JP2003513418A - マイクロターゲットを用いた方法及びラジエーション生成システム - Google Patents

マイクロターゲットを用いた方法及びラジエーション生成システム

Info

Publication number
JP2003513418A
JP2003513418A JP2001534180A JP2001534180A JP2003513418A JP 2003513418 A JP2003513418 A JP 2003513418A JP 2001534180 A JP2001534180 A JP 2001534180A JP 2001534180 A JP2001534180 A JP 2001534180A JP 2003513418 A JP2003513418 A JP 2003513418A
Authority
JP
Japan
Prior art keywords
radiation
target
micro
generation system
radiation generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001534180A
Other languages
English (en)
Japanese (ja)
Inventor
トゥルキュ、アイ、シー、エドモンド
フォスター、リチャード、エム
ピコ、キャレイ、エー
モーリス、ジェイムズ、エイチ
パワーズ、マイケル、エフ
カロセーラ、ジョン、エイチ
Original Assignee
ジェイ エム エー アール リサーチ、インク
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ジェイ エム エー アール リサーチ、インク filed Critical ジェイ エム エー アール リサーチ、インク
Publication of JP2003513418A publication Critical patent/JP2003513418A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H6/00—Targets for producing nuclear reactions

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2001534180A 1999-10-27 2000-10-27 マイクロターゲットを用いた方法及びラジエーション生成システム Pending JP2003513418A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US16189199P 1999-10-27 1999-10-27
US60/161,891 1999-10-27
PCT/US2000/029743 WO2001031678A1 (en) 1999-10-27 2000-10-27 Method and radiation generating system using microtargets

Publications (1)

Publication Number Publication Date
JP2003513418A true JP2003513418A (ja) 2003-04-08

Family

ID=22583229

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001534180A Pending JP2003513418A (ja) 1999-10-27 2000-10-27 マイクロターゲットを用いた方法及びラジエーション生成システム

Country Status (4)

Country Link
EP (1) EP1232516A4 (de)
JP (1) JP2003513418A (de)
AU (1) AU1241401A (de)
WO (1) WO2001031678A1 (de)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128157A (ja) * 2004-10-26 2006-05-18 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム
JP2006202671A (ja) * 2005-01-24 2006-08-03 Ushio Inc 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法
JP2010103499A (ja) * 2008-09-29 2010-05-06 Komatsu Ltd 極端紫外光源装置および極端紫外光生成方法
US20100284502A1 (en) * 2007-12-28 2010-11-11 Gregory Piefer High energy proton or neutron source
JP2010263210A (ja) * 2009-05-08 2010-11-18 Xtreme Technologies Gmbh Ｅｕｖ光源におけるエミッタ材料として溶融錫を連続生成するための装置
JP2010287479A (ja) * 2009-06-12 2010-12-24 Univ Of Miyazaki 極端紫外光源および極端紫外光発生方法
JP2011014913A (ja) * 2010-07-16 2011-01-20 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム
JP2013062146A (ja) * 2011-09-13 2013-04-04 Gigaphoton Inc 極端紫外光生成装置
JP2014096372A (ja) * 2008-09-29 2014-05-22 Gigaphoton Inc 極端紫外光源装置
JP2015053292A (ja) * 2014-12-04 2015-03-19 ギガフォトン株式会社 極端紫外光源装置及びそのターゲット供給システム
US9024261B2 (en) 2009-12-15 2015-05-05 Phoenix Nuclear Labs Llc Method and apparatus for performing active neutron interrogation of containters
JP2015527703A (ja) * 2013-03-04 2015-09-17 中国科学院近代物理研究所 中性子発生装置に用いられるターゲット装置、加速器駆動の中性子発生装置及びそのビーム結合方法
JP2016540346A (ja) * 2013-12-02 2016-12-22 エーエスエムエル ネザーランズ ビー．ブイ． レーザ生成プラズマｅｕｖ光源におけるソース材料送出の装置
JP2017522697A (ja) * 2014-07-17 2017-08-10 シーメンス アクチエンゲゼルシヤフトＳｉｅｍｅｎｓ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ Ｘ線管用の流体インジェクタおよび液体金属噴射により液体陽極を提供する方法
JP2018185548A (ja) * 2013-03-14 2018-11-22 エーエスエムエル ネザーランズ ビー．ブイ． ターゲット材料の供給および回収のための方法ならびに装置
US10681795B2 (en) 2013-12-02 2020-06-09 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
IT1316249B1 (it) * 2000-12-01 2003-04-03 Enea Ente Nuove Tec Procedimento di abbattimento del flusso di ioni e di piccoli detritiin sorgenti di raggi-x molli da plasma, tramite l'uso di kripton.
US6714624B2 (en) * 2001-09-18 2004-03-30 Euv Llc Discharge source with gas curtain for protecting optics from particles
US8653437B2 (en) 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
JP2010182698A (ja) * 2002-04-10 2010-08-19 Cymer Inc 極紫外線光源
WO2004084592A2 (en) 2003-03-18 2004-09-30 Philips Intellectual Property & Standards Gmbh Device for and method of generating extreme ultraviolet and/or soft x-ray radiation by means of a plasma
EP1612848B1 (de) * 2003-03-26 2013-09-25 Osaka University Extrem-uv lichtquelle, extrem-uv lichtquellentargets und verfahren zur herstellung von extrem-uv lichtquellentargets
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
JP4337648B2 (ja) 2004-06-24 2009-09-30 株式会社ニコン Ｅｕｖ光源、ｅｕｖ露光装置、及び半導体デバイスの製造方法
US7741616B2 (en) 2004-06-24 2010-06-22 Nikon Corporation EUV light source, EUV exposure equipment, and semiconductor device manufacturing method
FR2874785B1 (fr) * 2004-08-27 2006-12-01 Commissariat Energie Atomique Procede et dispositif de generation de rayonnement ou de particules par interaction entre un faisceau laser et une cible
US7885387B2 (en) 2004-12-17 2011-02-08 Osaka University Extreme ultraviolet light and X-ray source target and manufacturing method thereof
JP4710463B2 (ja) * 2005-07-21 2011-06-29 ウシオ電機株式会社 極端紫外光発生装置
US8901521B2 (en) 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
US7763871B2 (en) 2008-04-02 2010-07-27 Asml Netherlands B.V. Radiation source
NL1035846A1 (nl) * 2007-08-23 2009-02-24 Asml Netherlands Bv Radiation source.
DE102007056872A1 (de) * 2007-11-26 2009-05-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Berlin Strahlungserzeugung mittels Laserbestrahlung eines freien Tröpfchentargets
RU2494484C2 (ru) 2008-05-02 2013-09-27 Шайн Медикал Текнолоджис, Инк. Устройство и способ производства медицинских изотопов
US10978214B2 (en) 2010-01-28 2021-04-13 SHINE Medical Technologies, LLC Segmented reaction chamber for radioisotope production
US10734126B2 (en) 2011-04-28 2020-08-04 SHINE Medical Technologies, LLC Methods of separating medical isotopes from uranium solutions
IN2014DN09137A (de) 2012-04-05 2015-05-22 Shine Medical Technologies Inc
DE102013209447A1 (de) * 2013-05-22 2014-11-27 Siemens Aktiengesellschaft Röntgenquelle und Verfahren zur Erzeugung von Röntgenstrahlung
DE102014226814B4 (de) 2014-12-22 2023-05-11 Siemens Healthcare Gmbh Metallstrahlröntgenröhre
GB201522590D0 (en) * 2015-12-22 2016-02-03 Sck Cen Target assembly for generation of radioactive isotopes
US10310380B2 (en) 2016-12-07 2019-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. High-brightness light source
US10847340B2 (en) 2017-10-11 2020-11-24 HIL Applied Medical, Ltd. Systems and methods for directing an ion beam using electromagnets
US10395881B2 (en) 2017-10-11 2019-08-27 HIL Applied Medical, Ltd. Systems and methods for providing an ion beam
KR102430082B1 (ko) * 2020-03-13 2022-08-04 경희대학교 산학협력단 전자빔을 이용한 극자외선 광원 장치
DE102021004714A1 (de) 2021-08-23 2023-02-23 Hochschule Mittweida (FH), Körperschaft des öffentlichen Rechts Einrichtung zur Beeinflussung der Röntgenemission bei der Lasermaterialbearbeitung eines Werkstücks mittels eines Lasers
US11882642B2 (en) 2021-12-29 2024-01-23 Innovicum Technology Ab Particle based X-ray source
WO2023128856A1 (en) * 2021-12-29 2023-07-06 Innovicum Technology Ab Particle based x-ray source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0186491B1 (de) * 1984-12-26 1992-06-17 Kabushiki Kaisha Toshiba Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel
US4866517A (en) * 1986-09-11 1989-09-12 Hoya Corp. Laser plasma X-ray generator capable of continuously generating X-rays
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
US5052034A (en) * 1989-10-30 1991-09-24 Siemens Aktiengesellschaft X-ray generator
US5459771A (en) * 1994-04-01 1995-10-17 University Of Central Florida Water laser plasma x-ray point source and apparatus
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6285743B1 (en) * 1998-09-14 2001-09-04 Nikon Corporation Method and apparatus for soft X-ray generation
FR2799667B1 (fr) * 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006128157A (ja) * 2004-10-26 2006-05-18 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム
JP2006202671A (ja) * 2005-01-24 2006-08-03 Ushio Inc 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法
JP2011508885A (ja) * 2007-12-28 2011-03-17 グレゴリー ピーファー， 高エネルギー陽子または中性子源
KR101591688B1 (ko) 2007-12-28 2016-02-04 피닉스 뉴클리어 랩스 엘엘씨 고에너지 양성자 및 또는 중성자 소스
US20100284502A1 (en) * 2007-12-28 2010-11-11 Gregory Piefer High energy proton or neutron source
US8837662B2 (en) 2007-12-28 2014-09-16 Phoenix Nuclear Labs Llc High energy proton or neutron source
JP2014096372A (ja) * 2008-09-29 2014-05-22 Gigaphoton Inc 極端紫外光源装置
JP2010103499A (ja) * 2008-09-29 2010-05-06 Komatsu Ltd 極端紫外光源装置および極端紫外光生成方法
US8604453B2 (en) 2008-09-29 2013-12-10 Gigaphoton Inc. Extreme ultraviolet light source apparatus and method of generating ultraviolet light
JP2010263210A (ja) * 2009-05-08 2010-11-18 Xtreme Technologies Gmbh Ｅｕｖ光源におけるエミッタ材料として溶融錫を連続生成するための装置
JP2010287479A (ja) * 2009-06-12 2010-12-24 Univ Of Miyazaki 極端紫外光源および極端紫外光発生方法
US9024261B2 (en) 2009-12-15 2015-05-05 Phoenix Nuclear Labs Llc Method and apparatus for performing active neutron interrogation of containters
JP2011014913A (ja) * 2010-07-16 2011-01-20 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム
JP2013062146A (ja) * 2011-09-13 2013-04-04 Gigaphoton Inc 極端紫外光生成装置
JP2015527703A (ja) * 2013-03-04 2015-09-17 中国科学院近代物理研究所 中性子発生装置に用いられるターゲット装置、加速器駆動の中性子発生装置及びそのビーム結合方法
JP2018185548A (ja) * 2013-03-14 2018-11-22 エーエスエムエル ネザーランズ ビー．ブイ． ターゲット材料の供給および回収のための方法ならびに装置
JP2016540346A (ja) * 2013-12-02 2016-12-22 エーエスエムエル ネザーランズ ビー．ブイ． レーザ生成プラズマｅｕｖ光源におけるソース材料送出の装置
JP2019012293A (ja) * 2013-12-02 2019-01-24 エーエスエムエル ネザーランズ ビー．ブイ． レーザ生成プラズマｅｕｖ光源におけるソース材料送出の装置及び方法
US10681795B2 (en) 2013-12-02 2020-06-09 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
JP2017522697A (ja) * 2014-07-17 2017-08-10 シーメンス アクチエンゲゼルシヤフトＳｉｅｍｅｎｓ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ Ｘ線管用の流体インジェクタおよび液体金属噴射により液体陽極を提供する方法
JP2015053292A (ja) * 2014-12-04 2015-03-19 ギガフォトン株式会社 極端紫外光源装置及びそのターゲット供給システム

Also Published As

Publication number Publication date
WO2001031678A1 (en) 2001-05-03
EP1232516A4 (de) 2003-03-12
AU1241401A (en) 2001-05-08
EP1232516A1 (de) 2002-08-21

Similar Documents

Publication Publication Date Title
JP2003513418A (ja) マイクロターゲットを用いた方法及びラジエーション生成システム
US8445877B2 (en) Extreme ultraviolet light source apparatus and target supply device
US6507641B1 (en) X-ray-generation devices, X-ray microlithography apparatus comprising same, and microelectronic-device fabrication methods utilizing same
JP6860185B2 (ja) 高輝度ｌｐｐ線源および放射線の発生方法並びにデブリの軽減方法
US5459771A (en) Water laser plasma x-ray point source and apparatus
KR101618143B1 (ko) Ｅｕｖ 생성 챔버에서 백스플래시를 방지하기 위한 액적 캐처용 시스템, 방법 및 장치
US6377651B1 (en) Laser plasma source for extreme ultraviolet lithography using a water droplet target
TW393662B (en) Laser plasma X-ray source and semiconductor lithography apparatus using the same and a method thereof
JP5156192B2 (ja) 極端紫外光源装置
US20130319466A1 (en) Cleaning method for euv light generation apparatus
US20130277452A1 (en) Chamber apparatus and method of maintaining target supply unit
KR20080088392A (ko) 극단 자외광 광원 장치 및 극단 자외광 발생 방법
EP1367866A1 (de) Verfahren zur Produktion von Tröpfchentargets für eine Laser-Plasma extrem-uIltraviolett-Lichtquelle mit hoher Pulsrate
TW202144932A (zh) Euv光源及清理一euv光源中之一靶材碎片沈積物之方法
US7476884B2 (en) Device and method for generating extreme ultraviolet (EUV) radiation
JP2004533704A (ja) 特にリソグラフィのための極短紫外の光を生成するための方法及び装置
JPH10319195A (ja) プラズマ・フォーカス高エネルギ・フォトン・ソース
JP2003297737A (ja) 極端紫外光源装置
JP2003534631A (ja) 中性ビームを制御することに基づく極紫外線源
US8025837B2 (en) Generator for flux specific bursts on nano-particles
JP4088485B2 (ja) 光波発生装置及び光波発生方法
US11940736B2 (en) Tin trap device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method
TWI345931B (en) Laser produced plasma euv light source with pre-pulse
CN112772000A (zh) 用于控制将euv靶材料引入euv室的装置和方法