JP3676073B2 - Polyimide film and manufacturing method thereof - Google Patents

Polyimide film and manufacturing method thereof Download PDF

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JP3676073B2
JP3676073B2 JP4185798A JP4185798A JP3676073B2 JP 3676073 B2 JP3676073 B2 JP 3676073B2 JP 4185798 A JP4185798 A JP 4185798A JP 4185798 A JP4185798 A JP 4185798A JP 3676073 B2 JP3676073 B2 JP 3676073B2
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polyimide film
polyamic acid
mol
film
solution
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JPH11236448A (en
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滋 田中
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Kaneka Corp
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Kaneka Corp
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

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  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、弾性率に代表される機械的特性に優れ、更に低吸水性や耐熱性に優れた新規なポリイミドフィルムとその製造方法に関するものである。
【0002】
【従来の技術】
従来、ポリイミドフィルムとして、ピロメリット酸二無水物と4,4’−ジアノジフェニルエ−テルからなるポリイミドや3,3’,4,4’−ビフェニルテトラカルボン酸二無水物とパラフェニレンジアミンからなるポリイミドが広く用いられており、特にその優れた耐熱性と電気絶縁特性によりフレキシブルプリント配線板(以下、FPC)や半導体装置におけるリ−ドオンチップ(LOC)テ−プ用ベ−スフィルム等の電子材料として多く利用いられている。更に、ポリイミドフィルムは、耐放射線性や極低温特性にも優れることから、航空機材料、宇宙材料用途等にも多く利用されている。
【0003】
【発明が解決しようとする課題】
近年、コンピュ−タや携帯電話等の電子機器の小型化、薄型化、軽量化に伴ってそれらに用いられる電子部品の小型化、薄型化、軽量化が強く求められるようになってきた。
そのため、電子部品の材料として、ポリイミドフィルムに対しても厚みが10ミクロン以下という極めて薄いフィルムが求められてきている。しかしながら、従来のポリイミドフィルムでは、弾性率が不十分であり薄手化が困難になりつつあった。また、高耐熱性、高弾性率が要求される薄型の高密度磁気記録テ−プ用ベ−スフィルムにも使用できず、高弾性率のポリイミドフィルムへの要求が高まりつつあった。
【0004】
弾性率が1000kg/mm2を超える高弾性率ポリイミドフィルムとして、4,4’−ジアミノベンズアニリドをジアミン成分、ピロメリット酸または3,3’,4,4’−ビフェニルテトラカルボン酸二無水物等の酸二無水物とを用いたポリイミドフィルムが提案されている。(特開昭62−280224)しかしながら、ジアミノベンズアニリドは極性の高いアミド基を有するため、得られるポリイミドフィルムの吸水率が高くなってしまうという問題を有していた。
【0005】
ポリイミドフィルムの吸水率が高いと吸湿寸法安定性に劣り、また半導体装置を製造する際、封止工程時にフィルムが吸収していた多量の水分を一気に放出することによってパッケ−ジクラックを発生させてしまう等加工性や信頼性の点で問題となる。
そこで本発明者らは、かかる実状に鑑み、従来の問題点を解決し、耐熱性に優れ、また、高い弾性率等の優れた機械的特性や低吸水性をあわせ有するポリイミドフィルムを提供することを目的に鋭意検討を重ねた結果、本発明に至ったのである。
【0006】
【課題を解決するための手段】
本発明にかかるポリイミドフィルムの要旨とするところは、一般式(1)
【0007】
【化4】

Figure 0003676073
【0008】
(但し、式中、R1は、
【0009】
【化4】
Figure 0003676073
【0010】
Rは、CH 3 、Cl、Brから選択される少なくとも1種、Zは0〜4の整数を表す。)で表される有機基から選択される少なくとも1種、R2は、
【0011】
【化5】
Figure 0003676073
【0012】
Rは、CH 3 、Cl、Brから選択される少なくとも1種、mおよびnは0〜4の整数を表す。)で表される有機基から選択される少なくとも1種を示す。)で表される繰り返し単位を含有してなる、弾性率が1000kg/mm2以上を有し、かつ吸水率が1.5%以下を併せ有することにある(請求項1)。本発明にかかるポリイミドフィルムの製造方法の要旨とするところは、テトラカルボン酸二無水物類とジアミン類との重縮合反応によって得られるポリイミドフィルムの前駆体であるポリアミド酸の溶液から流延法にて請求項1に記載するポリイミドフィルムを製造する方法において、前記ポリアミド酸の重量平均分子量が15万以上であることにある(請求項2)。
【0013】
【発明の実施の形態】
以下、本発明にかかるポリイミドフィルムの実施形態の1例について説明する。
本発明のポリイミドフィルムは、一般式(A)
【0014】
【化7】
Figure 0003676073
【0015】
(式中R1は、一般式(1)におけるR1と同じ2価の有機基を示す。)で表されるエステル基を含むテトラカルボン酸二無水物及び一般式(B)
2N−R2−NH2 (B)
(式中R2は、一般式(1)におけるR2と同じ2価の有機基を示す。)で表される芳香族ジアミンを原料として得ることができる。
【0016】
一般式(A)で表されるテトラカルボン酸二無水物の最も代表的な例としては、1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物、2,5−ジメチル−1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物、2,5−ジクロロ−1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物、2−クロロ−1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物等が挙げられ、1種または2種以上混合して用いることもできる。
【0017】
ここで、一般式(A)で表されるテトラカルボン酸二無水物は、トリメリット酸無水物モノクロライドと2価フェノ−ル類とを室温以下で反応させる方法、あるいは、トリメリット酸無水物と2価フェノ−ル類のジメチルエステルとを200〜300℃の高温で反応させる方法によって合成され得る。
また、上記の原料となる2価フェノ−ル類としては、ハイドロキノン、2−クロロハイドロキノン、2,5−ジクロロハイドロキノン、2,3,5,6−テトラクロロハイドロキノン、2,5−ジメチルハイドロキノン等が挙げられる。
【0018】
次に一般式(B)で表されるジアミンの代表例としては、4,4’−ジアミノベンズアニリド、4、4’−ジアミノ−3,3’−ジクロロベンズアニリド、1,4−ビス(4−アミノフェニルカルバモイル)ベンゼン等が挙げられ、1種または2種以上混合して用いることができる。
一般式(1)で表される繰り返し単位は、全繰り返し単位中50モル%以上、好ましくは70モル%以上、さらに好ましくは、90モル%以上含有することが必要である。
【0019】
一般式(1)で表される繰り返し単位の含有率が50%以下であると、高弾性率と低吸水率を併せ有するフィルムを得ることが困難である。
本発明のポリイミドフィルムは、一般式(1)で表される繰り返し単位の全繰り返し単位中の含有形式に限定されない。即ち、ランダム共重合体であってもよいし、交互共重合体であってもよい。特に、一般式(1)のくり返し単位が存在するセグメントの長さが重合体分子内において一定である部分を20モル%以上、好ましくは50モル%以上有する共重合体が機械的強度上好ましい。
【0020】
上記のように製造される一般式(1)で表されるくり返し単位を含有するポリイミドフィルムは、1000kg/mm2以上の弾性率と1.5%以下の吸水率を併せ有することができる。
次に、本発明にかかるポリイミドフィルムの製造方法について、具体的に説明する。
【0021】
本発明のポリイミドフィルムは、その前駆体である一般式(2)
【0022】
【化8】
Figure 0003676073
【0023】
(式中R1、R2は、一般式(1)におけるR1、R2と同じ有機基である。)で表されるポリアミド酸溶液から得られるが、このポリアミド酸溶液は公知の方法で製造することができる。即ちテトラカルボン酸二無水物類と芳香族ジアミン類を実質等モル使用し有機極性溶媒中で重合して得られる。
ポリアミド酸溶液を得るのに用いるテトラカルボン酸二無水物類としては、
1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物、2,5−ジメチル−1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物、2,5−ジクロロ−1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物、2−クロロ−1,4−ヒドロキノンジベンゾエ−ト−3,3’,4,4’−テトラカルボン酸二無水物等が挙げられ、1種または2種以上混合して用いることもできる。
【0024】
また、一般式(A)で表されるテトラカルボン酸二無水物とその他のテトラカルボン酸二無水物類を1種以上混合して用いることもできる。その他のテトラカルボン酸二無水物類としては、3,3’,4,4’−ジフェニルエ−テルテトラカルボン酸二無水物、3,3’,4,4’−ビフェニルテトラカルボン酸二無水物、ピロメリット酸二無水物、3,3’,4,4’−ベンゾフェノンテトラカルボン酸二無水物等が挙げられる。
【0025】
一般式(A)で表されるテトラカルボン酸二無水物類と、その他の酸二無水物類を混合して用いる場合、低吸水性の点で一般式(A)で表されるエステル基を有するテトラカルボン酸二無水物類を主成分とすることが好ましい。
エステル基含有のテトラカルボン酸二無水物類を用いたポリイミドフィルムの低吸水性については、そのメカニズムは明らかになっていないが、電子吸引性の基であるエステル基がイミド基の分極を弱めているからであると推測している。
【0026】
芳香族ジアミン類としては、4,4’−ジアミノベンズアニリド、4,4’−ジアミノ−3,3’−ジクロロベンズアニリド、1,4−ビス(4−アミノフェニルカルバモイル)ベンゼン等が挙げられ、1種または2種以上混合して用いることができる。
一般式(B)で表されるジアミン類とその他のジアミン類を1種類以上混合して用いることもできる。その他のジアミン類としては、パラフェニレンジアミン、2−クロロパラフェニレンジアミン、2,5−ジクロロパラフェニレンジアミン、4,4’−ジアミノ−2,2’−ジメチルビフェニル、4,4’−ジアミノ−2,2’−ジクロロビフェニル、4,4’−ジアミノジフェニルエ−テル類などが挙げられる。特に高弾性率の点から、屈曲性の基が少なくかつ置換基のない4,4’−ジアミノベンズアニリドを主成分とすることが好ましい。
【0027】
ここで、該ポリアミド酸の生成反応に使用される有機溶剤としては、ジメチルスルホキシド、ジエチルスルホキシド等のスルホキシド系溶媒、N,N−ジメチルホルムアミド、N,N−ジエチルホルムアミド等のホルムアミド系溶媒、N,N−ジメチルアセトアミド、N,N−ジエチルアセトアミド等のアセトアミド系溶媒、N−メチル−2−ピロリドン、N−ビニル−2−ピロリドン等のピロリドン系溶媒、フェノ−ル、o−,m−,またはp−クレゾ−ル等のフェノ−ル系溶媒等を挙げることができ、これらを単独または混合物として用いるのが望ましいが、更にキシレン、トルエンのような芳香族炭化水素の使用も可能である。また、このポリアミド酸は、前記の有機極性溶媒中に1〜40重量%、好ましくは5〜25重量%溶解されているのが取り扱いの面からも望ましい。
【0028】
ポリアミド酸の重合においてポリアミド酸の重量平均分子量は、15万以上が好ましく、20万以上が更に好ましい。
重量平均分子量が15万以下であると、強度に劣るポリイミドフィルムが得られるからである。
このポリアミド酸溶液から本発明のポリイミドフィルムを得るには、(1)熱的に脱水しイミド化する熱的方法と(2)脱水剤を用いる化学的方法のいずれを用いてもよいが、伸びや強度などの機械的特性の優れるフィルムを得やすい化学的方法による方がより好ましい。
【0029】
以下に、ポリアミド酸溶液からフィルムを製造する方法を例示する。(1)上記ポリアミド酸溶液をドラムあるいはエンドレスベルト上に流延または塗布して膜状とし、その膜を自己支持性を有するまで150℃以下の温度で約5分〜60分乾燥させる。ついで、これを支持体から引き剥がし端部を固定した後、膜の収縮を制限しながら約100℃〜500℃のまで徐々に加熱することにより乾燥及びイミド化し、冷却後これより取り外し本発明のポリイミドフィルムを得る。
【0030】
上記製造方法において、自己支持性を有するフィルムを支持体から剥がれやすくするためにポリアミド酸溶液にかえてポリアミド酸溶液に剥離剤を加えた混合溶液を用いてもよい。また、化学的方法によりポリイミドフィルムを得る場合は、ポリアミド酸溶液にかえて、ポリアミド酸溶液に化学量論以上の脱水剤と触媒量の3級アミン類を加えた混合溶液を用いればよい。
【0031】
ここで言う剥離剤としては、例えばジエチレングリコ−ルジメチルエ−テル、トリエチレングリコ−ルジメチルエ−テル等の脂肪族エ−テル類、ピリジン、ピコリンなどの3級アミン類、トリフェニルホスフィン、トリフェニルホスフェ−ト等の有機りん化合物類等が挙げられる。
また、脱水剤としては、例えば無水酢酸、無水フタル酸などの脂肪族あるいは芳香族酸無水物類等が挙げられる。触媒としては、例えばトリエチルアミンなどの脂肪族3級アミン、ピリジン、ピコリン、イソキノリン等の複素環式3級アミン類などが挙げられる。
【0032】
更に、フィルムを乾燥またはイミド化させる際に、延伸してもよい。延伸することにより機械的特性に優れるフィルムを得やすいからである。
また、フィルムに接着性や耐熱性、または滑り性等の各種特性を向上させることを目的に、フィルム中に、酸化チタン、炭酸カルシウム、アルミナ、シリカゲル等の微粒子を含有させたり、フィルム表面を、シランカップリング剤などの表面改質剤や微粒子とバインダ−樹脂を含む溶液等を塗布したり、コロナ処理やプラズマ処理などの放電処理などを施してもよい。
【0033】
以上、本発明にかかるポリイミドフィルムについて、製造方法も含め説明したが、本発明は、これらの実施の形態のみに限定されるものではなく、その趣旨を逸脱しない範囲内で当事業者の知識に基づき種々なる改良、修正、変形を加えた態様で実施し得るものである。
【0034】
【実施例】
次に、本発明の実施例をより具体的に説明するが、本発明はこれらの実施例のみによって限定されるものではない。
実施例中、DABAは4,4’−ジアミノベンズアニリド、BDABAは、1,4−ビス(4−アミノフェニルカルバモイル)ベンゼン、ODAは、4,4’−ジアミノジフェニルエ−テル、TMHQは1,4−ヒドロキノンジベンゾエ−ト−3.3’,4,4’−テトラカルボン酸二無水物、PMDAはピロメリット酸二無水物、ODPAは3,3’,4,4’−ジフェニルエ−テルテトラカルボン酸二無水物、NMPはN−メチル−2−ピロリドンを表す。
【0035】
(実施例1)
室温下において、攪拌機を備えた1リットルの三口セパラブルフラスコにDABA 0.1molのNMP溶液にTMHQ 0.095molの粉体を加え、窒素雰囲気で1時間攪拌した。次いで、この溶液にゆっくりとTMHQ 0.005molのNMP溶液を加えて15重量%のポリアミド酸を得た。
【0036】
上記の操作により得られたポリアミド酸溶液から化学的方法によりポリイミドフィルムを作製した。フィルムの作製は、以下のようにして行う。100gのポリアミド酸溶液に無水酢酸15g、β−ピコリン5g、NMP10gを加え充分攪拌した後、PETフィルム上にコ−タ−で塗布し、80℃で10分間加熱し自己支持性を有する膜を得た。この膜をPETから剥したのち、端部を固定して100℃〜450℃へ連続的に加熱し、更に450℃で5分間加熱しイミド化させて、厚みが15μmのポリイミドフィルム得た。
【0037】
得られたフィルムを用い引張試験をASTMD−882に準拠して行い、フィルムの弾性率と強度を求め、結果を表1に示した。更に得られたフィルムの吸水率をASTMD−570に準拠し測定し、結果を表1に示した。
(実施例2)
室温下において、攪拌機を備えた1リットルの三口セパラブルフラスコにBDABA 0.1molのNMP溶液にTMHQ 0.095molの粉体を加え、窒素雰囲気で1時間攪拌した。次いで、この溶液にゆっくりとTMHQ 0.005molのNMP溶液を加えて15重量%のポリアミド酸を得た。
【0038】
得られたポリアミド酸溶液を用いて実施例1と同様にポリイミドフィルムを得て、弾性率、強度と吸水率を測定した。その結果を表1に示す。
(実施例3)
室温下において、攪拌機を備えた1リットルの三口セパラブルフラスコにDABA 0.1molのNMP溶液にTMHQ 0.075molとODPA 0.02molの粉体を加え、窒素雰囲気で1時間攪拌した。次いで、この溶液にゆっくりとTMHQ 0.005molのNMP溶液を加えて15重量%のポリアミド酸を得た。得られたポリアミド酸溶液を用いて実施例1と同様にポリイミドフィルムを得、弾性率、強度と吸水率を測定した。その結果を表1に示す。
【0039】
(実施例4)
室温下において、攪拌機を備えた1リットルの三口セパラブルフラスコにDABA 0.08molとODA 0.02molのNMP溶液にTMHQ 0.095molの粉体を加え、窒素雰囲気で1時間攪拌した。次いで、この溶液にゆっくりとTMHQ 0.005molのNMP溶液を加えて15重量%のポリアミド酸を得た。得られたポリアミド酸溶液を用いて実施例1と同様にポリイミドフィルムを得、弾性率、強度と吸水率を測定した。その結果を表1に示す。
【0040】
(比較例1)
室温下において、攪拌機を備えた1リットルの三口セパラブルフラスコにODA 0.1molのNMP溶液にTMHQ 0.095molの粉体を加え、窒素雰囲気で1時間攪拌した。次いで、この溶液にゆっくりとTMHQ 0.005molのNMP溶液を加えて15重量%のポリアミド酸を得た。
【0041】
得られたポリアミド酸溶液を用いて実施例1と同様にポリイミドフィルムを得て、弾性率、強度と吸水率を測定した。その結果を表1に示す。
(比較例2)
室温下において、攪拌機を備えた1リットルの三口セパラブルフラスコにODA 0.1molのNMP溶液にPMDA 0.095molの粉体を加え、窒素雰囲気で1時間攪拌した。次いで、この溶液にゆっくりとPMDA 0.005molのNMP溶液を加えて15重量%のポリアミド酸を得た。
【0042】
得られたポリアミド酸溶液を用いて実施例1と同様にポリイミドフィルムを得て、弾性率、強度と吸水率を測定した。その結果を表1に示す。
【0043】
【表1】
Figure 0003676073
【0044】
【発明の効果】
以上のように、本発明にかかるポリイミドフィルムは、弾性率が1000kg/mm2以上、吸水率が1.5%以下という、高弾性かつ低吸水性をあわせ有している。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a novel polyimide film excellent in mechanical properties typified by elastic modulus, and excellent in low water absorption and heat resistance, and a method for producing the same.
[0002]
[Prior art]
Conventionally, as polyimide film, from polyimide made of pyromellitic dianhydride and 4,4′-dianodiphenyl ether, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and paraphenylenediamine Polyimide has been widely used, especially because of its excellent heat resistance and electrical insulation characteristics, such as flexible printed wiring boards (hereinafter referred to as FPC) and lead-on-chip (LOC) tape base films in semiconductor devices. It is widely used as a material. Furthermore, since polyimide films are excellent in radiation resistance and cryogenic properties, they are often used for aircraft materials and space materials.
[0003]
[Problems to be solved by the invention]
In recent years, along with the downsizing, thinning, and weight reduction of electronic devices such as computers and mobile phones, there has been a strong demand for downsizing, thinning, and weight reduction of electronic components used therein.
Therefore, an extremely thin film having a thickness of 10 microns or less is demanded as a material for electronic parts even with respect to a polyimide film. However, in the conventional polyimide film, the elastic modulus is insufficient and thinning is becoming difficult. Further, it cannot be used for a thin high-density magnetic recording tape base film that requires high heat resistance and high elastic modulus, and there has been an increasing demand for a polyimide film having a high elastic modulus.
[0004]
As a high elastic modulus polyimide film having an elastic modulus exceeding 1000 kg / mm2, 4,4′-diaminobenzanilide is used as a diamine component, pyromellitic acid or 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, etc. A polyimide film using acid dianhydride has been proposed. However, since diaminobenzanilide has a highly polar amide group, it has a problem that the water absorption of the resulting polyimide film is increased.
[0005]
When the water absorption rate of the polyimide film is high, the hygroscopic dimensional stability is inferior, and when manufacturing a semiconductor device, a package crack is generated by releasing a large amount of moisture absorbed by the film at the time of the sealing process. This is a problem in terms of equal workability and reliability.
Therefore, in view of the actual situation, the present inventors provide a polyimide film that solves the conventional problems, has excellent heat resistance, and has excellent mechanical properties such as high elastic modulus and low water absorption. As a result of intensive studies for the purpose, the present invention has been achieved.
[0006]
[Means for Solving the Problems]
The gist of the polyimide film according to the present invention is the general formula (1).
[0007]
[Formula 4]
Figure 0003676073
[0008]
(In the formula, R1 is
[0009]
[Formula 4]
Figure 0003676073
[0010]
( R represents at least one selected from CH 3 , Cl, and Br , and Z represents an integer of 0 to 4.)
[0011]
[Chemical formula 5]
Figure 0003676073
[0012]
( R represents at least one selected from CH 3 , Cl and Br , and m and n each represents an integer of 0 to 4). ), The elastic modulus is 1000 kg / mm 2 or more, and the water absorption is 1.5% or less (Claim 1). The gist of the method for producing a polyimide film according to the present invention is that a casting method is performed from a polyamic acid solution, which is a precursor of a polyimide film obtained by a polycondensation reaction of tetracarboxylic dianhydrides and diamines. In the method for producing a polyimide film according to claim 1, the polyamic acid has a weight average molecular weight of 150,000 or more (claim 2).
[0013]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an example of an embodiment of a polyimide film according to the present invention will be described.
The polyimide film of the present invention has the general formula (A)
[0014]
[Chemical 7]
Figure 0003676073
[0015]
(Wherein R1 represents the same divalent organic group as R1 in the general formula (1)) and a tetracarboxylic dianhydride containing the ester group represented by the general formula (B)
H 2 N—R 2 —NH 2 (B)
(Wherein R2 represents the same divalent organic group as R2 in the general formula (1)) can be obtained as a raw material.
[0016]
The most typical example of the tetracarboxylic dianhydride represented by the general formula (A) is 1,4-hydroquinone dibenzoate-3,3 ′, 4,4′-tetracarboxylic dianhydride. 2,5-dimethyl-1,4-hydroquinone dibenzoate-3,3 ′, 4,4′-tetracarboxylic dianhydride, 2,5-dichloro-1,4-hydroquinone dibenzoate 3,3 ′, 4,4′-tetracarboxylic dianhydride, 2-chloro-1,4-hydroquinone dibenzoate-3,3 ′, 4,4′-tetracarboxylic dianhydride, etc. In addition, one kind or a mixture of two or more kinds may be used.
[0017]
Here, the tetracarboxylic dianhydride represented by the general formula (A) is a method of reacting trimellitic anhydride monochloride with divalent phenols at room temperature or below, or trimellitic anhydride. And a dimethyl ester of a divalent phenol can be synthesized at a high temperature of 200 to 300 ° C.
Examples of the divalent phenols used as the raw material include hydroquinone, 2-chlorohydroquinone, 2,5-dichlorohydroquinone, 2,3,5,6-tetrachlorohydroquinone, 2,5-dimethylhydroquinone, and the like. Can be mentioned.
[0018]
Next, representative examples of the diamine represented by formula (B) include 4,4′-diaminobenzanilide, 4,4′-diamino-3,3′-dichlorobenzanilide, 1,4-bis (4 -Aminophenylcarbamoyl) benzene etc. are mentioned, It can use 1 type or in mixture of 2 or more types.
The repeating unit represented by the general formula (1) needs to be contained in an amount of 50 mol% or more, preferably 70 mol% or more, more preferably 90 mol% or more in all repeating units.
[0019]
When the content of the repeating unit represented by the general formula (1) is 50% or less, it is difficult to obtain a film having both a high elastic modulus and a low water absorption.
The polyimide film of this invention is not limited to the containing form in all the repeating units of the repeating unit represented by General formula (1). That is, a random copolymer may be sufficient and an alternating copolymer may be sufficient. In particular, a copolymer having a portion in which the length of the segment in which the repeating unit of the general formula (1) is present is constant in the polymer molecule is 20 mol% or more, preferably 50 mol% or more is preferable in terms of mechanical strength.
[0020]
The polyimide film containing the repeating unit represented by the general formula (1) produced as described above can have both an elastic modulus of 1000 kg / mm 2 or more and a water absorption of 1.5% or less.
Next, the manufacturing method of the polyimide film concerning this invention is demonstrated concretely.
[0021]
The polyimide film of the present invention has a general formula (2) which is a precursor thereof.
[0022]
[Chemical 8]
Figure 0003676073
[0023]
(Wherein R1 and R2 are the same organic groups as R1 and R2 in the general formula (1)). This polyamic acid solution can be produced by a known method. it can. That is, it is obtained by polymerizing tetracarboxylic dianhydrides and aromatic diamines in an organic polar solvent using substantially equimolar amounts.
As tetracarboxylic dianhydrides used to obtain a polyamic acid solution,
1,4-hydroquinone dibenzoate-3,3 ', 4,4'-tetracarboxylic dianhydride, 2,5-dimethyl-1,4-hydroquinone dibenzoate-3,3', 4 4′-tetracarboxylic dianhydride, 2,5-dichloro-1,4-hydroquinone dibenzoate-3,3 ′, 4,4′-tetracarboxylic dianhydride, 2-chloro-1,4 -Hydroquinone dibenzoate-3,3 ', 4,4'-tetracarboxylic dianhydride etc. are mentioned, It can also use 1 type or in mixture of 2 or more types.
[0024]
Moreover, the tetracarboxylic dianhydride represented by the general formula (A) and other tetracarboxylic dianhydrides may be used as a mixture. Other tetracarboxylic dianhydrides include 3,3 ′, 4,4′-diphenyl ether tetracarboxylic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride Pyromellitic dianhydride, 3,3 ′, 4,4′-benzophenone tetracarboxylic dianhydride, and the like.
[0025]
When the tetracarboxylic dianhydride represented by the general formula (A) and other acid dianhydrides are mixed and used, the ester group represented by the general formula (A) is reduced in terms of low water absorption. It is preferable that the main component is tetracarboxylic dianhydride.
Although the mechanism of low water absorption of polyimide films using ester group-containing tetracarboxylic dianhydrides has not been clarified, the electron-withdrawing ester group weakens the polarization of the imide group. I guess that is because.
[0026]
Examples of aromatic diamines include 4,4′-diaminobenzanilide, 4,4′-diamino-3,3′-dichlorobenzanilide, 1,4-bis (4-aminophenylcarbamoyl) benzene, and the like. One or a mixture of two or more can be used.
One or more diamines represented by the general formula (B) and other diamines may be mixed and used. Other diamines include paraphenylene diamine, 2-chloroparaphenylene diamine, 2,5-dichloroparaphenylene diamine, 4,4′-diamino-2,2′-dimethylbiphenyl, 4,4′-diamino-2. 2,2'-dichlorobiphenyl, 4,4'-diaminodiphenyl ether, and the like. In particular, from the viewpoint of a high elastic modulus, it is preferable that 4,4′-diaminobenzanilide having few flexible groups and no substituents as a main component.
[0027]
Here, examples of the organic solvent used in the polyamic acid formation reaction include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, formamide solvents such as N, N-dimethylformamide and N, N-diethylformamide, N, Acetamide solvents such as N-dimethylacetamide and N, N-diethylacetamide, pyrrolidone solvents such as N-methyl-2-pyrrolidone and N-vinyl-2-pyrrolidone, phenol, o-, m-, or p -Phenolic solvents such as cresol can be used, and these are preferably used alone or as a mixture, but aromatic hydrocarbons such as xylene and toluene can also be used. Further, it is desirable from the viewpoint of handling that the polyamic acid is dissolved in the organic polar solvent in an amount of 1 to 40% by weight, preferably 5 to 25% by weight.
[0028]
In the polymerization of polyamic acid, the weight average molecular weight of the polyamic acid is preferably 150,000 or more, and more preferably 200,000 or more.
This is because when the weight average molecular weight is 150,000 or less, a polyimide film having poor strength can be obtained.
In order to obtain the polyimide film of the present invention from this polyamic acid solution, either (1) a thermal method of dehydrating and imidizing thermally or (2) a chemical method using a dehydrating agent may be used. It is more preferable to use a chemical method that facilitates obtaining a film having excellent mechanical properties such as strength and strength.
[0029]
Below, the method of manufacturing a film from a polyamic acid solution is illustrated. (1) The polyamic acid solution is cast or coated on a drum or endless belt to form a film, and the film is dried at a temperature of 150 ° C. or lower for about 5 to 60 minutes until it has self-supporting properties. Then, after peeling off this from the support and fixing the end, it is dried and imidized by gradually heating to about 100 ° C. to 500 ° C. while restricting the shrinkage of the membrane, and after cooling it is removed from it and removed from this. A polyimide film is obtained.
[0030]
In the above production method, a mixed solution in which a release agent is added to the polyamic acid solution may be used instead of the polyamic acid solution in order to make the film having self-supporting property easy to peel off from the support. When a polyimide film is obtained by a chemical method, a mixed solution in which a dehydrating agent of a stoichiometric amount or more and a catalytic amount of tertiary amines are added to the polyamic acid solution may be used instead of the polyamic acid solution.
[0031]
Examples of the release agent herein include aliphatic ethers such as diethylene glycol dimethyl ether and triethylene glycol dimethyl ether, tertiary amines such as pyridine and picoline, triphenyl phosphine, and triphenyl phosphate. And organic phosphorus compounds such as
Examples of the dehydrating agent include aliphatic or aromatic acid anhydrides such as acetic anhydride and phthalic anhydride. Examples of the catalyst include aliphatic tertiary amines such as triethylamine, and heterocyclic tertiary amines such as pyridine, picoline, and isoquinoline.
[0032]
Further, the film may be stretched when it is dried or imidized. This is because it is easy to obtain a film having excellent mechanical properties by stretching.
In addition, for the purpose of improving various properties such as adhesiveness, heat resistance, or slipperiness in the film, the film may contain fine particles such as titanium oxide, calcium carbonate, alumina, silica gel, A surface modifier such as a silane coupling agent or a solution containing fine particles and a binder resin may be applied, or a discharge treatment such as a corona treatment or a plasma treatment may be performed.
[0033]
As mentioned above, although the manufacturing method was demonstrated about the polyimide film concerning this invention, this invention is not limited only to these embodiment, In the range which does not deviate from the meaning, it is knowledge of this operator. Based on this, the present invention can be implemented with various improvements, corrections, and modifications.
[0034]
【Example】
Next, examples of the present invention will be described more specifically. However, the present invention is not limited only to these examples.
In Examples, DABA is 4,4′-diaminobenzanilide, BDABA is 1,4-bis (4-aminophenylcarbamoyl) benzene, ODA is 4,4′-diaminodiphenyl ether, TMHQ is 1, 4-hydroquinone dibenzoate-3.3 ', 4,4'-tetracarboxylic dianhydride, PMDA is pyromellitic dianhydride, ODPA is 3,3', 4,4'-diphenyl ether Tetracarboxylic dianhydride, NMP represents N-methyl-2-pyrrolidone.
[0035]
(Example 1)
Under room temperature, TMHQ 0.095 mol powder was added to DAMP 0.1 mol NMP solution in a 1 liter three-necked separable flask equipped with a stirrer, and the mixture was stirred for 1 hour in a nitrogen atmosphere. Subsequently, TMHQ 0.005 mol of NMP solution was slowly added to this solution to obtain 15% by weight of polyamic acid.
[0036]
A polyimide film was produced from the polyamic acid solution obtained by the above operation by a chemical method. The film is produced as follows. To 100 g of polyamic acid solution, 15 g of acetic anhydride, 5 g of β-picoline and 10 g of NMP were added and stirred sufficiently. It was. After peeling off this film from PET, the end portion was fixed and continuously heated to 100 ° C. to 450 ° C., and further imidized by heating at 450 ° C. for 5 minutes to obtain a polyimide film having a thickness of 15 μm.
[0037]
Using the obtained film, a tensile test was conducted according to ASTM D-882, the elastic modulus and strength of the film were determined, and the results are shown in Table 1. Further, the water absorption of the obtained film was measured according to ASTM D-570, and the results are shown in Table 1.
(Example 2)
Under room temperature, TMHQ 0.095 mol powder was added to BMPA 0.1 mol NMP solution in a 1 liter three-necked separable flask equipped with a stirrer, and the mixture was stirred for 1 hour in a nitrogen atmosphere. Subsequently, TMHQ 0.005 mol of NMP solution was slowly added to this solution to obtain 15% by weight of polyamic acid.
[0038]
Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength, and water absorption were measured. The results are shown in Table 1.
(Example 3)
Under room temperature, powder of TMHQ 0.075 mol and ODPA 0.02 mol was added to NMP solution of DABA 0.1 mol in a 1 liter three-necked separable flask equipped with a stirrer, and stirred for 1 hour in a nitrogen atmosphere. Subsequently, TMHQ 0.005 mol of NMP solution was slowly added to this solution to obtain 15% by weight of polyamic acid. Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength, and water absorption were measured. The results are shown in Table 1.
[0039]
(Example 4)
Under room temperature, a powder of TMHQ 0.095 mol was added to an NMP solution of DABA 0.08 mol and ODA 0.02 mol in a 1 liter three-necked separable flask equipped with a stirrer, and stirred in a nitrogen atmosphere for 1 hour. Subsequently, TMHQ 0.005 mol of NMP solution was slowly added to this solution to obtain 15% by weight of polyamic acid. Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength, and water absorption were measured. The results are shown in Table 1.
[0040]
(Comparative Example 1)
Under room temperature, TMHQ 0.095 mol powder was added to ODA 0.1 mol NMP solution in a 1 liter three-necked separable flask equipped with a stirrer, and the mixture was stirred in a nitrogen atmosphere for 1 hour. Subsequently, TMHQ 0.005 mol of NMP solution was slowly added to this solution to obtain 15% by weight of polyamic acid.
[0041]
Using the obtained polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength, and water absorption were measured. The results are shown in Table 1.
(Comparative Example 2)
Under room temperature, PMDA 0.095 mol powder was added to ODA 0.1 mol NMP solution in a 1 liter three-necked separable flask equipped with a stirrer, and the mixture was stirred in a nitrogen atmosphere for 1 hour. Next, PMDA 0.005 mol of NMP solution was slowly added to this solution to obtain 15 wt% polyamic acid.
[0042]
Using the resulting polyamic acid solution, a polyimide film was obtained in the same manner as in Example 1, and the elastic modulus, strength, and water absorption were measured. The results are shown in Table 1.
[0043]
[Table 1]
Figure 0003676073
[0044]
【The invention's effect】
As described above, the polyimide film according to the present invention has both high elasticity and low water absorption such as an elastic modulus of 1000 kg / mm 2 or more and a water absorption of 1.5% or less.

Claims (2)

下記一般式(1)
Figure 0003676073
(但し、式中、R1は、下記
Figure 0003676073
Rは、CH 3 、Cl、Brから選択される少なくとも1種、Zは0〜4の整数を表す。)で表される有機基から選択される少なくとも1種、R2は下記
Figure 0003676073
Rは、CH 3 、Cl、Brから選択される少なくとも1種、mおよびnは0〜4の整数を表す。)で表される有機基から選択される少なくとも1種を示す。)で表される繰り返し単位を含有してなる、弾性率が1000kg/mm2以上を有し、かつ吸水率が1.5%以下を併せ有することを特徴とするポリイミドフィルム。
The following general formula (1)
Figure 0003676073
(In the formula, R1 is as follows.
Figure 0003676073
( R represents at least one selected from CH 3 , Cl, and Br , Z represents an integer of 0 to 4), and R 2 represents the following:
Figure 0003676073
( R represents at least one selected from CH 3 , Cl and Br , and m and n each represents an integer of 0 to 4). A polyimide film comprising a repeating unit represented by the formula (1) having an elastic modulus of 1000 kg / mm 2 or more and a water absorption of 1.5% or less.
テトラカルボン酸二無水物類とジアミン類との重縮合反応によって得られるポリイミドフィルムの前駆体であるポリアミド酸の溶液から流延法にて請求項1に記載するポリイミドフィルムを製造する方法において、前記ポリアミド酸の重量平均分子量が15万以上であることを特徴とするポリイミドフィルムの製造方法In the method for producing a polyimide film according to claim 1 by a casting method from a solution of a polyamic acid which is a precursor of a polyimide film obtained by a polycondensation reaction of tetracarboxylic dianhydrides and diamines, A method for producing a polyimide film, wherein the polyamic acid has a weight average molecular weight of 150,000 or more
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