JP6865071B2 - Powder coating equipment and how to use it - Google Patents

Description

The present disclosure relates to a powder coating apparatus and a method of using the same.

A thin film may be coated on the surface of the particles to give the powder its function. There is a sputtering method as a technique for coating by a dry method, and various coating devices for powders using the sputtering method have been proposed (see, for example, Patent Documents 1 to 4).

In Patent Document 1, a sputtering apparatus including a rotating barrel whose inside is held in a vacuum, a target unit arranged in the rotating barrel, and a DC type sputtering power supply connected to the target unit and capable of generating plasma. Discloses a technique for sputtering platinum onto carbon powder using the above. Here, the target is sputtered and coated while rotating the rotating barrel. Then, the stirring blade is arranged in the barrel and oscillates within a range of an angle of ± α around the rotation axis of the rotating barrel to prevent the carbon powder from agglomerating.

Patent Document 2 discloses a technique of coating various metals on the surface of a magnetic powder by using a sputtering apparatus having a rotating barrel. Also in this document, the stirring blade is arranged in the barrel and oscillates within a range of an angle of ± α around the rotation axis of the rotating barrel to prevent the magnetic powder from agglomerating.

Patent Document 3 discloses a powder coating apparatus that forms a uniform coating layer on the surface of powder particles while stirring the raw material powder charged in the rotating drum and scraping off the raw material powder adhering to the inner wall of the drum. Here, the stirring plate mixes the powder particles in the upper layer and the lower layer forming the fluidized bed with each other, and the individual powder particles are equally exposed to sputtering. Further, the scraper scrapes off the powder that adheres to the inner surface of the drum and tries to rotate together with the drum body, and returns the powder particles to the fluidized bed. Furthermore, the wiper returns the powder particles that have fallen and accumulated on the upper surface of the casing to the fluidized bed.

Patent Document 4 discloses a powder coating apparatus in which a rotating tubular container is arranged in the vacuum container because the structure becomes complicated when the vacuum container itself is rotated. Here, the stirring bar arranged with a clearance between the drum and the drum is rotated or swung by an independent drive unit. Further, a stirring member that moves in conjunction with the stirring bar and hits the drum is provided.

The applicant also proposes a multi-dimensional sputtering apparatus (see, for example, Patent Documents 5 and 6).

Japanese Unexamined Patent Publication No. 2012-18267 Japanese Patent No. 4183098 Japanese Unexamined Patent Publication No. 5-271922 Japanese Unexamined Patent Publication No. 2014-159623 International Publication No. 2017/014304 Japanese Unexamined Patent Publication No. 2017-31509

When a film is formed on a substrate using a sputtering device, the substrate is arranged parallel to the target. According to this, in a powder coating device, it is ideal that the surface of the powder, that is, the surface formed by the aggregate of fine particles, is flattened along the inner wall surface of the cylindrical drum.

However, in all of the powder coating devices described in Patent Documents 1 to 4, the powder is placed in a rotating drum. Therefore, the surface of the powder, that is, the surface formed by the aggregate of fine particles, forms a mountain shape and is constantly deformed during the film formation. The powder agitation mechanism of these devices does not work to even out the surface of the powder.

The powder coating apparatus described in Patent Documents 5 and 6 includes a leveling component that functions to level the surface of the powder. Patent Documents 5 and 6 do not study how to adjust the leveling component with respect to the rotational speed of the barrel.

An object of the present disclosure is to provide a powder coating apparatus capable of stirring powder more efficiently when forming a film and a method of using the powder coating apparatus.

The powder coating apparatus according to the present invention includes a barrel, an exhaust means for vacuuming the inside of the barrel, and a sputtering apparatus installed in the barrel and having at least one target. In a powder coating device that is oriented in the horizontal direction and rotates about the main axis, and the sputtering device forms a coating film on the surface of the powder placed in the barrel, the powder coating device is further described. From the powder rise suppressing component, which is arranged in contact with the side wall of the portion of the inner side wall of the barrel that moves upward due to the rotation of the barrel, and which determines the upper limit position at which the powder approaches, and the powder rise suppressing component. Also at a lower position, the powder leveling component is arranged on the inner side wall of the barrel at intervals and oscillates around the spindle as the center of rotation, and the leveling component rotates the barrel. maximum speed of moving in the same direction as the direction, the barrel rotation speed rather fast than the the maximum speed V1 which said smoothing component is moved in the same direction as the rotation of the barrel, the smoothing part of the barrel Condition 1 is satisfied when the maximum speed of movement in the direction opposite to the rotation direction is V2 . By satisfying condition 1, when the leveling part moves in the same direction as the rotation direction of the barrel, the powder is stirred more uniformly, and when the leveling part moves in the direction opposite to the rotation direction of the barrel, the powder Can be evened out more evenly.
(Condition 1) V1> V2

In the powder coating apparatus according to the present invention, when the leveling component moves in a direction opposite to the rotation direction of the barrel, the maximum moving speed of the leveling component is preferably slower than the rotation speed of the barrel. No.

In the powder coating apparatus according to the present invention, when the leveling component oscillates in a direction opposite to the rotation direction of the barrel, the lowest position of the inner side wall of the barrel or a position beyond the position is exceeded. It is preferable to stop at for a predetermined time. Even if the powder has poor fluidity, the powder can be returned to the film forming range, and the sputtered particles can be easily applied uniformly to the entire powder.

In the powder coating apparatus according to the present invention, the turning point of the opposite side of the front Symbol powder elevation suppressing component side of the smoothing part, of the inner side wall of the barrel, be a position beyond the lowest position or the position It is preferable that the leveling component is stopped for a predetermined time at a turning point on the side opposite to the powder rise suppressing component side. Even if the powder has poor fluidity, the powder can be returned to the film forming range, and the sputtered particles can be easily applied uniformly to the entire powder.

The method of using the powder coating device according to the present invention is the method of using the powder coating device according to the present invention, and the amount of powder to be put into the barrel is such that the leveling component oscillates in the rotation direction of the barrel. It is characterized in that it is an amount that sometimes passes through the inside of the powder pile and smoothes the powder pile when it makes a oscillating motion in a direction opposite to the rotation direction of the barrel.

According to the present disclosure, it is possible to provide a powder coating apparatus capable of stirring powder more efficiently when forming a film and a method of using the powder coating apparatus.

It is an overall block diagram of the powder coating apparatus which concerns on this embodiment. It is the schematic of the AA cross section about the target unit, the barrel, the powder rise suppressing part and the leveling part. It is a perspective schematic view about a target unit and a barrel. It is a schematic diagram for demonstrating the relationship between the orientation of a target and the position of a powder. It is the schematic for demonstrating the movement by the 1st angle adjustment mechanism of a target unit. It is a schematic diagram explaining the movement which stirs and smoothes a powder in the powder coating apparatus which concerns on this embodiment. The leveling parts move in the order of (a), (b), (c), (d), and (e) in chronological order, and then return to (a) and repeat. It is a schematic diagram explaining the movement that a leveling part agitates and leveles a powder when the fluidity of the powder is poor.

Hereinafter, the present invention will be described in detail by showing embodiments, but the present invention is not construed as being limited to these descriptions. The embodiments may be modified in various ways as long as the effects of the present invention are exhibited.

Prior to explaining the powder stirring method, the film forming mechanism will be described first.

First, refer to FIGS. 1 to 3. FIG. 1 is an overall configuration diagram of a powder coating apparatus according to the present embodiment. FIG. 2 is a schematic view of the AA cross section of the target unit, the barrel, the powder rise suppressing component, and the leveling component. FIG. 3 is a schematic perspective view of the target unit and the barrel. As shown in FIG. 1, the powder coating apparatus 100 according to the present embodiment includes a barrel 3, an exhaust means 4 for evacuating the inside of the barrel 3, and a sputtering apparatus 2 installed in the barrel 3. The barrel 3 has a spindle C oriented in the horizontal direction and rotates about the spindle C, and the sputtering apparatus 2 forms a coating film on the surface of the powder 7 placed in the barrel 3.

The powder coating apparatus according to the present embodiment is a rotary barrel sputtering apparatus capable of coating the entire surface of powder particles. Here, the embodiment in which the powder coating apparatus 100 is a multi-dimensional sputtering apparatus including a plurality of targets will be described, but the present invention is not limited to this, and the powder coating apparatus 100 is a unit sputtering apparatus including one target. It may be.

The powder coating device 100 according to the present embodiment is, for example, a rotary barrel type multi-dimensional sputtering device capable of applying a coating film to the entire surface of powder particles. This device can sputter two or more targets at the same time, and each target is individually connected to the power source 1. It is preferable that each target is connected to one power source. For example, if two or more types of targets are attached, it is possible to sputter a plurality of substances at the same time. Further, since the output of each target can be adjusted individually, it is possible to sputter at an arbitrary ratio.

The barrel 3 is supported by a driving roll 5a and a driven roll 5b. The drive roll 5a can receive power from the drive motor 5 and rotate the main axis C of the barrel 3 as a horizontal axis. The barrel 3 is provided with a barrel body 3d having an open upper end of the cylinder and a lid 3e for closing the barrel body 3d, and is sealed with an O-ring (not shown). The powder 7 is charged into the barrel 3 through the opening of the barrel body 3d. Further, the barrel 3 may have a vertically divided or horizontally divided structure instead of having the barrel body 3d and the lid 3e. In this case, the powder 7 is charged at the time of division.

The barrel 3 also serves as a vacuum container. The evacuating exhaust means 4 exhausts the gas in the internal space of the barrel 3. The exhaust means 4 is airtightly held by the vacuum seal type bearing 4a.

The barrel 3 may be placed in a vacuum chamber (not shown). In this case, since it is not necessary to seal the barrel 3, the structure of the barrel can be simplified.

The sputtering device 2 installed inside the barrel 3 is connected to a sputtering power supply 1 installed outside the barrel 3. The sputtering power supply 1 may be either a DC power supply or a high frequency power supply. The sputtering device 2 is mounted in the barrel 3 by an arm 1b airtightly held by a vacuum seal type bearing 1a. The target cooling water passage inlet 1c, the target cooling water passage outlet 1d, and the argon gas inlet 1e are built in the airtightly maintained arm 1b.

Two or more sputtering devices 2 are installed in the barrel 3 (in FIG. 2, three sputtering devices 2a, 2b, 2c are installed), whereby two sputtering devices 2 are installed in the barrel 3. The above targets 6 can be installed (in FIG. 2, three targets 6a, 6b, and 6c are installed). The sputtering apparatus 2 has one fixing portion 10 (10a, 10b, 10c) for each target. That is, in FIG. 2, the three sputtering devices 2a, 2b, and 2c have fixed portions 10a, 10b, and 10c, respectively. Further, the sputtering power supply 1 is separately connected to the sputtering devices 2a, 2b, and 2c, and the output is controlled separately. As a result, the sputtering apparatus 2 becomes a multi-dimensional sputtering apparatus.

The fixing portion 10 is a backing plate that holds the target 6. The target 6 is attached to the front side of the backing plate by a mounting bracket. On the front side of the backing plate, a shield cover, which is the opposite electrode when plasma is generated, is attached at a predetermined distance from the backing plate. On the other hand, a plurality of recesses for accommodating magnets are formed on the back side of the backing plate. Further, on the back side of the backing plate, a cooling water passage connected to the target cooling water passage inlet 1c and the target cooling water passage outlet 1d is arranged.

When the target 6 is attached to the fixed portion 10, the targets 6a, 6b, and 6c are arranged in parallel with each other at the same level position with respect to the direction of the spindle C, as shown in FIG. For example, it is preferable that the positions of the centers of gravity of the targets 6a, 6b, and 6c in the direction of the spindle C are aligned with each other. Further, when the sizes of the targets 6a, 6b, and 6c in the direction of the spindle C are the same, it is preferable that the positions of both ends of the targets in the direction of the spindle C are aligned with each other. Since the barrel 3 rotates about the spindle C, if the targets 6a, 6b, 6c are arranged in parallel with each other at the same level position with respect to the direction of the spindle C, the barrels 3 pop out from the targets 6a, 6b, 6c. Since the sputtered particles evenly hit the powder contained in the rotating barrel 3, composition unevenness is unlikely to occur. Further, the length of each of the targets 6a, 6b, 6c in the direction of the spindle C is preferably slightly shorter than the length of the barrel 3 in the axial direction in order to avoid interference.

If the targets are arranged in order along the direction of the spindle C instead of the targets shown in FIG. 3, the powder is difficult to mix in the direction of the spindle C, so that only the sputtered particles protruding from one target hit the film. The composition becomes uneven. That is, since a plurality of types of sputtered particles protruding from a plurality of targets do not reach the surface of the powder particles at the same time, a uniform alloy film, a double oxide film, a double nitride film, or a double carbide film cannot be formed. If each target is arranged in order along the direction of the main axis C and the direction of the target surface is adjusted so that the target particles protruding from each target gather in a predetermined area, the above problem can be solved, but the area is the main axis. It is limited to a part of the barrel side wall in the C direction. Then, the amount of powder that can be processed per the volume of the barrel becomes small, and the productivity is inferior. Even if the same type of target is used, the productivity is similarly inferior.

Next, refer to FIG. FIG. 4 is a schematic view for explaining the relationship between the orientation of the target and the position of the powder. In the powder coating apparatus 100 according to the present embodiment, as shown in FIG. 4, each target 6a, 6b, 6c has a target surface on the inner side wall 3a of the barrel 3 in parallel with the normals ha, hb, hc of the target surface. When projected toward, it is preferable that the projection views are oriented in an overlapping direction before reaching the inner side wall 3a. Since the elements (sputtered particles) protruding from each of the targets 6a, 6b, and 6c arrive in a more mixed state with respect to the powder 7 contained in the barrel 3, each element is evenly taken in from each target. A thin film can be formed on the surface of powder particles. Specifically, the front side of reaching the inner side wall 3a is preferably the surface of the powder 7. For example, assuming that the radius of the barrel 3 (distance between the main shaft C and the inner side wall 3a) is r, from the inner side wall 3a. It is in the range of 0.05r to 0.15r toward the spindle C. Further, it is more preferable that the targets 6a, 6b, 6c are oriented so that the normals passing through the center of gravity of the target surface overlap on the inner side wall 3a or the surface of the particles of the powder 7. FIG. 3 illustrates a form in which the normals (ha, hb, hc) passing through the center of gravity of the target surface are oriented so as to overlap on the surface of the powder particles. Even when the sizes of the targets 6a, 6b, and 6c are not uniform, the elements protruding from the targets 6a, 6b, and 6c can be more mixed to reach the powder. Further, it is preferable to set the size of the target or the opening of the shield cover and the orientation of the target so that the projections completely overlap on the inner side wall 3a or on the surface of the powder particles. Composition unevenness is further suppressed.

In the powder coating apparatus 100 according to the present embodiment, it is preferable that the targets 6a, 6b, and 6c have different compositions from each other. It is possible to reduce composition unevenness when forming an alloy film, a double oxide film, a double nitride film, a double carbide film, or the like. As an alloy film, there is an example in which a Pt-Au alloy film is formed on the surface of glass beads using a platinum target and a gold target. If the compositions of the targets 6a, 6b, and 6c are the same, the same effect as increasing the film formation amount within a predetermined time can be obtained. That is, the film forming speed can be increased. The combination of the compositions of the targets 6a, 6b, and 6c can be appropriately selected. However, _{when an oxide target such as SiO 2} , TiO ₂ is used, the film formation speed is slow, so that two or three sheets are simultaneously sputtered. As a result, the film formation speed can be increased. For example, when there are three targets, each target (6a, 6b, 6c) is set to (SiO ₂ , SiO ₂ , SiO ₂ ), (TiO ₂ , TiO ₂ , TiO ₂ ), or the like. Further, when it is desired to form a composite film using a target having a high film forming speed (for example, metal) and a target having a slow film forming speed (for example, an oxide), the speed of the target having a slow film forming speed is relatively increased. Set the number of targets with a slow film speed more than the number of targets with a high film formation speed. For example, when there are three targets, two targets with a slow film forming speed are set, and one target with a high film forming speed is set. For example, each target (6a, 6b, 6c) is set to (Pt, SiO ₂ , SiO ₂ ).

Next, refer to FIG. FIG. 5 is a schematic view for explaining the movement of the target unit by the first angle adjusting mechanism. In the powder coating apparatus 100 according to the present embodiment, as shown in FIG. 5, the fixing portions 10a, 10b, and 10c are attached to the target unit 2U in order to fix the relative orientation of the attached targets. It is preferable that the target unit 2U is rotatably attached around the spindle C, and the first angle adjusting mechanism 8 of the target unit 2U is further provided. When the barrel 3 is rotated, the powder 7 rises, and the angle of the target unit 2U can be adjusted according to the degree of the rise. The target unit 2U is, for example, in a form in which the fixing portions 10a, 10b, 10c are fixed by fixing the sputtering devices 2a, 2b, 2c in one housing, or the sputtering devices 2a, as shown in FIG. There is a form in which the fixing portions 10a, 10b, and 10c are fixed by fixing the 2b and 2c with the arm 12. The first angle adjusting mechanism 8 adjusts the angles of the targets 6a, 6b, and 6c attached to the fixed portions 10a, 10b, and 10c while keeping the distance from the main shaft C constant. By the first angle adjusting mechanism 8, even if the powder 7 rises with the rotation of the barrel 3, the relative positional relationship between the targets 6a, 6b, 6c and the powder 7 can be kept constant.

Next, the mechanism for leveling the surface of the powder will be described with reference to FIGS. 1 and 6. FIG. 6 is a schematic view illustrating a movement of stirring and leveling powder in the powder coating apparatus according to the present embodiment. The leveling parts move in the order of (a), (b), (c), (d), and (e) in chronological order, and then return to (a) and repeat. In the powder coating apparatus 100 according to the present embodiment, as shown in FIGS. 1 and 6, the powder coating apparatus 100 is arranged in contact with the side wall of the portion of the inner side wall 3a of the barrel 3 that moves upward due to the rotation of the barrel 3. , The powder rise suppressing component 13 that determines the upper limit position at which the powder 7 approaches, and the powder rise suppressing component 13 are arranged at intervals below the powder rise suppressing component 13 on the inner side wall 3a of the barrel 3 and oscillate with the spindle C as the center of rotation. It has an exercising powder 7 leveling component 9 and. The side wall of the portion of the inner side wall 3a of the barrel 3 that moves upward due to the rotation of the barrel 3 is the right half of the circle formed by the side wall of the barrel 3 as described in FIG. 6A. FIG. 6 shows a case where the leveling component 9 is a round bar type having a circular cross section.

The powder rise suppressing component 13 is preferably a brush or a spatula. The brush or spatula can efficiently scrape the powder 7 from the barrel 3. The powder rise suppressing component 13 is fixed to, for example, a portion supporting the sputtering apparatus 2 of FIG. With such a structure, the mounting structure of the powder rise suppressing component can be simplified. A part that is modularized with the sputtering device (a part that is fixed and integrated with the sputtering device) can be a part that supports the sputtering device 2. It is preferable that the portion supporting the sputtering apparatus 2 is a portion where grounding measures are taken. The sputtering device and the modularized component are, for example, the arm 12 of the target unit 2U shown in FIG. When each sputtering device 2a, 2b, 2c is fixed to one housing, the sputtering device and the modularized component are the housing. Further, instead of being fixed to the portion supporting the sputtering apparatus 2, the powder rise suppressing component 13 is a portion of the sputtering apparatus that does not correspond to either the target itself or the portion electrically conducting with the target. For example, it may be fixed by being connected to a place where grounding measures are taken, such as the housing of the main body of the sputtering apparatus. In FIG. 2, the powder rise suppressing component 13 may be fixed by being connected to a sputtering device 2c, particularly a portion that does not correspond to either the target itself or the portion conducting with the target. With such a structure, the mounting structure of the powder rise suppressing component can be simplified. The powder rise suppressing component 13 may include a support rod. When the support rod is provided, one end of the support rod is connected to the main body of the powder rise suppressing component 13, and the other end of the support rod does not correspond to either the target itself or the part of the sputtering device that is conductive with the target. Connected to a location or to a sputtering device and modularized parts. At this time, it is preferable that the length and shape of the support rod are determined so as not to pass through the space between the target surface and the inner wall surface of the barrel. The powder rise suppressing component 13 is fixed to a portion that does not move together with the barrel 3 even if the barrel 3 rotates. Therefore, in the powder rise suppressing component 13, the powder 7 rotates in the same manner as the barrel 3 due to the rotation of the barrel 3. You can prevent it from being stolen. Further, since the position of the powder rising suppressing component 13 is fixed at least during the film formation, that position becomes the upper limit position of the powder 7 rising. By matching the position of the powder rise suppressing component 13 with the boundary position of the irradiation region of the sputtered particles, the sputtered particles can be irradiated to the powder 7 more efficiently. That is, since the sputtered particles can be applied in a state where the powder 7 is retained by the powder rising suppressing component 13, the irradiation efficiency of the sputtered particles can be improved.

The leveling component 9 oscillates around the spindle C as the center of rotation. The leveling component 9 is preferably a rod or a plate. When the leveling component 9 is a rod, the cross-sectional shape may be circular, semi-circular, elliptical, semi-elliptical, or polygonal such as a triangle or a quadrangle. Further, when the leveling component 9 is a plate, there is a form in which the shape of the cross section is a rectangle having a long side and a short side. In FIG. 6, as an example, a case where the leveling component 9 is a round bar type having a circular cross section is shown. The rod or plate can easily even out the crests 7b of the powder 7. The leveling component 9 is fixed to the rotating shaft of the stirring motor 9b airtightly held by the vacuum seal type bearing 9a shown in FIG. 1, and the angle θ = (shown in FIG. 6B) around the rotating shaft. Swing within the range of _{α 1} + α _2). This rotating shaft is coaxial with the main shaft C, which is the rotating shaft of the barrel 3. Further, in the present embodiment, the range of the angle θ preferably includes the range of existence of the powder 7 at the time of barrel rotation. The swing angle and swing speed can be appropriately adjusted according to the agglomeration state of the powder 7, but it is necessary to set the swing speed so that the powder does not fly too fast. For example, the rocking speed is set to 2 round trips / minute, but may be 1 to 10 round trips / minute. The leveling component 9 may be oscillated intermittently.

The leveling component 9 may be folded back below the powder rise suppressing component 13 when it oscillates along the rotation direction R of the barrel 3 (see, for example, FIGS. 6A to 6C). preferable. It is preferable that the portion between the peak of the peak 7a of the powder 7 and the powder rise suppressing component 13 is a turning point. When the leveling component 9 oscillates in the direction opposite to the rotation direction R of the barrel 3, the entire powder 7 can be leveled uniformly. Further, the leveling component 9 has a higher stirring efficiency than the case where the powder rise suppressing component 13 simply scrapes off the powder adhering to the inner wall of the barrel.

When the leveling component 9 oscillates in a direction opposite to the rotation direction R of the barrel 3 (see, for example, FIGS. 6 (d) to 6 (e)), of the inner side wall 3a of the barrel 3 It is preferable to fold back at the lowest position 3b or a position 3c beyond the position 3b (see, for example, FIGS. 6 (e) to 6 (a)). When the leveling component 9 oscillates in the rotation direction of the barrel 3, the entire powder 7 can be agitated. The lowest position 3b is a position on the vertical line lowered from the main axis C. The position 3c beyond the lowest position 3b may be a position opposite to the rotation direction R than the lowest position 3b, and is not particularly limited, but for example, a position beyond the boundary portion where the powder 7 exists. Or, the vertical direction is 0 °, and the position is preferably 1 to 45 ° in the direction opposite to the rotation direction R.

The relationship between the oscillating motion of the leveling component 9 and the motion of the powder 7 will be described. First, the powder 7 moves upward in the rotation direction R due to the rotation of the barrel 3. At this time, the powder 7 approaches while forming the mountain 7a. Here, the leveling component 9 enters the pile 7a of the powder 7 when it makes a oscillating motion along the rotation direction R of the barrel 3 (see, for example, FIGS. 6A to 6C). (See FIG. 6 (b).) Further, when moving to the front of the powder rise suppressing component 13, the mountain 7a is passed through (see FIG. 6 (c)). As a result, the powder 7 is agitated including the inside. Next, when the leveling component 9 is inverted and oscillates in the direction opposite to the rotation direction R of the barrel 3 (see, for example, FIGS. 6 (d) to 6 (e)), the pile 7b of the powder 7 Move while leveling (see FIG. 6 (d)). When the turning point of the leveling component 9 is reached (see FIG. 6E), the surface of the powder 7 is leveled flat. As a result, the sputtered particles are likely to hit the entire powder 7 uniformly, and uneven composition of the film can be suppressed particularly in the case of multiple sputtering. The flattening of the surface of the powder 7 means that the surface is leveled along the shape of the inner surface of the side wall of the barrel. Here, the amount of powder to be put into the barrel 3 is such that the leveling component 9 passes through the inside of the ridge 7a of the powder 7 when the leveling component 9 oscillates in the rotation direction R of the barrel 3, and the rotation direction R of the barrel. The amount of the powder pile 7b is smoothed when the swaying motion is performed in the opposite direction.

The Applicant has found that it is important to appropriately adjust the moving speed of the leveling component 9 with respect to the rotation speed of the barrel 3 in order to more uniformly level the powder with the leveling component 9. In the powder coating apparatus 100 according to the present embodiment, the maximum speed at which the leveling component 9 moves in the same direction as the rotation direction R of the barrel 3 is faster than the rotation speed of the barrel 3. As a result, the leveling component 9 can be moved faster than the powder 7 which moves in the rotation direction R of the barrel 3 by the rotation of the barrel 3, and the powder 7 can be efficiently agitated. In the present specification, the speed at which the leveling component 9 moves (including the maximum speed and the maximum moving speed) means an absolute value of the speed regardless of the direction in which the leveling component 9 moves. For example, the speed at which the leveling component 9 moves in the same direction as the rotation direction R of the barrel 3 is the absolute value of the distance that the leveling component 9 moves in the same direction as the rotation direction R of the barrel 3 per unit time (unit:: m / min). The speed at which the leveling component 9 moves in the direction opposite to the rotation direction R of the barrel 3 is the absolute value of the distance that the leveling component 9 moves in the direction opposite to the rotation direction R of the barrel 3 per unit time (unit:: m / min). Further, in the present specification, the rotation speed of the barrel 3 is the number of times the barrel 3 rotates per unit time (unit: rotation / minute, rpm) and the length of the inner circumference of the inner side wall 3a of the barrel 3 (unit: unit:). It is a value converted by multiplying by m) to the distance (unit: m / min) traveled by an arbitrary point on the inner side wall 3a of the barrel 3 per unit time.

In the powder coating apparatus 100 according to the present embodiment, the maximum speed at which the leveling component 9 moves in the same direction as the rotation direction R of the barrel 3 is V1, and the leveling component 9 moves in the direction opposite to the rotation direction R of the barrel 3. When the maximum speed to be applied is V2, it is preferable to satisfy the condition 1. In condition 1, V1 and V2 compare the absolute values of velocities with each other regardless of the direction in which the leveling component 9 moves.
(Condition 1) V1 ≧ V2

When the leveling component 9 moves in the direction opposite to the rotation direction R of the barrel 3, the slower the moving speed of the leveling component 9, the longer the leveling component 9 stays in the region where the powder 7 exists. Can be done. Therefore, by satisfying the condition 1, when the leveling component 9 moves in the direction opposite to the rotation direction R of the barrel 3, the powder 7 can be leveled more uniformly. Further, when the leveling component 9 moves in the direction opposite to the rotation direction R of the barrel 3, the relative speed of the leveling component 9 with respect to the rotation speed of the barrel 3 becomes high. Therefore, the powder 7 can be efficiently leveled without increasing the moving speed of the leveling component 9. When the leveling component 9 moves in the direction opposite to the rotation direction R of the barrel 3, the maximum moving speed of the leveling component 9 may be faster, the same, or slower than the rotation speed of the barrel 3.

The moving speed of the leveling component 9 may be constant or may be changed. In the case of shifting, for example, the moving speed of the leveling component 9 may be slowed down near the turning point on the powder rising suppressing component 13 side or the turning point on the opposite side of the powder rising suppressing component 13.

FIG. 7 is a schematic view illustrating the movement of the leveling component to stir and level the powder when the fluidity of the powder is poor. When the fluidity of the powder is good, as shown in FIGS. 6A to 6E, when the leveling component 9 is moved, small peaks 7a and 7b of the powder 7 (7X) are formed, but the peaks 7a, Since the 7b is formed and collapses, the powder 7 (7X) is not squeezed by the leveling component 9. Therefore, the powder can be sufficiently agitated by swinging the leveling component 9. On the other hand, when the fluidity of the powder is poor, for example, as shown in FIG. 7B, when the leveling component 9 is moved, a mountain 7c of the powder 7 (7Y) is formed, and the mountain 7c is hard to collapse, so that the leveling is performed. The powder 7 (7Y) is scraped by the component 9. Therefore, the powder may not be sufficiently agitated only by swinging the leveling component 9. Therefore, by stopping the leveling component 9 at the lowest position 3b of the inner side wall 3a of the barrel 3 or the position 3c beyond the position 3b for a predetermined time, even if the powder has poor fluidity, the powder can be produced. The film formation range can be returned, and the sputtered particles can be easily applied uniformly to the entire powder.

When the powder 7 (7Y) is a powder having poor fluidity, the relationship between the oscillating motion of the leveling component 9 and the motion of the powder 7 (7Y) will be described.

First, when the leveling component 9 is moved from the turning point on the powder rise suppressing component 13 side in the direction opposite to the rotation direction R of the barrel 3, the leveling component 9 causes all or part of the powder 7 (7Y) to be barrel 3. 7c of powder 7 (7Y) may be formed by moving in the direction opposite to the rotation direction R of the above (see, for example, FIGS. 7 (a) to 7 (b)). At this time, it is preferable that the leveling component 9 is stopped for a predetermined time at the lowest position 3b of the inner side wall 3a of the barrel 3 or the position 3c beyond the position 3b. After stopping the leveling component 9 at a predetermined position when the turning point on the side opposite to the powder rise suppressing component 13 side of the leveling component 9 is the same position as the position where the leveling component 9 is stopped for a predetermined time. , The leveling part 9 is folded back at the stopped position. Further, when the folding point of the leveling component 9 opposite to the powder rise suppressing component 13 side is on the back side (rear side of the rotation direction R of the barrel 3) from the position where the leveling component 9 is stopped for a predetermined time. After the leveling component 9 is folded back at the folding point on the side opposite to the powder rise suppressing component 13 side, the leveling component 9 is stopped at a predetermined position. In the present embodiment, the folding point on the side opposite to the powder rise suppressing component 13 side of the leveling component 9 is the same position as the position where the leveling component 9 is stopped for a predetermined time (for example, of the inner side wall 3a of the barrel 3). It is more preferably the lowest position 3b or the position 3c) beyond the position 3b, and the leveling component 9 is stopped for a predetermined time at a turning point on the side opposite to the powder rise suppressing component 13 side.

When the rotation of the barrel 3 is continued with the leveling part 9 stopped, all or a part of the powder 7 (7Y) exceeds the upper part of the leveling part 9 or falls below the leveling part 9. Through it, it moves in the rotation direction R of the barrel 3 while breaking the shape of the mountain 7c of the powder 7 (7Y). Thereby, the powder 7 (7Y) can be returned to the film forming range (see, for example, FIGS. 7 (c) to 7 (d)). At this time, the powder 7 (7Y) that hits the leveling component 9 moves above, above, and below the leveling component 9, thereby forming a flow of the powder 7 (7Y). 7 (7Y) stirring is performed.

Next, at a predetermined timing, for example, when more than half of the powder 7 (7Y) moves from the leveling component 9 in the rotation direction of the barrel 3, the leveling component 9 is on the side opposite to the powder rise suppressing component 13 side. It is moved from the turning point in the rotation direction R of the barrel 3 (see, for example, FIG. 7 (e)). At this time, the powder 7 (7Y) is pushed by the leveling component 9, or moves together with the inner side wall 3a by the rotation of the barrel 3, and is pushed up toward the rotation direction R side of the barrel 3. Then, when the powder 7 (7Y) reaches a high position on the inner side wall 3a of the barrel 3, the avalanche falls on the side opposite to the rotation direction R of the barrel 3 by gravity or by being scraped off by the powder rise suppressing component 13. .. As the powder 7 (7Y) collapses in this way, the powder 7 (7Y) is agitated. Further, when the leveling component 9 is moved in the rotation direction R of the barrel 3, the leveling component 9 may enter the mountain 7e of the powder 7 (7Y) and move. In this case, the powder 7 (7Y) is stirred including the inside.

The powder coating apparatus 100 according to the present embodiment can stir both powders having good fluidity and powders having poor fluidity by changing the movement of the leveling component 9 according to the fluidity of the powder 7. , Sputter particles can be easily applied uniformly to the entire powder.

1 Sputtering power supply 1a Vacuum sealed bearing 1b Arm 1c Target cooling water passage inlet 1d Target cooling water passage outlet 1e Argon gas inlet 2 Sputtering device 3 Barrel 3a Barrel inner side wall 3b Barrel 3 lowest position 3c Barrel 3 lowest position 3d Barrel body 3e Lid 4 Exhaust means 4a Vacuum seal type bearing 5a Drive roll 5b Driven roll 6 (6a, 6b, 6c) Target 7 Powder 7a, 7b, 7c, 7d Powder pile 7X Good fluidity Powder 7Y Poor fluidity Powder 8 First angle adjustment mechanism 9 Leveling part 9a Vacuum seal type bearing 9b Stirring motor 10 (10a, 10b, 10c) Fixing part 12 Arm 13 Powder rise suppressing part 100 Powder coating device ha, hb, hc Target surface normal C Main shaft 2U Target unit R Barrel rotation direction

Claims (5)

It has a barrel, an exhaust means for evacuating the inside of the barrel, and a sputtering device installed in the barrel and having at least one target. In a powder coating device that rotates about the spindle and forms a coating film on the surface of the powder placed in the barrel, the sputtering device is used.
The powder coating device further
A powder rise suppressing component that is arranged in contact with the side wall of a portion of the inner side wall of the barrel that moves upward due to the rotation of the barrel and that determines an upper limit position at which the powder approaches.
It has a powder leveling component which is arranged on the inner side wall of the barrel at a position below the powder rise suppressing component and which oscillates around the spindle as a rotation center.
Maximum speed the homogeneous and parts move in the same direction as the rotation of the barrel, rather faster than the rotational speed of the barrel,
Condition 1 is satisfied when the maximum speed at which the leveling component moves in the same direction as the barrel rotation direction is V1 and the maximum speed at which the leveling component moves in the direction opposite to the barrel rotation direction is V2. A powder coating device characterized by that.
(Condition 1) V1> V2 The powder coating according to claim 1, wherein when the leveling component moves in a direction opposite to the rotation direction of the barrel, the maximum moving speed of the leveling component is slower than the rotation speed of the barrel. apparatus. The leveling component is characterized in that when it oscillates in a direction opposite to the rotation direction of the barrel, it stops for a predetermined time at the lowest position of the inner side wall of the barrel or a position beyond the position. The powder coating apparatus according to claim 1 or 2. The turning point of the opposite side of the front Symbol powder elevation suppressing component side of the smoothing part, of the inner side wall of the barrel, a position beyond the lowest position or the position,
The powder coating apparatus according to claim 3, wherein the leveling component is stopped at a turning point on the side opposite to the powder rise suppressing component side for a predetermined time. The method of using the powder coating apparatus according to any one of claims 1 to 4.
The amount of powder to be put into the barrel is such that when the leveling component makes a pulsating motion in the direction of rotation of the barrel, it passes through the inside of the pile of powder and oscillates in a direction opposite to the direction of rotation of the barrel. A method of using a powder coating apparatus, which is an amount for smoothing a pile of the powder when the powder is applied.

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