JP2004277508A5 - - Google Patents
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- Publication number
- JP2004277508A5 JP2004277508A5 JP2003068760A JP2003068760A JP2004277508A5 JP 2004277508 A5 JP2004277508 A5 JP 2004277508A5 JP 2003068760 A JP2003068760 A JP 2003068760A JP 2003068760 A JP2003068760 A JP 2003068760A JP 2004277508 A5 JP2004277508 A5 JP 2004277508A5
- Authority
- JP
- Japan
- Prior art keywords
- atom
- silica
- forming
- film according
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 26
- 239000000377 silicon dioxide Substances 0.000 claims 13
- 125000004429 atom Chemical group 0.000 claims 12
- 239000011248 coating agent Substances 0.000 claims 7
- 238000000576 coating method Methods 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 5
- -1 alkylene glycol dialkyl ether Chemical class 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 2
- 125000004437 phosphorous atom Chemical group 0.000 claims 2
- 238000009833 condensation Methods 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 238000010304 firing Methods 0.000 claims 1
- 230000003301 hydrolyzing effect Effects 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003068760A JP2004277508A (ja) | 2003-03-13 | 2003-03-13 | シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003068760A JP2004277508A (ja) | 2003-03-13 | 2003-03-13 | シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004277508A JP2004277508A (ja) | 2004-10-07 |
| JP2004277508A5 true JP2004277508A5 (https=) | 2005-09-08 |
Family
ID=33286003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003068760A Withdrawn JP2004277508A (ja) | 2003-03-13 | 2003-03-13 | シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2004277508A (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004277502A (ja) * | 2003-03-13 | 2004-10-07 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品 |
| JP4409515B2 (ja) | 2003-04-09 | 2010-02-03 | エルジー・ケム・リミテッド | 絶縁膜形成用コーティング組成物、その組成物を使用した低誘電絶縁膜の製造方法、その組成物より製造される半導体素子用低誘電絶縁膜およびその絶縁膜からなる半導体素子 |
| US20060047034A1 (en) | 2004-09-02 | 2006-03-02 | Haruaki Sakurai | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film |
| JP2006117763A (ja) * | 2004-10-20 | 2006-05-11 | Catalysts & Chem Ind Co Ltd | 低誘電率非晶質シリカ系被膜形成用塗布液、その調製方法およびこれより得られる低誘電率非晶質シリカ系被膜 |
| TW200641075A (en) * | 2004-12-21 | 2006-12-01 | Hitachi Chemical Co Ltd | Film, silica film and method of forming the same, composition for forming silica film, and electronic part |
| JP2006213908A (ja) * | 2004-12-21 | 2006-08-17 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品 |
-
2003
- 2003-03-13 JP JP2003068760A patent/JP2004277508A/ja not_active Withdrawn
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