JP3528236B2 - Roughened polyimide film and method for producing the same - Google Patents

Roughened polyimide film and method for producing the same

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Publication number
JP3528236B2
JP3528236B2 JP10967694A JP10967694A JP3528236B2 JP 3528236 B2 JP3528236 B2 JP 3528236B2 JP 10967694 A JP10967694 A JP 10967694A JP 10967694 A JP10967694 A JP 10967694A JP 3528236 B2 JP3528236 B2 JP 3528236B2
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JP
Japan
Prior art keywords
polyimide
bis
film
formula
organic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP10967694A
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Japanese (ja)
Other versions
JPH07316290A (en
Inventor
昌二 前川
国彦 高井
庸介 佐藤
静男 寺澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Japan Chemical Co Ltd
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New Japan Chemical Co Ltd
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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、機械的強度及び耐熱性
を保持したまま、優れた易滑性、接着性を有する均一に
表面が粗面化されたポリイミドフィルム及びその製造方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a uniformly roughened polyimide film having excellent slipperiness and adhesiveness while maintaining mechanical strength and heat resistance, and a method for producing the same.

【0002】[0002]

【従来の技術】ポリイミドフィルムは、耐熱性、耐摩耗
性、耐薬品性、電気特性、機械特性、等優れた諸特性を
有していることが知られており、電気絶縁フィルム、保
護フィルム、断熱フィルム、フレキシブルプリント配線
板のベースフィルム等に広く使用されている。
2. Description of the Related Art Polyimide films are known to have various excellent properties such as heat resistance, abrasion resistance, chemical resistance, electrical properties and mechanical properties. Widely used for heat insulating films, base films for flexible printed wiring boards, etc.

【0003】通常、これらのポリイミドフィルムは、ポ
リイミド前駆体であるポリアミド酸溶液を支持体(金
属、ガラス、プラスチック等)上に流延し、空気或いは
不活性ガス雰囲気中又は減圧下において加熱処理を施
し、脱水、脱溶剤することにより製造される。
Usually, these polyimide films are heat-treated by casting a polyamic acid solution, which is a polyimide precursor, on a support (metal, glass, plastic, etc.) and in air or an inert gas atmosphere or under reduced pressure. It is produced by subjecting it to dehydration and solvent removal.

【0004】しかし、この方法で得られるフィルムは表
面が極めて平滑で、上記用途に用いられる際の重要な実
用特性のひとつである易滑性に著しく劣り、そのため巻
取り、巻出し等の様々なフィルム製造・加工工程におい
て、金属とフィルム間、フィルム同士の密着等により、
フィルムに表面欠陥が発生する等大きな問題があった。
However, the film obtained by this method has an extremely smooth surface and is extremely inferior in slipperiness, which is one of the important practical properties when it is used in the above-mentioned applications, and therefore, it can be used in various winding and unwinding processes. In the film manufacturing and processing process, due to the adhesion between the metal and the film, the adhesion of the films, etc.
There were major problems such as surface defects on the film.

【0005】従来、フィルムの易滑性を改良する方法と
して、フィルム表面を粗面化する方法が知られており、
この方法だと接着剤を介してのプラスチック、銅箔等の
金属との接着性の向上にもつながる。
Conventionally, as a method of improving the slipperiness of a film, a method of roughening the film surface has been known,
This method also leads to an improvement in the adhesiveness with a metal such as plastic or copper foil via an adhesive.

【0006】かかるフィルム表面の粗面化方法のひとつ
として、原料溶液に無機微粒子を添加する方法がある
(特開昭61−246919号、特開昭62−6885
3号)。この方法により確かに易滑性は改良されるが、
無機微粒子の沈降、凝集等により、均一な凹凸をつける
ことが困難であった。
As one of the methods for roughening the surface of the film, there is a method of adding inorganic fine particles to the raw material solution (Japanese Patent Laid-Open No. 61-246919 and Japanese Patent Laid-Open No. 62-6885).
No. 3). This method certainly improves slipperiness,
It was difficult to make uniform unevenness due to sedimentation and aggregation of the inorganic fine particles.

【0007】又、ポリイミドフィルムの表面をプラズマ
処理する方法(特開平4−345630号)の他、サン
ドプラスト処理、コロナ処理等も知られているが、これ
らの方法ではフィルム製造後、新たに一工程を設ける必
要があり経済的な観点から有利とは言えない。
Besides the method of plasma-treating the surface of the polyimide film (Japanese Patent Laid-Open No. 4-345630), sand plast treatment, corona treatment and the like are also known. In these methods, a new method is used after the film is produced. Since it is necessary to provide a process, it cannot be said to be advantageous from an economical viewpoint.

【0008】[0008]

【発明が解決しようとする課題】本発明は、より簡便に
ポリイミドフィルムの表面を粗面化する新規有用な方法
を提案し、易滑性、接着性の優れた粗面化ポリイミドフ
ィルムを提供することを目的とする。
DISCLOSURE OF THE INVENTION The present invention proposes a novel and useful method for roughening the surface of a polyimide film more simply, and provides a roughened polyimide film excellent in slipperiness and adhesiveness. The purpose is to

【0009】[0009]

【課題を解決するための手段】本発明者らは、かかる課
題を達成し得る表面粗面化ポリイミドフィルムを提案す
べく鋭意検討した結果、ポリイミド溶液とポリイミド前
駆体であるポリアミド酸溶液とを混合攪拌して得られた
エマルション化物から調製される焼き付けフィルムが均
一に粗面化された表面を有し、かかる粗面化されたフィ
ルムが優れた易滑性及び接着性を有していることを見い
だし、かかる知見に基づいて本発明を完成するに至っ
た。
Means for Solving the Problems As a result of intensive investigations by the present inventors to propose a surface-roughened polyimide film that can achieve such a problem, a polyimide solution and a polyamic acid solution as a polyimide precursor are mixed. A baked film prepared from an emulsion obtained by stirring has a uniformly roughened surface, and the roughened film has excellent slipperiness and adhesiveness. The present invention has been completed and the present invention has been completed based on such findings.

【0010】即ち、本発明に係る粗面化ポリイミドフィ
ルムの製造方法は、有機溶剤可溶性の芳香族ポリイミ
ド、ポリアミド酸及び有機溶剤とを含有してなる混合物
を流延し、次いで脱水及び脱溶剤することを特徴とす
る。
That is, in the method for producing a roughened polyimide film according to the present invention, a mixture containing an organic solvent-soluble aromatic polyimide, a polyamic acid and an organic solvent is cast, followed by dehydration and solvent removal. It is characterized by

【0011】かかる方法によりポリイミドフィルム表面
が粗面される事実は、製膜するに際し、脱溶剤のみを伴
うポリイミド成分と脱溶剤に加えて脱水を伴うポリアミ
ド酸成分との製膜プロセス(水の発生温度、溶剤及び水
の揮発速度等)の差に起因するものと推察される。
The fact that the surface of the polyimide film is roughened by such a method is due to the fact that, during the film formation, the film formation process of the polyimide component accompanied only by desolvation and the polyamic acid component accompanied by dehydration (generation of water) It is assumed that this is due to differences in temperature, solvent and water volatilization rate).

【0012】有機溶剤可溶性の芳香族ポリイミドとして
は、有機溶剤可溶性の芳香族ポリイミドが一般式(1)
で表される繰り返し単位を有する芳香族ポリイミドが例
示される。
As the organic solvent-soluble aromatic polyimide, an organic solvent-soluble aromatic polyimide is represented by the general formula (1):
An aromatic polyimide having a repeating unit represented by

【0013】 [式中、Aは単結合、−SO2−、−CO−、−O−、
又は−C(−CF3)(−CF3)−を表わす。Zは、−
S−、式aで表される基、式bで表される基又は一般式
cで表される基を表す。mは正数を表す。]
[0013] [In the formula, A is a single bond, —SO 2 —, —CO—, —O—,
Or -C (-CF 3) (- CF 3) - represents a. Z is −
S- represents a group represented by the formula a, a group represented by the formula b, or a group represented by the general formula c. m represents a positive number. ]

【0014】 [0014]

【0015】 [0015]

【0016】 [式中、Xは−O−、−S−又は−C(−R1)(−
2)−を表し、Yは単結合、−O−、−S−、−C
(−R1)(−R2)−又は−CO−から選ばれる二価の
基を表す。R1、R2は同一又は異なって、水素原子、ハ
ロゲン原子又はハロゲン原子で置換されていてもよい炭
素数1〜5のアルキル基を表す]
[0016] [In the formula, X is -O-, -S- or -C (-R 1 ) (-
R 2) -, Y represents a single bond, -O -, - S -, - C
It represents a divalent group selected from (-R 1 ) (-R 2 )-or -CO-. R 1 and R 2 are the same or different and each represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 5 carbon atoms which may be substituted with a halogen atom.

【0017】より具体的には、3,3’,4,4’−ジ
フェニルスルホンテトラカルボン酸二無水物(DSD
A)を酸成分として調製されるポリイミド(例えば、特
開昭64−121号、特開平3−160025号)、
3,3’,4,4’−ベンゾフェノンテトラカルボン酸
二無水物(BTDA)を酸成分として調製されるポリイ
ミド(例えば、特公昭47−26878号、特開昭61
−19634号)、3,3’,4,4’−ビフェニルテ
トラカルボン酸二無水物(BPDA)を酸成分として調
製されるポリイミド(例えば、特開昭50−11359
7号、特開昭60−40131号)、ビス(3,4−ジ
カルボキシフェニル)エ−テル二無水物(ODPA)を
酸成分として調製されるポリイミド、2,2−ビス
(3,4−ジカルボキシフェニル)ヘキサフロロプロパ
ン二無水物(6FDA)を酸成分として調製されるポリ
イミド(例えば、特開平3−126779号、J.Appl.P
olym.Sci.,43,1-10 (1991))、p,p’−ジアミノ化合
物を適用してなるポリイミド(例えば、特開昭61−2
8526号、特開昭61−123634号)等、各種の
ポリイミドが例示される。
More specifically, 3,3 ', 4,4'-diphenylsulfone tetracarboxylic dianhydride (DSD)
A) polyimide prepared using A) as an acid component (for example, JP-A-64-121 and JP-A-3-160025),
A polyimide prepared using 3,3 ′, 4,4′-benzophenone tetracarboxylic acid dianhydride (BTDA) as an acid component (for example, JP-B-47-26878 and JP-A-61-61).
No. 19634) and 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (BPDA) as an acid component (for example, JP-A-50-11359).
7, JP-A-60-40131), a polyimide prepared using bis (3,4-dicarboxyphenyl) ether dianhydride (ODPA) as an acid component, 2,2-bis (3,4-). A polyimide prepared by using dicarboxyphenyl) hexafluoropropane dianhydride (6FDA) as an acid component (for example, JP-A-3-126779, J. Appl. P.
olym.Sci., 43 , 1-10 (1991)), and a polyimide prepared by applying a p, p'-diamino compound (see, for example, JP-A-61-2).
Examples include various polyimides such as 8526 and JP-A-61-2123634.

【0018】上記の有機溶剤可溶性のポリイミドを得る
ための酸成分及びジアミン成分の具体例は、以下のとお
りである。かかる酸成分及びジアミン成分は、夫々単独
で又は2種以上を適宜組み合わせて用いられる。
Specific examples of the acid component and the diamine component for obtaining the above organic solvent-soluble polyimide are as follows. The acid component and the diamine component may be used either individually or in combination of two or more kinds.

【0019】酸成分としては、3,3’,4,4’−ジ
フェニルスルホンテトラカルボン酸二無水物、3,
3’,4,4’−ベンゾフェノンテトラカルボン酸二無
水物、3,3’,4,4’−ビフェニルテトラカルボン
酸二無水物、ビス(3,4−ジカルボキシフェニル)エ
ーテル二無水物、2,2−ビス(3,4−ジカルボキシ
フェニル)ヘキサフロロプロパン二無水物等及びこれら
1種若しくは2種以上の化合物が例示される。
As the acid component, 3,3 ', 4,4'-diphenylsulfone tetracarboxylic acid dianhydride, 3,3'
3 ', 4,4'-benzophenone tetracarboxylic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, 2 , 2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride and the like, and one or more compounds thereof.

【0020】ジアミン成分としては、下記の化合物が例
示される。4,4’−ジアミノジフェニルスルフィド、
2,2−ビス[4−(p−アミノフェノキシ)フェニ
ル]プロパン、2,2−ビス[3−(p−アミノフェノ
キシ)フェニル]プロパン、2,2−ビス[4−(p−
アミノフェニルチオエーテル)フェニル]プロパン、
2,2−ビス[3−(p−アミノフェニルチオエーテ
ル)フェニル]プロパン、4,4’−ビス(p−アミノ
フェノキシ)ジフェニルスルホン、3,3’−ビス(p
−アミノフェノキシ)ジフェニルスルホン、3,4’−
ビス(p−アミノフェノキシ)ジフェニルスルホン、
4,4’−ビス(p−アミノフェノキシ)ジフェニルエ
ーテル、3,3’−ビス(p−アミノフェノキシ)ジフ
ェニルエーテル、3,4’−ビス(p−アミノフェノキ
シ)ジフェニルエーテル、4,4’−ビス(p−アミノ
フェノキシ)ジフェニルスルフィド、3,3’−ビス
(p−アミノフェノキシ)ジフェニルスルフィド、3,
4’−ビス(p−アミノフェノキシ)ジフェニルスルフ
ィド、4,4’−ビス(p−アミノフェニルチオエーテ
ル)ジフェニルスルホン、3,3’−ビス(p−アミノ
フェニルチオエーテル)ジフェニルスルホン、3,4’
−ビス(p−アミノフェニルチオエーテル)ジフェニル
スルホン、4,4’−ビス(p−アミノフェニルチオエ
ーテル)ジフェニルエーテル、3,3’−ビス(p−ア
ミノフェニルチオエーテル)ジフェニルエーテル、3,
4’−ビス(p−アミノフェニルチオエーテル)ジフェ
ニルエーテル、4,4’−ビス(p−アミノフェニルチ
オエーテル)ジフェニルスルフィド、3,3’−ビス
(p−アミノフェニルチオエーテル)ジフェニルスルフ
ィド、3,4’−ビス(p−アミノフェニルチオエーテ
ル)ジフェニルスルフィド、4,4’−ビス(p−アミ
ノフェノキシ)ジフェニル、3,3’−ビス(p−アミ
ノフェノキシ)ジフェニル、3,4’−ビス(p−アミ
ノフェノキシ)ジフェニル、4,4’−ビス(p−アミ
ノフェノキシ)ベンゾフェノン、3,3’−ビス(p−
アミノフェノキシ)ベンゾフェノン、3,4’−ビス
(p−アミノフェノキシ)ベンゾフェノン、4,4’−
ビス(p−アミノフェニルチオエーテル)ジフェニル、
3,3’−ビス(p−アミノフェニルチオエーテル)ジ
フェニル、3,4’−ビス(p−アミノフェニルチオエ
ーテル)ジフェニル、4,4’−ビス(p−アミノフェ
ニルチオエーテル)ベンゾフェノン、3,3’−ビス
(p−アミノフェニルチオエーテル)ベンゾフェノン、
3,4’−ビス(p−アミノフェニルチオエーテル)ベ
ンゾフェノン、1,4−ビス(p−アミノフェニルチオ
エーテル)ベンゼン、1,3−ビス(p−アミノフェニ
ルチオエーテル)ベンゼン、4,4’−(p−フェニレ
ンジイソプロピリデン)ジアニリン、4,4’−(m−
フェニレンジイソプロピリデン)ジアニリン、2,2−
ビス[4−(p−アミノフェノキシ)フェニル]ヘキサ
フロロプロパン。
The following compounds are exemplified as the diamine component. 4,4'-diaminodiphenyl sulfide,
2,2-bis [4- (p-aminophenoxy) phenyl] propane, 2,2-bis [3- (p-aminophenoxy) phenyl] propane, 2,2-bis [4- (p-
Aminophenyl thioether) phenyl] propane,
2,2-bis [3- (p-aminophenylthioether) phenyl] propane, 4,4'-bis (p-aminophenoxy) diphenylsulfone, 3,3'-bis (p
-Aminophenoxy) diphenyl sulfone, 3,4'-
Bis (p-aminophenoxy) diphenyl sulfone,
4,4'-bis (p-aminophenoxy) diphenyl ether, 3,3'-bis (p-aminophenoxy) diphenyl ether, 3,4'-bis (p-aminophenoxy) diphenyl ether, 4,4'-bis (p -Aminophenoxy) diphenyl sulfide, 3,3'-bis (p-aminophenoxy) diphenyl sulfide, 3,
4'-bis (p-aminophenoxy) diphenyl sulfide, 4,4'-bis (p-aminophenyl thioether) diphenyl sulfone, 3,3'-bis (p-aminophenyl thioether) diphenyl sulfone, 3,4 '
-Bis (p-aminophenyl thioether) diphenyl sulfone, 4,4'-bis (p-aminophenyl thioether) diphenyl ether, 3,3'-bis (p-aminophenyl thioether) diphenyl ether, 3,
4'-bis (p-aminophenyl thioether) diphenyl ether, 4,4'-bis (p-aminophenyl thioether) diphenyl sulfide, 3,3'-bis (p-aminophenyl thioether) diphenyl sulfide, 3,4'- Bis (p-aminophenyl thioether) diphenyl sulfide, 4,4'-bis (p-aminophenoxy) diphenyl, 3,3'-bis (p-aminophenoxy) diphenyl, 3,4'-bis (p-aminophenoxy) ) Diphenyl, 4,4'-bis (p-aminophenoxy) benzophenone, 3,3'-bis (p-
Aminophenoxy) benzophenone, 3,4'-bis (p-aminophenoxy) benzophenone, 4,4'-
Bis (p-aminophenyl thioether) diphenyl,
3,3'-bis (p-aminophenyl thioether) diphenyl, 3,4'-bis (p-aminophenyl thioether) diphenyl, 4,4'-bis (p-aminophenyl thioether) benzophenone, 3,3'- Bis (p-aminophenylthioether) benzophenone,
3,4'-bis (p-aminophenylthioether) benzophenone, 1,4-bis (p-aminophenylthioether) benzene, 1,3-bis (p-aminophenylthioether) benzene, 4,4 '-(p -Phenylenediisopropylidene) dianiline, 4,4 '-(m-
Phenylene diisopropylidene) dianiline, 2,2-
Bis [4- (p-aminophenoxy) phenyl] hexafluoropropane.

【0021】もちろん、本発明においては、得られるポ
リイミドが有機溶剤可溶性を示す範囲において、他の芳
香族テトラカルボン酸及びジアミンを併用しても差し支
えない。
Of course, in the present invention, other aromatic tetracarboxylic acids and diamines may be used in combination as long as the obtained polyimide is soluble in an organic solvent.

【0022】併用可能な他の芳香族テトラカルボン酸と
しては、ピロメリット酸二無水物、ナフタリンテトラカ
ルボン酸二無水物等が例示される。
Examples of other aromatic tetracarboxylic acids that can be used in combination include pyromellitic dianhydride and naphthalenetetracarboxylic dianhydride.

【0023】又、使用可能な他のジアミンとしては、
4,4’−ジアミノジフェニルエーテル、3,4’−ジ
アミノジフェニルエーテル、3,3’−ジアミノジフェ
ニルエーテル、4,4’−ジアミノジフェニルメタン、
3,4’−ジアミノジフェニルメタン、3,3’−ジア
ミノジフェニルメタン、4,4’−ジアミノジフェニル
スルホン、3,4’−ジアミノジフェニルスルホン、
3,3’−ジアミノジフェニルスルホン、4,4’−ジ
アミノベンゾフェノン、3,4’−ジアミノベンゾフェ
ノン、3,3’−ジアミノベンゾフェノン、4,4’−
ジアミノジフェニル、3,4’−ジアミノジフェニル、
3,3’−ジアミノジフェニル、m−フェニレンジアミ
ン、p−フェニレンジアミン等が例示される。
Other diamines that can be used include
4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane,
3,4'-diaminodiphenylmethane, 3,3'-diaminodiphenylmethane, 4,4'-diaminodiphenylsulfone, 3,4'-diaminodiphenylsulfone,
3,3'-diaminodiphenyl sulfone, 4,4'-diaminobenzophenone, 3,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 4,4'-
Diaminodiphenyl, 3,4'-diaminodiphenyl,
Examples include 3,3′-diaminodiphenyl, m-phenylenediamine, p-phenylenediamine and the like.

【0024】本発明において、有機溶剤可溶性ポリイミ
ドとは、上記の酸成分及びジアミン成分との組み合わせ
等により得られるポリイミドが、N,N−ジメチルアセ
トアミド、N,N−ジメチルホルムアミド、N−メチル
−2−ピロリドン、ジメチルスルホキシド、フェノー
ル、クレゾール、クロルフェノール、γ-ブチロラクト
ン、ビス(2−メトキシエチル)エーテル、テトラヒド
ロフラン、1,3−ジオキサン、及び1,4−ジオキサ
ン、ジクロルメタンのいずれか1種以上に室温にて、樹
脂濃度1重量%以上、好ましくは5重量%以上で溶解可
能なものをいう。
In the present invention, the organic solvent-soluble polyimide is a polyimide obtained by combining the above-mentioned acid component and diamine component, etc., with N, N-dimethylacetamide, N, N-dimethylformamide and N-methyl-2. -Pyrrolidone, dimethylsulfoxide, phenol, cresol, chlorophenol, γ-butyrolactone, bis (2-methoxyethyl) ether, tetrahydrofuran, 1,3-dioxane, and 1,4-dioxane or dichloromethane at room temperature. Is a resin that can be dissolved at a resin concentration of 1% by weight or more, preferably 5% by weight or more.

【0025】上記各種のポリイミドの中、特にDSDA
を酸成分として調製されるポリイミドが有用である。こ
れは、ODPAを酸成分として調製されるポリイミドは
耐熱性にやや欠ける傾向があり、BTDAを酸成分とし
て調製されるポリイミドについては溶液での保存安定性
に問題がある。又、BPDAを酸成分として調製される
ポリイミドについては可溶性となる有機溶剤が著しく制
限される。6FDAを酸成分として調製されるポリイミ
ドは6FDAが高価であるため経済性に欠ける等、夫々
問題点を有しているためである。
Among the various polyimides mentioned above, especially DSDA
A polyimide prepared by using as an acid component is useful. This means that the polyimide prepared using ODPA as an acid component tends to be slightly lacking in heat resistance, and the polyimide prepared using BTDA as an acid component has a problem in storage stability in a solution. In addition, for polyimide prepared using BPDA as an acid component, the soluble organic solvent is significantly limited. This is because polyimide prepared using 6FDA as an acid component has problems such as lack of economy because 6FDA is expensive.

【0026】本発明に係るポリアミド酸としては、一般
式(2)で表される繰り返し単位を有するポリアミド酸
が推奨される。
As the polyamic acid according to the present invention, a polyamic acid having a repeating unit represented by the general formula (2) is recommended.

【0027】 [式中、R3は4価の有機基、R4は2価の有機基を表
す。]
[0027] [In the formula, R 3 represents a tetravalent organic group, and R 4 represents a divalent organic group. ]

【0028】特に推奨されるポリアミド酸としては、上
記芳香族ポリイミドの前駆体である各種ポリアミド酸の
他、ピロメリット酸二無水物(PMDA)を酸成分とし
て調製されるポリアミド酸、4,4’−ジアミノジフェ
ニルエーテル(DDE)をジアミン成分として調製され
るポリアミド酸等が例示される。
As particularly recommended polyamic acid, in addition to various polyamic acids which are the precursors of the above aromatic polyimide, polyamic acid prepared by using pyromellitic dianhydride (PMDA) as an acid component, 4,4 ′ Examples thereof include polyamic acid prepared by using diaminodiphenyl ether (DDE) as a diamine component.

【0029】上記芳香族ポリイミドとポリアミド酸との
組み合わせの中で、特に下記の組み合わせが推奨され
る。
Among the above-mentioned combinations of aromatic polyimide and polyamic acid, the following combinations are particularly recommended.

【0030】(1)DSDAを酸成分として調製される
ポリイミドとその前駆体であるポリアミド酸との組み合
わせの場合には、工業的に有利な条件下で製造され、経
済性に優れる。
(1) In the case of a combination of a polyimide prepared using DSDA as an acid component and a polyamic acid which is a precursor thereof, it is produced under industrially advantageous conditions and is excellent in economic efficiency.

【0031】(2)DSDAを酸成分として調製される
ポリイミドとPMDAとDDEより調製されるポリアミ
ド酸との組み合わせの場合には、高耐熱性の粗面化フィ
ルムが得られる。
(2) In the case of a combination of a polyimide prepared using DSDA as an acid component and a polyamic acid prepared from PMDA and DDE, a roughened film having high heat resistance can be obtained.

【0032】本発明において、ポリイミド成分(A)と
ポリアミド酸成分(B)との配合量は、A/B=90〜
10/10〜90重量部が好ましく、A/B=75〜2
5/25〜75が更に好ましい。配合比率がこの範囲を
はずれると平滑なフィルムとなる傾向が認められ、本発
明所定の効果が得られにくい。
In the present invention, the blending amount of the polyimide component (A) and the polyamic acid component (B) is A / B = 90-
10/10 to 90 parts by weight is preferable, and A / B = 75 to 2
5/25 to 75 are more preferable. When the compounding ratio is out of this range, it tends to be a smooth film, and it is difficult to obtain the effects of the present invention.

【0033】尚、ポリイミド成分(A)は、必ずしもイ
ミド化が完結したものである必要はなく、ポリアミド酸
からのイミド化比率が50%以上であれば構わない。イ
ミド化比率が50%以下では、ポリアミド酸(B)との
混合溶液が外観上エマルション化せず均一となり、本発
明の目的である粗面化フィルムが得られない場合があ
る。又、ポリアミド酸成分(B)についても、溶剤可溶
性を示す範囲において、イミド化比率が50%未満であ
れば、一部イミド化していても差し支えない。
The polyimide component (A) does not necessarily have to be completely imidized, and the imidization ratio of polyamic acid may be 50% or more. When the imidization ratio is 50% or less, the mixed solution with the polyamic acid (B) does not appear as an emulsion and becomes uniform, and the roughened film, which is the object of the present invention, may not be obtained. In addition, the polyamic acid component (B) may be partially imidized as long as the imidization ratio is less than 50% within the range of solvent solubility.

【0034】本発明に係る各成分の混合方法は、特に制
限されるものではないが、中でも、各成分を個々に所定
の有機溶剤に溶解した溶液を混合攪拌する方法やポリイ
ミド溶液中において酸原料及びジアミン原料よりポリア
ミド酸成分を合成する方法が推奨される。
The mixing method of each component according to the present invention is not particularly limited, but among them, a method in which each component is individually dissolved in a predetermined organic solvent is mixed and stirred, or an acid raw material is used in a polyimide solution. A method of synthesizing a polyamic acid component from a diamine raw material is recommended.

【0035】本発明において使用できる有機溶剤として
は、個々の成分が溶解し、かつ混合攪拌後の溶液が外観
上エマルション化し、外観上、不透明乃至微濁状の液状
物となる範囲において、特に制限されるものではない
が、例えば、N,N−ジメチルアセトアミド(DMA
c)、N,N−ジメチルホルムアミド、N−メチル−2
−ピロリドン(NMP)、ジメチルスルホキシド等の非
プロトン系極性溶剤、フェノール、クレゾール、クロル
フェノール等のフェノール系溶剤、γ-ブチロラクトン
等のラクトン系溶剤、ビス(2−メトキシエチル)エー
テル、テトラヒドロフラン、1,3−ジオキサン、1,
4−ジオキサン等のエーテル系溶剤等が例示される。中
でも非プロトン系極性溶剤が特に好適である。
The organic solvent that can be used in the present invention is particularly limited as long as the individual components are dissolved and the solution after mixing and stirring becomes an emulsion in appearance and becomes an opaque or slightly turbid liquid in appearance. For example, N, N-dimethylacetamide (DMA
c), N, N-dimethylformamide, N-methyl-2
-Aprotic polar solvents such as pyrrolidone (NMP) and dimethyl sulfoxide, phenolic solvents such as phenol, cresol and chlorophenol, lactone solvents such as γ-butyrolactone, bis (2-methoxyethyl) ether, tetrahydrofuran, 1, 3-dioxane, 1,
Examples include ether solvents such as 4-dioxane. Of these, aprotic polar solvents are particularly suitable.

【0036】有機溶剤の適用量としては、通常、ポリイ
ミド成分(A)とポリアミド酸成分(B)との合計量1
00重量部に対し、100〜2,000重量部の範囲で
あり、300〜1,000重量部の範囲がより好まし
い。
The amount of the organic solvent applied is usually 1 as the total amount of the polyimide component (A) and the polyamic acid component (B).
It is in the range of 100 to 2,000 parts by weight, and more preferably in the range of 300 to 1,000 parts by weight, relative to 00 parts by weight.

【0037】有機溶剤の適用量がこの範囲未満の場合に
は、混合溶液の粘度が高く、作業性に劣り、又、この範
囲をこえる場合には、所定の効果が得られない。
When the applied amount of the organic solvent is less than this range, the viscosity of the mixed solution is high and the workability is poor, and when it exceeds this range, a predetermined effect cannot be obtained.

【0038】当該混合物より粗面化フィルムを得るため
のフィルム化条件としては、特に特殊な条件コントロー
ルは必要とせず、ポリアミド酸溶液又はポリイミド溶液
よりポリイミドフィルムを得る一般的な条件が適用され
る。
The film forming conditions for obtaining a roughened film from the mixture do not require any special condition control, and general conditions for obtaining a polyimide film from a polyamic acid solution or a polyimide solution are applied.

【0039】例えば、混合エマルション溶液をガラス、
金属、プラスチック等の支持体上にナイフコーター、ロ
ータリーコーター等を用いて均一に流延後、脱水及び脱
溶剤する。
For example, the mixed emulsion solution is glass,
After uniformly casting on a support such as metal or plastic using a knife coater, a rotary coater or the like, dehydration and solvent removal are performed.

【0040】脱水及び脱溶剤方法としては、空気或いは
不活性ガス雰囲気中、又は減圧下において150〜35
0℃、好ましくは200〜300℃で加熱する方法や無
水酢酸等の脱水閉環剤を用いてポリアミド酸成分を閉環
すると共に加熱して脱溶剤する方法等が例示される。
The dehydration and desolvation methods include 150 to 35 in air or an inert gas atmosphere or under reduced pressure.
Examples thereof include a method of heating at 0 ° C., preferably 200 to 300 ° C., a method of ring-closing the polyamic acid component with a dehydrating ring-closing agent such as acetic anhydride, and a method of heating to remove the solvent.

【0041】本発明に係る粗面化フィルムは、耐熱性、
機械特性等、本来これらのポリイミドが有する優れた特
性を保持したまま、易滑性、接着性が改良されており、
電気絶縁フィルム、断熱フィルム、保護フィルム、フレ
キシブルプリント配線板のベースフィルム等として、
又、材料間の接着性が要求される多層構造体の一部とし
ても有用である。
The roughened film according to the present invention has heat resistance,
While retaining the excellent properties originally possessed by these polyimides such as mechanical properties, slipperiness and adhesiveness have been improved,
As electric insulation film, heat insulation film, protective film, base film for flexible printed wiring boards, etc.
Further, it is also useful as a part of a multi-layer structure requiring adhesion between materials.

【0042】[0042]

【実施例】以下、本発明を実施例によって更に詳細に説
明する。尚、実施例中における物性の測定方法は次のと
おりである。
EXAMPLES The present invention will be described in more detail below with reference to examples. The methods for measuring the physical properties in the examples are as follows.

【0043】(a)引張り強度、破断伸び JIS K7127 の方法に準拠した(25℃)。(A) Tensile strength, elongation at break It was based on the method of JIS K7127 (25 ° C).

【0044】(b)光沢度 JIS K 7105の方法に準拠し、60゜鏡面光沢
度を測定した。
(B) Glossiness A 60 ° specular glossiness was measured according to the method of JIS K 7105.

【0045】(c)平均粗さ 電子線三次元粗さ解析装置(ELIONIX EPA-8000)により
中心線平均粗さ(Ra)を測定した。
(C) Average roughness The centerline average roughness (Ra) was measured by an electron beam three-dimensional roughness analyzer (ELIONIX EPA-8000).

【0046】ポリイミド溶液の製造Preparation of polyimide solution

【0047】製造例1 温度計、攪拌器、冷却管及び窒素導入管を備えた1リッ
トルの反応器に4,4’−ビス(p−アミノフェノキ
シ)ジフェニルスルホン(BAPS)43.25g
(0.100モル)及びNMP362gを仕込み、窒素
雰囲気下、室温でBAPSを溶解させた。次いで、DS
DA35.80g(0.10モル)を添加後、170℃
で7時間反応させ、透明で粘稠なポリイミド溶液(A
1)を得た。
Production Example 1 4,4'-bis (p-aminophenoxy) diphenyl sulfone (BAPS) 43.25 g was placed in a 1 liter reactor equipped with a thermometer, a stirrer, a cooling tube and a nitrogen introducing tube.
(0.100 mol) and 362 g of NMP were charged, and BAPS was dissolved at room temperature in a nitrogen atmosphere. Then DS
After adding 35.80 g (0.10 mol) of DA, 170 ° C
React for 7 hours at room temperature to obtain a transparent and viscous polyimide solution (A
1) was obtained.

【0048】製造例2 製造例1と同様の反応器に2,2−ビス[4−(p−ア
ミノフェノキシ)フェニル]プロパン(BAPP)4
1.05g(0.10モル)及びDMAc352gを仕
込み、窒素雰囲気下、室温でBAPPを溶解させた。次
にDSDA35.80g(0.10モル)を添加後、1
70℃で7時間反応させ、透明で粘稠なポリイミド溶液
(A2)を得た。
Production Example 2 2,2-bis [4- (p-aminophenoxy) phenyl] propane (BAPP) 4 was placed in the same reactor as in Production Example 1.
1.05 g (0.10 mol) and 352 g of DMAc were charged, and BAPP was dissolved at room temperature in a nitrogen atmosphere. Next, after adding 35.80 g (0.10 mol) of DSDA,
The reaction was carried out at 70 ° C. for 7 hours to obtain a transparent and viscous polyimide solution (A2).

【0049】製造例3 製造例1と同様の反応器にBAPP28.74g(0.
07モル)、DDE6.00g(0.03モル)及びN
MP301gを仕込み、窒素雰囲気下、室温でBAPP
及びDDEを溶解させた。次にODPA31.00g
(0.10モル)を添加後、170℃で反応生成水を抜
き出しながら7時間反応させ、透明で粘稠なポリイミド
溶液(A3)を得た。
Production Example 3 In the same reactor as in Production Example 1, 28.74 g (0.
07 mol), DDE 6.00 g (0.03 mol) and N
Charge MP301g, BAPP at room temperature under nitrogen atmosphere
And DDE was dissolved. Then ODPA31.00g
After adding (0.10 mol), the reaction product water was extracted at 170 ° C. for 7 hours to obtain a transparent and viscous polyimide solution (A3).

【0050】製造例4 製造例1と同様の反応器にBAPS43.25g(0.
10モル)及びNMP337gを仕込み、窒素雰囲気
下、室温でBAPSを溶解させた。次にBTDA16.
10g(0.05モル)及びBPDA14.70g
(0.05モル)を添加後、170℃で反応生成水を抜
き出しながら7時間反応させ、透明で粘稠なポリイミド
溶液(A4)を得た。
Production Example 4 BAPS 43.25 g (0.
(10 mol) and NMP (337 g) were charged, and BAPS was dissolved at room temperature in a nitrogen atmosphere. Next, BTDA16.
10 g (0.05 mol) and 14.70 g BPDA
After adding (0.05 mol), the reaction product water was extracted at 170 ° C. for 7 hours to obtain a transparent and viscous polyimide solution (A4).

【0051】ポリアミド酸溶液の製造Preparation of Polyamic Acid Solution

【0052】製造例5 製造例1と同様の反応器にBAPS43.25g(0.
10モル)及びNMP362gを仕込み、窒素雰囲気
下、室温でBAPSを溶解させた。次にDSDA35.
80g(0.10モル)を徐々に添加し、室温以下で5
時間反応させ、透明で粘稠なポリアミド酸溶液(B1)
を得た。
Production Example 5 43.25 g of BAPS (0.
10 mol) and NMP362 g were charged, and BAPS was dissolved at room temperature in a nitrogen atmosphere. Next, DSDA35.
80 g (0.10 mol) was gradually added, and the mixture was cooled to room temperature below 5
Clear and viscous polyamic acid solution (B1)
Got

【0053】製造例6 製造例1と同様の反応器にBAPP41.05g(0.
10モル)及びDMAc352gを仕込み、窒素雰囲気
下、室温でBAPPを溶解させた。次にDSDA35.
80g(0.10モル)を徐々に添加し、室温以下で5
時間反応させ、透明で粘稠なポリアミド酸溶液(B2)
を得た。
Production Example 6 A reactor similar to that in Production Example 1 was charged with 41.05 g of BAPP (0.
10 mol) and DMAc (352 g) were charged, and BAPP was dissolved at room temperature in a nitrogen atmosphere. Next, DSDA35.
80 g (0.10 mol) was gradually added, and the mixture was cooled to room temperature below 5
Clear and viscous polyamic acid solution (B2)
Got

【0054】製造例7 製造例1と同様の反応器にDDE20.00g(0.1
0モル)及びNMP256gを仕込み、窒素雰囲気下、
室温でDDEを溶解させた。次にDSDA35.80g
(0.10モル)を徐々に添加し、室温で5時間反応さ
せ、透明で粘稠なポリアミド酸溶液(B3)を得た。
Production Example 7 In the same reactor as in Production Example 1, 20.00 g (0.1
0 mol) and NMP256g were charged, and under a nitrogen atmosphere,
The DDE was dissolved at room temperature. Next, DSDA 35.80g
(0.10 mol) was gradually added and reacted at room temperature for 5 hours to obtain a transparent and viscous polyamic acid solution (B3).

【0055】製造例8 製造例1と同様の反応器にDDE20.00g(0.1
0モル)及びDMAc188gを仕込み、窒素雰囲気
下、室温でDDEを溶解させた。次にPMDA21.8
0g(0.10モル)を徐々に添加し、室温で5時間反
応させ、透明で粘稠なポリアミド酸溶液(B4)を得
た。
Production Example 8 20.00 g (0.1%) of DDE was placed in the same reactor as in Production Example 1.
0 mol) and 188 g of DMAc were charged, and DDE was dissolved at room temperature in a nitrogen atmosphere. Then PMDA 21.8
0 g (0.10 mol) was gradually added and reacted at room temperature for 5 hours to obtain a transparent viscous polyamic acid solution (B4).

【0056】実施例1 ポリイミド溶液(A1)とポリアミド酸溶液(B1)と
を100mlのガラス瓶に夫々25gずつ入れ、シーソー回
転式ローターにて室温3時間攪拌し、外観上エマルショ
ン化した混合溶液を得た。得られた溶液をガラス板上に
スピンコーターにてキャストし、通風式オーブンで25
0℃、30分間焼き付けを行い、片面粗面化フィルムを
得、このものの光沢度、平均粗さ、引張り強度及び破断
伸びを測定した。得られた結果を第1表に示す。尚、フ
ィルムの外観は粗面であった。
Example 1 25 g of each of the polyimide solution (A1) and the polyamic acid solution (B1) were placed in a 100 ml glass bottle and stirred at room temperature for 3 hours with a seesaw rotary rotor to obtain an emulsified mixed solution in appearance. It was The obtained solution was cast on a glass plate with a spin coater and placed in a ventilated oven at 25 ° C.
The film was baked at 0 ° C. for 30 minutes to obtain a one-sided roughened film, and the glossiness, average roughness, tensile strength and breaking elongation of this film were measured. The results obtained are shown in Table 1. The appearance of the film was rough.

【0057】実施例2〜12 製造例1〜4で得られたポリイミド溶液と製造例5〜8
で得られたポリアミド酸溶液を各種組み合わせてエマル
ション化した混合物を調製し、実施例1に準じて片面粗
面化フィルムを得た。製膜条件、得られたフィルムの光
沢度、平均粗さ、引張り強度及び破断伸びを測定した。
得られた結果を第1表に示す。尚、フィルムの外観は、
何れの実施例においても粗面であった。
Examples 2 to 12 Polyimide solutions obtained in Production Examples 1 to 4 and Production Examples 5 to 8
A mixture prepared by emulsifying various polyamic acid solutions obtained in 1 above was prepared, and a single-sided roughened film was obtained according to Example 1. The film forming conditions, the glossiness of the obtained film, the average roughness, the tensile strength and the elongation at break were measured.
The results obtained are shown in Table 1. The appearance of the film is
The surface was rough in all the examples.

【0058】実施例13 温度計、攪拌器、窒素導入管を取付けた200mlの反応
器にポリイミド溶液(A1)50g、DSDA4.08
g(0.0114モル)、BAPS4.92g(0.0
114モル)及びNMP41gを加え、窒素雰囲気下、
室温で5時間反応させ、エマルション化した粘稠なポリ
イミド/ポリアミド酸等重量溶液を得た。その溶液より
実施例1と同様にして(製膜条件:250℃/30
分)、片面粗面化フィルムを得た。得られたフィルムの
外観は粗面であり、光沢度は32.5%、平均粗さ(R
a)は0.72μm、引張り強度は11.5kgf/mm2
び破断伸びは11.0%であった。
Example 13 A 200 ml reactor equipped with a thermometer, a stirrer and a nitrogen inlet tube was charged with 50 g of polyimide solution (A1) and 4.08 of DSDA.
g (0.0114 mol), BAPS 4.92 g (0.0
114 mol) and 41 g of NMP, and under a nitrogen atmosphere,
The reaction was carried out at room temperature for 5 hours to obtain an emulsified viscous polyimide / polyamic acid equivalent weight solution. The solution was processed in the same manner as in Example 1 (film forming condition: 250 ° C./30
Min), and a one-sided roughened film was obtained. The obtained film has a rough appearance, a glossiness of 32.5%, and an average roughness (R
a) was 0.72 μm, the tensile strength was 11.5 kgf / mm 2 and the elongation at break was 11.0%.

【0059】比較例1 ポリイミド溶液(A1)とポリイミド溶液(A2)とを
100mlのガラス瓶に夫々25gずつに入れ、シーソー
回転式ローターにて室温下、3時間攪拌し、透明均一な
混合溶液を得た。その溶液より実施例1と同様にしてフ
ィルム化したが、その表面は粗面化されておらず、極め
て平滑であった。製膜条件、得られたフィルムの光沢
度、平均粗さ、引張り強度及び破断伸びを測定した。得
られた結果を第1表に示す。
Comparative Example 1 25 g each of the polyimide solution (A1) and the polyimide solution (A2) were placed in 100 ml glass bottles and stirred at room temperature for 3 hours in a seesaw rotary rotor to obtain a transparent and homogeneous mixed solution. It was A film was formed from the solution in the same manner as in Example 1, but the surface was not roughened and was extremely smooth. The film forming conditions, the glossiness of the obtained film, the average roughness, the tensile strength and the elongation at break were measured. The results obtained are shown in Table 1.

【0060】比較例2 ポリアミド酸溶液(B1)とポリアミド酸溶液(B2)
とを100mlのガラス瓶に夫々25gずつに入れ、シーソ
ー回転式ローターにて室温3時間攪拌し、透明均一な混
合溶液を得た。その溶液より実施例1と同一の手法でフ
ィルム化したが、得られたフィルムの表面は粗面化され
ておらず、極めて平滑であった。製膜条件、得られたフ
ィルムの光沢度、平均粗さ、引張り強度及び破断伸びを
測定した。得られた結果を第1表に示す。
Comparative Example 2 Polyamic Acid Solution (B1) and Polyamic Acid Solution (B2)
25 g of each of these were placed in a 100 ml glass bottle, and the mixture was stirred with a seesaw rotary rotor at room temperature for 3 hours to obtain a transparent and uniform mixed solution. A film was formed from the solution by the same method as in Example 1, but the surface of the obtained film was not roughened and was extremely smooth. The film forming conditions, the glossiness of the obtained film, the average roughness, the tensile strength and the elongation at break were measured. The results obtained are shown in Table 1.

【0061】[0061]

【発明の効果】本発明に係る方法を適用することによ
り、簡便に粗面化ポリイミドフィルムを得ることができ
る。しかも、得られたポリイミドフィルムは、優れた易
滑性及び接着性を備えている。
By applying the method according to the present invention, a roughened polyimide film can be easily obtained. Moreover, the obtained polyimide film has excellent slipperiness and adhesiveness.

【表1】 [Table 1]

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平1−110535(JP,A) 特開 平6−5997(JP,A) 特開 平5−214135(JP,A) 特開 平5−212807(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08G 73/00 - 73/26 C08J 5/18 ─────────────────────────────────────────────────── --- Continuation of the front page (56) References JP-A-1-110535 (JP, A) JP-A-6-5997 (JP, A) JP-A-5-214135 (JP, A) JP-A-5- 212807 (JP, A) (58) Fields surveyed (Int.Cl. 7 , DB name) C08G 73/00-73/26 C08J 5/18

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 有機溶剤可溶性の芳香族ポリイミド、ポ
リアミド酸及び有機溶剤とを含有してなる混合物を流延
し、次いで脱水及び脱溶剤することを特徴とする粗面化
ポリイミドフィルムの製造方法。
1. A method for producing a roughened polyimide film, which comprises casting a mixture containing an organic solvent-soluble aromatic polyimide, a polyamic acid and an organic solvent, followed by dehydration and solvent removal.
【請求項2】 有機溶剤可溶性の芳香族ポリイミド樹脂
が一般式(1) [式中、Aは単結合、−SO−、−CO−、−O−又
は−C(−CF)(−CF)−を表す。Zは、−
S−、式aで表される基、式bで表される基又は一般式
cで表される基を表す。mは整数を表す。]で表される
繰り返し単位を有する有機溶剤可溶性の芳香族ポリイミ
ドであり、且つポリアミド酸が、一般式(2) [式中、Rは4価の有機基を表す。Rは2価の有機
基を表す。nは整数を表す。]で表される繰り返し単位
を有するポリアミド酸である請求項1に記載の粗面化ポ
リイミドフィルムの製造方法。 【化1】 【化2】 【化3】 [式中、Xは−O−、−S−又は−C(−R)(−R
)−を表し、Yは単結合、−O−、−S−、−C(−
)(−R)−又は−CO−を表す。R、R
同一又は異なって、水素原子、ハロゲン原子又はハロゲ
ン原子で置換されていてもよい炭素数1〜5のアルキル
基を表す。]
2. An organic solvent-soluble aromatic polyimide resin represented by the general formula (1): [In the formula, A represents a single bond, -SO 2 -, - CO - , - O- or -C (-CF 3) (- CF 3) - represents a. Z 1 is −
S- represents a group represented by the formula a, a group represented by the formula b, or a group represented by the general formula c. m represents an integer. ] An organic solvent-soluble aromatic polyimide having a repeating unit represented by the following general formula (2) [In the formula, R 3 represents a tetravalent organic group. R 4 represents a divalent organic group. n represents an integer. ] The manufacturing method of the roughened polyimide film of Claim 1 which is a polyamic acid which has a repeating unit represented by these. [Chemical 1] [Chemical 2] [Chemical 3] [In the Formula, X is -O-, -S-, or -C (-R < 1 >) (-R
2 )-, Y is a single bond, -O-, -S-, -C (-
R 1) (- R 2) - or an -CO-. R 1 and R 2 are the same or different and each represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 5 carbon atoms which may be substituted with a halogen atom. ]
【請求項3】 有機溶剤可溶性の芳香族ポリイミドが、
3,3’,4,4’−ジフェニルスルホンテトラカルボ
ン酸二無水物、3,3’,4,4’−ベンゾフェノンテ
トラカルボン酸二無水物3,3’,4,4’−ビフェニ
ルテトラカルボン酸二無水物、ビス(3,4−ジカルボ
キシフェニル)エーテル二無水物、2,2−ビス(3,
4−ジカルボキシフェニル)ヘキサフロロプロパン二無
水物よりなる群より選ばれる1種若しくは2種以上の化
合物を酸成分としてなるポリイミドである請求項1又は
請求項2に記載の粗面化ポリイミドフィルムの製造方
法。
3. An organic solvent-soluble aromatic polyimide,
3,3 ', 4,4'-diphenylsulfone tetracarboxylic acid dianhydride, 3,3', 4,4'-benzophenone tetracarboxylic acid dianhydride 3,3 ', 4,4'-biphenyltetracarboxylic acid Dianhydride, bis (3,4-dicarboxyphenyl) ether dianhydride, 2,2-bis (3,3
The surface-roughened polyimide film according to claim 1 or 2, which is a polyimide having one or more compounds selected from the group consisting of 4-dicarboxyphenyl) hexafluoropropane dianhydride as an acid component. Production method.
JP10967694A 1994-05-24 1994-05-24 Roughened polyimide film and method for producing the same Expired - Fee Related JP3528236B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10967694A JP3528236B2 (en) 1994-05-24 1994-05-24 Roughened polyimide film and method for producing the same

Publications (2)

Publication Number Publication Date
JPH07316290A JPH07316290A (en) 1995-12-05
JP3528236B2 true JP3528236B2 (en) 2004-05-17

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Country Link
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* Cited by examiner, † Cited by third party
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CN113845674B (en) * 2021-09-13 2023-12-08 苏州尊尔光电科技有限公司 Polyimide film with low expansion coefficient and preparation method thereof

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