JP2004161535A5 - - Google Patents
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- Publication number
- JP2004161535A5 JP2004161535A5 JP2002329129A JP2002329129A JP2004161535A5 JP 2004161535 A5 JP2004161535 A5 JP 2004161535A5 JP 2002329129 A JP2002329129 A JP 2002329129A JP 2002329129 A JP2002329129 A JP 2002329129A JP 2004161535 A5 JP2004161535 A5 JP 2004161535A5
- Authority
- JP
- Japan
- Prior art keywords
- zeolite sol
- producing
- particle size
- average particle
- zeolite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002329129A JP4170735B2 (ja) | 2002-11-13 | 2002-11-13 | ゼオライトゾルとその製造方法、多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
| US10/703,854 US7244657B2 (en) | 2002-11-13 | 2003-11-07 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device |
| TW092131710A TW200415217A (en) | 2002-11-13 | 2003-11-12 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device |
| CNB200310114941XA CN100567150C (zh) | 2002-11-13 | 2003-11-13 | 沸石溶胶及其制法、多孔膜形成用组合物、多孔膜及其制法、层间绝缘膜和半导体装置 |
| US11/652,297 US7405459B2 (en) | 2002-11-13 | 2007-01-11 | Semiconductor device comprising porous film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002329129A JP4170735B2 (ja) | 2002-11-13 | 2002-11-13 | ゼオライトゾルとその製造方法、多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004161535A JP2004161535A (ja) | 2004-06-10 |
| JP2004161535A5 true JP2004161535A5 (enExample) | 2006-10-26 |
| JP4170735B2 JP4170735B2 (ja) | 2008-10-22 |
Family
ID=32212017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002329129A Expired - Fee Related JP4170735B2 (ja) | 2002-11-13 | 2002-11-13 | ゼオライトゾルとその製造方法、多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7244657B2 (enExample) |
| JP (1) | JP4170735B2 (enExample) |
| CN (1) | CN100567150C (enExample) |
| TW (1) | TW200415217A (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7674390B2 (en) * | 2003-11-17 | 2010-03-09 | Intel Corporation | Zeolite—sol gel nano-composite low k dielectric |
| US7968471B2 (en) * | 2003-11-28 | 2011-06-28 | Nec Corporation | Porous insulating film, method for producing the same, and semiconductor device using the same |
| WO2005109475A2 (en) * | 2004-05-04 | 2005-11-17 | California Institute Of Technology | Zeolite films for low k applications |
| US20050274646A1 (en) * | 2004-06-14 | 2005-12-15 | Conocophillips Company | Catalyst for hydroprocessing of Fischer-Tropsch products |
| US20060081557A1 (en) | 2004-10-18 | 2006-04-20 | Molecular Imprints, Inc. | Low-k dielectric functional imprinting materials |
| US7303989B2 (en) * | 2004-11-22 | 2007-12-04 | Intel Corporation | Using zeolites to improve the mechanical strength of low-k interlayer dielectrics |
| US7468545B2 (en) * | 2005-05-06 | 2008-12-23 | Megica Corporation | Post passivation structure for a semiconductor device and packaging process for same |
| US8039921B2 (en) * | 2005-09-16 | 2011-10-18 | Nec Corporation | Wiring structure, semiconductor device and manufacturing method thereof |
| DE102006031772A1 (de) * | 2006-07-10 | 2008-01-17 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Sensorelements sowie Sensorelement |
| JP2008205008A (ja) * | 2007-02-16 | 2008-09-04 | Shin Etsu Chem Co Ltd | 半導体層間絶縁膜形成用組成物とその製造方法、膜形成方法と半導体装置 |
| JP2008201833A (ja) | 2007-02-16 | 2008-09-04 | Shin Etsu Chem Co Ltd | 膜形成用組成物、低誘電率絶縁膜、低誘電率絶縁膜の形成方法及び半導体装置 |
| JP2008201832A (ja) * | 2007-02-16 | 2008-09-04 | Shin Etsu Chem Co Ltd | シロキサン重合体とその製造方法、該重合体を含有する多孔質膜形成用塗布液ならびに多孔質膜と、該多孔質膜を用いた半導体装置 |
| JP4866290B2 (ja) * | 2007-04-03 | 2012-02-01 | 信越化学工業株式会社 | ゼオライト含有膜の製造方法 |
| EP2212742B1 (en) * | 2007-11-21 | 2014-07-02 | Molecular Imprints, Inc. | Porous template and imprinting stack for nano-imprint lithography |
| JP2009286935A (ja) * | 2008-05-30 | 2009-12-10 | Shin-Etsu Chemical Co Ltd | 有機酸化ケイ素微粒子及びその製造方法、多孔質膜形成用組成物、多孔質膜及びその形成方法、並びに半導体装置 |
| JP5096233B2 (ja) | 2008-05-30 | 2012-12-12 | 信越化学工業株式会社 | 有機酸化ケイ素系微粒子及びその製造方法、多孔質膜形成用組成物、多孔質膜及びその形成方法、並びに半導体装置 |
| JP4883323B2 (ja) * | 2008-08-26 | 2012-02-22 | 信越化学工業株式会社 | 非水電解質二次電池負極材及びＳｉ−Ｏ−Ａｌ複合体の製造方法、ならびに非水電解質二次電池負極及び非水電解質二次電池 |
| US20100072671A1 (en) * | 2008-09-25 | 2010-03-25 | Molecular Imprints, Inc. | Nano-imprint lithography template fabrication and treatment |
| US8470188B2 (en) * | 2008-10-02 | 2013-06-25 | Molecular Imprints, Inc. | Nano-imprint lithography templates |
| US20100104852A1 (en) * | 2008-10-23 | 2010-04-29 | Molecular Imprints, Inc. | Fabrication of High-Throughput Nano-Imprint Lithography Templates |
| WO2011094317A2 (en) * | 2010-01-26 | 2011-08-04 | Molecular Imprints, Inc. | Micro-conformal templates for nanoimprint lithography |
| WO2011094696A2 (en) * | 2010-01-29 | 2011-08-04 | Molecular Imprints, Inc. | Ultra-compliant nanoimprint lithography template |
| US8440772B2 (en) | 2011-04-28 | 2013-05-14 | Chevron Phillips Chemical Company Lp | Methods for terminating olefin polymerizations |
| US10273315B2 (en) | 2012-06-20 | 2019-04-30 | Chevron Phillips Chemical Company Lp | Methods for terminating olefin polymerizations |
| JP6459489B2 (ja) * | 2014-03-11 | 2019-01-30 | 三菱マテリアル株式会社 | シリカ多孔質膜形成用液組成物及びその液組成物から形成されたシリカ多孔質膜 |
| US20160177063A1 (en) * | 2014-12-23 | 2016-06-23 | Behr Process Corporation | Seed Scavenging Technologies for Waterborne Paint Formulations |
| JP6979548B2 (ja) * | 2019-03-25 | 2021-12-15 | 日本碍子株式会社 | ゼオライト膜複合体の製造方法およびゼオライト膜複合体 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3677973A (en) * | 1970-03-16 | 1972-07-18 | Universal Oil Prod Co | Transalkylation of alklaromatic hydrocarbons in contact with a zeolite catalyst composition |
| IT1265320B1 (it) * | 1993-12-22 | 1996-10-31 | Eniricerche Spa | Procedimento per la preparazione di silico-allumine amorfe cataliticamente attive |
| JPH09194298A (ja) | 1995-04-25 | 1997-07-29 | Rikagaku Kenkyusho | シリカ−界面活性剤ナノ複合体及びその製造方法 |
| US5792706A (en) * | 1996-06-05 | 1998-08-11 | Advanced Micro Devices, Inc. | Interlevel dielectric with air gaps to reduce permitivity |
| US6084096A (en) * | 1998-04-09 | 2000-07-04 | Air Products And Chemicals, Inc. | Triethylenediamine and piperazine synthesis using zeolite catalysts modified with a silicon-containing compound |
| JP2000044875A (ja) | 1998-05-18 | 2000-02-15 | Jsr Corp | 膜形成用組成物、膜の形成方法および低密度膜 |
| DE19829870A1 (de) * | 1998-07-03 | 2000-01-05 | Degussa | Mikro- und/oder mesoporöse zeolithische Materialien als Füllkomponenten in Dentalkompositen |
| PT1113992E (pt) * | 1998-09-06 | 2006-09-29 | Leibniz Inst Neue Materialien | Processo para o fabrico de suspensoes e de pos a base de oxido de indio-estanho e a sua utilizacao |
| US6177381B1 (en) * | 1998-11-03 | 2001-01-23 | Uop Llc | Layered catalyst composition and processes for preparing and using the composition |
| JP3733824B2 (ja) | 1999-08-12 | 2006-01-11 | Ｊｓｒ株式会社 | シリカ系被膜形成用塗布液の製造方法 |
| JP4524822B2 (ja) | 1999-10-29 | 2010-08-18 | 株式会社豊田中央研究所 | 高結晶性シリカメソ多孔体薄膜の製造方法 |
| US6685889B1 (en) * | 1999-12-14 | 2004-02-03 | Purdue Research Foundation | Photochemical catalysts and methods for their manufacture and use |
| WO2001045182A1 (en) * | 1999-12-17 | 2001-06-21 | Institute Of Materials Research & Engineering | Improved transparent electrode material for quality enhancement of oled devices |
| JP2001203197A (ja) | 2000-01-21 | 2001-07-27 | Jsr Corp | 膜、および膜の形成方法 |
| US6586434B2 (en) * | 2000-03-10 | 2003-07-01 | G.D. Searle, Llc | Method for the preparation of tetrahydrobenzothiepines |
| US6440309B1 (en) * | 2000-05-17 | 2002-08-27 | Yoram Cohen | Ceramic-supported polymer (CSP) pervaporation membrane |
| WO2002007191A2 (en) * | 2000-07-13 | 2002-01-24 | The Regents Of The Universty Of California | Silica zeolite low-k dielectric thin films |
| CN1124978C (zh) | 2000-08-23 | 2003-10-22 | 中国石油化工股份有限公司 | 硅分子筛及其合成方法 |
| KR100528950B1 (ko) * | 2001-01-29 | 2005-11-16 | 제이에스알 가부시끼가이샤 | 유전체용 복합 입자, 초미립자 복합 수지 입자, 유전체형성용 조성물 및 그의 용도 |
| CN1173885C (zh) | 2001-09-26 | 2004-11-03 | 复旦大学 | 纳米尺寸的均匀介孔氧化硅球分离剂的合成方法 |
| TWI338528B (enExample) * | 2002-07-19 | 2011-03-01 | Au Optronics Corp |
-
2002
- 2002-11-13 JP JP2002329129A patent/JP4170735B2/ja not_active Expired - Fee Related
-
2003
- 2003-11-07 US US10/703,854 patent/US7244657B2/en not_active Expired - Fee Related
- 2003-11-12 TW TW092131710A patent/TW200415217A/zh unknown
- 2003-11-13 CN CNB200310114941XA patent/CN100567150C/zh not_active Expired - Fee Related
-
2007
- 2007-01-11 US US11/652,297 patent/US7405459B2/en not_active Expired - Fee Related