 can have various, and optionally, pallet 6 is with groove fan trays 6.Sector support
Disk 6 is easy to prepare, and is easy to collect the organic material on shutter 4, and the edge of groove can stop the organic material that pallet is connected to
Slide.Certainly, the concrete shape of pallet 6 is not limited to sector, or rectangle etc., just no longer repeats one by one here.
During in order to prevent the organic material of evaporation on shutter 4 thicker, the pallet 6 with lower section produces interference, influences pallet 6
Rotation, the bottom surface of pallet 6 and shutter 4 are more than or equal to 50 millimeters towards the distance between the one side a of crucible 2.
In the specific embodiment that the utility model is provided, shutter 4 is circular shutter 4.
Further, as shown in figure 3, when shutter and pallet do not rotate, that is, when being in initial position, shutter
First center line opposing tray 6 of 4 orthographic projection in the plane where the bottom surface of pallet 6 is in the plane where its bottom surface
The angle b of the first side rotate counterclockwise of orthographic projection is more than or equal to 0 degree less than or equal to the one of the shutter full swing angle
Half, wherein the first center line intersects with the axis of rotating shaft 3, the first side is near shutter 4 in the plane where the bottom surface of pallet 6
Orthographic projection.Angle b is arranged such, can cause shutter 4 at least in first time rotate counterclockwise, pallet will not be blocked
Firmly evaporation source, i.e. shutter can collect the organic material that cannot be deposited with substrate, when shutter swings meeting initially again
During position, pallet just can (i.e. shutter be away from the side of pallet and near pallet in the length of shutter x in the first direction
The distance between side) on cover shutter projection thereon.
Preferably, the diameter of circular shutter is less than or equal to the radius of pallet, so in shutter in a reciprocally swinging
When returning to initial position after ability after complete, pallet just can be in length (the i.e. shutter and rotating shaft of the y in a second direction of shutter
One end of connection to shutter away from rotating shaft the distance between one end) on cover shutter projection thereon.
The angle of the pallet that the utility model embodiment is provided is more than or equal to the full swing angle of n times of shutter and small
In equal to the first set angle, wherein n is more than or equal to 2, and the first set angle is equal to 360 degree with shutter full swing angle
Difference.When such setting can cause shutter at least reciprocally swinging twice, shutter is in the plane where the bottom surface of pallet
Interior orthographic projection is fully located in pallet.
The angle that the utility model implements the fan trays 6 of offer is less than or equal to 270 degree more than or equal to 180 degree.So
Structure setting be easy to prepare.
In the embodiment that the utility model is provided, the upper surface in order to avoid pallet 6 when rotated with crucible 2 is collided with
Abrasion, pallet 6 towards crucible 2 with crucible 2 towards pallet 6 while the distance between be more than 20 millimeters.
From the material shape of corrosion-and high-temp-resistant, optionally, pallet 6 is the pallet 6 of metal material to above-mentioned pallet 6, and
The surface of pallet 6 is provided with sandblasting layer.The setting of metal material and sandblasting layer can prevent the organic material collected from being caused to pallet 6
Corrosion, improves the service life of pallet 6.
Obviously, those skilled in the art can carry out various changes and modification without deviating from this practicality to the utility model
New spirit and scope.So, if it is of the present utility model these modification and modification belong to the utility model claim and
Within the scope of its equivalent technologies, then the utility model is also intended to comprising these changes and modification.
Claims (10)
1. a kind of evaporated device, including：Evaporation chamber, the evaporation source in the evaporation chamber, in the evaporation source
Crucible, in the evaporation chamber and the rotating shaft that can be rotated around own axes, with blocking that the rotating shaft is fixedly connected
Plate, the shutter can rotate to the top of the evaporation source；Characterized in that, also including：
Positioned at the shutter towards the side of the crucible ratchet mechanism, ratchet and the rotating shaft in the ratchet mechanism
It is fixedly connected, the ratchet cover plate in the ratchet mechanism is installed in the rotating shaft；
The pallet being fixedly connected with the ratchet cover plate of the ratchet mechanism.
2. evaporated device according to claim 1, it is characterised in that the pallet is the reeded fan trays of tool.
3. evaporated device according to claim 1, it is characterised in that the bottom surface of the pallet and the shutter towards institute
The distance between one side of crucible is stated more than or equal to 50 millimeters.
4. evaporated device according to claim 2, it is characterised in that the shutter is circular shutter.
5. evaporated device according to claim 4, it is characterised in that the shutter is where the bottom surface of the pallet
First side of orthographic projection of the relatively described pallet of the first center line of the orthographic projection in plane in the plane where its bottom surface is inverse
The angle of hour hands rotation is less than or equal to the half of the shutter full swing angle more than or equal to 0 degree, wherein in described first
Heart line intersects with the axis of the rotating shaft, and first side is near the shutter in the plane where the bottom surface of the pallet
Orthographic projection.
6. evaporated device according to claim 5, it is characterised in that the diameter of the circular shutter is less than or equal to described
The radius of pallet.
7. evaporated device according to claim 5, it is characterised in that the angle of the pallet is described more than or equal to n times
The full swing angle of shutter and less than or equal to the first set angle, wherein n is more than or equal to 2, described first set angle etc.
In 360 degree with the difference of the shutter full swing angle.
8. evaporated device according to claim 5, it is characterised in that the angle of the pallet is 180 degree or 270 degree.
9. evaporated device according to claim 1, it is characterised in that the pallet towards the crucible one side with it is described
Crucible is more than 20 millimeters towards the distance between the one side of the pallet.
10. the evaporated device according to any one of claim 1~9, it is characterised in that the pallet is the support of metal material
Disk, and the surface of the pallet is provided with sandblasting layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621421395.3U CN206244867U (en) | 2016-12-21 | 2016-12-21 | Evaporated device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621421395.3U CN206244867U (en) | 2016-12-21 | 2016-12-21 | Evaporated device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206244867U true CN206244867U (en) | 2017-06-13 |
Family
ID=59008682
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621421395.3U Active CN206244867U (en) | 2016-12-21 | 2016-12-21 | Evaporated device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206244867U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106435484A (en) * | 2016-12-21 | 2017-02-22 | 京东方科技集团股份有限公司 | Evaporation plating equipment |
-
2016
- 2016-12-21 CN CN201621421395.3U patent/CN206244867U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106435484A (en) * | 2016-12-21 | 2017-02-22 | 京东方科技集团股份有限公司 | Evaporation plating equipment |
| CN106435484B (en) * | 2016-12-21 | 2018-07-17 | 京东方科技集团股份有限公司 | Evaporated device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106435484B (en) | Evaporated device | |
| CN206244867U (en) | Evaporated device | |
| JP6938078B2 (en) | Powder coating equipment | |
| WO2008025242A1 (en) | Moving method of cooking pot and device thereof | |
| CN106978588B (en) | A kind of vapor deposition cover, evaporation source, evaporation coating device and evaporation coating method | |
| CN204033051U (en) | A kind of stir-frying mechanism of automatic cooking apparatus | |
| CN104026964B (en) | Stir-frying control method and stir-frying mechanism of automatic cooking equipment | |
| EP2060657A1 (en) | Substrate supporting device and sputtering apparatus including the same | |
| EP3123091B1 (en) | Light-curing oven | |
| US2876039A (en) | Apparatus for distributing pasty material | |
| CN109136855B (en) | Evaporation source and evaporation device | |
| CN205731971U (en) | Chain drive screen brush | |
| US1869539A (en) | Food preparing machine | |
| JP2016132811A (en) | Vapor deposition device and optical substrate holding member for vapor deposition device | |
| CN208232032U (en) | Prime cement device on a kind of Novel ceramic tile | |
| CN106399950B (en) | A kind of film plating process for realizing ion source uniform irradiation film plating substrate | |
| JP5497553B2 (en) | Fine particle film forming method and apparatus | |
| US3961567A (en) | Machine for automatically making pancakes | |
| JP6865071B2 (en) | Powder coating equipment and how to use it | |
| JP6902339B2 (en) | Powder coating equipment and how to use it | |
| JPS63147571A (en) | Paint pan with stirrer | |
| US2009652A (en) | Spray device | |
| CN217839103U (en) | Film coating machine | |
| CN115110037B (en) | Coating method of evaporation coating device and evaporation coating device | |
| SU837827A1 (en) | Device for surface-strengthening of parts by shot-peening |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |