JP2009235145A - Highly adhesive polyimide film and its manufacturing method - Google Patents

Highly adhesive polyimide film and its manufacturing method Download PDF

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JP2009235145A
JP2009235145A JP2008079581A JP2008079581A JP2009235145A JP 2009235145 A JP2009235145 A JP 2009235145A JP 2008079581 A JP2008079581 A JP 2008079581A JP 2008079581 A JP2008079581 A JP 2008079581A JP 2009235145 A JP2009235145 A JP 2009235145A
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polyimide film
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highly adhesive
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adhesive polyimide
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JP5196344B2 (en
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Moritsugu Suehiro
盛嗣 末廣
Koichi Sawazaki
孔一 沢崎
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Du Pont Toray Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a highly adhesive polyimide film having improved adhesion to a copper foil, without post handling, by means of controlling adhesion of a polyimide film, and to provide its manufacturing method. <P>SOLUTION: The method for manufacturing the highly adhesive polyimide film includes producing a polyimide film by heat treatment of a polyamic acid gelled film cast-coated via casting, wherein the adhesion is controlled by controlling an L value of a color tone and a ratio of oxygene/carbon of a film surface. The highly adhesive polyimide film is formed from p-phenylenediamine, 4,4'-diaminodiphenyl ether, pyromellitic acid dianhydride and 3,3', 4,4'-biphenyltetracarboxylic acid dianhydride, wherein the L value of the color tone is ≥37, and the ratio of oxygene/carbon of the film surface is ≥0.215. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、高接着ポリイミドフィルムおよびその製造における接着性の制御に関するものである。   The present invention relates to a highly adhesive polyimide film and adhesion control in the production thereof.

ポリイミドフィルムのような耐熱性フィルムは、電子部品などのフレキシブルプリント配線基板(FPC)に用いる基材であるTAB(Tape Automated Bonding)、COF(Chip On Flex)の基材絶縁フィルムとして、あるいは半導体装置における支持部材であるLOC用テープなどとして用いられている。
そして、このような用途では、基材となるフィルムの接着性が大きいことが望まれており、特に近年の高密度配線や微細加工といったファインピッチ化に伴って、その要求レベルは益々厳しくなってきている。
A heat-resistant film such as a polyimide film is a base insulating film for TAB (Tape Automated Bonding), COF (Chip On Flex), which is a base material used for flexible printed circuit boards (FPC) such as electronic components, or a semiconductor device. It is used as a tape for LOC, which is a support member.
In such applications, it is desired that the film as a base material has high adhesiveness, and the required level is becoming increasingly severe, especially with the recent fine pitches such as high-density wiring and fine processing. ing.

また、耐熱性フィルムは、磁気記録媒体のベース材料としても用いられており、このような場合においても、フィルムの耐熱性と共に高い接着性が求められている。   Further, the heat resistant film is also used as a base material for a magnetic recording medium. Even in such a case, high adhesiveness is required in addition to the heat resistance of the film.

これまでに、耐熱性フィルムの接着性を向上させる表面改質方法としては、コロナ放電処理する方法(例えば、特許文献1参照)、アルカリ処理する方法(例えば、特許文献2参照)、サンドマット処理する方法(例えば、特許文献3参照)、およびプラズマ放電処理する方法(例えば、特許文献4参照)等の種々の技術が提案されている。   So far, surface modification methods for improving the adhesiveness of heat-resistant films include corona discharge treatment (for example, see Patent Document 1), alkali treatment method (for example, Patent Document 2), sand mat treatment. Various techniques have been proposed, such as a method (for example, see Patent Document 3) and a method for plasma discharge treatment (for example, see Patent Document 4).

現在実施されているこれらの処理は、いずれもソルベントキャスト法による製造工程において形成されたフィルム表面の脆弱層が接着性を阻害するものと考え、その脆弱層の除去を目的とするものと考えられる。   These treatments currently being implemented are considered to have the purpose of removing the fragile layer because the fragile layer on the surface of the film formed in the manufacturing process by the solvent cast method impedes adhesion. .

しかしながら、これらの方法はすべて、製品化されたフィルムにさらに後処理を施すことにより接着性を向上させようとするものである。したがって、後処理前の製品フィルムの接着能力の変動や後処理の安定性、均質性等の点で問題が生じる場合があり、接着能力を改善したフィルムを安定供給することは基本的には困難であった。また、上記製品化されたフィルムに接着性を改善するための処理を行う新たな工程を要し、事実上コストの上昇を招くことが避けられないという問題があった。   However, all of these methods attempt to improve the adhesion by further post-treating the commercialized film. Therefore, problems may arise in terms of fluctuations in the adhesive ability of the product film before post-treatment, stability of post-treatment, homogeneity, etc., and it is basically difficult to stably supply a film with improved adhesive ability. Met. In addition, there is a problem in that a new process for performing the treatment for improving the adhesiveness is required for the commercialized film, and it is inevitable that the cost is increased.

従来技術では、ポリイミドフィルムに十分に満足すべき接着性を安定的に付与することが困難であり、その改良がしきりに望まれていた。
特開平7−330930号公報 特開平8−12779号公報 特開平8−34866号公報 特開2004−51712号公報
In the prior art, it has been difficult to stably impart sufficiently satisfactory adhesion to a polyimide film, and improvements have been continually desired.
JP 7-330930 A Japanese Patent Laid-Open No. 8-12779 JP-A-8-34866 JP 2004-51712 A

そこで、本発明者らは、このような実状に鑑み、強い接着強度を有するフィルムを安定的に供給することを目的として、上述の技術的課題を解決すべく鋭意研究を重ねた結果、製品化後のフィルム表面層への処理による接着性を改善するのではなく、従来は考えられていなかったフィルムフィルム成形工程において、既に優れた接着能力を獲得したフィルムを作り出す方法に想到し、さらにフィルム成形工程において接着性を制御しうることに想到したのである。   Therefore, in view of such a situation, the present inventors have conducted earnest research to solve the above technical problems with the aim of stably supplying a film having strong adhesive strength, and as a result, commercialized. Rather than improving the adhesion by the subsequent treatment to the film surface layer, we came up with a method to create a film that has already acquired excellent adhesive ability in a film film forming process that was not previously considered, and further film forming It was conceived that adhesiveness could be controlled in the process.

上述の課題を解決するために、本発明にかかるポリイミドフィルムの製造方法の要旨とするところは、キャスティングにより流延塗布したポリアミック酸ゲルフィルムを加熱処理することによりポリイミドフィルムを製造する方法において、色調L値、及びフィルム表面の酸素/炭素比を制御することにより、接着性を制御することにある。   In order to solve the above-mentioned problems, the gist of the method for producing a polyimide film according to the present invention is that, in the method for producing a polyimide film by heat-treating a polyamic acid gel film cast by casting, the color tone The adhesiveness is controlled by controlling the L value and the oxygen / carbon ratio of the film surface.

また、本発明にかかるポリイミドフィルムの製造方法の要旨とするところは、キャスティングにより流延塗布したポリアミック酸ゲルフィルムを加熱処理することによりポリイミドフィルムを製造する方法において、色調L値が35以上、及びフィルム表面の酸素/炭素比が0.215以上に調整し、接着性を向上させることを特徴とする高接着性ポリイミドフィルムであり、高接着性ポリイミドフィルムは、パラフェニレンジアミン、4,4’−ジアミノジフェニルエーテル、ピロメリット酸二無水物および3,3’,4,4’−ビフェニルテトラカルボン酸二無水物から形成されたことを特徴とする高接着性ポリイミドフィルムが提供される。なお、本発明の高接着性ポリイミドフィルムにおいては、12〜30モル%のパラフェニレンジアミン、70〜88モル%の4,4’−ジアミノジフェニルエーテル、50〜99.5モル%のピロメリット酸二無水物および0.5〜50モル%の3,3’,4,4’−ビフェニルテトラカルボン酸二無水物から形成されたものであることが好ましい。   Further, the gist of the method for producing a polyimide film according to the present invention is that the color tone L value is 35 or more in a method for producing a polyimide film by heat-treating a polyamic acid gel film cast by casting. It is a highly adhesive polyimide film characterized in that the oxygen / carbon ratio on the film surface is adjusted to 0.215 or more to improve adhesion, and the highly adhesive polyimide film is paraphenylenediamine, 4,4′- Provided is a highly adhesive polyimide film formed from diaminodiphenyl ether, pyromellitic dianhydride and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride. In the highly adhesive polyimide film of the present invention, 12 to 30 mol% paraphenylenediamine, 70 to 88 mol% 4,4'-diaminodiphenyl ether, 50 to 99.5 mol% pyromellitic dianhydride And 0.5 to 50 mol% of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride.

本発明によれば、以下に説明するとおり、製品化されたフィルムにさらに後処理を施すことなく、均質的に低コストで、銅箔との接着性が高いポリイミドフィルムを得ることができる。   According to the present invention, as will be described below, a polyimide film having high adhesion to a copper foil can be obtained uniformly and at low cost without further post-treatment of the commercialized film.

以下、本発明の高接着性ポリイミドフィルムおよびその製造方法についてさらに詳しく説明する。   Hereinafter, the highly adhesive polyimide film of the present invention and the production method thereof will be described in more detail.

まず、本発明の高接着性ポリイミドフィルムを得るに際してその前駆体であるポリアミック酸について説明する。本発明に用いられるポリアミック酸は、例えばジアミン成分としてのパラフェニレンジアミンおよび4,4’−ジアミノジフェニルエーテルと、酸成分としてのピロメリット酸二無水物および3,3’,4,4’−ビフェニルテトラカルボン酸二無水物を重合させることで得られるものである。パラフェニレンジアミンおよび4,4’−ジアミノジフェニルエーテルは、有機溶媒に溶解させて用いるのが好ましい。ピロメリット酸二無水物および3,3’,4,4’−ビフェニルテトラカルボン酸二無水物並びにパラフェニレンジアミン、4,4’−ジアミノジフェニルエーテルを重合してポリアミック酸を得る方法は、各種公知の方法で行ってもよく、例えば予め所定量のパラフェニレンジアミン、4,4’−ジアミノジフェニルエーテルと3,3’,4,4’−ビフェニルテトラカルボン酸二無水物を有機溶媒に溶解させておき、それにピロメリット酸二無水物を添加し、所定の粘度を有するポリアミック酸を得る方法が挙げられる。   First, the polyamic acid that is a precursor for obtaining the highly adhesive polyimide film of the present invention will be described. The polyamic acid used in the present invention includes, for example, paraphenylenediamine and 4,4′-diaminodiphenyl ether as a diamine component, pyromellitic dianhydride and 3,3 ′, 4,4′-biphenyltetra as an acid component. It is obtained by polymerizing carboxylic dianhydride. Paraphenylenediamine and 4,4'-diaminodiphenyl ether are preferably used after being dissolved in an organic solvent. There are various known methods for obtaining polyamic acid by polymerizing pyromellitic dianhydride and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, paraphenylenediamine, and 4,4′-diaminodiphenyl ether. For example, a predetermined amount of paraphenylenediamine, 4,4′-diaminodiphenyl ether and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride are dissolved in an organic solvent in advance, An example is a method in which pyromellitic dianhydride is added thereto to obtain a polyamic acid having a predetermined viscosity.

次に、得られたポリアミック酸溶液からポリイミドフィルムを得る方法を説明する。   Next, a method for obtaining a polyimide film from the obtained polyamic acid solution will be described.

まず、開環触媒および脱水剤を用いて脱水する化学閉環法または加熱処理によって脱水する熱閉環法によりポリアミック酸を環化させることにより、共重合ポリイミドのゲルフィルムを得ることが好ましく行われる。そして、得られたゲルフィルムの端部を固定し、縦方向に1.05〜1.5の倍率、横方向に1.05〜2.0の倍率で2軸延伸して共重合ポリイミドフィルムを得ることができる。かかる2軸延伸を行うことにより、得られるポリイミドフィルムの機械的特性を向上させることができる。化学閉環法または熱閉環法のいずれの方法で行っても良いが、得られるポリイミドフィルムの弾性率を向上させることができること、熱膨張係数を低下せせることができることなどの利点を有する化学閉環法が好ましく採用される。   First, it is preferable to obtain a copolyimide gel film by cyclizing the polyamic acid by a chemical ring closure method using a ring-opening catalyst and a dehydrating agent or a thermal ring closure method in which dehydration is performed by heat treatment. And the edge part of the obtained gel film was fixed, biaxially stretched by the magnification of 1.05-1.5 in the vertical direction, and the magnification of 1.05-2.0 in the horizontal direction, and the copolymerization polyimide film was obtained. Obtainable. By performing such biaxial stretching, the mechanical properties of the resulting polyimide film can be improved. Although it may be carried out by either the chemical ring closure method or the thermal ring closure method, there is a chemical ring closure method having advantages such as an improvement in the elastic modulus of the resulting polyimide film and a reduction in the thermal expansion coefficient. Preferably employed.

化学閉環法で使用される脱水剤としては、無水酢酸などの脂肪族酸無水物,N−ジアルキルカルボジイミド類、低級脂肪酸ハロゲン化物、アリルホスホン酸次ハロゲン化物、安息香酸無水物、フタル酸無水物などの芳香族酸無水物およびケテンなどが好ましい。   Dehydrating agents used in the chemical ring closure method include aliphatic acid anhydrides such as acetic anhydride, N-dialkylcarbodiimides, lower fatty acid halides, allylphosphonic acid subhalides, benzoic acid anhydrides, phthalic acid anhydrides, etc. Aromatic acid anhydrides and ketene are preferred.

また、使用される環化触媒としては、3,4’−Nルチジン、3,5−ルチジン、4−メチルピリジン、4−イソプロピルピリジン、4−ベンジルピリジンなどのピリジン類、N−ジメチルベンジルアミン、4−ジメチルベンジルアミン、4−ジメチルドデシルアミン、β−ピコリンなどのピコリン類、トリエチルアミン、N−ジメチルアニリン、キノリンおよびイソキノリンなどが好ましく、これらを単独または混合して使用するのが好ましい。   Examples of the cyclization catalyst used include pyridines such as 3,4′-N lutidine, 3,5-lutidine, 4-methylpyridine, 4-isopropylpyridine, 4-benzylpyridine, N-dimethylbenzylamine, Preferred are picolines such as 4-dimethylbenzylamine, 4-dimethyldodecylamine and β-picoline, triethylamine, N-dimethylaniline, quinoline and isoquinoline, and these are preferably used alone or in combination.

化学閉環法を行うに際しては、ポリアミック酸溶液中に環化触媒、脱水剤を混合させイミド化した後に、この溶液をコ−ティングして共重合ポリイミドフィルムを得る方法、およびポリアミック酸溶液をコ−ティングして薄膜化させた後、これを環化触媒、脱水剤の混合中に浸積してイミド化させることによってポリイミドフィルムを得る方法などを採用し得る。   In carrying out the chemical ring closure method, a polyamic acid solution is mixed with a cyclization catalyst and a dehydrating agent and imidized, and then this solution is coated to obtain a copolymerized polyimide film, and the polyamic acid solution is coated. For example, a method of obtaining a polyimide film by immersing it in a mixture of a cyclization catalyst and a dehydrating agent and imidizing it after forming a thin film by coating can be employed.

なお、得られるポリイミドフィルムの機械的性質などを改善させるために、種々の添加剤と触媒をポリアミック酸に添加することができるが
本発明においては、ポリイミドフィルムの表面を粗化させてフィルムに滑り性を付与し工程安定性を向上させる観点から、無機粒子をポリアミック酸に混合することが好ましい。
In order to improve the mechanical properties of the resulting polyimide film, various additives and catalysts can be added to the polyamic acid. In the present invention, the surface of the polyimide film is roughened and slipped on the film. From the viewpoint of imparting properties and improving process stability, it is preferable to mix inorganic particles with polyamic acid.

本発明のポリイミドフィルムを構成するポリイミドは、ブロックポリマ−、ランダムポリマ−および混合ポリマ−のいずれであってもよい。   The polyimide constituting the polyimide film of the present invention may be any of a block polymer, a random polymer, and a mixed polymer.

ポリアミック酸溶液は粘性が高いことから、通常、キャスティングドラムあるいはエンドレスベルトの上にポリアミック酸溶液をフィルム状に押し出し、あるいは流延塗布し、前記キャスティングドラムまたはエンドレスベルトの上にポリアミック酸を少なくとも自己支持を備える程度に硬化させた後、必要に応じて熱処理などを施し、安定なポリイミドフィルムとすることも好ましく行われる。   Since the polyamic acid solution is highly viscous, the polyamic acid solution is usually extruded onto a casting drum or an endless belt in the form of a film or cast, and at least the polyamic acid is self-supported on the casting drum or the endless belt. It is also preferably performed to make a stable polyimide film by performing heat treatment or the like as necessary after curing to the extent that it is provided.

本発明の高接着性ポリイミドフィルムは、12〜30モル%のパラフェニレンジアミン、70〜88モル%の4,4’−ジアミノジフェニルエーテル、50〜99.5モル%のピロメリット酸二無水物および0.5〜50モル%の3,3’,4,4’−ビフェニルテトラカルボン酸二無水物から形成されることが望ましい。   The highly adhesive polyimide film of the present invention comprises 12-30 mol% paraphenylenediamine, 70-88 mol% 4,4'-diaminodiphenyl ether, 50-99.5 mol% pyromellitic dianhydride and 0 Desirably formed from 5 to 50 mole percent 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride.

さらに好ましい組成は、ジアミン成分としてパラフェニレンジアミン12モル%と4,4’−ジアミノジフェニルエーテル88モル%、酸性分としてピロメリット酸二無水物80モル%と3,3’,4,4’−ビフェニルテトラカルボン酸二無水物20モル%から形成されるポリイミドフィルムである。   Further preferred compositions are 12 mol% paraphenylenediamine and 88 mol% 4,4'-diaminodiphenyl ether as the diamine component, and 80 mol% pyromellitic dianhydride and 3,3 ', 4,4'-biphenyl as the acidic component. It is a polyimide film formed from 20 mol% of tetracarboxylic dianhydride.

上記の組成からなる本発明の高接着性ポリイミドフィルムは、色調L値が37以上、かつフィルム表面酸素/炭素比が0.215以上であることを特徴とする。   The highly adhesive polyimide film of the present invention having the above composition has a color tone L value of 37 or more and a film surface oxygen / carbon ratio of 0.215 or more.

ここで、ポリイミドフィルムの色調L値、及びフィルム表面酸素/炭素比が上記の条件を外れる場合、すなわち色調L値36未満の場合、フィルム表面酸素/炭素比が0.214未満の場合は、いずれも接着性改良効果が不十分となるため好ましくない。色調L値、およびフィルム表面酸素/炭素比の2条件が上記の範囲を満たすことにより、銅箔との接着性が高く、接着性に優れたポリイミドフィルムを得ることができるのである。   Here, when the color tone L value of the polyimide film and the film surface oxygen / carbon ratio are outside the above conditions, that is, when the color tone L value is less than 36, the film surface oxygen / carbon ratio is less than 0.214, However, it is not preferable because the effect of improving adhesiveness is insufficient. When the two conditions of the color tone L value and the film surface oxygen / carbon ratio satisfy the above range, a polyimide film having high adhesion to the copper foil and excellent adhesion can be obtained.

色調L値は、フィルム熱処理温度にて制御することができ、色調L値37以上に維持するためには、フィルム加熱処理温度が450℃以下であることが望ましい。また、フィルム表面酸素/炭素比はフィルム乾燥温度にて制御することができ、O/C比を0.215以上に維持するためにはフィルム乾燥温度が260℃以下であることが望ましい。   The color tone L value can be controlled by the film heat treatment temperature. In order to maintain the color tone L value at 37 or more, the film heat treatment temperature is desirably 450 ° C. or lower. The film surface oxygen / carbon ratio can be controlled by the film drying temperature, and the film drying temperature is preferably 260 ° C. or lower in order to maintain the O / C ratio at 0.215 or higher.

色調L値とフィルム表面O/C比はいずれもフィルム成形工程で制御することができるため、プラズマ処理等の後処理の不安定性、不均質性の問題の発生がなく、低コストで接着性を改良することができる。   Since both the color tone L value and the film surface O / C ratio can be controlled in the film forming process, there is no problem of instability or inhomogeneity of post-treatment such as plasma treatment, and low cost adhesiveness. It can be improved.

ここでフィルムとは、厚み数μm〜数mmの平板な形状の樹脂を指す。本発明のポリイミドフィルムの厚みは、通常3〜300μmであり、好ましくは5〜125μm、より好ましくは7.5〜75μm、さらに好ましくは7.5〜50μmである。   Here, the film refers to a flat resin having a thickness of several μm to several mm. The thickness of the polyimide film of the present invention is usually 3 to 300 μm, preferably 5 to 125 μm, more preferably 7.5 to 75 μm, and further preferably 7.5 to 50 μm.

かくして得られる本発明の高接着性ポリイミドフィルムは、銅箔との接着性が高く、この特性を活かして、電子部品などのフレキシブルプリント配線基板(FPC)に用いる基材であるTAB(Tape Automated Bonding)、COF(Chip On Flex)の基材絶縁フィルムとして、あるいは半導体装置における支持部材であるLOC用テープなどとして有用に利用することができる。   The highly adhesive polyimide film of the present invention thus obtained has high adhesiveness to copper foil, and by utilizing this characteristic, TAB (Tape Automated Bonding) is a base material used for flexible printed circuit boards (FPC) such as electronic components. ), A COF (Chip On Flex) base insulating film, or a LOC tape that is a supporting member in a semiconductor device.

以下、実施例により本発明を具体的に説明する。   Hereinafter, the present invention will be described specifically by way of examples.

なお、実施例中のPPDはパラフェニレンジアミンを、ODAは4,4’−ジアミノジフェニルエーテルを、PMDAはピロメリット酸二無水物を、BPDAは3,3’,4,4’−ビフェニルテトラカルボン酸二無水物を、DMACはN,N−ジメチルアセトアミドを、それぞれ表す。   In the examples, PPD is paraphenylenediamine, ODA is 4,4′-diaminodiphenyl ether, PMDA is pyromellitic dianhydride, and BPDA is 3,3 ′, 4,4′-biphenyltetracarboxylic acid. The dianhydride and DMAC represent N, N-dimethylacetamide, respectively.

また、実施例中のポリイミドフィルムの各特性は、次の方法で評価した。   Moreover, each characteristic of the polyimide film in an Example was evaluated with the following method.

(1)色調L値
スガ試験機株式会社製SMカラーコンピューターにてフィルム2枚重ねにて評価した。
(1) Color tone L value Evaluation was made by superposing two films on an SM color computer manufactured by Suga Test Instruments Co., Ltd.

(2)フィルム表面酸素/炭素比
米国SSI社製SSX―100を用いX線光電子分光法にてフィルム表面酸素/炭素比を求めた。
(2) Film surface oxygen / carbon ratio The film surface oxygen / carbon ratio was determined by X-ray photoelectron spectroscopy using SSX-100 manufactured by SSI, USA.

(3)各フィルムの接着力評価
デュポン社製アクリル系接着剤(商品名パイララックスLF0100)を用いてフィルムと銅箔(日鉱金属(株)製圧延銅箔“BHY−13B−T”35μmとをラミネートし、160℃30分で接着剤の硬化反応を行い、銅貼り品幅が10mmとなるようサンプルを切り出し、引張試験器(オリエンテック社製“RTM−250”)により90度剥離の引張試験を行った。n=5の平均値による測定結果を表に示した。
(3) Adhesive strength evaluation of each film A film and a copper foil (rolled copper foil “BHY-13B-T” 35 μm manufactured by Nikko Metal Co., Ltd.) using a DuPont acrylic adhesive (trade name: PILARAX LF0100) Laminate, cure the adhesive at 160 ° C. for 30 minutes, cut out the sample so that the width of the copper-attached product is 10 mm, and perform a tensile test with 90-degree peeling using a tensile tester (Orientec “RTM-250”) The measurement results based on the average value of n = 5 are shown in the table.

接着強度は、20N/cm以上の値が得られれば良好な接着性を示す。   Adhesive strength shows good adhesiveness if a value of 20 N / cm or more is obtained.

<実施例1〜3>
ジメチルアセトアミド(DMAC)にパラフェニレンジアミン(PPD)14モル%とピロメリット酸二無水物(PMDA)の一部14.5モル%を投入し、常温常圧中窒素雰囲気下で1時間反応させた。次に、ここに4,4’−ジアミノジフェニルエーテル(ODA)86モル%を投入し均一になるまで撹拌した後、3,3’、4,4’−ビフェニルテトラカルボン酸二無水物(BPDA)20モル%を添加し、1時間撹拌反応させた。
続いてここに残りのPMDA65.5モル%を添加しさらに1時間反応させ3500ポイズのポリアミック酸溶液を得た。固形分濃度は、最終的に20.3重量%になるようにDMACを添加した。得られたポリアミック酸に無水酢酸、β−ピコリンを添加混合した後、キャスティングドラム上にキャストし高温で数秒乾燥して得られる自己支持性のフィルムを引き離し、端部を固定した後、テンタ−炉にて段階的に乾燥、熱処理して、厚さ38μm、色調L値が37.4〜40、フィルム表面酸素/炭素比0.219〜0.224の範囲の3水準のポリイミドフィルムを得た。得られたフィルムの接着強度測定結果を表1に示す。
<Examples 1-3>
Dimethylacetamide (DMAC) was charged with 14 mol% of paraphenylenediamine (PPD) and 14.5 mol% of pyromellitic dianhydride (PMDA) and allowed to react for 1 hour in a nitrogen atmosphere at room temperature and pressure. . Next, 86 mol% of 4,4′-diaminodiphenyl ether (ODA) was added thereto and stirred until uniform, and then 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (BPDA) 20 Mol% was added and the reaction was allowed to stir for 1 hour.
Subsequently, 65.5 mol% of the remaining PMDA was added thereto, and the mixture was further reacted for 1 hour to obtain a 3500 poise polyamic acid solution. DMAC was added so that the solid concentration finally reached 20.3% by weight. After adding acetic anhydride and β-picoline to the resulting polyamic acid and mixing, the film is cast on a casting drum and dried at high temperature for several seconds. Were dried and heat-treated in steps to obtain a three-level polyimide film having a thickness of 38 μm, a color tone L value of 37.4 to 40, and a film surface oxygen / carbon ratio of 0.219 to 0.224. Table 1 shows the adhesive strength measurement results of the obtained film.

<比較例1〜5>
DMACにPPD14モル%とPMDAの一部14.5モル%を投入し、常温常圧中窒素雰囲気下で1時間反応させた。次に、ここにODA86モル%を投入し均一になるまで撹拌した後、BPDA20モル%を添加し、1時間撹拌反応させた。
<Comparative Examples 1-5>
14 mol% of PPD and a part of 14.5 mol% of PMDA were added to DMAC, and reacted for 1 hour in a nitrogen atmosphere at room temperature and pressure. Next, 86 mol% of ODA was added thereto and stirred until uniform, and then 20 mol% of BPDA was added and allowed to react for 1 hour with stirring.

続いてここに残りのPMDA65.5モル%を添加しさらに1時間反応させ3500ポイズのポリアミック酸溶液を得た。固形分濃度は、最終的に20.3重量%になるようにDMACを添加した。得られたポリアミック酸に無水酢酸、β−ピコリンを添加混合した後、キャスティングドラム上にキャストし高温で数秒乾燥して得られる自己支持性のフィルムを引き離し、端部を固定した後、テンタ−炉にて段階的に乾燥、熱処理して、厚さ38μm、色調L値が31〜36、フィルム表面酸素/炭素比0.196〜0.219の範囲の5水準のポリイミドフィルムを得た。得られたフィルムの接着強度測定結果を表1に示す。   Subsequently, 65.5 mol% of the remaining PMDA was added thereto, and the mixture was further reacted for 1 hour to obtain a 3500 poise polyamic acid solution. DMAC was added so that the solid content concentration was finally 20.3% by weight. After adding acetic anhydride and β-picoline to the resulting polyamic acid and mixing, the film is cast on a casting drum and dried at high temperature for several seconds, the self-supporting film is pulled off, the ends are fixed, and a tenter furnace Were dried and heat-treated in steps to obtain a 5-level polyimide film having a thickness of 38 μm, a color tone L value of 31 to 36, and a film surface oxygen / carbon ratio of 0.196 to 0.219. Table 1 shows the adhesive strength measurement results of the obtained film.

<比較例6>
実施例1〜3と同組成のフィルムを用い、高接着処理を施すため、希ガスが20モル%以上含有される760torr(常圧)の雰囲気下で、表面が誘電体によって被覆され、かつ50℃に冷却された電極と、これに対向してもうけられた表面が誘電体によって被覆された電極を用いて処理電力密度500W・min/mの条件でプラズマ処理を行った。結果を表1に示した。
<Comparative Example 6>
Since a film having the same composition as in Examples 1 to 3 was used and a high adhesion treatment was performed, the surface was covered with a dielectric under an atmosphere of 760 torr (normal pressure) containing 20 mol% or more of a rare gas, and 50 Plasma treatment was performed under the condition of a treatment power density of 500 W · min / m 2 using an electrode cooled to 0 ° C. and an electrode having a surface opposite to the electrode covered with a dielectric. The results are shown in Table 1.

Figure 2009235145
Figure 2009235145

表1の結果から、色調L値37以上、かつフィルム表面酸素/炭素比0.215以上のフィルム(実施例1〜3)は、プラズマ処理を施したフィルム(比較例6)と同等の接着強度を示し、後処理を施すことなく接着性に優れるものであることがわかる。   From the results shown in Table 1, the films having the color tone L value of 37 or more and the film surface oxygen / carbon ratio of 0.215 or more (Examples 1 to 3) have the same adhesive strength as the plasma-treated film (Comparative Example 6). It can be seen that it has excellent adhesion without post-treatment.

本発明の高接着性ポリイミドフィルムは、後処理を施すことなく、均質的に低コストで銅箔との接着性が高いポリイミドフィルムが得られ、電子部品などのフレキシブルプリント配線基板(FPC)に用いる基材であるTAB(Tape Automated Bonding)、COF(Chip On Flex)の基材絶縁フィルムとして、あるいは半導体装置における支持部材であるLOC用テープなどとして有用に利用することができる。   The highly adhesive polyimide film of the present invention can be used for a flexible printed circuit board (FPC) such as an electronic component, which can be obtained at a uniform low cost and with a high adhesion to a copper foil without post-treatment. It can be usefully used as a base insulating film of TAB (Tape Automated Bonding) or COF (Chip On Flex) as a base material, or as a LOC tape as a support member in a semiconductor device.

Claims (5)

キャスティングにより流延塗布したポリアミック酸ゲルフィルムを加熱処理することによりポリイミドフィルムを製造する方法において、色調L値、およびフィルム表面の酸素/炭素比を制御することにより、接着性を制御することを特徴とする高接着性ポリイミドフィルムの製造方法。 In the method for producing a polyimide film by heat-treating a polyamic acid gel film cast by casting, the adhesiveness is controlled by controlling the color tone L value and the oxygen / carbon ratio of the film surface. A method for producing a highly adhesive polyimide film. キャスティングにより流延塗布したポリアミック酸ゲルフィルムを加熱処理することによりポリイミドフィルムを製造する方法において、色調L値が37以上、かつフィルム表面の酸素/炭素比が0.215以上に調整し、接着性を向上させることを特徴とする高接着性ポリイミドフィルムの製造方法。 In a method for producing a polyimide film by heat-treating a polyamic acid gel film cast by casting, the color tone L value is adjusted to 37 or more, and the oxygen / carbon ratio of the film surface is adjusted to 0.215 or more, and adhesion The manufacturing method of the highly adhesive polyimide film characterized by improving this. 流延塗布したポリアミック酸ゲルフィルムを260℃以下の温度で乾燥し、その後450℃以下の温度で加熱処理することを特徴とする請求項2に記載の高接着性ポリイミドフィルムの製造方法。 3. The method for producing a highly adhesive polyimide film according to claim 2, wherein the cast polyamic acid gel film is dried at a temperature of 260 [deg.] C. or less and then heat-treated at a temperature of 450 [deg.] C. or less. 請求項1〜2いずれかに記載の方法で製造された高接着性ポリイミドフィルムがパラフェニレンジアミン、4,4’−ジアミノジフェニルエーテル、ピロメリット酸二無水物および3,3’,4,4’−ビフェニルテトラカルボン酸二無水物から形成されたことを特徴とする高接着性ポリイミドフィルム。 A highly adhesive polyimide film produced by the method according to claim 1 is paraphenylenediamine, 4,4'-diaminodiphenyl ether, pyromellitic dianhydride and 3,3 ', 4,4'- A highly adhesive polyimide film formed from biphenyltetracarboxylic dianhydride. 前記ポリイミドフィルムが、12〜30モル%のパラフェニレンジアミン、70〜88モル%の4,4’−ジアミノジフェニルエーテル、50〜99.5モル%のピロメリット酸二無水物および0.5〜50モル%の3,3’,4,4’−ビフェニルテトラカルボン酸二無水物から形成されたものであることを特徴とする請求項4記載の高接着性ポリイミドフィルム。 The polyimide film comprises 12-30 mol% paraphenylenediamine, 70-88 mol% 4,4'-diaminodiphenyl ether, 50-99.5 mol% pyromellitic dianhydride and 0.5-50 mol. 5. The high adhesive polyimide film according to claim 4, wherein the highly adhesive polyimide film is formed from 1% of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride.
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JPH0555716A (en) * 1991-08-27 1993-03-05 Toray Ind Inc Manufacture of flexible wiring board
JPH08134234A (en) * 1994-09-16 1996-05-28 Ube Ind Ltd Modified polyimide film and laminate
JP2003335874A (en) * 2002-05-17 2003-11-28 Du Pont Toray Co Ltd Polyimide film
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JPH04266082A (en) * 1991-02-20 1992-09-22 Toray Ind Inc Manufacture of flexible wiring substrate
JPH0555716A (en) * 1991-08-27 1993-03-05 Toray Ind Inc Manufacture of flexible wiring board
JPH08134234A (en) * 1994-09-16 1996-05-28 Ube Ind Ltd Modified polyimide film and laminate
JP2004027213A (en) * 2002-05-02 2004-01-29 Du Pont Toray Co Ltd Polyimide film, method for producing the same and metallic wiring board using the same as base
JP2003335874A (en) * 2002-05-17 2003-11-28 Du Pont Toray Co Ltd Polyimide film

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016186031A (en) * 2015-03-27 2016-10-27 東レ・デュポン株式会社 Polyimide film

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