JP2004289151A5 - - Google Patents

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Publication number
JP2004289151A5
JP2004289151A5 JP2004076081A JP2004076081A JP2004289151A5 JP 2004289151 A5 JP2004289151 A5 JP 2004289151A5 JP 2004076081 A JP2004076081 A JP 2004076081A JP 2004076081 A JP2004076081 A JP 2004076081A JP 2004289151 A5 JP2004289151 A5 JP 2004289151A5
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JP
Japan
Prior art keywords
gas
chamber
storage device
light
pumping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004076081A
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English (en)
Japanese (ja)
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JP3957695B2 (ja
JP2004289151A (ja
Filing date
Publication date
Priority claimed from US10/392,793 external-priority patent/US6919573B2/en
Application filed filed Critical
Publication of JP2004289151A publication Critical patent/JP2004289151A/ja
Publication of JP2004289151A5 publication Critical patent/JP2004289151A5/ja
Application granted granted Critical
Publication of JP3957695B2 publication Critical patent/JP3957695B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004076081A 2003-03-20 2004-03-17 リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置 Expired - Fee Related JP3957695B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/392,793 US6919573B2 (en) 2003-03-20 2003-03-20 Method and apparatus for recycling gases used in a lithography tool

Publications (3)

Publication Number Publication Date
JP2004289151A JP2004289151A (ja) 2004-10-14
JP2004289151A5 true JP2004289151A5 (OSRAM) 2005-05-26
JP3957695B2 JP3957695B2 (ja) 2007-08-15

Family

ID=32824890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004076081A Expired - Fee Related JP3957695B2 (ja) 2003-03-20 2004-03-17 リソグラフィツールにおいて使用されるガスをリサイクルするための方法及び装置

Country Status (7)

Country Link
US (2) US6919573B2 (OSRAM)
EP (1) EP1460479A3 (OSRAM)
JP (1) JP3957695B2 (OSRAM)
KR (1) KR100730675B1 (OSRAM)
CN (1) CN1275099C (OSRAM)
SG (1) SG115636A1 (OSRAM)
TW (1) TW200421018A (OSRAM)

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US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
JP5578482B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP5578483B2 (ja) * 2009-09-01 2014-08-27 株式会社Ｉｈｉ Ｌｐｐ方式のｅｕｖ光源とその発生方法
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
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US8686381B2 (en) * 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
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US9389180B2 (en) * 2013-02-15 2016-07-12 Kla-Tencor Corporation Methods and apparatus for use with extreme ultraviolet light having contamination protection
US9585236B2 (en) 2013-05-03 2017-02-28 Media Lario Srl Sn vapor EUV LLP source system for EUV lithography
WO2024044165A1 (en) * 2022-08-24 2024-02-29 Lam Research Corporation A plasma processing system with a gas recycling system

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