JP2004087839A5 - - Google Patents

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Publication number
JP2004087839A5
JP2004087839A5 JP2002247525A JP2002247525A JP2004087839A5 JP 2004087839 A5 JP2004087839 A5 JP 2004087839A5 JP 2002247525 A JP2002247525 A JP 2002247525A JP 2002247525 A JP2002247525 A JP 2002247525A JP 2004087839 A5 JP2004087839 A5 JP 2004087839A5
Authority
JP
Japan
Prior art keywords
substrate processing
processing apparatus
remote operation
permission setting
remote
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002247525A
Other languages
English (en)
Japanese (ja)
Other versions
JP4316210B2 (ja
JP2004087839A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2002247525A external-priority patent/JP4316210B2/ja
Priority to JP2002247525A priority Critical patent/JP4316210B2/ja
Priority to PCT/JP2003/010156 priority patent/WO2004021417A1/ja
Priority to EP03791203.7A priority patent/EP1536459B1/en
Priority to CNB038202832A priority patent/CN100550298C/zh
Priority to US10/525,090 priority patent/US7524378B2/en
Priority to KR1020057003123A priority patent/KR101018509B1/ko
Priority to AU2003254901A priority patent/AU2003254901A1/en
Priority to EP08166438.5A priority patent/EP2006741B1/en
Publication of JP2004087839A publication Critical patent/JP2004087839A/ja
Publication of JP2004087839A5 publication Critical patent/JP2004087839A5/ja
Priority to US12/372,347 priority patent/US8171879B2/en
Publication of JP4316210B2 publication Critical patent/JP4316210B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2002247525A 2002-08-27 2002-08-27 保守システム，基板処理装置及び遠隔操作装置 Expired - Lifetime JP4316210B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2002247525A JP4316210B2 (ja) 2002-08-27 2002-08-27 保守システム，基板処理装置及び遠隔操作装置
KR1020057003123A KR101018509B1 (ko) 2002-08-27 2003-08-08 보수 시스템 기판 처리 장치 원격 조작 장치 및 통신 방법
EP08166438.5A EP2006741B1 (en) 2002-08-27 2003-08-08 Maintenance system, substrate processing apparatus, combination of remote operation unit and sensor, and communication method
EP03791203.7A EP1536459B1 (en) 2002-08-27 2003-08-08 Maintenance system, substrate processing device, combination of a remote operation device and an allowance setting section, and communication method
CNB038202832A CN100550298C (zh) 2002-08-27 2003-08-08 维修系统、基板处理装置、远程操作装置和通信方法
US10/525,090 US7524378B2 (en) 2002-08-27 2003-08-08 Maintenance system, substrate processing device, remote operation device, and communication method
PCT/JP2003/010156 WO2004021417A1 (ja) 2002-08-27 2003-08-08 保守システム，基板処理装置，遠隔操作装置及び通信方法
AU2003254901A AU2003254901A1 (en) 2002-08-27 2003-08-08 Maintenance system, substrate processing device, remote operation device, and communication method
US12/372,347 US8171879B2 (en) 2002-08-27 2009-02-17 Maintenance system, substrate processing apparatus, remote operation unit and communication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002247525A JP4316210B2 (ja) 2002-08-27 2002-08-27 保守システム，基板処理装置及び遠隔操作装置

Publications (3)

Publication Number Publication Date
JP2004087839A JP2004087839A (ja) 2004-03-18
JP2004087839A5 true JP2004087839A5 (enExample) 2005-06-02
JP4316210B2 JP4316210B2 (ja) 2009-08-19

Family

ID=31972472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002247525A Expired - Lifetime JP4316210B2 (ja) 2002-08-27 2002-08-27 保守システム，基板処理装置及び遠隔操作装置

Country Status (7)

Country Link
US (2) US7524378B2 (enExample)
EP (2) EP1536459B1 (enExample)
JP (1) JP4316210B2 (enExample)
KR (1) KR101018509B1 (enExample)
CN (1) CN100550298C (enExample)
AU (1) AU2003254901A1 (enExample)
WO (1) WO2004021417A1 (enExample)

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SG155210A1 (en) * 2004-08-12 2009-09-30 Nikon Corp Substrate processing apparatus, use state ascertaining method, and false use preventing method
WO2007122902A1 (ja) * 2006-03-24 2007-11-01 Hitachi Kokusai Electric Inc. 基板処理装置の管理方法
JP5020605B2 (ja) * 2006-11-16 2012-09-05 東京エレクトロン株式会社 上位制御装置、下位制御装置、画面の操作権付与方法および画面の操作権付与プログラムを記憶した記憶媒体
JP4994874B2 (ja) * 2007-02-07 2012-08-08 キヤノン株式会社 処理装置
JP4774029B2 (ja) * 2007-10-17 2011-09-14 三菱電機株式会社 計装制御システム
JP4672073B2 (ja) * 2008-08-22 2011-04-20 株式会社日立国際電気 基板処理装置、半導体装置の製造方法及び基板処理装置の運用方法
KR101675857B1 (ko) * 2010-11-09 2016-11-14 엘지디스플레이 주식회사 무인 제어 시스템
JP6063902B2 (ja) * 2014-06-30 2017-01-18 株式会社日立国際電気 基板処理装置及びその制御方法並びにプログラム
JP6309176B2 (ja) * 2016-03-15 2018-04-11 三菱電機株式会社 遠隔作業支援装置、指示用端末及び現場用端末
JP6584356B2 (ja) * 2016-03-30 2019-10-02 東京エレクトロン株式会社 基板処理装置及び基板処理装置の処理方法
JP7061524B2 (ja) * 2018-06-28 2022-04-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置のメンテナンス装置およびメンテナンス方法
JP7529363B2 (ja) * 2020-08-31 2024-08-06 東京エレクトロン株式会社 半導体製造システム、制御装置、制御方法及びプログラム
TWI850056B (zh) * 2023-08-08 2024-07-21 中華電信股份有限公司 用於企業專網的即時告警狀態變更系統及其方法

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Publication number Priority date Publication date Assignee Title
US4390953A (en) * 1980-11-10 1983-06-28 Kearney & Trecker Corporation Unmanned diagnostic communications system for computer controlled machine tools
US5559444A (en) * 1991-06-04 1996-09-24 Micron Technology, Inc. Method and apparatus for testing unpackaged semiconductor dice
US5339074A (en) * 1991-09-13 1994-08-16 Fluoroware, Inc. Very low frequency tracking system
JPH06119090A (ja) * 1992-10-07 1994-04-28 Hitachi Ltd 省電力制御方式
US5429912A (en) * 1993-08-02 1995-07-04 Chartered Semiconductor Manufacturing Pte Ltd. Method of dispensing fluid onto a wafer
KR0147245B1 (ko) * 1993-12-01 1998-09-15 모리시타 요이찌 강유전체박막 및 그 제조방법
TWI249760B (en) * 1996-07-31 2006-02-21 Canon Kk Remote maintenance system
JP2000155613A (ja) * 1998-11-19 2000-06-06 Nikko Co Ltd 生コンクリート製造プラントの遠隔保守管理装置
US6379465B1 (en) * 1999-09-17 2002-04-30 Nordson Corporation Coating system with centralized control panel and gun mapping
JP3595756B2 (ja) * 2000-06-01 2004-12-02 キヤノン株式会社 露光装置、リソグラフィ装置、ロードロック装置、デバイス製造方法およびリソグラフィ方法
JP4915033B2 (ja) 2000-06-15 2012-04-11 株式会社ニコン 露光装置、基板処理装置及びリソグラフィシステム、並びにデバイス製造方法
JP2002027567A (ja) * 2000-07-12 2002-01-25 Hitachi Kokusai Electric Inc 半導体製造装置のリモート操作システム、半導体製造装置および遠隔操作装置
JP3711237B2 (ja) * 2000-12-27 2005-11-02 東京エレクトロン株式会社 基板処理装置
JP2002231595A (ja) 2001-01-31 2002-08-16 Hitachi Ltd 半導体製造装置管理システム
TW559706B (en) * 2001-06-08 2003-11-01 Hon Hai Prec Ind Co Ltd Method and system for collecting and monitoring shop floor information

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