JP2003335874A - Polyimide film - Google Patents

Polyimide film

Info

Publication number
JP2003335874A
JP2003335874A JP2002143319A JP2002143319A JP2003335874A JP 2003335874 A JP2003335874 A JP 2003335874A JP 2002143319 A JP2002143319 A JP 2002143319A JP 2002143319 A JP2002143319 A JP 2002143319A JP 2003335874 A JP2003335874 A JP 2003335874A
Authority
JP
Japan
Prior art keywords
polyimide film
film
aromatic
polyamic acid
heat shrinkage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002143319A
Other languages
Japanese (ja)
Other versions
JP4665373B2 (en
Inventor
Koichi Sawazaki
孔一 沢崎
Hiroichi Yokoyama
博一 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Du Pont Toray Co Ltd
Original Assignee
Du Pont Toray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont Toray Co Ltd filed Critical Du Pont Toray Co Ltd
Priority to JP2002143319A priority Critical patent/JP4665373B2/en
Publication of JP2003335874A publication Critical patent/JP2003335874A/en
Application granted granted Critical
Publication of JP4665373B2 publication Critical patent/JP4665373B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a polyimide film suffering from small dimensional changes both at ordinary temperature and at a higher temperature and suitable for a fine pitch circuit board. <P>SOLUTION: The polyimide film has a Young's modulus of at least 4 GPa, a heat shrinkage ratio at 350°C of at most 0.15% and a heat shrinkage ratio at 400°C of at most 0.20%, and preferably has a water absorption of at most 2.5% and a thermal expansion coefficient between 350-400°C of 20-30 ppm/°C. The film is excellent in processability, has high dimensional stability and can reduce dimensional changes in a step at a higher temperature, and therefore is suitably employed for the fine pitch circuit board. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は常温、高温共に寸法
変化が小さく、ファインピッチ回路用基板に好適なポリ
イミドフィルムに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyimide film suitable for a fine pitch circuit substrate, which has a small dimensional change at both room temperature and high temperature.

【0002】[0002]

【従来の技術】フレキシブルプリント基板や半導体パッ
ケージの高繊細化に伴い、それらに用いられるポリイミ
ドフィルムへの要求事項も多くなっており、例えば金属
との張り合わせによる寸法変化やカールを小さくするこ
と、およびハンドリング性の高いことなどが挙げられ、
ポリイミドフィルムの物性として金属並の熱膨張係数を
有すること及び高弾性率であること、さらには吸水によ
る寸法変化の小さいフィルムが要求され、それに応じた
ポリイミドフィルムが開発されてきた。
2. Description of the Related Art As flexible printed circuit boards and semiconductor packages have become finer and finer, the requirements for polyimide films used for them have been increasing. For example, reduction of dimensional change and curl due to bonding with metal, and It has high handling properties,
As a physical property of a polyimide film, a film having a coefficient of thermal expansion comparable to that of a metal and a high elastic modulus, and further, a film having a small dimensional change due to water absorption are required, and a polyimide film corresponding thereto has been developed.

【0003】例えば特開昭60−210629、特開昭
64−16832、特開平1−131241号公報で
は、弾性率を高めるためパラフェニレンジアミンを使用
したポリイミドフィルムの例が記載されている。また特
開昭59−164328号公報、特開昭61−1113
59号公報では高弾性を保持しつつ吸水による寸法変化
を低減させるためパラフェニレンジアミンに加えビフェ
ニルテトラカルボン酸二無水物を使用したポリイミドフ
ィルムの例が記載されている。
For example, JP-A-60-210629, JP-A-64-16832, and JP-A-1-131241 disclose examples of polyimide films using para-phenylenediamine to increase the elastic modulus. Further, JP-A-59-164328 and JP-A-61-1113.
JP-A-59-59 describes an example of a polyimide film using biphenyltetracarboxylic dianhydride in addition to paraphenylenediamine in order to reduce dimensional change due to water absorption while maintaining high elasticity.

【0004】ところでTAB(Tape Automated Bondin
g)など高寸法精度を要する用途において、これらのポ
リイミドフィルムが使用されてきたが、近年は例えばC
OF(Chip on Film)用途で配線とチップとの接合に3
50〜400℃の高温がポリイミドフィルムに直接かか
り、それらの温度による熱収縮が大きいため寸法変化の
悪化を招くといった課題を抱えていた。また接着剤の信
頼性が向上しそれに伴って接着温度も上がってきている
がそれに対しポリイミドフィルムを350〜400℃で
加工すると寸法変化が大きくなりファインピッチ化要求
への対応が困難であった。
By the way, TAB (Tape Automated Bondin)
These polyimide films have been used in applications requiring high dimensional accuracy such as g), but in recent years, for example, C
3 for joining wiring and chip for OF (Chip on Film) applications
A high temperature of 50 to 400 ° C. is directly applied to the polyimide film, and heat shrinkage due to these temperatures is large, which causes a problem that dimensional change is deteriorated. Further, the reliability of the adhesive has been improved and the bonding temperature has been increased accordingly, but when the polyimide film is processed at 350 to 400 ° C., the dimensional change becomes large and it is difficult to meet the demand for fine pitch.

【0005】[0005]

【発明が解決しようとする課題】本発明は、上述した従
来技術における問題点の解決を課題として検討した結果
なされたものであり、350〜400℃加工時での寸法
変化を低減させることができるファインピッチ回路用基
板に好適なポリイミドフィルムの提供を目的とするもの
である。
The present invention has been made as a result of studying to solve the above-mentioned problems in the prior art, and can reduce the dimensional change during processing at 350 to 400 ° C. It is intended to provide a polyimide film suitable for a fine pitch circuit substrate.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明のポリイミドフィルムは、ヤング率4GP
a以上、350℃での加熱収縮率が0.15%以下、4
00℃での加熱収縮率が0.20%以下であることを特
徴とする。
In order to achieve the above object, the polyimide film of the present invention has a Young's modulus of 4 GP.
a or more and heat shrinkage at 350 ° C. of 0.15% or less, 4
The heat shrinkage percentage at 00 ° C. is 0.20% or less.

【0007】さらに、吸水率が2.5%以下であるこ
と、350〜400℃での熱膨張係数が20〜30pp
m/℃であることが好ましい。
Furthermore, the water absorption is 2.5% or less, and the coefficient of thermal expansion at 350 to 400 ° C. is 20 to 30 pp.
It is preferably m / ° C.

【0008】[0008]

【発明の実施の形態】本発明ポリイミドフィルムを得る
に際しての前駆体であるポリアミック酸溶液について説
明する。
BEST MODE FOR CARRYING OUT THE INVENTION A polyamic acid solution which is a precursor for obtaining the polyimide film of the present invention will be described.

【0009】本発明に用いられるポリアミック酸溶液
は、芳香族ジアミン成分としてパラフェニレンジアミン
及び4,4’−ジアミノジフェニルエーテルから構成さ
れることが好ましく、芳香族酸無水物成分としてはピロ
メリット酸二無水物及びビフェニルテトラカルボン酸二
無水物から構成されることが好ましい。また、ポリアミ
ック酸分子1単位当たりの分子量が420以下であるこ
とが好ましい。420を超えると高温350〜400℃
での寸法変化並びに熱収縮が大きくなり好ましくない。
ここでポリアミック酸分子1単位当たりの分子量とは、
芳香族ジアミン成分:芳香族酸無水物成分1:1とした
時の分子量のことをいい、下記式により計算される。
The polyamic acid solution used in the present invention is preferably composed of paraphenylenediamine and 4,4'-diaminodiphenyl ether as an aromatic diamine component, and pyromellitic dianhydride as an aromatic acid anhydride component. And biphenyltetracarboxylic dianhydride. The molecular weight per unit of polyamic acid molecule is preferably 420 or less. If it exceeds 420, high temperature 350-400 ℃
It is not preferable because the dimensional change and the heat shrinkage become large.
Here, the molecular weight per unit of polyamic acid molecule is
Aromatic diamine component: Aromatic acid anhydride component: The molecular weight when it is 1: 1 and calculated by the following formula.

【0010】 ポリアミック酸分子1単位当たりの分子量 =A(芳香族ジアミン成分)の分子量×全芳香族ジアミン成分の中でのAの モル比率 +B(芳香族ジアミン成分)の分子量×全芳香族ジアミン成分の中でのBの モル比率 +・・・+・・・ +Z(芳香族酸無水物成分)の分子量×全芳香族酸無水物成分の中でのZの モル比率 +Y(芳香族酸無水物成分)の分子量×全芳香族酸無水物成分の中でのYの モル比率 +・・・+・・・ 用いられる芳香族ジアミン成分としては、剛構造の芳香
族ジアミン成分と柔構造の芳香族ジアミン成分の組み合
わせで用いると、適度な柔軟性が得られかつ寸法変化の
小さいフィルムが得られるので好ましい。剛構造の芳香
族ジアミン成分の例としては下記に示したような化合物
を挙げることができる。
Molecular weight per unit of polyamic acid molecule = molecular weight of A (aromatic diamine component) × molar ratio of A in the total aromatic diamine component + molecular weight of B (aromatic diamine component) × total aromatic diamine component Molar ratio of B in the mixture + ... + ... + Molecular weight of Z (aromatic acid anhydride component) x molar ratio of Z in the wholly aromatic acid anhydride component + Y (aromatic acid anhydride) Component) molecular weight × molar ratio of Y in the wholly aromatic acid anhydride component + ... + ... The aromatic diamine component used is a rigid structure aromatic diamine component and a flexible structure aromatic diamine component. It is preferable to use it in combination with a diamine component, since it is possible to obtain a film having appropriate flexibility and a small dimensional change. Examples of the rigid structure aromatic diamine component include the compounds shown below.

【0011】[0011]

【化1】 [Chemical 1]

【0012】(ただし、式中のX,Yは、水素、ハロゲ
ン基、カルボキシル基、低級アルキル基、低級アルコキ
シル基(炭素数1〜3)から選ばれる1価の置換基を表
し、X,Yは同じ置換基でも異なった置換基でも良
い。) 上記に示した剛構造の芳香族ジアミン化合物のなかで
も、得られるポリイミドフィルムの弾性率を高める点や
取り扱い面、コスト面の点で、特にパラフェニレンジア
ミンを使用するのが好ましい。
(Wherein X and Y represent a monovalent substituent selected from hydrogen, a halogen group, a carboxyl group, a lower alkyl group and a lower alkoxyl group (having 1 to 3 carbon atoms), and X and Y May be the same substituent or different substituents.) Among the above-mentioned rigid-structure aromatic diamine compounds, in particular in terms of increasing the elastic modulus of the obtained polyimide film, handling and cost, Preference is given to using phenylenediamine.

【0013】また、柔構造の芳香族ジアミン化合物の例
としては、下記に示したような化合物を挙げることがで
きる。
Examples of the flexible aromatic diamine compound include the compounds shown below.

【0014】[0014]

【化2】 [Chemical 2]

【0015】(ただし、式中のX、Yは水素、ハロゲン
基、カルボキシル基低級アルキル基、低級アルコキシル
基(炭素数1〜3)から選ばれる1価の置換基を表し、
X、Yは同じ置換基でも異なった置換基でも良い。また
Aは−O−,−S−,−CO−,−SO−,−SO
2 −,−CH2 −などの2価の連結基を表す。) 上記に示した柔構造の芳香族ジアミンのうちでも、得ら
れるポリイミドフィルムの成形性を高める点で、特にジ
アミノジフェニルエーテル類を使用するのが好ましい。
(Where X and Y represent a monovalent substituent selected from hydrogen, a halogen group, a carboxyl group, a lower alkyl group and a lower alkoxyl group (having 1 to 3 carbon atoms),
X and Y may be the same or different substituents. A is -O-, -S-, -CO-, -SO-, -SO.
2 -, - CH 2 - represents a divalent linking group, such as. Among the above-mentioned aromatic diamines having a flexible structure, it is preferable to use diaminodiphenyl ethers from the viewpoint of enhancing the moldability of the obtained polyimide film.

【0016】用いられる芳香族酸無水物成分としては、
ピロメリット酸類と2個以上のベンゼン環を有する芳香
族テトラカルボン酸類化合物の組み合わせで用いると、
低吸水性が得られかつ高温での寸法安定性の良好なフィ
ルムが得られるので好ましい。
As the aromatic acid anhydride component used,
When used in combination with pyromellitic acid and an aromatic tetracarboxylic acid compound having two or more benzene rings,
It is preferable because a film having low water absorption and good dimensional stability at high temperature can be obtained.

【0017】本発明で使用する芳香族テトラカルボン酸
類化合物の内で、ピロメリット酸類の例としては、ピロ
メリット酸またはその二無水物を挙げることができる。
また、2個以上のベンゼン環を有する芳香族テトラカル
ボン酸類化合物の例としては3,3’,4,4’−ビフ
ェニルテトラカルボン酸またはその二無水物や3,
3’,4,4’−ベンゾフェノンテトラカルボン酸また
はその二無水物を挙げることができるが前者の方が得ら
れるポリイミドフィルムの弾性率を高める点や低吸水性
を高める点で好ましい。
Among the aromatic tetracarboxylic acid compounds used in the present invention, examples of pyromellitic acids include pyromellitic acid and dianhydride thereof.
Examples of the aromatic tetracarboxylic acid compound having two or more benzene rings include 3,3 ′, 4,4′-biphenyltetracarboxylic acid or its dianhydride or 3,3 ′, 4,4′-biphenyltetracarboxylic acid.
Although 3 ', 4,4'-benzophenone tetracarboxylic acid or a dianhydride thereof can be mentioned, the former is preferred from the viewpoint of increasing the elastic modulus and low water absorption of the obtained polyimide film.

【0018】本発明ポリイミドフィルムを得るに際して
の前駆体であるポリアミド酸溶液について説明する。
A polyamic acid solution which is a precursor for obtaining the polyimide film of the present invention will be described.

【0019】重合方法は公知のいずれの方法で行っても
よく、例えば (1).先に芳香族ジアミン成分全量を溶媒中に入れ、そ
の後芳香族テトラカルボン酸類成分を芳香族ジアミン成
分全量と当量になるよう加えて重合する方法。
The polymerization method may be any known method, for example, (1). A method in which the total amount of the aromatic diamine component is first placed in a solvent, and then the aromatic tetracarboxylic acid component is added in an amount equivalent to the total amount of the aromatic diamine component to carry out polymerization.

【0020】(2).先に芳香族テトラカルボン酸類成分
全量を溶媒中に入れ、その後芳香族ジアミン成分を芳香
族テトラカルボン酸類成分と等量になるよう加えて重合
する方法。
(2). A method in which the total amount of the aromatic tetracarboxylic acid components is first placed in a solvent, and then the aromatic diamine component is added in an amount equal to that of the aromatic tetracarboxylic acid components to carry out polymerization.

【0021】(3).剛構造の芳香族ジアミン化合物を溶
媒中に入れた後、反応成分に対して芳香族テトラカルボ
ン酸類化合物が95〜105モル%となる比率で反応に
必要な時間混合した後、柔構造の芳香族ジアミン化合物
を添加し、続いて芳香族テトラカルボン酸類化合物を全
芳香族ジアミン成分と全芳香族テトラカルボン酸類成分
とがほぼ等量になるよう添加して重合する方法。
(3). After the aromatic diamine compound having a rigid structure is put into a solvent, the aromatic tetracarboxylic acid compound is mixed with the reaction components at a ratio of 95 to 105 mol% for a time necessary for the reaction, and then the aromatic aromatic compound having a flexible structure is mixed. A method in which a diamine compound is added, and subsequently, an aromatic tetracarboxylic acid compound is added so that the wholly aromatic diamine component and the wholly aromatic tetracarboxylic acid component are approximately equal in amount and polymerized.

【0022】(4).芳香族テトラカルボン酸類化合物を
溶媒中に入れた後、反応成分に対して剛構造の芳香族ジ
アミン化合物が95〜105モル%となる比率で反応に
必要な時間混合した後、芳香族テトラカルボン酸類化合
物を添加し、続いて柔構造の芳香族ジアミン化合物を全
芳香族ジアミン成分と全芳香族テトラカルボン酸類成分
とがほぼ等量になるよう添加して重合する方法。
(4). After the aromatic tetracarboxylic acid compound is placed in the solvent, the aromatic diamine compound having a rigid structure is mixed with the reaction components at a ratio of 95 to 105 mol% for a time necessary for the reaction, and then the aromatic tetracarboxylic acid compound is mixed. A method in which a compound is added, and subsequently, a flexible aromatic diamine compound is added so that the wholly aromatic diamine component and the wholly aromatic tetracarboxylic acid component are approximately equal in amount and polymerized.

【0023】(5).溶媒中で剛構造の芳香族ジアミン成
分と芳香族テトラカルボン酸類をどちらかが過剰になる
よう反応させてポリアミド酸溶液(A)を調整し、別の
溶媒中で柔構造の芳香族ジアミン成分と芳香族テトラカ
ルボン酸類をどちらかが過剰になるよう反応させポリア
ミド酸溶液(B)を調整する。こうして得られた各ポリ
アミド酸溶液(A)と(B)を混合し、重合を完結する
方法。この時ポリアミド酸溶液(A)を調整するに際し
芳香族ジアミン成分が過剰の場合、ポリアミド酸溶液
(B)では芳香族テトラカルボン酸成分を過剰に、また
ポリアミド酸溶液(A)で芳香族テトラカルボン酸成分
が過剰の場合、ポリアミド酸溶液(B)では芳香族ジア
ミン成分を過剰にし、ポリアミド酸溶液(A)と(B)
を混ぜ合わせこれら反応に使用される全芳香族ジアミン
成分と全芳香族テトラカルボン酸類成分とがほぼ等量に
なるよう調整する。
(5). A polyamic acid solution (A) is prepared by reacting an aromatic diamine component having a rigid structure and an aromatic tetracarboxylic acid with each other in a solvent to prepare an excess, and then preparing a polyamic acid solution (A) in another solvent to obtain an aromatic diamine component having a flexible structure. Aromatic tetracarboxylic acids are reacted so that one of them is excessive, and a polyamic acid solution (B) is prepared. A method of mixing the thus obtained polyamic acid solutions (A) and (B) to complete the polymerization. At this time, when the aromatic diamine component is excessive when adjusting the polyamic acid solution (A), the aromatic tetracarboxylic acid component is excessive in the polyamic acid solution (B), and the aromatic tetracarboxylic acid component is excessive in the polyamic acid solution (A). When the acid component is excessive, the polyamic acid solution (B) contains excess aromatic diamine component, and the polyamic acid solutions (A) and (B) are added.
Are mixed so that the wholly aromatic diamine component and the wholly aromatic tetracarboxylic acid component used in these reactions are adjusted to be approximately equal in amount.

【0024】なお、重合方法はこれらに限定されること
はなく、その他公知の方法を用いてもよい。
The polymerization method is not limited to these, and other known methods may be used.

【0025】次に、得られたポリアミド酸溶液からポリ
イミドフィルムを得る方法を説明する。
Next, a method for obtaining a polyimide film from the obtained polyamic acid solution will be described.

【0026】まず、ポリアミド酸溶液を環化触媒および
脱水剤を用いて化学環化するか加熱処理による熱的環化
によりポリイミドのゲルフィルムを得る。
First, a polyamic acid solution is chemically cyclized by using a cyclization catalyst and a dehydrating agent or thermally cyclized by heat treatment to obtain a polyimide gel film.

【0027】次に、このゲルフィルムの端部を固定し、
縦方向に1.05〜1.5、横方向に1.05〜2.0
の倍率で延伸するのが好ましい。このような2軸延伸を
行うと、得られるポリイミドフィルムの機械特性向上、
さらには等方性が改良されるので好ましい。
Next, fix the end portion of this gel film,
1.05-1.5 in the vertical direction, 1.05-2.0 in the horizontal direction
It is preferable to stretch at a magnification of. When such biaxial stretching is performed, the mechanical properties of the obtained polyimide film are improved,
Furthermore, the isotropic property is improved, which is preferable.

【0028】また走行速度を調整しポリイミドフィルム
の厚みを調整するが、ポリイミドフィルムの厚みとして
は3〜250μmが好ましい。これより薄くても厚くて
もフィルムの製膜性が著しく悪化するので好ましくな
い。
The running speed is adjusted to adjust the thickness of the polyimide film, and the thickness of the polyimide film is preferably 3 to 250 μm. If it is thinner or thicker than this, the film-forming property of the film is significantly deteriorated, which is not preferable.

【0029】上記の重合で使用する溶媒としては、ジメ
チルスルホキシド、N,N−ジメチルアセトアミド、
N,N−ジエチルアセトアミド、N,N−ジメチルホル
ムアミド、N,N−ジエチルホルムアミド、N−メチル
−2−ピロリドンおよびジメチルスルホンなどが挙げら
れ、これらを単独あるいは混合して使用するのが好まし
い。
As the solvent used in the above polymerization, dimethyl sulfoxide, N, N-dimethylacetamide,
Examples thereof include N, N-diethylacetamide, N, N-dimethylformamide, N, N-diethylformamide, N-methyl-2-pyrrolidone and dimethyl sulfone, and these are preferably used alone or in combination.

【0030】上記の重合で得られるポリアミド酸は、前
記溶媒中に10〜30重量%の割合となるように調整す
る。
The polyamic acid obtained by the above polymerization is adjusted so as to be 10 to 30% by weight in the solvent.

【0031】得られたポリアミド酸を環化させてポリイ
ミドフィルムにする際には、脱水剤と触媒を用いて脱水
する化学閉環法、熱的に脱水する熱閉環法のいずれで行
ってもよいが、化学閉環法で行った方が、得られるポリ
イミドフィルムの弾性率が高く、熱膨張係数が低くな
り、さらにケミカルエッチング性が付与できるため好ま
しい。
When the obtained polyamic acid is cyclized into a polyimide film, it may be carried out by either a chemical ring-closing method of dehydrating using a dehydrating agent and a catalyst or a thermal ring-closing method of thermally dehydrating. The chemical ring closure method is preferable because the polyimide film obtained has a high elastic modulus, a low thermal expansion coefficient, and chemical etching properties can be imparted.

【0032】化学閉環法で使用する脱水剤としては、無
水酢酸などの脂肪族酸無水物、フタル酸無水物などの芳
香族酸無水物などが挙げられ、これらを単独あるいは混
合して使用するのが好ましい。また触媒としては、ピリ
ジン、ピコリン、キノリンなどの複素環式第3級アミン
類、トリエチルアミンなどの脂肪族第3級アミン類、
N,N−ジメチルアニリンなどの芳香族第3級アミン類
などが挙げられ、これらを単独あるいは混合して使用す
るのが好ましい。
Examples of the dehydrating agent used in the chemical ring closure method include aliphatic acid anhydrides such as acetic anhydride and aromatic acid anhydrides such as phthalic anhydride. These are used alone or in combination. Is preferred. Further, as the catalyst, heterocyclic tertiary amines such as pyridine, picoline and quinoline, aliphatic tertiary amines such as triethylamine,
Examples thereof include aromatic tertiary amines such as N, N-dimethylaniline, and these are preferably used alone or in combination.

【0033】また、化学閉環法を行う場合は、ポリアミ
ド酸溶液中に触媒・脱水剤を混合させイミド化した後に
この溶液をコーティングしてポリイミドフィルムを得る
方法と、ポリアミド酸溶液をコーティングして薄膜化さ
せた後に触媒・脱水剤の混合中に浸漬してイミド化させ
ることによってポリイミドフィルムを得る方法がある。
前者の方が厚み方向に均一なポリイミドフィルムが得ら
れるので好ましい。
When the chemical ring-closing method is carried out, a catalyst and a dehydrating agent are mixed in a polyamic acid solution to imidize it and then the solution is coated to obtain a polyimide film, and a polyamic acid solution is coated to form a thin film. There is a method of obtaining a polyimide film by immersing it in a mixture of a catalyst and a dehydrating agent and then imidizing it.
The former is preferred because a polyimide film having a uniform thickness can be obtained.

【0034】このようにして得られたポリイミドフィル
ムをさらに350〜400℃の温度でアニール処理を行
うことが好ましい。そうすることによってフィルムの熱
リラックスが起こり同温度での工程で使用された時にポ
リイミドフィルムの寸法変化を小さく抑えることができ
る。具体的には350〜400℃の炉の中を、低張力下
にてフィルムを走行させ、アニール処理を行う。炉の中
でフィルムが滞留する時間が処理時間となるが、走行速
度を変えることでコントロールすることになり、30秒
〜5分の処理時間であることが好ましい。これより短い
とフィルムに充分熱が伝わらず、また長いと過熱気味に
なり平面性を損なうので好ましくない。また走行時のフ
ィルム張力は10〜50N/mが好ましく、さらには2
0〜30N/mが好ましい。この範囲よりも張力が低い
とフィルムの走行性が悪くなり、また張力が高いと得ら
れたフィルムの走行方向の熱収縮率が高くなるので好ま
しくない。
The polyimide film thus obtained is preferably annealed at a temperature of 350 to 400 ° C. By doing so, thermal relaxation of the film occurs and the dimensional change of the polyimide film can be suppressed when used in the process at the same temperature. Specifically, the film is run in a furnace at 350 to 400 ° C. under low tension to perform annealing treatment. The processing time is the time for the film to stay in the furnace, but it is controlled by changing the running speed, and the processing time is preferably 30 seconds to 5 minutes. If the length is shorter than this, heat is not sufficiently transmitted to the film, and if the length is longer than that, the film tends to be overheated and impairs the flatness. The film tension during running is preferably 10 to 50 N / m, and further 2
0 to 30 N / m is preferable. When the tension is lower than this range, the running property of the film is deteriorated, and when the tension is high, the heat shrinkage ratio in the running direction of the obtained film is high, which is not preferable.

【0035】なお、得られるポリイミドフィルムの表面
を粗化させてフィルムに滑り性を与え工程安定性を良く
するために、有機フィラーまたは無機フィラーをポリア
ミド酸溶液に混合してもよい。
An organic filler or an inorganic filler may be mixed with the polyamic acid solution in order to roughen the surface of the obtained polyimide film to give the film slipperiness and improve the process stability.

【0036】また、得られたポリイミドフィルムに接着
性を持たせるため、フィルム表面にコロナ処理やプラズ
マ処理のような電気処理あるいはブラスト処理のような
物理的処理を行ってもよい。
In order to impart adhesiveness to the obtained polyimide film, the film surface may be subjected to electrical treatment such as corona treatment or plasma treatment or physical treatment such as blast treatment.

【0037】このようにして得られるポリイミドフィル
ムは、ヤング率4GPa以上、吸水率2.5%以下、3
50℃での加熱収縮率が0.20%以下、400℃での
加熱収縮率が0.15%以下となり、さらに350〜4
00℃での熱膨張係数が20〜30ppm/℃になるよ
うな特性が得られるので、加工性に優れ寸法安定性が高
く、なおかつ高温工程でも寸法変化を低減することがで
き、ファインピッチ回路用基板に好適である。
The polyimide film thus obtained has a Young's modulus of 4 GPa or more and a water absorption rate of 2.5% or less, 3
The heat shrinkage at 50 ° C is 0.20% or less, the heat shrinkage at 400 ° C is 0.15% or less, and 350 to 4
Since it has characteristics such that the coefficient of thermal expansion at 00 ° C is 20 to 30 ppm / ° C, it has excellent workability, high dimensional stability, and can reduce dimensional changes even in high temperature processes. Suitable for substrates.

【0038】[0038]

【実施例】以下、実施例により本発明を具体的に説明す
る。
EXAMPLES The present invention will be specifically described below with reference to examples.

【0039】なお、実施例中PPDはパラフェニレンジ
アミン、4,4’−ODAは4,4’−ジアミノジフェ
ニルエーテル、PMDAはピロメリット酸二無水物、B
PDAは3,3’−4,4’−ジフェニルテトラカルボ
ン酸二無水物、DMAcはN,N−ジメチルアセトアミ
ドをそれぞれ表す。
In the examples, PPD is paraphenylenediamine, 4,4'-ODA is 4,4'-diaminodiphenyl ether, PMDA is pyromellitic dianhydride, B
PDA represents 3,3′-4,4′-diphenyltetracarboxylic dianhydride, and DMAc represents N, N-dimethylacetamide.

【0040】また、実施例中の各特性は次の方法で評価
した。 (1)吸水率 98%RH雰囲気下のデシケーター内に2日間静置し、
乾燥時重量に対しての増加重量%で評価した。 (2)弾性率 機器:RTM−250を使用し、引張速度:100mm
/minの条件で測定した。 (3)加熱収縮率 (a)350℃ 25℃、60%RHに調整された部屋に2日間放置した
後のフィルム寸法(L1)を測定し、続いて350℃3
0分間加熱した後再び25℃、60%RHに調整された
部屋に2日間放置した後フィルム寸法(L2)を測定
し、下記式計算により評価した。
Each characteristic in the examples was evaluated by the following methods. (1) Water absorption rate: 98%, left in a desiccator under RH atmosphere for 2 days,
The evaluation was made by the weight% increase with respect to the dry weight. (2) Elastic modulus device: RTM-250 is used, pulling speed: 100 mm
It was measured under the condition of / min. (3) Heat shrinkage ratio (a) 350 ° C. The film size (L1) was measured after leaving it in a room adjusted to 25 ° C. and 60% RH for 2 days, and then 350 ° C. 3
After heating for 0 minutes, the film was allowed to stand in a room adjusted to 25 ° C. and 60% RH again for 2 days, and then the film size (L2) was measured and evaluated by the following formula calculation.

【0041】 加熱収縮率 = −(L2−L1)/L1×100 (b)400℃ 25℃、60%RHに調整された部屋に2日間放置した
後のフィルム寸法(L1)を測定し、続いて400℃3
0分間加熱した後再び25℃、60%RHに調整された
部屋に2日間放置した後フィルム寸法(L2)を測定
し、下記式計算により評価した。
Heat shrinkage rate = − (L2-L1) / L1 × 100 (b) 400 ° C. The film size (L1) after standing for 2 days in a room adjusted to 25 ° C. and 60% RH was measured. 400 ℃ 3
After heating for 0 minutes, the film was allowed to stand in a room adjusted to 25 ° C. and 60% RH again for 2 days, and then the film size (L2) was measured and evaluated by the following formula calculation.

【0042】 加熱収縮率 = −(L2−L1)/L1×100 (4)熱膨張係数 機器:TMA−50を使用し、測定温度範囲:350〜
400℃、昇温速度:10℃/minの条件で測定し
た。
Heat shrinkage rate =-(L2-L1) / L1 × 100 (4) Thermal expansion coefficient Equipment: TMA-50 is used, and measurement temperature range: 350-
The measurement was carried out under the conditions of 400 ° C. and temperature rising rate: 10 ° C./min.

【0043】[実施例1]500mlのセパルブルフラ
スコにDMAc239.1gを入れ、ここにPPD2.
71g(0.025モル)、4,4’−ODA24.4
4g(0.122モル)、BPDA6.49g(0.0
22モル)、PMDA27.27g(0.125モル)
を投入し、常温常圧中で1時間反応、均一になるまで撹
拌しポリアミック酸溶液を得た。
Example 1 DMAc (239.1 g) was placed in a 500 ml separable flask, and PPD2.
71 g (0.025 mol), 4,4'-ODA24.4
4 g (0.122 mol), BPDA 6.49 g (0.0
22 mol), PMDA 27.27 g (0.125 mol)
Was added, and the mixture was reacted at room temperature and atmospheric pressure for 1 hour and stirred until it became uniform to obtain a polyamic acid solution.

【0044】なお、この重合で各原料の添加モル比は、
表1に示す割合で行い、固形分合計重量は60.9gに
調整した。このポリアミック酸溶液から15gを採って
マイナス5℃で冷却後、無水酢酸1.5gとβ−ピコリ
ン1.6gを混合することにより、ポリアミック酸のイ
ミド化を行った。
In this polymerization, the addition molar ratio of each raw material is
It carried out in the ratio shown in Table 1, and adjusted the total solid content weight to 60.9 g. After taking 15 g of this polyamic acid solution and cooling at −5 ° C., the polyamic acid was imidized by mixing 1.5 g of acetic anhydride and 1.6 g of β-picoline.

【0045】こうして得られたポリイミドポリマーをガ
ラス板にコーティングして100℃で5分間加熱してゲ
ルフィルムを得た後、このゲルフィルムをガラス板から
剥がして、そのゲルフィルムの端部をピン止めし、縦方
向1.1倍、横方向1.3倍に延伸した。その後300
℃で20分間、続いて400℃で5分間加熱乾燥し、厚
さ25μmのポリイミドフィルムを得た。このポリイミ
ドフィルムを370℃に設定された炉の中で20N/m
の張力をかけて1分間アニール処理を行った後、各物性
を評価した。
The polyimide polymer thus obtained was coated on a glass plate and heated at 100 ° C. for 5 minutes to obtain a gel film. The gel film was peeled off from the glass plate, and the ends of the gel film were pinned. Then, it was stretched 1.1 times in the longitudinal direction and 1.3 times in the lateral direction. Then 300
The film was heated and dried at 20 ° C. for 20 minutes and then at 400 ° C. for 5 minutes to obtain a polyimide film having a thickness of 25 μm. 20 N / m of this polyimide film in a furnace set at 370 ° C.
After applying the tension of 1 to perform the annealing treatment for 1 minute, each physical property was evaluated.

【0046】 ヤング率 : 5.3GPa 吸水率 : 2.4% 350℃加熱収縮率 : 0.06% 400℃加熱収縮率 : 0.09% 350〜400℃熱膨張係数: 28.3ppm/℃ [実施例2〜4]実施例1と同様の手順で、芳香族ジア
ミン成分および芳香族テトラカルボン酸成分を表1に示
す割合に変更し、それぞれポリアミック酸溶液を得た
後、ポリアミック酸溶液からポリイミドフィルムを得る
操作については実施例1と同様にして行い、アニール処
理も実施例1と同様にして実施した。
Young's modulus: 5.3 GPa Water absorption: 2.4% 350 ° C. heat shrinkage: 0.06% 400 ° C. Heat shrinkage: 0.09% 350-400 ° C. Thermal expansion coefficient: 28.3 ppm / ° C. [ Examples 2 to 4] By the same procedure as in Example 1, the ratios of the aromatic diamine component and the aromatic tetracarboxylic acid component were changed to those shown in Table 1 to obtain polyamic acid solutions, and then the polyamic acid solution was used to remove the polyimide. The operation for obtaining the film was performed in the same manner as in Example 1, and the annealing treatment was performed in the same manner as in Example 1.

【0047】得られた各ポリイミドフィルムの各物性評
価結果を表1に示した。
Table 1 shows the evaluation results of the physical properties of the obtained polyimide films.

【0048】[0048]

【表1】 [Table 1]

【0049】[比較例1]各原料実施例1と同一にて調
整、同様の手順でポリアミック酸溶液を得た後、ポリア
ミック酸溶液からポリイミドフィルムを得る操作につい
ても実施例1と同様にして行い、アニール処理は行わ
ず、各物性を評価した結果を表2に示した。
[Comparative Example 1] Preparation of each raw material in the same manner as in Example 1, and after obtaining a polyamic acid solution by the same procedure, the operation of obtaining a polyimide film from the polyamic acid solution was also performed in the same manner as in Example 1. Table 2 shows the results of evaluating the respective physical properties without performing the annealing treatment.

【0050】[比較例2、3]実施例1と同様の手順
で、芳香族ジアミン成分および芳香族テトラカルボン酸
成分を表2に示す割合に変更し、それぞれポリアミック
酸溶液を得た後、ポリアミック酸溶液からポリイミドフ
ィルムを得る操作については実施例1と同様にして行
い、アニール処理も実施例1と同様にして実施した。
[Comparative Examples 2 and 3] By the same procedure as in Example 1, the ratios of the aromatic diamine component and the aromatic tetracarboxylic acid component were changed to those shown in Table 2 to obtain polyamic acid solutions, and then polyamic acid was obtained. The operation of obtaining the polyimide film from the acid solution was performed in the same manner as in Example 1, and the annealing treatment was performed in the same manner as in Example 1.

【0051】得られた各ポリイミドフィルムの各物性評
価結果を表2に併記した。
Table 2 also shows the evaluation results of the physical properties of the obtained polyimide films.

【0052】[0052]

【表2】 [Table 2]

【0053】[0053]

【発明の効果】本発明のポリイミドフィルムは、ヤング
率4GPa以上、吸水率2.5%以下、350℃での加
熱収縮率が0.20%以下、400℃での加熱収縮率が
0.15%以下となり、さらに350〜400℃での熱
膨張係数が20〜30ppm/℃になるような特性が得
られるので、加工性に優れ寸法安定性が高く、なおかつ
高温工程でも寸法変化を低減することができ、ファイン
ピッチ回路用基板に好適に用いることができる。
INDUSTRIAL APPLICABILITY The polyimide film of the present invention has a Young's modulus of 4 GPa or more, a water absorption rate of 2.5% or less, a heat shrinkage rate at 350 ° C. of 0.20% or less, and a heat shrinkage rate at 400 ° C. of 0.15. % Or less, and further, the characteristic that the coefficient of thermal expansion at 350 to 400 ° C. is 20 to 30 ppm / ° C. is obtained, so that the workability is excellent, the dimensional stability is high, and the dimensional change is reduced even in the high temperature process. Therefore, it can be suitably used for a fine pitch circuit substrate.

フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08L 79:08 C08L 79:08 Z Fターム(参考) 4F071 AA60 AA60X AA81 AA81X AF10Y AF61Y AF62Y AG28 AH13 BA02 BB02 BB07 BB12 BC01 4F210 AA40 AC03 AG01 AH36 QA08 QC05 QD01 QG01 QG17 QW06 QW11 QW17 4J043 PA01 PA04 QB05 QB26 QC02 RA05 RA34 SA06 SB03 TA22 TB03 UA121 UA122 UA131 UA132 UB121 UB402 VA011 VA021 VA022 VA062 XA16 XA19 YA06 YA07 YA08 YA28 YA29 ZA04 ZA12 ZA35 ZB50Front page continuation (51) Int.Cl. 7 Identification code FI theme code (reference) C08L 79:08 C08L 79:08 ZF term (reference) 4F071 AA60 AA60X AA81 AA81X AF10Y AF61Y AF62Y AG28 AH13 BA02 BB02 BB07 BB12 BC01 4F210 AA40 AC03 AG01 AH36 QA08 QC05 QD01 QG01 QG17 QW06 QW11 QW17 4J043 PA01 PA04 QB05 QB26 QC02 RA05 RA34 SA06 SB03 TA22 TB03 UA121 UA122 UA131 UA132 YA35 YA08 YA08 YA08 YA08 YA02 VA02 XA02 VA06 XA2

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ヤング率4GPa以上、350℃での加
熱収縮率が0.15%以下、400℃での加熱収縮率が
0.20%以下であることを特徴とするポリイミドフィ
ルム。
1. A polyimide film having a Young's modulus of 4 GPa or more, a heat shrinkage at 350 ° C. of 0.15% or less, and a heat shrinkage at 400 ° C. of 0.20% or less.
【請求項2】 吸水率が2.5%以下であることを特徴
とする請求項1記載のポリイミドフィルム。
2. The polyimide film according to claim 1, which has a water absorption of 2.5% or less.
【請求項3】 350〜400℃での熱膨張係数が20
〜30ppm/℃であることを特徴とする請求項2記載
のポリイミドフィルム。
3. The coefficient of thermal expansion at 350 to 400 ° C. is 20.
The polyimide film according to claim 2, wherein the polyimide film has a content of -30 ppm / ° C.
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JP2011167903A (en) * 2010-02-18 2011-09-01 Du Pont-Toray Co Ltd Polyimide sheet
JP2011167905A (en) * 2010-02-18 2011-09-01 Du Pont-Toray Co Ltd Polyimide sheet
KR101240955B1 (en) 2010-12-27 2013-03-11 웅진케미칼 주식회사 Polyimide film having excellent high temperature stability and substrate for display device using the same
KR20150001662A (en) * 2013-06-26 2015-01-06 듀폰 도레이 컴파니, 리미티드 Polyimide film
JP2015010107A (en) * 2013-06-26 2015-01-19 東レ・デュポン株式会社 Polyimide film
KR102272950B1 (en) 2013-06-26 2021-07-05 듀폰 도레이 컴파니, 리미티드 Polyimide film

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