JP2003109989A - Polyimide film for flexible printed board - Google Patents
Polyimide film for flexible printed boardInfo
- Publication number
- JP2003109989A JP2003109989A JP2001299920A JP2001299920A JP2003109989A JP 2003109989 A JP2003109989 A JP 2003109989A JP 2001299920 A JP2001299920 A JP 2001299920A JP 2001299920 A JP2001299920 A JP 2001299920A JP 2003109989 A JP2003109989 A JP 2003109989A
- Authority
- JP
- Japan
- Prior art keywords
- polyimide film
- flexible printed
- film
- polyimide
- polyamic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、熱膨張係数、湿度
膨張係数が小さく寸法安定性に優れ、さらにフレキシブ
ルでハンドリング性に優れたフレキシブルプリント基板
用ポリイミドフィルムに関する。TECHNICAL FIELD The present invention relates to a polyimide film for a flexible printed circuit board, which has a small coefficient of thermal expansion and a coefficient of humidity expansion, is excellent in dimensional stability, and is flexible and easy to handle.
【0002】[0002]
【従来の技術】従来よりフレキシブルプリント基板用ポ
リイミドフィルムには屈曲性、耐折り曲げ性などのフレ
キシビリティが要求され、4,4’−ジアミノジフェニ
ルエーテルと無水ピロメリット酸二無水物から成るポリ
アミック酸をイミド化して得られるフィルム厚み25μ
mのポリイミドフィルムが主に使用されてきた。このポ
リイミドフィルムはフレキシビリティには富むものの熱
膨張係数、湿度膨張係数が高いため、フレキシブルプリ
ント基板を作成するに至るまでの工程での寸法変化が大
きく、近年の電子機器の高機能化に伴う高寸法安定性を
要求されるフレキシブルプリント基板用には適さなくな
ってきた。2. Description of the Related Art Conventionally, polyimide films for flexible printed circuit boards have been required to have flexibility such as flexibility and bending resistance, and polyamic acid composed of 4,4'-diaminodiphenyl ether and pyromellitic dianhydride is imidized. Film thickness obtained by liquefying
m polyimide film has been mainly used. Although this polyimide film is highly flexible, it has a high coefficient of thermal expansion and high coefficient of humidity expansion, so there is a large dimensional change in the process until the flexible printed circuit board is made. It has become unsuitable for flexible printed circuit boards that require dimensional stability.
【0003】また寸法安定性を高くするため、前述の2
つの成分にパラフェニレンジアミンを加えたポリアミッ
ク酸をイミド化して得られるポリイミドフィルムが作成
されている。しかしこのポリイミドフィルムは加熱時の
寸法安定性には優れるものの、吸水率、湿度膨張係数が
高く薬液洗浄などのウェット工程通過時の寸法変化が大
きくなるという欠点を持つ。さらに4,4’−ジアミノ
ジフェニルエーテルと無水ピロメリット酸二無水物のみ
から成るポリイミドフィルムに比べるとフレキシビリテ
ィが損なわれている。In order to improve the dimensional stability, the above-mentioned 2
A polyimide film obtained by imidizing a polyamic acid obtained by adding para-phenylenediamine to two components has been prepared. However, although this polyimide film is excellent in dimensional stability during heating, it has a drawback that it has a high water absorption coefficient and a high coefficient of humidity expansion, resulting in a large dimensional change during a wet process such as chemical cleaning. Further, the flexibility is impaired as compared with a polyimide film composed of 4,4′-diaminodiphenyl ether and pyromellitic dianhydride alone.
【0004】[0004]
【発明が解決しようとする課題】本発明は、上述した従
来技術における問題点の解決を課題として検討した結果
なされたものであり、加熱工程及びウェット工程通過時
の寸法安定性に優れ、かつフレキシビリティに富みハン
ドリング性の良好なフレキシブルプリント基板用ポリイ
ミドフィルムの提供を目的とするものである。DISCLOSURE OF THE INVENTION The present invention has been made as a result of studying the solution of the above-mentioned problems in the prior art, and is excellent in dimensional stability during the heating step and the wet step, and is flexible. The purpose of the present invention is to provide a polyimide film for a flexible printed circuit board, which is excellent in handleability and has good handleability.
【0005】[0005]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明のフレキシブルプリント基板用ポリイミド
フィルムは、フィルム厚みが5〜20μm、ヤング率が
4〜7GPa、熱膨張係数が14〜22ppm/℃であ
ることを特徴とする。さらに、本発明のフレキシブルプ
リント基板用ポリイミドフィルムは、下記(1)〜
(3)の条件を併せ持つことが好ましい。
(1)吸水率が2.2%以下、湿度膨張係数が20pp
m/%RH以下であること。
(2)ポリイミドフィルムが芳香族ジアミン成分として
パラフェニレンジアミン、4,4’−ジアミノジフェニ
ルエーテル、3,4’−ジアミノジフェニルエーテル、
4,4’−ジアミノジフェニルメタンのうち少なくとも
2種以上含むポリイミドから成ること。
(3)ポリイミドフィルムが芳香族テトラカルボン酸類
化合物成分としてピロメリット酸類、ビフェニルテトラ
カルボン酸類、ベンゾフェノンテトラカルボン酸類のう
ち1種以上含むポリイミドから成ること。In order to achieve the above object, the polyimide film for a flexible printed board of the present invention has a film thickness of 5 to 20 μm, a Young's modulus of 4 to 7 GPa and a thermal expansion coefficient of 14 to 22 ppm. / ° C. Furthermore, the polyimide film for flexible printed circuit boards of the present invention has the following (1) to
It is preferable to have the condition (3) together. (1) Water absorption rate is 2.2% or less, humidity expansion coefficient is 20 pp
m /% RH or less. (2) The polyimide film has para-phenylenediamine as an aromatic diamine component, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether,
Consists of a polyimide containing at least two of 4,4'-diaminodiphenylmethane. (3) The polyimide film is composed of a polyimide containing at least one of pyromellitic acids, biphenyltetracarboxylic acids, and benzophenonetetracarboxylic acids as an aromatic tetracarboxylic acid compound component.
【0006】[0006]
【発明の実施の形態】本発明ポリイミドフィルムについ
て以下詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION The polyimide film of the present invention will be described in detail below.
【0007】フレキシブルプリント基板を製造する上
で、工程でのハンドリング性を保持し、かつ製造された
フレキシブルプリント基板のフレキシビリティを持たせ
るには、フィルム厚みを5〜20μm、ヤング率を4〜
7GPaの範囲内にすることが好ましい。フィルム厚み
がこの範囲より薄くすると工程でのハンドリング性を、
また厚くすると基板のフレキシビリティを損なうので好
ましくない。またヤング率も4GPa以下にするとハン
ドリング性、7GPa以上にするとフレキシビリティを
損なうので好ましくない。In manufacturing the flexible printed circuit board, the film thickness is 5 to 20 μm and the Young's modulus is 4 to 4 in order to maintain the handling property in the process and to give the flexibility of the manufactured flexible printed circuit board.
It is preferably within the range of 7 GPa. If the film thickness is thinner than this range, handling in the process
If the thickness is increased, the flexibility of the substrate is impaired, which is not preferable. Also, Young's modulus of 4 GPa or less impairs handleability and 7 GPa or more deteriorates flexibility, which is not preferable.
【0008】また銅との張り合わせによる寸法変化率お
よびカールを小さくするには、熱膨張係数が14〜22
ppm/℃であることが好ましい。この範囲から外れる
と銅の熱膨張係数との差異が大きくなり銅との張り合わ
せ時にヒズミが生じ寸法変化を大きくしてしまうので好
ましくない。In order to reduce the dimensional change rate and the curl due to the bonding with copper, the coefficient of thermal expansion is 14 to 22.
It is preferably ppm / ° C. If it deviates from this range, the difference from the coefficient of thermal expansion of copper becomes large, and when it is bonded to copper, a strain occurs and a dimensional change becomes large, which is not preferable.
【0009】さらにウェット工程でのヒズミを抑えるに
は吸水率を2.2%以下に抑えるのが好ましく、また同
ウェット工程での寸法変化を低減させるには湿度膨張係
数を20ppm/%RH以下に抑えるのが好ましい。Further, in order to suppress the strain in the wet process, it is preferable to suppress the water absorption rate to 2.2% or less, and to reduce the dimensional change in the wet process, the humidity expansion coefficient is set to 20 ppm /% RH or less. It is preferable to suppress it.
【0010】次に本発明ポリイミドフィルムを得るに際
しての前駆体であるポリアミド酸溶液について説明す
る。Next, a polyamic acid solution which is a precursor for obtaining the polyimide film of the present invention will be described.
【0011】本発明に用いられるポリアミド酸溶液は、
パラフェニレンジアミン、4,4’−ジアミノジフェニ
ルエーテル、3,4’−ジアミノジフェニルエーテル、
4,4’−ジアミノジフェニルメタンのうち少なくとも
2種以上含む芳香族ジアミン成分とピロメリット酸類、
ビフェニルテトラカルボン酸類、ベンゾフェノンテトラ
カルボン酸類のうち1種以上含む芳香族テトラカルボン
酸類化合物成分とを、溶媒中で重合させることによって
得られることが好ましい。The polyamic acid solution used in the present invention is
Paraphenylenediamine, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether,
An aromatic diamine component containing at least two kinds of 4,4′-diaminodiphenylmethane and pyromellitic acid,
It is preferably obtained by polymerizing, in a solvent, an aromatic tetracarboxylic acid compound component containing at least one of biphenyltetracarboxylic acids and benzophenonetetracarboxylic acids.
【0012】重合方法は公知のいずれの方法で行っても
よく、例えば
(1)先に芳香族ジアミン成分全量を溶媒中に入れ、その
後芳香族テトラカルボン酸類成分を芳香族ジアミン成分
全量と当量になるよう加えて重合する方法。The polymerization method may be carried out by any known method, for example, (1) first, the total amount of the aromatic diamine component is placed in a solvent, and then the aromatic tetracarboxylic acid component is added in an amount equivalent to the total amount of the aromatic diamine component. To add and polymerize.
【0013】(2)先に芳香族テトラカルボン酸類成分全
量を溶媒中に入れ、その後芳香族ジアミン成分を芳香族
テトラカルボン酸類成分と等量になるよう加えて重合す
る方法。(2) A method in which the entire amount of the aromatic tetracarboxylic acid component is first placed in a solvent, and then the aromatic diamine component is added in an amount equal to that of the aromatic tetracarboxylic acid component to carry out polymerization.
【0014】(3)芳香族ジアミン化合物のうち1種を溶
媒中に入れた後、反応成分に対して芳香族テトラカルボ
ン酸類化合物が95〜105モル%となる比率で反応に
必要な時間混合した後、先に入れたとは別の芳香族ジア
ミン化合物を添加し、続いて芳香族テトラカルボン酸類
化合物を全芳香族ジアミン成分と全芳香族テトラカルボ
ン酸類成分とがほぼ等量になるよう添加して重合する方
法。(3) One of the aromatic diamine compounds was placed in a solvent and then mixed at a ratio of 95 to 105 mol% of an aromatic tetracarboxylic acid compound to the reaction components for a time required for the reaction. After that, an aromatic diamine compound different from the one previously added is added, and then an aromatic tetracarboxylic acid compound is added so that the wholly aromatic diamine component and the wholly aromatic tetracarboxylic acid component are approximately equal in amount. How to polymerize.
【0015】(4)芳香族テトラカルボン酸類化合物を溶
媒中に入れた後、反応成分に対して1種の芳香族ジアミ
ン化合物が95〜105モル%となる比率で反応に必要
な時間混合した後、芳香族テトラカルボン酸類化合物を
添加し、続いて先に入れたとは別の芳香族ジアミン化合
物を全芳香族ジアミン成分と全芳香族テトラカルボン酸
類成分とがほぼ等量になるよう添加して重合する方法。(4) After the aromatic tetracarboxylic acid compound is put in a solvent, and then mixed at a ratio of 95 to 105 mol% of one aromatic diamine compound to the reaction components for a time necessary for the reaction. , An aromatic tetracarboxylic acid compound is added, and then an aromatic diamine compound different from the one previously added is added so that the wholly aromatic diamine component and the wholly aromatic tetracarboxylic acid component are approximately equal in amount and polymerized. how to.
【0016】(5)溶媒中で1種の芳香族ジアミン成分と
芳香族テトラカルボン酸類をどちらかが過剰になるよう
反応させてポリアミド酸溶液(A)を調整し、別の溶媒
中で先とは別の芳香族ジアミン成分と芳香族テトラカル
ボン酸類をどちらかが過剰になるよう反応させポリアミ
ド酸溶液(B)を調整する。こうして得られた各ポリア
ミド酸溶液(A)と(B)を混合し、重合を完結する方
法。この時ポリアミド酸溶液(A)を調整するに際し芳
香族ジアミン成分が過剰の場合、ポリアミド酸溶液
(B)では芳香族テトラカルボン酸成分を過剰に、また
ポリアミド酸溶液(A)で芳香族テトラカルボン酸成分
が過剰の場合、ポリアミド酸溶液(B)では芳香族ジア
ミン成分を過剰にし、ポリアミド酸溶液(A)と(B)
を混ぜ合わせこれら反応に使用される全芳香族ジアミン
成分と全芳香族テトラカルボン酸類成分とがほぼ等量に
なるよう調整する。(5) A polyamic acid solution (A) is prepared by reacting one aromatic diamine component and an aromatic tetracarboxylic acid in a solvent so that one of them is in excess, and the polyamic acid solution (A) is prepared in another solvent. Prepares a polyamic acid solution (B) by reacting another aromatic diamine component and an aromatic tetracarboxylic acid so that either one becomes excessive. A method of mixing the thus obtained polyamic acid solutions (A) and (B) to complete the polymerization. At this time, when the aromatic diamine component is excessive when adjusting the polyamic acid solution (A), the aromatic tetracarboxylic acid component is excessive in the polyamic acid solution (B), and the aromatic tetracarboxylic acid component is excessive in the polyamic acid solution (A). When the acid component is excessive, the polyamic acid solution (B) contains excess aromatic diamine component, and the polyamic acid solutions (A) and (B) are added.
Are mixed so that the wholly aromatic diamine component and the wholly aromatic tetracarboxylic acid component used in these reactions are adjusted to be approximately equal in amount.
【0017】なお、重合方法はこれらに限定されること
はなく、その他公知の方法を用いてもよい。The polymerization method is not limited to these, and other known methods may be used.
【0018】次に、得られたポリアミド酸溶液からポリ
イミドフィルムを得る方法を説明する。Next, a method for obtaining a polyimide film from the obtained polyamic acid solution will be described.
【0019】まず、ポリアミド酸溶液を環化触媒および
脱水剤を用いて化学環化するか加熱処理による熱的環化
によりポリイミドのゲルフィルムを得る。First, a polyamic acid solution is chemically cyclized by using a cyclization catalyst and a dehydrating agent or thermally cyclized by heat treatment to obtain a polyimide gel film.
【0020】次に、このゲルフィルムの端部を固定し、
縦方向に1.05〜1.5、横方向に1.05〜2.0
の倍率で延伸するのが好ましい。このような2軸延伸を
行うと、得られるポリイミドフィルムの機械特性向上、
さらには等方性が改良されるので好ましい。Next, fix the end of this gel film,
1.05-1.5 in the vertical direction, 1.05-2.0 in the horizontal direction
It is preferable to stretch at a magnification of. When such biaxial stretching is performed, the mechanical properties of the obtained polyimide film are improved,
Furthermore, the isotropic property is improved, which is preferable.
【0021】本発明で使用する芳香族テトラカルボン酸
類化合物の内で、ピロメリット酸類の例としては、ピロ
メリット酸またはその二無水物を、また、ビフェニルテ
トラカルボン酸類の例としては3,3’,4,4’−ビ
フェニルテトラカルボン酸またはその二無水物を、ベン
ゾフェノンテトラカルボン酸類の例としては3,3’,
4,4’−ベンゾフェノンテトラカルボン酸またはその
二無水物を挙げることができる。Among the aromatic tetracarboxylic acid compounds used in the present invention, examples of pyromellitic acid are pyromellitic acid or its dianhydride, and examples of biphenyltetracarboxylic acid are 3,3 '. , 4,4′-biphenyltetracarboxylic acid or a dianhydride thereof is used as an example of benzophenonetetracarboxylic acid, 3,3 ′,
4,4'-benzophenone tetracarboxylic acid or its dianhydride can be mentioned.
【0022】上記の重合で使用する溶媒としては、ジメ
チルスルホキシド、N,N−ジメチルアセトアミド、
N,N−ジエチルアセトアミド、N,N−ジメチルホル
ムアミド、N,N−ジエチルホルムアミド、N−メチル
−2−ピロリドンおよびジメチルスルホンなどが挙げら
れ、これらを単独あるいは混合して使用するのが好まし
い。As the solvent used in the above polymerization, dimethyl sulfoxide, N, N-dimethylacetamide,
Examples thereof include N, N-diethylacetamide, N, N-dimethylformamide, N, N-diethylformamide, N-methyl-2-pyrrolidone and dimethyl sulfone, and these are preferably used alone or in combination.
【0023】上記の重合で得られるポリアミド酸は、前
記溶媒中に10〜30重量%の割合となるように調整す
る。The polyamic acid obtained by the above polymerization is adjusted so as to be 10 to 30% by weight in the solvent.
【0024】得られたポリアミド酸を環化させてポリイ
ミドフィルムにする際には、脱水剤と触媒を用いて脱水
する化学閉環法、熱的に脱水する熱閉環法のいずれで行
ってもよいが、化学閉環法で行った方が、得られるフィ
ルムにケミカルエッチング性が付与できるため好まし
い。When the obtained polyamic acid is cyclized into a polyimide film, it may be carried out by either a chemical ring-closing method of dehydrating using a dehydrating agent and a catalyst or a thermal ring-closing method of thermally dehydrating. The chemical ring closure method is preferable because the film obtained can have chemical etching properties.
【0025】化学閉環法で使用する脱水剤としては、無
水酢酸などの脂肪族酸無水物、フタル酸無水物などの芳
香族酸無水物などが挙げられ、これらを単独あるいは混
合して使用するのが好ましい。また触媒としては、ピリ
ジン、ピコリン、キノリンなどの複素環式第3級アミン
類、トリエチルアミンなどの脂肪族第3級アミン類、
N,N−ジメチルアニリンなどの芳香族第3級アミン類
などが挙げられ、これらを単独あるいは混合して使用す
るのが好ましい。Examples of the dehydrating agent used in the chemical ring closure method include aliphatic acid anhydrides such as acetic anhydride and aromatic acid anhydrides such as phthalic anhydride. These may be used alone or in combination. Is preferred. Further, as the catalyst, heterocyclic tertiary amines such as pyridine, picoline and quinoline, aliphatic tertiary amines such as triethylamine,
Examples thereof include aromatic tertiary amines such as N, N-dimethylaniline, and these are preferably used alone or in combination.
【0026】また、化学閉環法を行う場合は、ポリアミ
ド酸溶液中に触媒・脱水剤を混合させイミド化した後に
この溶液をコーティングしてポリイミドフィルムを得る
方法と、ポリアミド酸溶液をコーティングして薄膜化さ
せた後に触媒・脱水剤の混合中に浸漬してイミド化させ
ることによってポリイミドフィルムを得る方法がある。When the chemical ring-closing method is carried out, a catalyst and a dehydrating agent are mixed in a polyamic acid solution to imidize it and then the solution is coated to obtain a polyimide film, and a polyamic acid solution is coated to form a thin film. There is a method of obtaining a polyimide film by immersing it in a mixture of a catalyst and a dehydrating agent and then imidizing it.
【0027】なお、得られるポリイミドフィルムの表面
を粗化させてフィルムに滑り性を与え工程安定性を良く
するために、有機フィラーまたは無機フィラーをポリア
ミド酸溶液に混合してもよい。An organic filler or an inorganic filler may be mixed with the polyamic acid solution in order to roughen the surface of the obtained polyimide film to give the film slipperiness and improve the process stability.
【0028】また、得られたポリイミドフィルムに接着
性を持たせるため、フィルム表面にコロナ処理やプラズ
マ処理のような電気処理あるいはブラスト処理のような
物理的処理を行ってもよく、さらには熱的安定化させる
ために、フィルムをアニール処理により熱リラックスさ
せてもよい。In order to impart adhesiveness to the obtained polyimide film, the film surface may be subjected to physical treatment such as electrical treatment such as corona treatment or plasma treatment or blast treatment, and further, thermal treatment. The film may be heat relaxed by an annealing treatment to stabilize it.
【0029】このようにして得られるポリイミドフィル
ムは、フレキシブルプリント基板用として好適な特性を
有する。すなわち、熱膨張係数、湿度膨張係数が小さく
寸法安定性に優れ、さらにフレキシビリティに富み、か
つハンドリング性に優れたポリイミドフィルムが得られ
る。The polyimide film thus obtained has suitable properties for a flexible printed board. That is, a polyimide film having a small coefficient of thermal expansion and a coefficient of humidity expansion, excellent dimensional stability, rich flexibility, and excellent handling property can be obtained.
【0030】[0030]
【実施例】以下、実施例により本発明を具体的に説明す
る。EXAMPLES The present invention will be specifically described below with reference to examples.
【0031】なお、実施例中PPDはパラフェニレンジ
アミン、4,4’−ODAは4,4’−ジアミノジフェ
ニルエーテル、3,4’−ODAは3,4’−ジアミノ
ジフェニルエーテル、PMDAはピロメリット酸二無水
物、BPDAは3,3’−4,4’−ジフェニルテトラ
カルボン酸二無水物、DMAcはN,N−ジメチルアセ
トアミドをそれぞれ表す。In the examples, PPD is paraphenylenediamine, 4,4'-ODA is 4,4'-diaminodiphenyl ether, 3,4'-ODA is 3,4'-diaminodiphenyl ether, and PMDA is pyromellitic acid diester. Anhydride, BPDA represents 3,3′-4,4′-diphenyltetracarboxylic dianhydride, and DMAc represents N, N-dimethylacetamide, respectively.
【0032】[実施例1]500mlのセパルブルフラ
スコにDMAc239.1gを入れ、ここにPPD2.
311g(21.4mmol)、4,4’−ODA2
4.254g(121.1mmol)、PMDA21.
757g(99.7mmol)、BPDA12.578
g(42.7mmol)を投入し、常温常圧中で1時間
反応させポリアミド酸溶液を得た。Example 1 DMAc 239.1 g was put in a 500 ml separable flask, and PPD2.
311 g (21.4 mmol), 4,4'-ODA2
4.254 g (121.1 mmol), PMDA21.
757 g (99.7 mmol), BPDA12.578
g (42.7 mmol) was added, and the mixture was reacted at room temperature and atmospheric pressure for 1 hour to obtain a polyamic acid solution.
【0033】このポリアミド酸溶液から7.5gを採っ
てマイナス5℃で冷却後、無水酢酸0.8gとβ−ピコ
リン0.8gを混合することにより、ポリアミド酸のイ
ミド化を行った。After taking 7.5 g of this polyamic acid solution and cooling it at -5 ° C, the polyamic acid was imidized by mixing 0.8 g of acetic anhydride and 0.8 g of β-picoline.
【0034】こうして得られたポリイミドポリマーをガ
ラス板にコーティングして100℃で5分間加熱してゲ
ルフィルムを得た後、このゲルフィルムをガラス板から
剥がして、そのゲルフィルムの端部をピン止めし、縦方
向1.1倍、横方向1.3倍に延伸した。その後300
℃で20分間、続いて400℃で5分間加熱乾燥し、厚
さ12.5μmのポリイミドフィルムを得た。The polyimide polymer thus obtained was coated on a glass plate and heated at 100 ° C. for 5 minutes to obtain a gel film. The gel film was peeled off from the glass plate and the ends of the gel film were pinned. Then, it was stretched 1.1 times in the longitudinal direction and 1.3 times in the lateral direction. Then 300
The film was heated and dried at 20 ° C. for 20 minutes and then at 400 ° C. for 5 minutes to obtain a polyimide film having a thickness of 12.5 μm.
【0035】[実施例2]500mlのセパラブルフラ
スコにDMAc239.1gを入れ、ここにPPD3.
116g(28.8mmol)、4,4’−ODA2
3.076g(115.2mmol)、PMDA21.
994g(100.8mmol)、BPDA12.71
5g(43.2mmol)を投入し、常温常圧中で1時
間反応させポリアミド酸溶液を得た。[Example 2] DMAc 239.1 g was put in a 500 ml separable flask, and PPD3.
116 g (28.8 mmol), 4,4'-ODA2
3.076 g (115.2 mmol), PMDA21.
994 g (100.8 mmol), BPDA 12.71
5 g (43.2 mmol) was added and the reaction was carried out at room temperature and normal pressure for 1 hour to obtain a polyamic acid solution.
【0036】この後、実施例1と同様の手順にて厚さ1
2.5μmのポリイミドフィルムを得た。After that, the thickness 1 is obtained by the same procedure as in the first embodiment.
A 2.5 μm polyimide film was obtained.
【0037】[実施例3]500mlのセパラブルフラ
スコにDMAc239.1gを入れ、ここにPPD3.
937g(36.4mmol)、4,4’−ODA2
1.872g(109.2mmol)、PMDA22.
236g(101.9mmol)、BPDA12.85
5g(43.7mmol)を投入し、常温常圧中で1時
間反応させポリアミド酸溶液を得た。[Example 3] DMAc 239.1 g was put in a 500 ml separable flask, and PPD3.
937 g (36.4 mmol), 4,4'-ODA2
1.872 g (109.2 mmol), PMDA22.
236 g (101.9 mmol), BPDA 12.85
5 g (43.7 mmol) was added and the reaction was carried out at room temperature and atmospheric pressure for 1 hour to obtain a polyamic acid solution.
【0038】この後、実施例1と同様の手順にて厚さ1
2.5μmのポリイミドフィルムを得た。Thereafter, the thickness of 1 is obtained by the same procedure as in the first embodiment.
A 2.5 μm polyimide film was obtained.
【0039】[実施例4]500mlのセパラブルフラ
スコにDMAc239.1gを入れ、ここに3,4’−
ODA14.574g(72.8mmol)、4,4’
−ODA14.574g(72.8mmol)、PMD
A31.751g(145.6mmol)を投入し、常
温常圧中で1時間反応させポリアミド酸溶液を得た。[Example 4] DMAc 239.1 g was put in a 500 ml separable flask, and 3,4'-
ODA 14.574 g (72.8 mmol), 4,4 '
-ODA 14.574 g (72.8 mmol), PMD
A31.751 g (145.6 mmol) was added, and the mixture was reacted at room temperature and normal pressure for 1 hour to obtain a polyamic acid solution.
【0040】この後、実施例1と同様の手順にて厚さ1
2.5μmのポリイミドフィルムを得た。After that, the thickness 1 is obtained by the same procedure as in the first embodiment.
A 2.5 μm polyimide film was obtained.
【0041】[比較例1]500mlのセパラブルフラ
スコにDMAc239.1gを入れ、ここに4,4’−
ODA29.149g(145.6mmol)、PMD
A31.751g(145.6mmol)を投入し、常
温常圧中で1時間反応させポリアミド酸溶液を得た。[Comparative Example 1] DMAc (239.1 g) was put in a 500 ml separable flask, and 4,4'- was added thereto.
ODA 29.149 g (145.6 mmol), PMD
A31.751 g (145.6 mmol) was added, and the mixture was reacted at room temperature and normal pressure for 1 hour to obtain a polyamic acid solution.
【0042】このポリアミド酸溶液から15gを採って
マイナス5℃で冷却後、無水酢酸1.5gとβ−ピコリ
ン1.6gを混合することにより、ポリアミド酸のイミ
ド化を行った。After taking 15 g of this polyamic acid solution and cooling it at -5 ° C, the polyamic acid was imidized by mixing 1.5 g of acetic anhydride and 1.6 g of β-picoline.
【0043】こうして得られたポリイミドポリマーをガ
ラス板にコーティングして100℃で5分間加熱してゲ
ルフィルムを得た後、このゲルフィルムをガラス板から
剥がして、そのゲルフィルムの端部をピン止めし、縦方
向1.1倍、横方向1.3倍に延伸した。その後300
℃で20分間、続いて400℃で5分間加熱乾燥し、厚
さ25μmのポリイミドフィルムを得た。The polyimide polymer thus obtained was coated on a glass plate and heated at 100 ° C. for 5 minutes to obtain a gel film. The gel film was peeled off from the glass plate, and the ends of the gel film were pinned. Then, it was stretched 1.1 times in the longitudinal direction and 1.3 times in the lateral direction. Then 300
The film was heated and dried at 20 ° C. for 20 minutes and then at 400 ° C. for 5 minutes to obtain a polyimide film having a thickness of 25 μm.
【0044】[比較例2]500mlのセパラブルフラ
スコにDMAc239.1gを入れ、ここにパラフェニ
レンジアミン5.056g(46.8mmol)、4,
4’−ODA21.847g(109.1mmol)、
PMDA33.997g(155.9mmol)を投入
し、常温常圧中で1時間反応させポリアミド酸溶液を得
た。[Comparative Example 2] DMAc (239.1 g) was placed in a 500 ml separable flask, and 5.056 g (46.8 mmol) of paraphenylenediamine was added thereto.
4'-ODA 21.847 g (109.1 mmol),
33.997 g (155.9 mmol) of PMDA was added and the reaction was carried out at room temperature and normal pressure for 1 hour to obtain a polyamic acid solution.
【0045】この後、比較例1と同様の手順にて厚さ2
5μmのポリイミドフィルムを得た。
<ポリイミドフィルムの各特性の評価法>
(1)フィルム厚
Mitutoyo製ライトマチック(Series318 )を使
用して測定した。
(2)ヤング率
機器:RTM−250を使用し、引張速度:100mm
/minの条件で測定した。
(3)熱膨張係数
機器:TMA−50を使用し、測定温度範囲:50〜2
00℃、昇温速度:10℃/minの条件で測定した。
(4)吸水率
98%RH雰囲気下のデシケーター内に2日間静置し、
乾燥時重量に対しての増加重量%で評価した。
(5)湿度膨張係数
25℃にてTM7000炉内にフィルムを取り付け、炉
内にドライガスを送り込んで乾燥させた後、HC−1型
水蒸気発生装置からの給気によりTM7000炉内を9
0%RHに加湿させ、その間の寸法変化から湿度膨張係
数を求めた。
(6)耐屈曲回数
JIS P 8115に準じた方法にて測定した。
<フレキシブルプリント基板の作成>得られた各種ポリ
イミドフィルムにエポキシ系接着剤を介し銅箔と130
℃にて貼り合わせ(ロール式)、120℃1時間、14
0℃1時間、160℃1時間加熱処理し銅張り積層板
(CCL)を得た。その後、表1の条件にて焼き付け〜
現像〜エッチング〜酸洗浄〜リフロー工程を経てフレキ
シブルプリント基板を得た。Thereafter, the thickness of 2 is obtained by the same procedure as in Comparative Example 1.
A 5 μm polyimide film was obtained. <Evaluation Method of Each Property of Polyimide Film> (1) Film Thickness It was measured using a Lightmatic (Series 318) manufactured by Mitutoyo. (2) Young's modulus device: RTM-250 is used, tensile speed: 100 mm
It was measured under the condition of / min. (3) Thermal expansion coefficient device: TMA-50 is used, measurement temperature range: 50 to 2
The measurement was carried out under the conditions of 00 ° C. and temperature rising rate: 10 ° C./min. (4) Water absorption rate: 98%, allowed to stand in a desiccator under RH atmosphere for 2 days,
The evaluation was made by the weight% increase with respect to the dry weight. (5) A film was attached to the inside of the TM7000 furnace at a humidity expansion coefficient of 25 ° C., a dry gas was fed into the furnace to dry the film, and then the inside of the TM7000 furnace was changed to 9 by supplying air from the HC-1 type steam generator.
The humidity expansion coefficient was calculated from the dimensional change during humidification to 0% RH. (6) Number of times of bending resistance It was measured by a method according to JIS P8115. <Preparation of Flexible Printed Circuit Board> Copper foil and 130
Bonding at ℃ (roll type), 120 ℃ for 1 hour, 14
Heat treatment was performed at 0 ° C. for 1 hour and 160 ° C. for 1 hour to obtain a copper-clad laminate (CCL). After that, baking under the conditions shown in Table 1
A flexible printed board was obtained through the steps of development, etching, acid cleaning, and reflow.
【0046】[0046]
【表1】
<各種フレキシブルプリント基板の評価>CCL時の寸
法(L0)、フレキシブルプリント基板作成後の寸法
(L1)を測定し以下式により寸法変化率を求めた。[Table 1] <Evaluation of Various Flexible Printed Circuit Boards> The dimension (L0) at the time of CCL and the dimension (L1) after making the flexible printed circuit board were measured, and the dimensional change rate was obtained by the following formula.
【0047】寸法変化率(%) = (L1−L0)/
L0 ×100
以上により得られた各種結果のうち実施例結果を表2、
比較例結果を表3に纏めた。Dimensional change rate (%) = (L1-L0) /
L0 × 100 Table 2 shows the results of Examples among various results obtained by the above.
The results of comparative examples are summarized in Table 3.
【0048】[0048]
【表2】 [Table 2]
【0049】[0049]
【表3】 [Table 3]
【0050】[0050]
【発明の効果】本発明のポリイミドフィルムは、熱膨張
係数、湿度膨張係数が小さく寸法安定性に優れ、さらに
フレキシブルでかつハンドリング性に優れているのでフ
レキシブルプリント基板用として好適に用いることがで
きる。INDUSTRIAL APPLICABILITY The polyimide film of the present invention has a small coefficient of thermal expansion and a coefficient of humidity expansion, is excellent in dimensional stability, is flexible, and is excellent in handleability, and therefore can be suitably used for a flexible printed circuit board.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 犬飼 孝二 愛知県東海市新宝町31番地6 東レ・デュ ポン株式会社東海事業場内 Fターム(参考) 4F071 AA60 AF43 AF53 AH13 BA02 BB02 BC02 5F044 KK03 MM06 MM48 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Koji Inukai 31 Tora-cho, Tokai-shi, Aichi 6 Toray Du Pon Co., Ltd. Tokai Plant F-term (reference) 4F071 AA60 AF43 AF53 AH13 BA02 BB02 BC02 5F044 KK03 MM06 MM48
Claims (4)
が4〜7GPa、熱膨張係数が14〜22ppm/℃で
あることを特徴とするフレキシブルプリント基板用ポリ
イミドフィルム。1. A polyimide film for a flexible printed circuit board, which has a film thickness of 5 to 20 μm, a Young's modulus of 4 to 7 GPa, and a thermal expansion coefficient of 14 to 22 ppm / ° C.
20ppm/%RH以下であることを特徴とする請求項
1記載のフレキシブルプリント基板用ポリイミドフィル
ム。2. The polyimide film for a flexible printed circuit board according to claim 1, which has a water absorption of 2.2% or less and a humidity expansion coefficient of 20 ppm /% RH or less.
分としてパラフェニレンジアミン、4,4’−ジアミノ
ジフェニルエーテル、3,4’−ジアミノジフェニルエ
ーテル、4,4’−ジアミノジフェニルメタンのうち少
なくとも2種以上含むポリイミドから成ることを特徴と
する請求項1または2に記載のフレキシブルプリント基
板用ポリイミドフィルム。3. A polyimide film comprising a polyimide containing at least two or more of paraphenylenediamine, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether and 4,4′-diaminodiphenylmethane as an aromatic diamine component. The polyimide film for a flexible printed board according to claim 1 or 2, characterized in that.
ボン酸類化合物成分としてピロメリット酸類、ビフェニ
ルテトラカルボン酸類、ベンゾフェノンテトラカルボン
酸類のうち1種以上含むポリイミドから成ることを特徴
とする請求項1〜3のいずれか1項に記載のフレキシブ
ルプリント基板用ポリイミドフィルム。4. The polyimide film according to claim 1, wherein the polyimide film comprises a polyimide containing at least one of pyromellitic acid, biphenyltetracarboxylic acid, and benzophenonetetracarboxylic acid as an aromatic tetracarboxylic acid compound component. 2. A polyimide film for flexible printed circuit board according to item 1.
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JP2001299920A JP2003109989A (en) | 2001-09-28 | 2001-09-28 | Polyimide film for flexible printed board |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004031270A1 (en) * | 2002-10-07 | 2004-04-15 | Teijin Limited | Polyimide film and process for producing the same |
JP2006054357A (en) * | 2004-08-13 | 2006-02-23 | Nippon Steel Chem Co Ltd | Laminate for flexible printed-wiring board, and its manufacturing method |
JP2007201441A (en) * | 2005-12-27 | 2007-08-09 | Du Pont Toray Co Ltd | Chip-on film |
JP2008166554A (en) * | 2006-12-28 | 2008-07-17 | Du Pont Toray Co Ltd | Flexible printed wiring board |
JP2008290302A (en) * | 2007-05-23 | 2008-12-04 | Du Pont Toray Co Ltd | Copper-clad plate |
TWI405793B (en) * | 2005-12-27 | 2013-08-21 | Du Pont Toray Co Ltd | Chip-on film |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001072781A (en) * | 1998-11-05 | 2001-03-21 | Kanegafuchi Chem Ind Co Ltd | Polyimide film and substrate for electric and electronic apparatus using same |
-
2001
- 2001-09-28 JP JP2001299920A patent/JP2003109989A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001072781A (en) * | 1998-11-05 | 2001-03-21 | Kanegafuchi Chem Ind Co Ltd | Polyimide film and substrate for electric and electronic apparatus using same |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004031270A1 (en) * | 2002-10-07 | 2004-04-15 | Teijin Limited | Polyimide film and process for producing the same |
JP2006054357A (en) * | 2004-08-13 | 2006-02-23 | Nippon Steel Chem Co Ltd | Laminate for flexible printed-wiring board, and its manufacturing method |
JP4647954B2 (en) * | 2004-08-13 | 2011-03-09 | 新日鐵化学株式会社 | Method for producing laminate for flexible printed wiring board |
JP2007201441A (en) * | 2005-12-27 | 2007-08-09 | Du Pont Toray Co Ltd | Chip-on film |
TWI405793B (en) * | 2005-12-27 | 2013-08-21 | Du Pont Toray Co Ltd | Chip-on film |
JP2008166554A (en) * | 2006-12-28 | 2008-07-17 | Du Pont Toray Co Ltd | Flexible printed wiring board |
JP2008290302A (en) * | 2007-05-23 | 2008-12-04 | Du Pont Toray Co Ltd | Copper-clad plate |
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