JP2004079705A5 - - Google Patents

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Publication number
JP2004079705A5
JP2004079705A5 JP2002236535A JP2002236535A JP2004079705A5 JP 2004079705 A5 JP2004079705 A5 JP 2004079705A5 JP 2002236535 A JP2002236535 A JP 2002236535A JP 2002236535 A JP2002236535 A JP 2002236535A JP 2004079705 A5 JP2004079705 A5 JP 2004079705A5
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JP
Japan
Prior art keywords
mis transistor
region
gate electrode
drain
source
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Pending
Application number
JP2002236535A
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English (en)
Japanese (ja)
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JP2004079705A (ja
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Priority to JP2002236535A priority Critical patent/JP2004079705A/ja
Priority claimed from JP2002236535A external-priority patent/JP2004079705A/ja
Publication of JP2004079705A publication Critical patent/JP2004079705A/ja
Publication of JP2004079705A5 publication Critical patent/JP2004079705A5/ja
Pending legal-status Critical Current

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JP2002236535A 2002-08-14 2002-08-14 半導体集積回路装置およびその製造方法 Pending JP2004079705A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002236535A JP2004079705A (ja) 2002-08-14 2002-08-14 半導体集積回路装置およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002236535A JP2004079705A (ja) 2002-08-14 2002-08-14 半導体集積回路装置およびその製造方法

Publications (2)

Publication Number Publication Date
JP2004079705A JP2004079705A (ja) 2004-03-11
JP2004079705A5 true JP2004079705A5 (zh) 2005-11-04

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ID=32020681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002236535A Pending JP2004079705A (ja) 2002-08-14 2002-08-14 半導体集積回路装置およびその製造方法

Country Status (1)

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JP (1) JP2004079705A (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7274072B2 (en) * 2005-04-15 2007-09-25 International Business Machines Corporation Hybrid bulk-SOI 6T-SRAM cell for improved cell stability and performance
JP5190189B2 (ja) 2006-08-09 2013-04-24 パナソニック株式会社 半導体装置及びその製造方法
CN102197490B (zh) 2008-10-24 2013-11-06 株式会社半导体能源研究所 半导体器件和用于制造该半导体器件的方法
WO2012131818A1 (ja) * 2011-03-25 2012-10-04 パナソニック株式会社 半導体装置及びその製造方法
KR101923946B1 (ko) 2012-08-31 2018-11-30 삼성전자 주식회사 반도체 장치 및 그 제조 방법
JP6110686B2 (ja) * 2013-02-26 2017-04-05 旭化成エレクトロニクス株式会社 半導体装置の製造方法
JP7145032B2 (ja) * 2018-10-19 2022-09-30 キヤノン株式会社 表示装置および電子機器

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