JP2000063543A - Polyimide film and its production - Google Patents

Polyimide film and its production

Info

Publication number
JP2000063543A
JP2000063543A JP23804998A JP23804998A JP2000063543A JP 2000063543 A JP2000063543 A JP 2000063543A JP 23804998 A JP23804998 A JP 23804998A JP 23804998 A JP23804998 A JP 23804998A JP 2000063543 A JP2000063543 A JP 2000063543A
Authority
JP
Japan
Prior art keywords
polyimide film
mol
film
acid
coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23804998A
Other languages
Japanese (ja)
Inventor
Hitoshi Nojiri
仁志 野尻
Koichiro Tanaka
康一郎 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP23804998A priority Critical patent/JP2000063543A/en
Priority to TW88114072A priority patent/TW531547B/en
Priority to KR1020007004426A priority patent/KR20010031408A/en
Priority to US09/530,102 priority patent/US6335416B1/en
Priority to PCT/JP1999/004553 priority patent/WO2000011066A1/en
Publication of JP2000063543A publication Critical patent/JP2000063543A/en
Pending legal-status Critical Current

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  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PROBLEM TO BE SOLVED: To produce a polyimide film having a high elasticity, coefficient of linear expansion near to copper, sufficient tenacity, low water absorption coefficient, hygroscopic swelling coefficient, or the like by forming the film of a specific polyamic acid. SOLUTION: This polyimide film (pref. having an average coefficient of linear expansion of 15-30 ppm in the range of 100-200 deg.C, a tensile elasticity of 4.5-8.5 G.Pa, an elongation of >=20% at break, a coefficient of linear expansion of <=10 ppm and a glass transition temperature of >=200 deg.C) is produced by forming the film with a polyamic acid obtained by reacting (A) p- phenylenebis(trimellitic acid monoester anhydride), (B) oxydiphthalic acid dianydride, (C) p-phenylenediamine and (D) 4,4'-diaminodiphenyl ether in (E) an organic solvent. The film is pref. used for products laminated with metal (esp. copper) and is useful, e.g. in flexible printed board having thin wiring lines or the like.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、金属、特に銅との
張り合わせ製品において、低反り、高寸法安定性を与え
得る、物性バランスに優れたポリイミドフィルムに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyimide film having excellent physical property balance, which can provide low warpage and high dimensional stability in a product laminated with metal, especially copper.

【0002】[0002]

【従来の技術】ポリイミドフィルムは、耐熱性、絶縁
性、耐溶剤性、および耐低温性等を備えており、コンピ
ュータ並びにIC制御の電気・電子機器部品材料として
広く用いられている。
2. Description of the Related Art Polyimide films have heat resistance, insulation properties, solvent resistance, low temperature resistance, etc., and are widely used as materials for computer and IC controlled electric / electronic equipment parts.

【0003】近年、コンピュータ並びにIC制御の電気
・電子機器の小型化・薄型化に伴い、配線基盤類やIC
パッケージ材料も小型化・薄型化が求められるようにな
っている。このため、これらに施される配線パターンも
細密になり、フレキシブル配線盤やTAB用キャリアテ
ープ等に用いられるポリイミドフィルムについても加熱
や引張り、さらには吸湿による寸法変化が小さいことが
必要になる。さらに、材料の薄型化に伴い、積層体全体
の「こし」を保ち、加工工程を安定にする必要もある。
In recent years, with the miniaturization and thinning of electric devices and electronic devices for controlling computers and ICs, wiring boards and ICs have been developed.
The packaging materials are also required to be smaller and thinner. For this reason, the wiring pattern applied to them becomes fine, and it is necessary that the polyimide film used for the flexible wiring board, the carrier tape for TAB and the like also has a small dimensional change due to heating and tension and further moisture absorption. Further, as the material is made thinner, it is necessary to maintain the "stiffness" of the entire laminate and stabilize the processing process.

【0004】このような必要性を満たす為、ポリイミド
フィルムは、線膨張係数が小さく、弾性率が高く吸湿膨
張係数の低いことが望まれる。ただし、フレキシブル配
線盤やICパッケージの製造の際、ポリイミドフィルム
と銅箔とを張り合わせて加工するため、フィルム線膨張
係数に関しては、銅の線膨張係数と大きく異なることは
好ましくない。すなわち、ポリイミドフィルムと銅箔の
線膨張係数が大きく異なると、張り合わせ品に反りが生
じ、加工がしにくくなり、その結果、全体的な寸法精度
や歩留まりが低下するからである。
In order to meet such needs, it is desired that the polyimide film has a small linear expansion coefficient, a high elastic modulus and a low hygroscopic expansion coefficient. However, when manufacturing a flexible wiring board or an IC package, a polyimide film and a copper foil are laminated and processed. Therefore, it is not preferable that the coefficient of linear expansion of the film is significantly different from that of copper. That is, if the coefficient of linear expansion of the polyimide film and that of the copper foil are significantly different, the laminated product will be warped, making it difficult to process, and as a result, the overall dimensional accuracy and yield will be reduced.

【0005】まず、ポリイミドフィルムの高弾性率化の
ためには、剛直な構造のモノマー即ち直線性の高いモノ
マーを用いれば良いことは広く知られている。ところ
が、直線性の高いモノマーを多量用いればフィルムの線
膨張係数は低くなりすぎて、銅箔との張り合わせの用途
には適さなくなる。
First, in order to increase the elastic modulus of a polyimide film, it is widely known that a monomer having a rigid structure, that is, a monomer having high linearity may be used. However, if a large amount of a monomer having high linearity is used, the linear expansion coefficient of the film becomes too low, which makes it unsuitable for use in bonding with a copper foil.

【0006】比較的高い弾性率を実現しながらも線膨張
係数を下げ過ぎないために、比較的剛直な構造を有する
モノマーを用いて、化学的イミド化剤を用いず熱キュア
法で製造し、面方向の配向を甘くするという方法を取る
例もあるが、熱キュア法は化学的キュア法に比べ必要な
加熱時間が長く、生産性に劣るという不利がある。さら
に、剛直で直線性の高いモノマーを用いると、一般的に
はフィルムの柔軟性は損なわれ、フレキシブル配線板等
としての利点の一つである折り曲げ可能という点に、難
が生じる可能性がある。
[0006] In order to achieve a relatively high elastic modulus while not lowering the linear expansion coefficient too much, a monomer having a relatively rigid structure is used, and it is produced by a thermal curing method without using a chemical imidizing agent, Although there is an example in which the method of softening the orientation in the plane direction is adopted, the thermal curing method has a disadvantage that the heating time required is longer than that of the chemical curing method and the productivity is poor. Furthermore, when a rigid and highly linear monomer is used, the flexibility of the film is generally impaired, and there is a possibility that it may be difficult to fold, which is one of the advantages as a flexible wiring board. .

【0007】半導体パッケージ用途等では、半導体の信
頼性の観点から、特に吸水率ができるだけ低いことが求
められ、寸法安定性の観点から吸湿膨張係数も低いこと
が求められる。吸水率や吸湿膨張係数を下げるには、分
子構造中のイミド基量を減らすことが有効である。この
為、屈曲基を主鎖中に複数含む長鎖のモノマーが使用さ
れることが多い。しかしこの結果、弾性率の低下や線膨
張係数の過度な増大を招き、寸法安定性が犠牲になる。
極端な場合は、例えば200℃以下の低温にTgを有す
るような熱可塑性を示すようになり、ベースフィルムと
して用いるには適さなくなる。直線性で長いモノマーを
用いると、分子鎖のパッキングが難しくなり、十分な靭
性を発現することができず、場合によってはフィルム化
する事自体が困難になる。
In semiconductor package applications and the like, it is required that the water absorption rate be as low as possible from the viewpoint of semiconductor reliability, and that the hygroscopic expansion coefficient be low from the viewpoint of dimensional stability. In order to reduce the water absorption rate and the coefficient of hygroscopic expansion, it is effective to reduce the amount of imide groups in the molecular structure. Therefore, a long-chain monomer containing a plurality of bending groups in the main chain is often used. However, as a result, the elastic modulus is lowered and the linear expansion coefficient is excessively increased, and the dimensional stability is sacrificed.
In an extreme case, the thermoplastic resin has Tg at a low temperature of, for example, 200 ° C. or lower, and is not suitable for use as a base film. When a linear and long monomer is used, packing of molecular chains becomes difficult, sufficient toughness cannot be expressed, and in some cases, it becomes difficult to form a film.

【0008】このように、ポリイミドフィルムの特性と
しては、高弾性率、低線膨張係数、吸水性を低下させる
こと以外にも考慮すべき点は多い。しかし、いずれかの
特性を満足させようとすると、他の特性が犠牲になるな
ど、複数の良い特性を併せ持つポリイミドフィルムを得
ることは特に困難な状況である。
As described above, as the characteristics of the polyimide film, there are many points to be considered in addition to the reduction of the high elastic modulus, the low linear expansion coefficient and the water absorption. However, it is a particularly difficult situation to obtain a polyimide film having a plurality of good properties, because if one of the properties is to be satisfied, the other properties are sacrificed.

【0009】[0009]

【発明が解決しようとする課題】そこで、本発明者ら
は、上記の問題点を解決し、高弾性率、銅に近い線膨張
係数、十分な靱性、低い吸水率および吸湿膨張係数とい
った特性を併せ持つ、細配線のフレキシブルプリント基
板やTABフィルムに適したポリイミドフィルムを製造
することに関し、鋭意検討を行った結果、本発明に到っ
たのである。
Therefore, the inventors of the present invention have solved the above-mentioned problems, and have the characteristics such as high elastic modulus, linear expansion coefficient close to that of copper, sufficient toughness, low water absorption coefficient and hygroscopic expansion coefficient. The present invention has been achieved as a result of earnestly studying the production of a polyimide film suitable for a flexible printed circuit board having a fine wiring and a TAB film which are also held.

【0010】[0010]

【課題を解決するための手段】本発明者らは前述の要求
に鑑み、特定の組成のポリイミドフィルムにおいて、諸
特性バランスを高度に実現できる特異な場合を見出し
た。
In view of the above requirements, the present inventors have found a unique case in which a polyimide film having a specific composition can achieve a highly balanced property.

【0011】本発明のポリイミドフィルムの要旨とする
ところは、p−フェニレンビス(トリメリット酸モノエ
ステル無水物)、オキシジフタル酸二無水物、p−フェ
ニレンジアミン、および4、4' −ジアミノジフェニル
エーテルとを有機溶剤中で反応させて得られるポリアミ
ド酸から製造されることにある。
The main points of the polyimide film of the present invention are p-phenylene bis (trimellitic acid monoester anhydride), oxydiphthalic acid dianhydride, p-phenylenediamine, and 4,4'-diaminodiphenyl ether. It is to be produced from a polyamic acid obtained by reacting in an organic solvent.

【0012】係るポリイミドフィルムにおいて、上記p
−フェニレンビス(トリメリット酸モノエステル無水
物)が、全酸無水物に対して0より多く90モル%以下
の範囲、好ましくは1〜90モル%であり、オキシジフ
タル酸二無水物が、全酸無水物に対して10以上100
モル%未満、好ましくは、10モル%〜99モル%であ
り、p−フェニレンジアミンが、全ジアミンに対して2
5〜90モル%であり、4、4' −ジアミノジフェニル
エーテルが、全ジアミンに対して10〜75モル%であ
ることにある。
In such a polyimide film, the p
-Phenylene bis (trimellitic acid monoester anhydride) is in the range of more than 0 and 90 mol% or less, preferably 1 to 90 mol%, based on the total acid anhydride, and oxydiphthalic acid dianhydride is the total acid. 10 to 100 for anhydrous
Less than mol%, preferably from 10 mol% to 99 mol%, wherein p-phenylenediamine is 2 relative to all diamines.
5 to 90 mol%, and 4,4′-diaminodiphenyl ether is 10 to 75 mol% based on all diamines.

【0013】係るポリイミドフィルムにおいて、100
℃から200℃の間の平均線膨張係数が15〜30pp
m、引張弾性率が4.5〜8.5GPa、破断時伸び率
が20%以上、吸湿膨張係数が10ppm以下、Tgが
200℃以上であることにある。
In such a polyimide film, 100
The average coefficient of linear expansion between 15 ° C and 200 ° C is 15 to 30 pp
m, the tensile elastic modulus is 4.5 to 8.5 GPa, the elongation at break is 20% or more, the hygroscopic expansion coefficient is 10 ppm or less, and the Tg is 200 ° C. or more.

【0014】本発明のポリイミドフィルムの製造方法の
要旨とするところは、4、4' −ジアミノジフェニルエ
ーテルとパラフェニレンジアミンを有機溶剤中に溶解さ
せ、これにp−フェニレンビス(トリメリット酸モノエ
ステル無水物)を加え、続いてオキシジフタル酸二無水
物を加えて得られたポリアミド酸重合体を、脱水閉環し
て、ポリイミドフィルムを得ることにある。
The gist of the method for producing a polyimide film of the present invention is that 4,4'-diaminodiphenyl ether and paraphenylenediamine are dissolved in an organic solvent, and p-phenylene bis (trimellitic acid monoester anhydride is added thereto. Of the polyamic acid polymer obtained by adding oxydiphthalic acid dianhydride, and dehydrating and ring-closing the polyamic acid polymer.

【0015】好ましくは、本発明のポリイミドフィルム
の製造方法では、上記脱水閉環が、酸無水物と三級アミ
ンとのイミド化剤の存在下で行われ得る。
Preferably, in the method for producing a polyimide film of the present invention, the dehydration ring closure can be carried out in the presence of an imidizing agent of an acid anhydride and a tertiary amine.

【0016】p−フェニレンビス(トリメリット酸モノ
エステル無水物)モノマー(以下TMHQという)は、
パラフェニレンジアミン(PDA)との組み合わせにお
いて、棒状構造をとり、フィルムの高弾性が顕現され、
主鎖構造上にはエステル結合があり、これが熱的にはや
や柔軟であるため、例えばピロメリット酸を用いた場合
等に比べて線膨張係数が極端に下がることがなくなる。
また、エステル結合がイミド環の分極を緩和し、吸水率
を下げ吸水膨張率を下げる効果も有する。ところが、T
MHQは、PDAとの組み合わせでは、構造的に硬す
ぎ、線膨張係数も依然低く、また靭性が不十分である。
ジアミノジフェニルエーテルを共重合することによって
も、依然一定以上の弾性率を得ようとすると線膨張係数
は下がりすぎ、また靭性も不十分である。
The p-phenylene bis (trimellitic acid monoester anhydride) monomer (hereinafter referred to as TMHQ) is
When combined with para-phenylenediamine (PDA), it has a rod-like structure and exhibits high elasticity of the film.
Since there is an ester bond on the main chain structure and it is slightly flexible in terms of heat, the linear expansion coefficient does not drop extremely compared with the case where, for example, pyromellitic acid is used.
Further, the ester bond also has the effect of relaxing the polarization of the imide ring, lowering the water absorption rate and lowering the water absorption expansion rate. However, T
When combined with PDA, MHQ is structurally too hard, its linear expansion coefficient is still low, and its toughness is insufficient.
Even if the diaminodiphenyl ether is copolymerized, the coefficient of linear expansion becomes too low and the toughness is insufficient when an elastic modulus above a certain level is to be obtained.

【0017】オキシジフタル酸二無水物(以下、ODP
Aという)を用いて、PDAとジアミノジフェニルエー
テルとを重合させ、適度に高い弾性率と銅との組み合わ
せにおいて不都合のない適度な線膨張係数、また十分な
靭性等を実現させ得る。ただし、ODPAだけでは吸水
率そのものはさほど下がらず、吸湿特性を下げてかつ諸
特性を好ましく保つにはTMHQをさらに共重合する、
本発明の構成は、非常に有効である。すなわち、本発明
によれば、一定の耐熱性、接着性等を有しつつ、高弾性
率、高破断時伸び率、低線膨張係数、低吸湿膨張係数の
特性を有するバランスのよいポリイミドフィルムが得ら
れる。
Oxydiphthalic acid dianhydride (hereinafter referred to as ODP
A) can be used to polymerize PDA and diaminodiphenyl ether to achieve an appropriately high elastic modulus and an appropriate linear expansion coefficient that is not inconvenient in combination with copper, and sufficient toughness. However, ODPA alone does not significantly lower the water absorption rate, and TMHQ is further copolymerized in order to reduce the moisture absorption characteristics and keep various characteristics favorable.
The configuration of the present invention is very effective. That is, according to the present invention, while having a certain heat resistance, adhesiveness, etc., a well-balanced polyimide film having high elastic modulus, high elongation at break, low linear expansion coefficient, and low hygroscopic expansion coefficient. can get.

【0018】[0018]

【発明の実施の形態】本発明の用語「モノマー」とは、
単量体のジアミンあるいはテトラカルボン酸二無水物の
いずれかをいう。
BEST MODE FOR CARRYING OUT THE INVENTION The term "monomer" of the present invention means
Refers to either monomeric diamine or tetracarboxylic dianhydride.

【0019】ポリイミドフィルムの特性として、ここ
で、引張弾性率および破断時伸び率とは、それぞれAS
TM−D882に準じて測定した値をいう。平均線膨張
係数は、理学電機(株)製TMA8140を用いて、窒
素の存在下、1分間に10℃の割合で温度を上昇させ
て、100℃〜200℃の時の値を測定して求める。吸
湿膨張係数は、ポリイミドフィルムがたるまないように
最低限の加重をかけた状態(5mm×20mmのサンプ
ルに対して、約3g)で、湿度を30RH%に調湿し完
全に飽和するまで吸湿させて寸法を計測し、その後湿度
を90RH%に調湿して同様に飽和吸湿させた後寸法を
計測し、両者の結果から相対湿度差1%あたりの寸法変
化率を求める。ガラス転移温度(Tg)は、動的粘弾性
測定装置(セイコー電子工業(株)製DMS200)を
用いて引張モードで、3℃/分の割合で昇温させながら
測定し、tanσの値から求める。
As the characteristics of the polyimide film, the tensile modulus and the elongation at break are AS and AS, respectively.
The value measured according to TM-D882. The average coefficient of linear expansion is determined by using TMA8140 manufactured by Rigaku Denki Co., Ltd., increasing the temperature at a rate of 10 ° C. for 1 minute in the presence of nitrogen, and measuring the value at 100 ° C. to 200 ° C. . The coefficient of hygroscopic expansion is such that the polyimide film is subjected to the minimum weight (about 3 g for a sample of 5 mm x 20 mm) so that it does not sag, and the humidity is adjusted to 30 RH% and absorbed until completely saturated. The size is measured, the humidity is adjusted to 90 RH% and saturated moisture is similarly absorbed, and then the size is measured, and the dimensional change rate per 1% relative humidity difference is determined from the results of both. The glass transition temperature (Tg) is measured by using a dynamic viscoelasticity measuring device (DMS200 manufactured by Seiko Denshi Kogyo Co., Ltd.) in a tensile mode while increasing the temperature at a rate of 3 ° C./min, and is calculated from the value of tan σ. .

【0020】本発明のポリイミドフィルムは、当業者に
公知のポリアミド酸合成法により調製されたポリアミド
酸から、製造され得る。
The polyimide film of the present invention can be produced from a polyamic acid prepared by a polyamic acid synthesis method known to those skilled in the art.

【0021】本発明の重合工程で用いられる有機溶剤
は、当業者に公知の種々の溶剤を用い得る。例えば、ポ
リアミド酸に対して高い溶解性を有する高極性溶媒を用
いることが好ましいが、これらの高極性溶媒に貧溶媒を
添加することも可能である。高極性溶媒の例としては、
N,N−ジメチルホルムアミド、N,N−ジメチルアセ
トアミド等のアミド類、N−メチル−2−ピロリドン等
のピロリドン類、フェノール、p−クロロフェノール、
o−クロロフェノール等のフェノール類等が挙げられ
る。貧溶媒の例としては、トルエン、テトラヒドロフラ
ン、アセトン、メチルエチルケトン、メタノール、エタ
ノール等が挙げられる。これらの溶媒を混合して、適当
に溶解度パラメータを調整することにより、溶解性を高
めることもできる。
As the organic solvent used in the polymerization step of the present invention, various solvents known to those skilled in the art can be used. For example, it is preferable to use a highly polar solvent having high solubility in polyamic acid, but it is also possible to add a poor solvent to these highly polar solvents. Examples of highly polar solvents include:
Amides such as N, N-dimethylformamide, N, N-dimethylacetamide, pyrrolidones such as N-methyl-2-pyrrolidone, phenol, p-chlorophenol,
Examples thereof include phenols such as o-chlorophenol. Examples of the poor solvent include toluene, tetrahydrofuran, acetone, methyl ethyl ketone, methanol, ethanol and the like. The solubility can also be increased by mixing these solvents and appropriately adjusting the solubility parameter.

【0022】本発明において、ポリアミド酸を合成する
為には、酸無水物として、以下の構造式を持つTMHQ
In the present invention, in order to synthesize polyamic acid, TMHQ having the following structural formula is used as an acid anhydride.

【0023】[0023]

【化1】 [Chemical 1]

【0024】および以下の構造式を持つODPAAnd ODPA having the following structural formula

【0025】[0025]

【化2】 [Chemical 2]

【0026】ジアミンとして、以下の構造式を持つPD
PD having the following structural formula as the diamine
A

【0027】[0027]

【化3】 [Chemical 3]

【0028】および以下の構造式を持つODAAnd an ODA having the following structural formula

【0029】[0029]

【化4】 [Chemical 4]

【0030】を用いる。Is used.

【0031】ポリアミド酸の合成のための各モノマーの
添加順序は特に限定されず、様々な方法が可能である。
溶媒に、全ジアミンを溶解し、これにテトラカルボン酸
二無水物を徐々に加えておおむね当量として粘度を調整
しつつ、さらに残りのテトラカルボン酸二無水物をその
ままあるいは適当な溶媒に溶解して加えて、当量比を等
しくさせることが一般的に行われているが、これに限定
されない。これらの添加順序によっては、フィルムの特
性を微妙に制御することも可能である。具体的には、O
DAとPDAを溶剤中に溶解し、これに対して、TMH
Qを加え、その後ODPAを加える方法;あるいは、同
様に2種のジアミンを溶剤に溶解しておき、これにOD
PA、TMHQの順に二種の酸無水物を順次加える方
法;または、同様に2種のジアミンを溶解しておき、こ
れに2種の酸無水物の混合物を加える方法;2種のジア
ミンのうちどちらか一方を溶剤に溶解しておき、これに
2種の酸無水物のうち1種を加えて、その後にもう1種
のジアミンを加え、さらにその後もう1種の酸無水物を
加える方法、等を上げることができる。1種のジアミン
を複数のステップに分けて添加する事などでさらにバリ
エーションは多くなり、これらにより種々の特性の微妙
な調整が可能である。特にODAとPDAを有機溶剤中
に溶解させ、これにTMHQを加え、続いてODPAを
加えるという手順によって合成されたポリアミド酸を用
いた場合は、酸無水物の添加順序をこの逆にした場合よ
りも得られるポリイミドフィルムが高いTgを示し、好
ましい。
The order of addition of each monomer for synthesizing the polyamic acid is not particularly limited, and various methods are possible.
In the solvent, dissolve all the diamines, gradually add tetracarboxylic dianhydride to this to adjust the viscosity as an equivalent weight, and further dissolve the remaining tetracarboxylic dianhydride as it is or in a suitable solvent. In addition, the equivalence ratio is generally made equal, but not limited to this. The properties of the film can be finely controlled depending on the order of addition. Specifically, O
DA and PDA are dissolved in a solvent, while TMH
A method of adding Q and then adding ODPA; or, similarly, two kinds of diamines are dissolved in a solvent and OD is added thereto.
A method of sequentially adding two kinds of acid anhydrides in the order of PA and TMHQ; or a method of similarly dissolving two kinds of diamines and then adding a mixture of two kinds of acid anhydrides; among the two kinds of diamines Either one is dissolved in a solvent, one of the two acid anhydrides is added to this, then another diamine is added, and then another acid anhydride is added, Etc. can be raised. Variations are further increased by adding one kind of diamine in a plurality of steps, and these allow fine adjustment of various characteristics. In particular, when a polyamic acid synthesized by dissolving ODA and PDA in an organic solvent, adding TMHQ, and then adding ODPA was used, the order of addition of acid anhydrides was reversed from that in the reverse order. The polyimide film obtained also has a high Tg and is preferable.

【0032】何れの場合もジアミン化合物のモル量の合
計と酸無水物化合物のモル量の合計はほぼ同一となるよ
うに用いる。ここで、「ほぼ同一」としたのは、完全に
同一であると重合度が過度に上がりすぎ、その結果溶液
粘度が過度に上昇して取り扱いにくくなるからである。
ジアミン化合物モル量合計と、酸無水物化合物モル量合
計の比率は、0.95〜1.05、好ましくは0.98
〜1.02の範囲であり、1:1でないことが特に好ま
しい。
In any case, the total molar amount of the diamine compound and the total molar amount of the acid anhydride compound are set to be substantially the same. Here, the reason why they are "substantially the same" is that if they are completely the same, the degree of polymerization will be excessively increased, and as a result, the solution viscosity will be excessively increased, making it difficult to handle.
The ratio of the total molar amount of diamine compounds and the total molar amount of acid anhydride compounds is 0.95 to 1.05, preferably 0.98.
The range is from 1.02, and it is particularly preferable that the ratio is not 1: 1.

【0033】それぞれのモノマーの添加割合は、特に限
定されないが、好ましくは全酸無水物中、TMHQは、
0モル%より多く90モル%以下であり、ODPAは、
10モル%以上100モル%未満であり、全ジアミン
中、PDAは、25モル%以上90モル%以下であり、
ODAは、10モル%以上75モル%以下である。特に
好ましくは、全酸無水物中、TMHQは、1モル%以上
90モル%以下であり、ODPAは、10モル%以上9
9モル%以下である。最も好ましくは、全酸無水物中、
TMHQは、5モル%以上50モル%以下であり、OD
PAは、50モル%以上95モル%以下であり、全ジア
ミン中、PDAは、50モル%以上90モル%以下であ
り、ODAは、10モル%以上50モル%以下である。
The addition ratio of each monomer is not particularly limited, but TMHQ is preferably contained in all acid anhydrides.
It is more than 0 mol% and 90 mol% or less, and ODPA is
10 mol% or more and less than 100 mol%, PDA is 25 mol% or more and 90 mol% or less in all diamines,
ODA is 10 mol% or more and 75 mol% or less. Particularly preferably, TMHQ is 1 mol% to 90 mol% and ODPA is 10 mol% to 9 mol in the total acid anhydride.
It is 9 mol% or less. Most preferably, in total acid anhydride,
TMHQ is 5 mol% or more and 50 mol% or less, OD
PA is 50 mol% or more and 95 mol% or less, PDA is 50 mol% or more and 90 mol% or less, and ODA is 10 mol% or more and 50 mol% or less in all diamines.

【0034】これらの4種のモノマー以外のモノマー成
分を少量加え、すなわちジアミンの場合はジアミン全体
の10モル%以下、酸無水物の場合は酸無水物全体の1
5モル%以下の量を加え、得られるポリイミドフィルム
の特性の微妙な調整をすることも可能である。使用する
モノマーにもよるが、概ねこの量以下の共重合であれ
ば、吸湿特性・熱特性・機械特性を好ましいレベルに保
つ事ができる。少量用いるモノマーとしては、ジアミン
としては、ジメチルベンジジン、2、2' −ビス(4−
アミノフェノキシフェニル)プロパン、4、4' −ビス
(4−アミノフェノキシ)ビフェニル、またこれらのフ
ッ素等ハロゲン置換体等があげられる。酸無水物として
は、3,3' ,4,4' −ビフェニルテトラカルボン酸
二無水物、3,3' ,4,4' −ベンゾフェノンテトラ
カルボン酸二無水物、ピロメリット酸二無水物、3,
3' ,4,4' −ジフェニルスルフォンテトラカルボン
酸二無水物、等を例示することができる。
A small amount of a monomer component other than these four types of monomers is added, that is, in the case of a diamine, 10 mol% or less of the whole diamine, and in the case of an acid anhydride, 1% of the whole acid anhydride.
It is also possible to finely adjust the properties of the obtained polyimide film by adding an amount of 5 mol% or less. Although depending on the monomer used, if the amount of the copolymer is generally less than this amount, the hygroscopic property, thermal property, and mechanical property can be maintained at preferable levels. As a monomer used in a small amount, as a diamine, dimethylbenzidine, 2,2'-bis (4-
Examples thereof include aminophenoxyphenyl) propane, 4,4′-bis (4-aminophenoxy) biphenyl, and halogen substitution products thereof such as fluorine. Examples of acid anhydrides include 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 3,3 ′, 4,4′-benzophenonetetracarboxylic dianhydride, pyromellitic dianhydride, and 3 ,
Examples thereof include 3 ′, 4,4′-diphenylsulfone tetracarboxylic acid dianhydride.

【0035】重合反応は、一般的にポリアミド酸の重合
反応に用いられる温度であれば、特に限定されないが、
60℃以下が好ましく、40℃以下で行うことがより好
ましい。高温度になると、酸無水物基の開環反応が生じ
易く、ポリアミド酸の生成反応を阻害することがある。
The polymerization reaction is not particularly limited as long as it is a temperature generally used for the polymerization reaction of polyamic acid.
The temperature is preferably 60 ° C or lower, and more preferably 40 ° C or lower. At a high temperature, a ring-opening reaction of an acid anhydride group is likely to occur, which may hinder the polyamic acid formation reaction.

【0036】重合反応は、窒素あるいはアルゴン等の不
活性ガス中で行わせることが好ましいが、その他の条件
下でも行い得る。
The polymerization reaction is preferably carried out in an inert gas such as nitrogen or argon, but may be carried out under other conditions.

【0037】ポリアミド酸の溶液中の濃度は、5〜30
wt%、さらには10〜25wt%が好ましい。これよ
り低いと溶剤が増え、フィルム製造後の乾燥に時間がか
かり、これより高い濃度の場合、粘度が上昇して加工が
困難となる場合がある。
The concentration of the polyamic acid in the solution is 5 to 30.
wt%, and more preferably 10 to 25 wt%. If the concentration is lower than this, the amount of solvent increases, and it takes time to dry after the film is produced. If the concentration is higher than this, the viscosity may increase and the processing may become difficult.

【0038】ポリアミド酸溶液の粘度は、フィルム加工
できる粘度であれば特に限定されないが、22℃で約1
00〜10000ポイズ程度、好ましくは、500〜6
000ポイズである。粘度が低過ぎるとフィルムの特性
に悪影響を与え、加工の際に厚みを安定化することも難
しい。一方、粘度が高過ぎる場合、溶液の攪拌が困難と
なり、フィルム状に加工する際に強い力が必要となり、
不都合である。
The viscosity of the polyamic acid solution is not particularly limited as long as it can be processed into a film, but it is about 1 at 22 ° C.
00 to 10000 poise, preferably 500 to 6
It is 000 poise. If the viscosity is too low, the film characteristics are adversely affected, and it is difficult to stabilize the thickness during processing. On the other hand, if the viscosity is too high, it becomes difficult to stir the solution, and a strong force is required when processing into a film,
It is inconvenient.

【0039】得られたポリアミド酸の溶液を、フィルム
状に形成し、ポリアミド酸をイミド化してポリイミドフ
ィルムを得ることができる。一般的には、このイミド化
は、加熱により脱水する熱的方法および脱水剤あるいは
イミド化触媒を用いる化学的方法とがある。このうちの
いずれの方法を用いてもよく、化学的方法と熱的方法の
両方を併用することもできる。脱水剤と触媒を添加して
加熱、乾燥する化学的方法によれば、熱的方法よりも効
率がよく、優れた特性がフィルムに付与され得る。脱水
剤あるいはイミド化触媒を用いない場合でも、本願発明
の4種のモノマーを用いるならば製造工程で延伸工程を
入れる等の方法により、同等の特性を実現することも可
能であるが、生産性の面から、化学的方法が好ましい。
The obtained solution of polyamic acid can be formed into a film, and the polyamic acid can be imidized to obtain a polyimide film. Generally, this imidization includes a thermal method of dehydrating by heating and a chemical method of using a dehydrating agent or an imidizing catalyst. Any of these methods may be used, and both the chemical method and the thermal method may be used in combination. A chemical method in which a dehydrating agent and a catalyst are added and heated and dried is more efficient than the thermal method, and excellent characteristics can be imparted to the film. Even when a dehydrating agent or an imidization catalyst is not used, if the four kinds of monomers of the present invention are used, it is possible to achieve the same characteristics by a method such as adding a stretching step in the manufacturing process, but productivity is also improved. From the aspect, the chemical method is preferable.

【0040】このような脱水剤は、例えば、無水酢酸等
の脂肪族酸無水物、芳香族酸無水物などである。
Such a dehydrating agent is, for example, an aliphatic acid anhydride such as acetic anhydride or an aromatic acid anhydride.

【0041】イミド化に用いられる触媒は、ピリジン、
α−ピコリン、β−ピコリン、γ−ピコリン、トリメチ
ルアミン、ジメチルアニリン、トリエチルアミン、イソ
キノリンなどの第3級アミンなどである。
The catalyst used for imidization is pyridine,
and tertiary amines such as α-picoline, β-picoline, γ-picoline, trimethylamine, dimethylaniline, triethylamine and isoquinoline.

【0042】以下にイミド化の化学的方法の例を挙げら
れるが、本発明はこれに限定されない。すなわち、得ら
れたポリアミド酸溶液に化学量論以上の脱水剤と触媒量
の第3級アミンとを加えた溶液を、支持板やPET等の
有機化合物でできたフィルム、ドラム、あるいはエンド
レスベルト状に流延又は塗布して膜状とし、その膜を1
50℃以下の温度で約5分〜90分間乾燥し、自己支持
性のポリアミド酸重合体の塗膜を得る。次にこれを支持
体より引き剥がして端部を固定する。その後、100℃
〜500℃程度まで徐々に加熱することによりイミド化
させ、冷却後これより取り外してポリイミドフィルムを
得る。
Examples of chemical methods for imidization are shown below, but the present invention is not limited thereto. That is, a solution obtained by adding a stoichiometric or more stoichiometric dehydrating agent and a catalytic amount of a tertiary amine to the obtained polyamic acid solution is used as a film, a drum, or an endless belt made of an organic compound such as a support plate or PET. It is cast or coated on to form a film.
It is dried at a temperature of 50 ° C. or lower for about 5 to 90 minutes to obtain a self-supporting polyamic acid polymer coating film. Next, this is peeled off from the support to fix the end portion. After that, 100 ℃
It is imidized by gradually heating to about 500 ° C., cooled, and then removed to obtain a polyimide film.

【0043】熱的方法によるイミド化の例は、上記の化
学的イミド化法と同様の工程が挙げられるが、これに限
定されない。すなわち、ポリアミド酸溶液を支持板やP
ET等の有機化合物製のフィルム、ドラムあるいはエン
ドレスベルト等の支持体上に流延または塗布して膜状と
し、加熱処理し得る。
Examples of thermal imidization include, but are not limited to, steps similar to those of the chemical imidization method described above. That is, the polyamic acid solution is applied to a support plate or P
A film made of an organic compound such as ET or a support such as a drum or an endless belt may be cast or coated to form a film, and heat-treated.

【0044】フィルムの製造に際しては、さらに、熱劣
化防止剤を加えて焼成時のフィルムの劣化を防止し得
る。その他の添加剤を加えて、フィルム製造時における
フィルムの劣化等を防止することもできる。熱劣化防止
剤としては、トリフェニルフォスフェイト等の燐酸系の
劣化防止剤、置換基を有する又は置換基を有さないベン
ゾフェノン等が挙げられる。その他の添加剤としては、
金属単体、有機金属化合物、またはガラス系のフィラー
類等が挙げられる。
In the production of the film, a thermal deterioration inhibitor may be added to prevent the film from deteriorating during firing. Other additives can be added to prevent deterioration of the film during film production. Examples of the thermal deterioration inhibitor include phosphoric acid-based deterioration inhibitors such as triphenyl phosphate, and benzophenone having a substituent or not having a substituent. Other additives include
Examples include simple metals, organic metal compounds, and glass-based fillers.

【0045】以下に実施例により本発明をより具体的に
説明するが、本発明はこれら実施例によって限定される
ものではない。
Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.

【0046】[0046]

【実施例】【Example】

【0047】(実施例1)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド 750g中に、25.1g(総
ジアミン中の約62.5mol%)のPDAと27.9
g(総ジアミン中の約37.5mol%)のODAを溶
解し、これにTMHQ52.7g(総酸無水物中の約3
1mol%)を徐々に加えて良く攪拌反応させ、続いて
ODPA79.4g(総酸無水物中の約69mol%)
を徐々に加え、23℃での測定で約2500ポイズのポ
リアミド酸溶液を得た。
Example 1 25.1 g (about 62.5 mol% of total diamine) of PDA and 27.9 g of 750 g of dimethylacetamide in an ice bath in a nitrogen-substituted atmosphere.
g (about 37.5 mol% of total diamine) ODA was dissolved, and 52.5 g of TMHQ (about 3% of total acid anhydride) was dissolved therein.
1 mol%) was gradually added to the reaction mixture with good stirring, followed by 79.4 g of ODPA (about 69 mol% in total acid anhydride).
Was slowly added, and a polyamic acid solution having a porosity of about 2500 poise was measured at 23 ° C.

【0048】このポリアミド酸溶液100gを0℃程度
に冷却し、これに13.5gの無水酢酸と4.1gのイ
ソキノリンを加えて、均一に攪拌しこれを、SUS板上
に焼成後50μm になるような所定の厚みにキャスト
し、125℃で5分熱風乾燥した。その後SUS板より
フィルムを引き剥がし、これを4片を固定した状態で1
70℃で1.5分、250℃で1.5分、350℃で3
分、430℃で3分加熱乾燥し、ポリイミドフィルムを
得た。このフィルムの引張弾性率、破断時伸び率、線膨
張係数、吸湿膨張係数、Tgを測定した結果を表1に示
す。
100 g of this polyamic acid solution was cooled to about 0 ° C., 13.5 g of acetic anhydride and 4.1 g of isoquinoline were added thereto, and the mixture was uniformly stirred. After baking this on a SUS plate, it became 50 μm. It was cast to a predetermined thickness as described above and dried at 125 ° C. for 5 minutes with hot air. After that, peel off the film from the SUS plate, and fix it with 4 pieces 1
1.5 minutes at 70 ℃, 1.5 minutes at 250 ℃, 3 at 350 ℃
Min, heated and dried at 430 ° C. for 3 minutes to obtain a polyimide film. Table 1 shows the results of measuring the tensile elastic modulus, elongation at break, linear expansion coefficient, hygroscopic expansion coefficient, and Tg of this film.

【0049】(実施例2)窒素置換雰囲気中の氷浴下で
ジメチルアセトアミド 750g中に、20.6g(総
ジアミン中の約55mol%)のPDAと31.2g
(総ジアミン中の約45mol%)のODAを溶解し、
これにTMHQ79.4g(総酸無水物中の約50mo
l%)を徐々に加えて良く攪拌反応させ、続いてODP
A53.8g(総酸無水物中の約50mol%)を徐々
に加え、23℃での測定で約2500ポイズのポリアミ
ド酸溶液を得た。
Example 2 20.6 g (about 55 mol% of the total diamine) of PDA and 31.2 g of 750 g of dimethylacetamide in an ice bath under a nitrogen-substituted atmosphere were used.
Dissolve ODA (about 45 mol% in total diamine),
79.4 g of TMHQ (about 50 mo in total acid anhydride)
1%) was gradually added to the reaction mixture with good stirring, followed by ODP.
A53.8 g (about 50 mol% in the total acid anhydride) was gradually added to obtain a polyamic acid solution of about 2500 poise measured at 23 ° C.

【0050】このポリアミド酸溶液を実施例1と同様の
方法で加工し、ポリイミドフィルムとした。実施例1と
同様に、特性試験を行った。その結果を表1に示す。
This polyamic acid solution was processed in the same manner as in Example 1 to obtain a polyimide film. A characteristic test was conducted in the same manner as in Example 1. The results are shown in Table 1.

【0051】(実施例3)ODPAとTMHQの添加順
序を逆にした以外はすべて実施例1と同様の方法で重合
を行い、同様の方法でポリイミドフィルムを作成し、特
性試験を行った。その結果を表1に示す。
(Example 3) Polymerization was performed in the same manner as in Example 1 except that the order of addition of ODPA and TMHQ was reversed, and a polyimide film was prepared in the same manner as in Example 1, and a characteristic test was conducted. The results are shown in Table 1.

【0052】[0052]

【表1】 [Table 1]

【0053】(比較例1〜4)実施例と同様の方法で、
ジメチルアセトアミド中にジアミン成分を全て溶解した
後酸無水物を加える方法で、溶液中の総固形分濃度20
%、および粘度2500ポイズになるように重合反応を
おこなった。各成分とそのモル%は表2に示している。
ここで、PMDAは、ピロメリット酸二無水物を表し、
BPDAは、3,3’4,4’−ビフェニルテトラカル
ボン酸二無水物を表す。実施例と同様にこれらのポリア
ミド酸溶液を用いてポリイミドフィルムを得て、その特
性を測定した結果を表2に示す。
(Comparative Examples 1 to 4) In the same manner as in Examples,
The total solid content concentration in the solution is 20 by adding an acid anhydride after dissolving all the diamine components in dimethylacetamide.
%, And the viscosity was 2500 poise. Each component and its mol% are shown in Table 2.
Here, PMDA represents pyromellitic dianhydride,
BPDA represents 3,3'4,4'-biphenyltetracarboxylic dianhydride. A polyimide film was obtained using these polyamic acid solutions in the same manner as in the example, and the results of measuring the properties thereof are shown in Table 2.

【0054】[0054]

【表2】 [Table 2]

【0055】[0055]

【発明の効果】本発明のポリイミドフィルムはこれまで
のベース用ポリイミドフィルムに無い優れた吸湿特性、
特に低い吸湿膨張を有し、なおかつ高弾性でありながら
銅の線膨張係数を下回ることなく、従って銅張の基盤や
TAB用テープとして用いた場合に極めて優れた反り特
性を発現できる。本発明のポリイミドフィルムは、柔軟
性・耐熱性にも優れ、ベースポリイミドフィルムとして
必要な特性を損なわないため、益々細密化する電子機器
に対応することができる。
EFFECTS OF THE INVENTION The polyimide film of the present invention has excellent moisture absorption characteristics not found in conventional polyimide films for bases,
In particular, it has a low hygroscopic expansion, and has high elasticity, but does not fall below the linear expansion coefficient of copper. Therefore, when it is used as a copper-clad substrate or a tape for TAB, extremely excellent warp characteristics can be exhibited. INDUSTRIAL APPLICABILITY The polyimide film of the present invention is excellent in flexibility and heat resistance, and does not impair the properties required as a base polyimide film, so that it can be applied to electronic devices that are becoming more and more fine.

フロントページの続き Fターム(参考) 4F071 AA60 AA86 AF20Y AF21Y AF54 AF62Y AG12 AG28 AG34 AG36 AH12 BA02 BB02 BC01 4J002 CM041 GF00 GQ00 GS01 4J043 PA06 PA19 QB15 QB26 QB31 RA06 RA35 SA06 SB03 TA22 TB03 UA121 UA131 UA132 UA142 UB121 UB122 UB172 VA011 VA021 VA022 VA032 VA041 VA062 XA13 XB35 YA08 ZA32 ZB11 ZB50 Continued front page    F-term (reference) 4F071 AA60 AA86 AF20Y AF21Y                       AF54 AF62Y AG12 AG28                       AG34 AG36 AH12 BA02 BB02                       BC01                 4J002 CM041 GF00 GQ00 GS01                 4J043 PA06 PA19 QB15 QB26 QB31                       RA06 RA35 SA06 SB03 TA22                       TB03 UA121 UA131 UA132                       UA142 UB121 UB122 UB172                       VA011 VA021 VA022 VA032                       VA041 VA062 XA13 XB35                       YA08 ZA32 ZB11 ZB50

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 p−フェニレンビス(トリメリット酸モ
ノエステル無水物)、オキシジフタル酸二無水物、p−
フェニレンジアミン、および4、4' −ジアミノジフェ
ニルエーテルを有機溶剤中で反応させて得られるポリア
ミド酸から製造されることを特徴とするポリイミドフィ
ルム。
1. P-phenylene bis (trimellitic acid monoester anhydride), oxydiphthalic dianhydride, p-
A polyimide film produced from a polyamic acid obtained by reacting phenylenediamine and 4,4′-diaminodiphenyl ether in an organic solvent.
【請求項2】 前記p−フェニレンビス(トリメリット
酸モノエステル無水物)が、全酸無水物に対して1〜9
0モル%であり、オキシジフタル酸二無水物が、全酸無
水物に対して10〜99モル%であり、p−フェニレン
ジアミンが、全ジアミンに対して25〜90モル%であ
り、4、4' −ジアミノジフェニルエーテルが、全ジア
ミンに対して10〜75モル%であることを特徴とする
請求項1に記載のポリイミドフィルム。
2. The p-phenylene bis (trimellitic acid monoester anhydride) is contained in an amount of 1 to 9 with respect to the total acid anhydride.
0 mol%, oxydiphthalic dianhydride is 10-99 mol% based on total acid anhydrides, p-phenylenediamine is 25-90 mol% based on total diamines, 4, 4 '-Diaminodiphenyl ether is 10-75 mol% with respect to all diamines, The polyimide film of Claim 1 characterized by the above-mentioned.
【請求項3】 請求項1または2に記載のポリイミドフ
ィルムであって、100℃以上200℃以下の平均線膨
張係数が15〜30ppm、引張弾性率が4.5〜8.
5GPa、破断時伸び率が20%以上、吸湿膨張係数が
10ppm以下、Tgが200℃以上であることを特徴
とするポリイミドフィルム。
3. The polyimide film according to claim 1, wherein the average linear expansion coefficient at 100 ° C. or higher and 200 ° C. or lower is 15 to 30 ppm, and the tensile elastic modulus is 4.5 to 8.
A polyimide film having 5 GPa, an elongation at break of 20% or more, a hygroscopic expansion coefficient of 10 ppm or less, and a Tg of 200 ° C. or more.
【請求項4】 4、4' −ジアミノジフェニルエーテル
とパラフェニレンジアミンを有機溶剤中に溶解させ、該
有機溶剤溶液にp−フェニレンビス(トリメリット酸モ
ノエステル無水物)を加え、続いてオキシジフタル酸二
無水物を加えて得られたポリアミド酸重合体を、酸無水
物と三級アミンとを用いて脱水閉環し、ポリイミドフィ
ルムを得ることを特徴とするポリイミドフィルムの製造
方法。
4. 4,4′-Diaminodiphenyl ether and para-phenylenediamine are dissolved in an organic solvent, p-phenylenebis (trimellitic acid monoester anhydride) is added to the organic solvent solution, and then oxydiphthalic acid diester is added. A method for producing a polyimide film, which comprises subjecting a polyamic acid polymer obtained by adding an anhydride to dehydration ring closure using an acid anhydride and a tertiary amine to obtain a polyimide film.
JP23804998A 1998-08-25 1998-08-25 Polyimide film and its production Pending JP2000063543A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP23804998A JP2000063543A (en) 1998-08-25 1998-08-25 Polyimide film and its production
TW88114072A TW531547B (en) 1998-08-25 1999-08-18 Polyimide film and process for producing the same
KR1020007004426A KR20010031408A (en) 1998-08-25 1999-08-23 Polyimide film and process for producing the same
US09/530,102 US6335416B1 (en) 1998-08-25 1999-08-23 Polyimide film and process for producing the same
PCT/JP1999/004553 WO2000011066A1 (en) 1998-08-25 1999-08-23 Polyimide film and process for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23804998A JP2000063543A (en) 1998-08-25 1998-08-25 Polyimide film and its production

Publications (1)

Publication Number Publication Date
JP2000063543A true JP2000063543A (en) 2000-02-29

Family

ID=17024414

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2000063543A (en)

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JP2001323078A (en) * 2000-03-10 2001-11-20 Mitsubishi Plastics Ind Ltd Insulation film for metallic foil support on wiring board and the resultant wiring board
JP2002114848A (en) * 2000-10-06 2002-04-16 Kanegafuchi Chem Ind Co Ltd New thermoplastic polyimide resin and flexible metal foil-clad laminate
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JP2001323078A (en) * 2000-03-10 2001-11-20 Mitsubishi Plastics Ind Ltd Insulation film for metallic foil support on wiring board and the resultant wiring board
JP2002114848A (en) * 2000-10-06 2002-04-16 Kanegafuchi Chem Ind Co Ltd New thermoplastic polyimide resin and flexible metal foil-clad laminate
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US8865111B2 (en) 2003-09-02 2014-10-21 Kaneka Corporation Filmy graphite and process for producing the same
JPWO2005023713A1 (en) * 2003-09-02 2006-11-02 株式会社カネカ Film-like graphite and method for producing the same
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US7758842B2 (en) 2003-09-02 2010-07-20 Kaneka Corporation Filmy graphite and process for producing the same
JP4512802B2 (en) * 2003-09-02 2010-07-28 株式会社カネカ Film-like graphite and method for producing the same
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JPWO2006033267A1 (en) * 2004-09-24 2008-05-15 株式会社カネカ Novel polyimide film, adhesive film obtained using the same, and flexible metal-clad laminate
JP2012077302A (en) * 2004-09-24 2012-04-19 Kaneka Corp Novel polyimide film and adhesive film and flexible metal-clad laminate both obtained with the same
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US8338560B2 (en) 2005-04-25 2012-12-25 Kaneka Corporation Polyimide film and use thereof
JP2011063509A (en) * 2010-12-17 2011-03-31 Kaneka Corp Film-like graphite and method for producing the same
KR101338328B1 (en) 2011-12-28 2013-12-09 웅진케미칼 주식회사 Manufacturing Method Of Polyamic acid Composition, Polyamic acid Composition, Polyimide Film And Substrateused For Display Device Using The Same

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