JPH04207094A - Flexible printed-circuit board and its manufacture - Google Patents

Flexible printed-circuit board and its manufacture

Info

Publication number
JPH04207094A
JPH04207094A JP2339937A JP33993790A JPH04207094A JP H04207094 A JPH04207094 A JP H04207094A JP 2339937 A JP2339937 A JP 2339937A JP 33993790 A JP33993790 A JP 33993790A JP H04207094 A JPH04207094 A JP H04207094A
Authority
JP
Japan
Prior art keywords
aromatic series
flexible printed
circuit board
printed circuit
formulas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2339937A
Other languages
Japanese (ja)
Inventor
Taku Ito
卓 伊藤
Hitoshi Nojiri
仁志 野尻
Katsunori Yabuta
勝典 薮田
Yoshifumi Okada
好史 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP2339937A priority Critical patent/JPH04207094A/en
Publication of JPH04207094A publication Critical patent/JPH04207094A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable dimensional change in an etching drying treatment process to be suppressed and dimensional stability to be improved by using a copolymerization polyimide film consisting of a repetition unit which is expressed by an expression (A) including a long-chain aromatic series diamine remaining group with a flexed group and that expressed by an expression (B) including an aromatic series diamine remaining group as an insulating material. CONSTITUTION:An aromatic series tetracarbonaciddianhydride (a) and one aromatic series diamine compound (b) are allowed to react within an organic polarity solvent using a more excessive mol than (a) and (b), a prepolymer with an acid anhydride at both edges is obtained, and then an aromatic series diamine compound (c) is added so that all aromatic series diamine [(a)+(c)] has a virtually equal mol as the aromatic series tetracarbon acid dianhydride in this copolymerization method, thus obtaining a copolymerizate where a length of a segment where either one repetition unit exists is constant within the copolymerizate molecule.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、耐水性及び耐湿性に優れ、且つ高い弾性率を
有するポリイミドフィルムを金属導体層と積層した、優
れた寸法安定性を有するフレキシブルプリント基板、お
よび耐水性、耐湿性に優れ、且つ高い弾性率を有するポ
リイミドフィルムをフレキシブルプリント基板の絶縁層
に用いることにより歩留まりが大幅に改善された、フレ
キシブルプリント基板の製造方法に関するものである。
Detailed Description of the Invention [Industrial Field of Application] The present invention provides a flexible film with excellent dimensional stability, which is made by laminating a polyimide film with excellent water resistance and moisture resistance and a high modulus of elasticity with a metal conductor layer. The present invention relates to a method for manufacturing a flexible printed circuit board in which the yield is significantly improved by using a polyimide film having excellent water resistance, moisture resistance, and high elastic modulus for the insulating layer of the flexible printed circuit board.

〔従来の技術〕[Conventional technology]

ポリイミドは、一般に、耐熱性、電気絶縁性、耐薬品性
および耐放射線性に優れ、フレキシブルプリント基板の
絶縁材に適しており、従来から広く利用されてきている
。しかし乍ら、従来のポリイミドは、その化学構造上、
吸水率、吸湿率が高いという欠点がある。例えば、この
ポリイミドを絶縁材に用いたフレキシブルプリント基板
は、−般にエソチング工程における絶縁層の吸水により
寸法に変化を住じ、そのため回路設計の際、以後の工程
の寸法変化を予め考慮し設計する必要があった。この寸
法の変化量は、フレキシブルプリント基板のパターンの
種類によって異なるため、フレキシブルプリント基板の
製造工程を複雑化させ、さらには製品歩留まりを低下さ
せる大きな原因となっている。
Polyimide generally has excellent heat resistance, electrical insulation, chemical resistance, and radiation resistance, is suitable as an insulating material for flexible printed circuit boards, and has been widely used. However, due to its chemical structure, conventional polyimide
It has the disadvantage of high water absorption and moisture absorption. For example, flexible printed circuit boards that use polyimide as an insulating material generally undergo dimensional changes due to water absorption in the insulating layer during the etching process, so when designing circuits, the dimensional changes in subsequent processes must be taken into consideration in advance. I needed to. The amount of change in this dimension varies depending on the type of pattern of the flexible printed circuit board, and is therefore a major cause of complicating the manufacturing process of the flexible printed circuit board and further reducing the product yield.

そこで、吸水率を下げるための試みとして、長鎖の芳香
族ジアミンを用い、イミド環の数の全体に占める割合を
減らすことによって吸水率の低いポリイミドフィルムを
得、これを使ってフレキシブルプリント基板を製造する
方法が考えられている。しかしながら、多くの長鎖ジア
ミンはいくつかの屈曲基をその構造中に有しているため
、これを用いたポリイミドフィルムは耐水性、耐湿性に
優れてはいるが、弾性率が低くテンションに対する歪が
太き(なり、従ってこのポリイミドフィルムを使って製
造されたフレキシブルプリント基板の寸法安定性を充分
改善するには到っていない。
Therefore, in an attempt to lower the water absorption rate, we obtained a polyimide film with a low water absorption rate by using a long-chain aromatic diamine and reducing the proportion of imide rings in the total number, and using this to create flexible printed circuit boards. A method of manufacturing is being considered. However, since many long-chain diamines have several bending groups in their structure, polyimide films made using them have excellent water resistance and moisture resistance, but have low elastic modulus and distortion under tension. However, the dimensional stability of flexible printed circuit boards manufactured using this polyimide film cannot be sufficiently improved.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

本発明は、絶縁層に低吸水性、高弾性率を併せ持つポリ
イミドフィルムを用いることにより、エツチング乾燥処
理工程における寸法変化を抑え、且つ微細加工時におい
て必須の条件である寸法安定性を向上させたフレキシブ
ルプリント基板を提供することを目的とする。
The present invention suppresses dimensional changes during the etching drying process and improves dimensional stability, which is an essential condition during microfabrication, by using a polyimide film with low water absorption and high elastic modulus for the insulating layer. The purpose is to provide flexible printed circuit boards.

〔課題を解決するための手段〕[Means to solve the problem]

すなわち本発明の第1は、下記一般式(A)および(B
)で表される反復単位を有するポリイミドフィルムに、
接着剤を介しまたは介さずに、金属導体層が積層された
フレキシブルプリント基板; (Xは水素原子、フッ素原子、Rは水酸基、メチル基、
メトキシ基、塩素原子またはフッ素原子を表す。) 本発明の第2は、下記一般式(A)および(B)で表さ
れる反復単位を有するポリイミドフィルムに、接着剤を
介しまたは介さずに、金属導体層を形成することを特徴
とするフレキシブルプリント基板の製造方法: (Xは水素原子、フッ素原子、Rは水酸基、メチル基、
メトキシ基、塩素原子またはフッ素原子を表す。) を、それぞれ内容とするものである。
That is, the first aspect of the present invention is the following general formulas (A) and (B
) to a polyimide film having a repeating unit represented by
A flexible printed circuit board on which metal conductor layers are laminated with or without adhesive; (X is a hydrogen atom, a fluorine atom, R is a hydroxyl group, a methyl group,
Represents a methoxy group, chlorine atom or fluorine atom. ) The second aspect of the present invention is characterized in that a metal conductor layer is formed on a polyimide film having repeating units represented by the following general formulas (A) and (B), with or without an adhesive. Manufacturing method of flexible printed circuit board: (X is a hydrogen atom, a fluorine atom, R is a hydroxyl group, a methyl group,
Represents a methoxy group, chlorine atom or fluorine atom. ), respectively.

本発明によるフレキシブルプリント基板は、屈曲基を持
つ長鎖の芳香族ジアミン残基を含む一般式(A)で表さ
れる反復単位と、剛直な芳香族ジアミン残基を含む一般
式(B)で表される反復単位からなる共重合ポリイミド
フィルムを絶縁材として用いたことを特徴とする。絶縁
材フィルムとして、このような吸水率が低く、且つ弾性
率の高い材料を用いることによって、フレキシブルプリ
ント基板の各工程での歩留まりを向上させることができ
、同時に製造されたフレキシブルプリント基板の物性も
優れたものとなる。
The flexible printed circuit board according to the present invention has a repeating unit represented by general formula (A) containing a long chain aromatic diamine residue having a bending group, and a general formula (B) containing a rigid aromatic diamine residue. It is characterized in that a copolymerized polyimide film consisting of the following repeating units is used as an insulating material. By using such a material with low water absorption and high elastic modulus as the insulating film, it is possible to improve the yield in each process of flexible printed circuit boards, and at the same time improve the physical properties of the manufactured flexible printed circuit boards. It will be excellent.

上記のフレキシブルプリント基板とは、絶縁層と導体層
とが、接着剤を介してまたは介さずに、積層されたもの
、及びこれにバターニング、エツチング処理等を施され
たものをいう。
The above-mentioned flexible printed circuit board refers to one in which an insulating layer and a conductive layer are laminated with or without an adhesive, and one in which a patterning, etching treatment, etc. is applied to this.

接着剤を用いる場合、該接着剤には通常のフレキシブル
プリント基板の製造に用いられる接着剤を用いることが
できる。
When an adhesive is used, an adhesive used in the manufacture of ordinary flexible printed circuit boards can be used as the adhesive.

また、本発明に言う導体層とは、銅、鉄、アルミニウム
などの金属、或いは金属箔に代表されるものであるが、
これ以外のものでもよい。
Further, the conductor layer referred to in the present invention is typified by metal such as copper, iron, aluminum, or metal foil, but
It may be anything other than this.

本発明に用いる絶縁材のポリイミド共重合体はランダム
共重合体、交互共重合体、ブロック共重合体のいずれで
もよい。また、一般式(A)及び(B)で表される反復
単位の繰返し数はそれぞれ100〜1ooooの範囲が
好ましく、またモル比(A)/ (B)は20/80〜
80/20の範囲にあることが好ましく、更に好ましく
は40/60〜60/40の範囲である。(A)の比率
がこれより小さいと、フィルムの吸水率が高くなりエツ
チング工程など水にさらされる工程での寸法変化が大き
くなる。逆に(A)の比率がこれより大きいと、弾性率
が低くなるためテンションによる伸びが大きくなり、や
はり寸法変化が大きくなる原因となる。また、一般式(
A)及び(B)の繰り返し単位からなるポリイミド分子
の分子量は50.000〜1,000,000の間にあ
ることが好ましい、絶縁材には各種の有機添加材、無機
のフィラー類、各種の強化材等を単独又は組み合わせて
複合することも可能である。
The polyimide copolymer of the insulating material used in the present invention may be a random copolymer, an alternating copolymer, or a block copolymer. Further, the repeating number of the repeating units represented by general formulas (A) and (B) is preferably in the range of 100 to 1oooo, and the molar ratio (A)/(B) is 20/80 to
It is preferably in the range of 80/20, more preferably in the range of 40/60 to 60/40. If the ratio of (A) is smaller than this, the water absorption rate of the film will be high and the dimensional change will be large during a process in which the film is exposed to water such as an etching process. On the other hand, if the ratio of (A) is larger than this, the elastic modulus will be low and the elongation due to tension will be large, which will also cause large dimensional changes. Also, the general formula (
The molecular weight of the polyimide molecule consisting of the repeating units A) and (B) is preferably between 50.000 and 1,000,000.The insulating material contains various organic additives, inorganic fillers, and various other materials. It is also possible to use reinforcing materials alone or in combination.

次に、このポリイミド絶縁材の製造法について説明する
。この芳香族ポリイミド共重合体絶縁材は、その前駆体
であるポリアミド酸共重合体溶液から得られるが、この
ポリアミド酸共重合体溶液は、公知の方法で製造するこ
とができる。すなわち、テトラカルボン酸二無水物とジ
アミン成分を実質等モル使用し、有機極性溶媒中で重合
して得られる。
Next, a method for manufacturing this polyimide insulating material will be explained. This aromatic polyimide copolymer insulating material is obtained from a polyamic acid copolymer solution which is its precursor, and this polyamic acid copolymer solution can be produced by a known method. That is, it is obtained by using substantially equimolar amounts of tetracarboxylic dianhydride and diamine component and polymerizing them in an organic polar solvent.

このポリアミド酸共重合体溶液の製造方法の具体例を以
下に示す。
A specific example of the method for producing this polyamic acid copolymer solution is shown below.

(1)芳香族テトラカルボン酸二無水物(a)と、芳、
香族ジアミン化合物(b)と(c)の混合物を実質的に
等モル用い、有機極性溶媒中で反応させる共重合方法、
この方法ではランダム共重合体が得られる。
(1) Aromatic tetracarboxylic dianhydride (a), aromatic,
A copolymerization method in which a mixture of aromatic diamine compounds (b) and (c) is used in substantially equimolar amounts and reacted in an organic polar solvent,
This method yields random copolymers.

(2)芳香族テトラカルボン酸二無水物(a)と一方の
芳香族ジアミン化合物(b)を、(a)を(b)より過
剰モル用い、有機極性溶媒中にて反応させ、両末端に酸
無水物基を有するプレポリマーを得て、続いてここに芳
香族ジアミン化合物(e)を、全芳香族ジアミンC(b
) +(c))が芳香族テトラカルボン酸二無水物(a
)と実質的に等モルになるように添加する共重合方法、
この方法により、どちらか一方の反復単位が存在するセ
グメントの長さが共重合体分子内において一定である共
重合体を得ることができる。
(2) Aromatic tetracarboxylic dianhydride (a) and one aromatic diamine compound (b) are reacted in an organic polar solvent using a molar excess of (a) over (b), and both ends are reacted. A prepolymer having an acid anhydride group is obtained, and then an aromatic diamine compound (e) is added thereto, and a wholly aromatic diamine C (b
) + (c)) is aromatic tetracarboxylic dianhydride (a
), a copolymerization method in which the copolymerization method is added in a substantially equimolar amount with
By this method, a copolymer can be obtained in which the length of the segment in which one of the repeating units is present is constant within the copolymer molecule.

(3)芳香族ジアミン化合物(b)に対して芳香族テト
ラカルボン酸二無水物(a)を、(b)が(a)より過
剰になるように反応させ、両末端にアミノ基を存するプ
レポリマーを得て、続いてここに、芳香族ジアミン成分
(c)を追加添加後、全ジアミン成分C(b) +(c
))と実質的に等モルになるように、不足分の芳香族テ
トラカルボン酸二無水物(a)を添加反応させる共重合
方法。
(3) React the aromatic tetracarboxylic dianhydride (a) with the aromatic diamine compound (b) in such a manner that (b) is in excess of (a), and prepare a compound having amino groups at both ends. After obtaining a polymer and subsequently adding an aromatic diamine component (c) thereto, the total diamine component C(b) + (c
)) A copolymerization method in which an insufficient amount of aromatic tetracarboxylic dianhydride (a) is added and reacted so as to be substantially equimolar.

この方法によりブロック共重合体を得ることができる。A block copolymer can be obtained by this method.

ポリアミド酸共重合体を得るにはこれ以外の方法を用い
てもよく、さらには異種のポリアミド酸溶液の混合によ
り得ることも可能である。(2)の方法を用いると、特
性の面で優れたものが得られるので好ましい。
Other methods may be used to obtain the polyamic acid copolymer, and it is also possible to obtain the polyamic acid copolymer by mixing different types of polyamic acid solutions. It is preferable to use the method (2) because it yields products with excellent properties.

上記のポリアミド酸を得るために、芳香族テトラカルボ
ン酸二無水物としてピロメリット酸二無水物を用いると
特性の面で優れたものが得られる。
When pyromellitic dianhydride is used as the aromatic tetracarboxylic dianhydride to obtain the above-mentioned polyamic acid, the polyamic acid has excellent properties.

芳香族ジアミン成分として一般式(1)CX3 〔Xは水素原子またはフン素原子を表す。)で表される
芳香族ジアミン成分、及び一般式(It)(Rは水酸基
、メチル基、メトキシ基、塩素原子、またはフッ素分子
を表す。) で表される芳香族ジアミン成分を前記の成分(b)及び
(c)として好適に用いることができる。
The aromatic diamine component has the general formula (1) CX3 [X represents a hydrogen atom or a fluorine atom. ) and the aromatic diamine component represented by the general formula (It) (R represents a hydroxyl group, methyl group, methoxy group, chlorine atom, or fluorine molecule). It can be suitably used as b) and (c).

この一般式(1)で表される芳香族ジアミンとして、2
,2−ビス(4−(4−アミノフェノキシ)フェニル〕
プロパン、2.2−ビス〔4−(4−アミノフェノキシ
)フェニル〕へキサフルオロプロパン等を挙げることが
でき、これらは単独または2種以上組み合わせて用いら
れる。
As the aromatic diamine represented by this general formula (1), 2
,2-bis(4-(4-aminophenoxy)phenyl)
Examples include propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, and these may be used alone or in combination of two or more.

また、一般式(ff)で示される芳香族ジアミンとして
、3,3′−ジヒドロキシ−4,4′−ジアミノビフェ
ニル、3,3′−ジメチル−4,4′−ジアミノビフェ
ニル、3,3′−ジメトキシ−4,4’−ジアミノビフ
ェニル、3,3′−ジクロロ−4,4′−ジアミノビフ
ェニル、3.3′−ジフルオロ−4,4′−ジアミノビ
フェニル等を挙げることができ、これらは単独または2
種以上組み合わせて用いられる。
Further, as the aromatic diamine represented by the general formula (ff), 3,3'-dihydroxy-4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminobiphenyl, 3,3'- Examples include dimethoxy-4,4'-diaminobiphenyl, 3,3'-dichloro-4,4'-diaminobiphenyl, 3,3'-difluoro-4,4'-diaminobiphenyl, etc., which may be used alone or in combination. 2
Used in combination of more than one species.

また、該ポリアミド酸共重合体の生成反応に使用される
有機極性溶媒として、ジメチルスルホキシド、ジエチル
スルホキシドなどのスルホキシド系溶媒、N、 N−ジ
メチルホルムアミド、N、 N−ジエチルホルムアミド
などのホルムアミド系溶媒、N、N−ジメチルアセトア
ミド、N、N−ジエチルアセトアミドなどのアセトアミ
ド系溶媒、N−メチル−2−ピロリドン、N−ビニル−
2−ピロリドンなどのピロリドン系溶媒、フェノール、
0−1m−1またはp−クレゾール、キシレノール、ハ
ロゲン化フェノール、カテコールなどのフェノール系溶
媒、あるいはへキサメチルホスホルアミド、γ−ブチロ
ラクトンなどを挙げることができ、これらを単独または
2種以上の混合物として用いるのが望ましく、更にはキ
シレン、トルエンのような芳香族炭化水素の使用も可能
である。
In addition, as the organic polar solvent used in the production reaction of the polyamic acid copolymer, sulfoxide-based solvents such as dimethyl sulfoxide and diethyl sulfoxide, formamide-based solvents such as N,N-dimethylformamide, N,N-diethylformamide, etc. Acetamide solvents such as N,N-dimethylacetamide, N,N-diethylacetamide, N-methyl-2-pyrrolidone, N-vinyl-
Pyrrolidone solvents such as 2-pyrrolidone, phenol,
Examples include 0-1m-1 or p-cresol, xylenol, halogenated phenol, phenolic solvents such as catechol, hexamethylphosphoramide, γ-butyrolactone, etc., which may be used alone or in a mixture of two or more. It is preferable to use aromatic hydrocarbons such as xylene and toluene.

また、このポリアミド酸共重合体は各々前記の有機極性
溶媒中に5〜40重量%、好ましくは10〜30重量%
溶解されているのが取扱いの面からも望ましい。
Further, this polyamic acid copolymer is contained in the organic polar solvent in an amount of 5 to 40% by weight, preferably 10 to 30% by weight.
From the viewpoint of handling, it is desirable that the material be dissolved.

次いで、このポリアミド酸溶液からポリイミドからなる
有機絶縁膜を製造する方法については、従来公知の方法
を用いることができる。即ち熱的に脱水する熱的方法、
脱水剤と触媒を用いる化学的方法のいずれを用いてもよ
いが、化学的方法によると生成するポリイミド重合体の
伸びや引張強度等の機械特性が優れたものになるので好
ましい。
Next, a conventionally known method can be used to manufacture an organic insulating film made of polyimide from this polyamic acid solution. i.e. thermal methods of thermal dehydration;
Although any chemical method using a dehydrating agent and a catalyst may be used, the chemical method is preferred because the resulting polyimide polymer has excellent mechanical properties such as elongation and tensile strength.

なお、ここで言う脱水剤としては、例えば無水酢酸等の
脂肪族酸無水物、フタル酸無水物等の芳香族酸無水物な
どが挙げられる。また触媒として、例えばトリエチルア
ミンなどの脂肪族第3級アミン類、N、N−ジメチルア
ニリン等の芳香族第3級アミン頬、ピリジン、ピコリン
、イソキノリン、キノリン等の複素環式第3級アミン類
などが挙げられる。
Note that the dehydrating agent mentioned here includes, for example, aliphatic acid anhydrides such as acetic anhydride, aromatic acid anhydrides such as phthalic anhydride, and the like. Examples of catalysts include aliphatic tertiary amines such as triethylamine, aromatic tertiary amines such as N,N-dimethylaniline, and heterocyclic tertiary amines such as pyridine, picoline, isoquinoline, and quinoline. can be mentioned.

このようにして、低い吸水率と高い弾性率を併せ持つ絶
縁材を得ることができる。
In this way, an insulating material having both low water absorption and high elastic modulus can be obtained.

絶縁材の厚さは7〜150μmが好ましい。本発明のフ
レキシブルプリント基板は、上記の絶縁材と導体を積層
することにより得られる。代表例を次に説明するが、こ
の方法に限定されるものではない。
The thickness of the insulating material is preferably 7 to 150 μm. The flexible printed circuit board of the present invention is obtained by laminating the above-mentioned insulating material and conductor. A typical example will be described next, but the method is not limited to this method.

まず絶縁材に接着剤を塗布し、乾燥後約10〜70μm
の銅などの金属箔を加圧下で熱ラミネートし、所定のボ
ストキエアを行い、フレキシブル基板を得る。更に金属
面に所望の回路をバターニングし、次にエツチング、水
洗乾燥工程を経て、パターン化されたフレキシブル基板
を得ることができる。接着剤としては、エポキシ系接着
剤等通常フレキシブルプリント基板の製造に用いられる
接着剤を使用することができる。また、接着剤を用いな
い積層方法としては、該絶縁材上にスパッタリングや無
電解メツキによって導体薄層を形成した後、電解メツキ
によって一定厚みの導体層を得るなどの方法を用いるこ
とができる。
First, apply adhesive to the insulation material, and after drying, the thickness is about 10 to 70 μm.
A metal foil such as copper is thermally laminated under pressure, and a predetermined bonding process is performed to obtain a flexible board. Further, a desired circuit is patterned on the metal surface, and then a patterned flexible substrate can be obtained through etching, water washing and drying steps. As the adhesive, adhesives such as epoxy adhesives that are commonly used in the manufacture of flexible printed circuit boards can be used. Further, as a lamination method that does not use an adhesive, a method can be used in which a thin conductive layer is formed on the insulating material by sputtering or electroless plating, and then a conductive layer of a constant thickness is obtained by electrolytic plating.

〔実施例〕〔Example〕

以下、実施例により本発明を具体的に説明するが、本発
明はこれら実施例のみに限定されるものではない。
EXAMPLES Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited only to these Examples.

実施例中、ODAは4,4′−ジアミノジフェニルエー
テル、p−PDAはバラフェニレンジアミン、PMDA
はピロメリット酸二無水物、BAPPは2.2−ビス(
4−(4−アミノフェノキシ)フェニル〕プロパン、D
MBは3,3′−ジメチル−4,4′−ジアミノビフェ
ニル、DMFはジメチルホルムアミドを表す。
In the examples, ODA is 4,4'-diaminodiphenyl ether, p-PDA is phenylene diamine, PMDA
is pyromellitic dianhydride, BAPP is 2,2-bis(
4-(4-aminophenoxy)phenyl]propane, D
MB represents 3,3'-dimethyl-4,4'-diaminobiphenyl, and DMF represents dimethylformamide.

比較例工 21のセパラブルフラスコに脱水精製したDMF815
gを入れ、ここに0DA49.75 g (0゜248
モル)を投入し均一になるまで撹拌した。
Dehydrated and purified DMF815 in the separable flask of Comparative Example 21
g, here 0DA49.75 g (0°248
mol) and stirred until homogeneous.

次に、ここにPMDA108.38g (0,497モ
ル)を添加し、2時間反応させた。この間反応系をO″
Cの氷水で冷却した。続いて、ここにp−pDA26.
87 g (0,248モル)を添加し、更に4時間反
応させて、固形分18.5重量%のポリアミド酸溶液を
得た。
Next, 108.38 g (0,497 mol) of PMDA was added thereto and reacted for 2 hours. During this time, the reaction system was
Cooled with ice water at C. Next, p-pDA26.
87 g (0,248 mol) was added thereto, and the reaction was further continued for 4 hours to obtain a polyamic acid solution with a solid content of 18.5% by weight.

このポリアミド酸溶液に、脱水剤として無水酢酸、触媒
としてピリジンを添加した後、ガラス板上に流延塗布し
、約100℃にて約90秒乾燥した後、ポリアミド酸塗
膜をガラス板より剥し、その塗膜を支持枠に固定した。
After adding acetic anhydride as a dehydrating agent and pyridine as a catalyst to this polyamic acid solution, it was cast onto a glass plate, dried at about 100°C for about 90 seconds, and then the polyamic acid coating was peeled off from the glass plate. , the coating was fixed to a support frame.

その後、約110°Cで約90秒、約200°Cで約6
0秒、約300°Cで約60秒、続いて約400°Cで
約60秒加熱し、脱水閉環、乾燥した後、上記支持枠よ
り取り外し、約25μmのポリイミド膜を得た。この絶
縁材の初期弾性率は630 kg/mm”であり、吸水
率は4.2%であった。
After that, it was heated to about 110°C for about 90 seconds, and then heated to about 200°C for about 6 seconds.
After heating at about 300° C. for about 60 seconds and then at about 400° C. for about 60 seconds, dehydration, ring closure, and drying, the film was removed from the support frame to obtain a polyimide film of about 25 μm. The initial elastic modulus of this insulating material was 630 kg/mm'', and the water absorption rate was 4.2%.

次に、この絶縁材にナイロン/エポキシ系の接着剤を塗
布乾燥した後、銅箔を加圧熱ラミネートし、これにボス
トキュアを施した後、フレキシブル銅張板を得た。
Next, a nylon/epoxy adhesive was applied to this insulating material and dried, and then a copper foil was laminated under pressure and heat, and this was subjected to a boss cure to obtain a flexible copper clad board.

続いて、このフレキシブル銅張板の絶縁材上にA、Bの
二点を刻印し、この間隔A、Bの長さを測定し、これを
10とした。
Subsequently, two points A and B were stamped on the insulating material of this flexible copper clad board, and the lengths of the distances A and B were measured and were set as 10.

更に、常法に従いこのフレキシブル網張板にパターンニ
ングを行い、次にエツチング、水洗乾燥工程を経た後、
パターン化されたフレキシブル基板を得た。このフレキ
シブルプリント基板において上記のA、8間の距離を測
定し、これをlとした。以下の式を用い、寸法変化率を
計算した。
Furthermore, this flexible net cladding board is patterned according to a conventional method, and then after going through an etching, washing and drying process,
A patterned flexible substrate was obtained. In this flexible printed circuit board, the distance between A and 8 above was measured, and this was defined as l. The dimensional change rate was calculated using the following formula.

l。l.

この結果、このフレキシブルプリント基板の寸法変化率
は0.3%であった。
As a result, the dimensional change rate of this flexible printed circuit board was 0.3%.

比較例2 BAPP 120.81 g (0,294モル)とP
MDA64.19g (0,294モル)をDMF81
5g中で重合し、18.5重量%のポリアミド酸溶液を
得た。以下、比較例1と同様の操作により約25μmの
厚みを有するポリイミド絶縁材を得た。
Comparative Example 2 BAPP 120.81 g (0,294 mol) and P
MDA64.19g (0,294 mol) DMF81
Polymerization was carried out in 5 g to obtain a 18.5% by weight polyamic acid solution. Thereafter, a polyimide insulating material having a thickness of about 25 μm was obtained by the same operation as in Comparative Example 1.

この絶縁材の初期弾性率は280 kg/lan”であ
り、吸水率は0,5%であった。
The initial elastic modulus of this insulation material was 280 kg/lan'' and the water absorption rate was 0.5%.

次に、この絶縁材に比較例1と同様の操作を施し、その
寸法変化を求めた結果、0.1%であった。
Next, this insulating material was subjected to the same operation as in Comparative Example 1, and the dimensional change was determined to be 0.1%.

実施例1 比較例1と同様の手順でDMF815gにBAPP71
.72g (0,175モル)、PMDAT6゜21g
(0,35モルL DMB37.08g (0,175
モル)を順に加えて重合し、18.5重量%のポリアミ
ド酸溶液を得た。以下、比較例工と同様の操作により約
25μmの厚みを有するポリイミド絶縁材を得た。この
絶縁材の初期弾性率は660 kg/+u+”であり、
吸水率は1.3%であった。
Example 1 BAPP71 was added to 815 g of DMF in the same manner as in Comparative Example 1.
.. 72g (0,175mol), PMDAT6゜21g
(0,35 mol L DMB37.08g (0,175
mol) were added in order for polymerization to obtain a 18.5% by weight polyamic acid solution. Thereafter, a polyimide insulating material having a thickness of about 25 μm was obtained by the same operation as in the comparative example. The initial elastic modulus of this insulation material is 660 kg/+u+”,
The water absorption rate was 1.3%.

次に、この絶縁材に比較例1と同様の操作を施し、その
寸法変化を求めた結果、0.1%であった。
Next, this insulating material was subjected to the same operation as in Comparative Example 1, and the dimensional change was determined to be 0.1%.

以上の結果を第1表に示す。The above results are shown in Table 1.

第    1    表 〔発明の効果〕 本発明によれば、初期弾性率が高く、且つ吸水率が低い
絶縁材を用いることにより、製造工程中のロスも少なく
、また寸法変化も非常に小さなフレキシブルプリント基
板を提供することができる。
Table 1 [Effects of the Invention] According to the present invention, by using an insulating material that has a high initial elastic modulus and a low water absorption rate, a flexible printed circuit board with little loss during the manufacturing process and very small dimensional change can be produced. can be provided.

Claims (4)

【特許請求の範囲】[Claims] 1.下記一般式(A)および(B)で表される反復単位
を有するポリイミドフィルムに、接着剤を介しまたは介
さずに、金属導体層が積層されたフレキシブルプリント
基板。 (A)▲数式、化学式、表等があります▼ (B)▲数式、化学式、表等があります▼ (Xは水素原子、フッ素原子、Rは水酸基、メチル基、
メトキシ基、塩素原子またはフッ素原子を表す。)
1. A flexible printed circuit board in which a metal conductor layer is laminated with or without an adhesive on a polyimide film having repeating units represented by the following general formulas (A) and (B). (A) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (B) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (X is a hydrogen atom, a fluorine atom, R is a hydroxyl group, a methyl group,
Represents a methoxy group, chlorine atom or fluorine atom. )
2.上記一般式(A)および(B)で表される反復単位
の比(A)/(B)が40/60〜60/40の範囲で
あるポリイミドフィルムを用いた請求項1記載のフレキ
シブルプリント基板。
2. The flexible printed circuit board according to claim 1, which uses a polyimide film in which the ratio (A)/(B) of the repeating units represented by the general formulas (A) and (B) is in the range of 40/60 to 60/40. .
3.下記一般式(A)および(B)で表される反復単位
を有するポリイミドフィルムに、接着剤を介しまたは介
さずに、金属導体層を形成することを特徴とするフレキ
シブルプリント基板の製造方法。 (A)▲数式、化学式、表等があります▼ (B)▲数式、化学式、表等があります▼ (Xは水素原子、フッ素原子、Rは水酸基、メチル基、
メトキシ基、塩素原子またはフッ素原子を表す。)
3. A method for producing a flexible printed circuit board, comprising forming a metal conductor layer on a polyimide film having repeating units represented by the following general formulas (A) and (B), with or without an adhesive. (A) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (B) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (X is a hydrogen atom, a fluorine atom, R is a hydroxyl group, a methyl group,
Represents a methoxy group, chlorine atom or fluorine atom. )
4.上記一般式(A)および(B)で表される反復単位
の比(A)/(B)が40/60〜60/40の範囲で
あるポリイミドフィルムを用いる請求項1記載のフレキ
シブルプリント基板の製造方法。
4. The flexible printed circuit board according to claim 1, wherein a polyimide film having a ratio (A)/(B) of repeating units represented by the above general formulas (A) and (B) is in the range of 40/60 to 60/40. Production method.
JP2339937A 1990-11-30 1990-11-30 Flexible printed-circuit board and its manufacture Pending JPH04207094A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2339937A JPH04207094A (en) 1990-11-30 1990-11-30 Flexible printed-circuit board and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2339937A JPH04207094A (en) 1990-11-30 1990-11-30 Flexible printed-circuit board and its manufacture

Publications (1)

Publication Number Publication Date
JPH04207094A true JPH04207094A (en) 1992-07-29

Family

ID=18332173

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5668247A (en) * 1992-12-16 1997-09-16 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide, polyamide acid, and thermally fusible laminated film for covering conductive wires
WO2001029114A1 (en) * 1999-10-19 2001-04-26 National University Of Singapore A chemical curing process for polyimide formation
EP1184407A1 (en) * 2000-08-24 2002-03-06 DuPont-Toray Co., Ltd. Polyimide film, method of manufacture, and metal interconnect board with polyimide film substrate
JP2007137050A (en) * 2005-10-21 2007-06-07 Mitsubishi Gas Chem Co Inc Metal foil-clad laminate and method of manufacturing the same
JPWO2007132529A1 (en) * 2006-05-17 2009-09-17 株式会社ピーアイ技術研究所 Metal composite film and manufacturing method thereof
US8158268B2 (en) 2005-08-04 2012-04-17 Kaneka Corporation Metal-coated polyimide film
JP4951513B2 (en) * 2005-08-04 2012-06-13 株式会社カネカ Flexible metal-clad laminate
US20120273577A1 (en) * 2011-04-29 2012-11-01 Samsung Techwin Co., Ltd. Rfid tag having enhanced durability
US8338560B2 (en) 2005-04-25 2012-12-25 Kaneka Corporation Polyimide film and use thereof
US8426548B2 (en) 2004-09-24 2013-04-23 Kaneka Corporation Polyimide film and adhesive film and flexible metal-clad laminate both obtained with the same

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5668247A (en) * 1992-12-16 1997-09-16 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide, polyamide acid, and thermally fusible laminated film for covering conductive wires
WO2001029114A1 (en) * 1999-10-19 2001-04-26 National University Of Singapore A chemical curing process for polyimide formation
EP1184407A1 (en) * 2000-08-24 2002-03-06 DuPont-Toray Co., Ltd. Polyimide film, method of manufacture, and metal interconnect board with polyimide film substrate
US6555238B2 (en) 2000-08-24 2003-04-29 Dupont-Toray Co. Ltd. Polyimide film, method of manufacture, and metal interconnect board with polyimide film substrate
US8426548B2 (en) 2004-09-24 2013-04-23 Kaneka Corporation Polyimide film and adhesive film and flexible metal-clad laminate both obtained with the same
US8338560B2 (en) 2005-04-25 2012-12-25 Kaneka Corporation Polyimide film and use thereof
US8158268B2 (en) 2005-08-04 2012-04-17 Kaneka Corporation Metal-coated polyimide film
JP4951513B2 (en) * 2005-08-04 2012-06-13 株式会社カネカ Flexible metal-clad laminate
JP5049784B2 (en) * 2005-08-04 2012-10-17 株式会社カネカ Metal-coated polyimide film
US8293331B2 (en) 2005-08-04 2012-10-23 Kaneka Corporation Metal-coated polyimide film
JP2007137050A (en) * 2005-10-21 2007-06-07 Mitsubishi Gas Chem Co Inc Metal foil-clad laminate and method of manufacturing the same
JPWO2007132529A1 (en) * 2006-05-17 2009-09-17 株式会社ピーアイ技術研究所 Metal composite film and manufacturing method thereof
US8771496B2 (en) 2006-05-17 2014-07-08 Pi R&D Co., Ltd. Process for producing metal composite film
US20120273577A1 (en) * 2011-04-29 2012-11-01 Samsung Techwin Co., Ltd. Rfid tag having enhanced durability
US9189726B2 (en) * 2011-04-29 2015-11-17 Intellectual Discovery Co., Ltd. RFID tag including protection layers and having enhanced durability

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