JPS6211727A - Aromatic polyimide and composition thereof - Google Patents

Aromatic polyimide and composition thereof

Info

Publication number
JPS6211727A
JPS6211727A JP15043885A JP15043885A JPS6211727A JP S6211727 A JPS6211727 A JP S6211727A JP 15043885 A JP15043885 A JP 15043885A JP 15043885 A JP15043885 A JP 15043885A JP S6211727 A JPS6211727 A JP S6211727A
Authority
JP
Japan
Prior art keywords
aromatic polyimide
aromatic
aminophenoxy
organic polar
polar solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15043885A
Other languages
Japanese (ja)
Other versions
JPH0374702B2 (en
Inventor
Tsunetomo Nakano
中野 常朝
Kohei Nakajima
中島 紘平
Kazuaki Nishio
一章 西尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP15043885A priority Critical patent/JPS6211727A/en
Publication of JPS6211727A publication Critical patent/JPS6211727A/en
Publication of JPH0374702B2 publication Critical patent/JPH0374702B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To produce the titled polyimide soluble in organic polar solvent and suitable for varnish, etc., by polymerizing an acid component composed mainly of biphenyltetracarboxylic acid and a diamine component composed mainly of di(aminophenoxy) benzene, and imidating the polymer. CONSTITUTION:The objective polyimide having a logarithmic viscosity of 0.2-5.0 can be produced by heating (A) an aromatic tetracarboxylic acid component containing preferably >=80 mol% biphenyltetracarboxylic acid and (B) nearly equimolar amount of an aromatic diamine component containing preferably >=80mol% di(aminophenoxy)benzene of formula in an organic polar solvent (e.g. N, N-dimethyl sulfoxide) e.g. at 100-300 deg.C, thereby causing the polymerization imidation reaction. USE:The polymer is dissolved in an organic polar solvent at a concentration of 1-30wt% and used as a varnish.

Description

【発明の詳細な説明】 〔本発明の技術分野〕 本発明は、有機極性溶媒に対する可溶性および耐熱性が
優れている特定の芳香族ポリイミドに係るものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a specific aromatic polyimide that has excellent solubility in organic polar solvents and excellent heat resistance.

本発明の芳香族ポリイミドは、電気的性質、機械的性質
などにおいて優れていると共に、有機溶媒に対する溶解
性(可溶性)および耐熱性が優れているので、種々の電
気または電子部品の電気絶縁用の保護膜を形成するため
の本発明の芳香族ポリイミド組成物(フェス)を容易に
調製することができ、さらに、この芳香族ポリイミド組
成物を種々の電気または電子部品の表面に塗布して電気
絶縁用の保護膜を形成することができる。
The aromatic polyimide of the present invention has excellent electrical properties, mechanical properties, etc., as well as excellent solubility in organic solvents and heat resistance, so it can be used for electrical insulation of various electrical or electronic parts. The aromatic polyimide composition (face) of the present invention for forming a protective film can be easily prepared, and the aromatic polyimide composition can also be applied to the surfaces of various electrical or electronic components to provide electrical insulation. It is possible to form a protective film for

〔公知技術の説明〕[Description of known technology]

芳香族ポリイミドを、電気絶縁性の保護膜(層間絶縁膜
など)として使用することは、電気または電子材料工業
において、例えば、特開昭48−34686号公報、特
開昭49−40077号公報などに示、されているよう
に、固体素子への絶縁膜、パッシベーション膜の形成材
料、半導体集積回路などの層間絶縁膜などにおいて、耐
熱性および絶縁性などの優れた性質からポリイミドで形
成することが、すでに種々提案されている。
The use of aromatic polyimide as an electrically insulating protective film (such as an interlayer insulating film) is known in the electrical or electronic materials industry, for example, in JP-A-48-34686 and JP-A-49-40077. As shown in , polyimide can be used as a material for forming insulating films for solid-state devices, passivation films, and interlayer insulating films for semiconductor integrated circuits due to its excellent properties such as heat resistance and insulating properties. , various proposals have already been made.

しかしながら、一般的に、芳香族ポリイミドは、有機溶
媒に溶解し難いために、芳香族ポリイミドの前駆体(芳
香族ポリアミック酸)の溶液を使用して、塗布膜を形成
し、次いで、乾燥とイミド化のために塗布膜を、かなり
の高温で長時間、加熱処理して、芳香族ポリイミド製の
保護膜を形成する必要があり、芳香族ポリイミド製の保
護膜を比較的低温で再現性よく形成できるものではなか
ったので、保護すべき電気または電子材料自体が熱的に
劣化してしまうという問題があった。
However, since aromatic polyimide is generally difficult to dissolve in organic solvents, a solution of an aromatic polyimide precursor (aromatic polyamic acid) is used to form a coating film, and then dried and imide coated. In order to form a protective film made of aromatic polyimide, it is necessary to heat-treat the coated film at a fairly high temperature for a long time to form a protective film made of aromatic polyimide at a relatively low temperature. However, there was a problem in that the electrical or electronic materials themselves to be protected would be thermally degraded.

一方、有機極性溶媒に可溶性の芳香族ポリイミドとして
は、例えば、特公昭57−41491号公報に記載され
ているようなポリイミドが知られており、これらの芳香
族ポリイミドは、一般にかなりの溶解性および耐熱性を
有しているが、必ずしも実質的に満足し得るものではな
く、例えば、ポリイミド溶液を調製する場合に長時間を
要したり、一旦物品の表面に形成したポリイミド被膜を
除去する場合に容易でない等、種々の保護膜として使用
する場合に問題があった。
On the other hand, as aromatic polyimides soluble in organic polar solvents, for example, polyimides such as those described in Japanese Patent Publication No. 57-41491 are known, and these aromatic polyimides generally have considerable solubility and Although it has heat resistance, it is not necessarily substantially satisfactory; for example, it takes a long time to prepare a polyimide solution, or it is difficult to remove a polyimide film once formed on the surface of an article. There were problems when using it as various protective films, such as that it was not easy to use.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者らは、優れた溶解性および耐熱性を共に有して
いる芳香族ポリイミドを提供すべく鋭意研究した結果、
ビフェニルテトラカルボン酸類と、ジ(アミノフェノキ
シ)ベンゼン類とを、重合およびイミド化して得られた
芳香族ポリイミドが、有機極性溶媒に対する優れた溶解
性を有しており、しかも高い耐熱性を有していることを
見い出し、本発明を完成した。
As a result of intensive research to provide an aromatic polyimide that has both excellent solubility and heat resistance, the present inventors found that
The aromatic polyimide obtained by polymerizing and imidizing biphenyltetracarboxylic acids and di(aminophenoxy)benzenes has excellent solubility in organic polar solvents and high heat resistance. The present invention was completed based on the discovery that

すなわち、本発明は、ビフェニルテトラカルボン酸類を
主成分とする芳香族テトラカルボン酸成分と、 で示されるジ(アミノフェノキシ)ベンゼン類を主成分
とする芳香族ジアミン成分とから、重合およびイミド化
によって得られた可溶性芳香族ポリイミドを提供するも
のである。
That is, the present invention provides an aromatic tetracarboxylic acid component mainly composed of biphenyltetracarboxylic acids and an aromatic diamine component mainly composed of di(aminophenoxy)benzenes represented by the following, by polymerization and imidization. The obtained soluble aromatic polyimide is provided.

また、本発明は、前述の芳香族ポリイミドが、有機極性
溶媒に均一に溶解している芳香族ポリイミド組成物を提
供するものである。
Further, the present invention provides an aromatic polyimide composition in which the above-mentioned aromatic polyimide is uniformly dissolved in an organic polar solvent.

〔本発明の詳細な説明〕[Detailed description of the invention]

本発明の芳香族ポリイミドは、ビフェニルテトラカルボ
ン酸類を、好ましくは80%モル以上含有している芳香
族テトラカルボン酸成分と、一般式 で示されるジ(アミノフェノキン)ベンゼン類を、好ま
しくは80モル%以上含有している芳香族ジアミン成分
とを、略等モル、有機極性溶媒中で、かなり高温(好ま
しくは約100〜300℃の温度、特に好ましくは14
0〜250℃の温度)に加熱して、一段で重合およびイ
ミド化することによって製造されるか、あるいは、前記
の二成分を、略等モル、有機極性溶媒中で、好ましくは
約80℃以下の温度、特に0〜60℃の温度で重合して
芳香族ポリアミック酸(芳香族ポリイミドの前駆体)を
製造し、その芳香族ポリアミック酸を適当な条件でイミ
ド化して製造される可溶性芳香族ポリイミドである。
The aromatic polyimide of the present invention preferably contains an aromatic tetracarboxylic acid component containing biphenyltetracarboxylic acids, preferably 80% or more by mole, and di(aminophenoquine)benzenes represented by the general formula, preferably 80% by mole or more. The aromatic diamine component containing at least mol% of the aromatic diamine component is mixed in approximately equimolar amounts in an organic polar solvent at a fairly high temperature (preferably at a temperature of about 100 to 300°C, particularly preferably at a temperature of about 14°C).
0 to 250°C) and polymerization and imidization in one step, or the above two components are mixed in approximately equimolar amounts in an organic polar solvent, preferably at a temperature of about 80°C or less. Soluble aromatic polyimide produced by polymerizing aromatic polyamic acid (precursor of aromatic polyimide) at a temperature of 0 to 60 °C, in particular, and imidizing the aromatic polyamic acid under appropriate conditions. It is.

前記のビフェニルテトラカルボン酸類としては、3.3
“、4.4°〜ビフエニルテトラカルボン酸またはその
酸二無水物、2,3.3”、4’−ビフェニルテトラカ
ルボン酸またはその酸二無水物、あるいは、上記の芳香
族テトラカルボン酸のエステル化物または塩などでもよ
い。本発明では、2,3.3′、4′−ビフェニルテト
ラカルボン酸またはその酸二無水物は、得られる芳香族
ポリイミドが極めて溶解性などが優れているので、最適
である。
The above biphenyltetracarboxylic acids include 3.3
", 4.4° ~ biphenyltetracarboxylic acid or its acid dianhydride, 2,3.3", 4'-biphenyltetracarboxylic acid or its acid dianhydride, or the above aromatic tetracarboxylic acid. It may also be an esterified product or a salt. In the present invention, 2,3.3',4'-biphenyltetracarboxylic acid or its acid dianhydride is most suitable because the resulting aromatic polyimide has extremely good solubility.

前記の芳香族テトラカルボン酸成分は、前記のビフェニ
ルテトラカルボン酸類の一部を、例えば、3.3’ 、
4.4’−ベンゾフェノンテトラカルボン酸またはその
酸二無水物、2.3.3’、4°−ベンゾフェノンテト
ラカルボン酸またはその酸二無水物、ピロメリット酸ま
たはその酸二無水物などのその他の芳香族テトラカルボ
ン酸類で置き換えて、前記のビフェニルテトラカルボン
酸類と共に使用することができる。前記のrその他の芳
香族テトラカルボン酸類jの使用量の割合は、全芳香族
テトラカルボン酸成分に対して約20モル%未満、特に
10モル%未満であることが好ましい。
The aromatic tetracarboxylic acid component includes a portion of the biphenyltetracarboxylic acids, for example, 3.3',
4.4'-benzophenonetetracarboxylic acid or its acid dianhydride, 2.3', 4°-benzophenonetetracarboxylic acid or its acid dianhydride, pyromellitic acid or other acid dianhydrides, etc. Aromatic tetracarboxylic acids can be substituted and used together with the above-mentioned biphenyltetracarboxylic acids. The proportion of the above-mentioned r and other aromatic tetracarboxylic acids j to be used is preferably less than about 20 mol%, particularly less than 10 mol%, based on the total aromatic tetracarboxylic acid component.

また、前記の芳香族ジアミン成分の主成分である「前記
の一般式で示されるジ(アミノフェノキシ)ベンゼン類
jとしては、例えば、l、4−ジ(4−アミノフェノキ
シ)ベンゼン、1.3−ジ(4−アミノフェノキシ)ベ
ンゼン、1.4〜ジ(3−7ミノフエノキシ)ベンゼン
、1−(p−アミノフェノキシ) −4−(o−アミノ
フェノキシ)ベンゼンなどを挙げることができる。前記
のジ(アミノフェノキシ)、ベンゼン類としては、前述
の芳香族ジアミン化合物のベンゼン環の水素の少なくと
も一つが、適当な置換基(例えば、メチル基、エチル基
、プロピル基などの低級アルキル基、メトキシ基、エト
キシ基などのアルコキシ基などの置換基)で置換されて
いてもよい。
In addition, examples of the di(aminophenoxy)benzenes j represented by the above general formula, which are the main components of the aromatic diamine component, include l,4-di(4-aminophenoxy)benzene, 1.3 -di(4-aminophenoxy)benzene, 1.4-di(3-7minophenoxy)benzene, 1-(p-aminophenoxy)-4-(o-aminophenoxy)benzene, etc. As for di(aminophenoxy) and benzenes, at least one hydrogen of the benzene ring of the above-mentioned aromatic diamine compound is a suitable substituent (for example, a lower alkyl group such as a methyl group, an ethyl group, a propyl group, or a methoxy group). , an alkoxy group such as an ethoxy group).

前記の芳香族ジアミン成分は、前記ジ(アミノフェノキ
シ)ベンゼン類の一部を、例えば、パラフェニレンジア
ミン、メタフェニレンジアミン、2.4−ジアミノトル
エン、4,4”−ジアミノジフェニルエーテル、4,4
゛−ジアミノジフェニルメタン、0−)リジン、1.4
−ビス(4−アミノフェノキシ)ベンゼン、0−)リジ
ンスルホンなどのその他の芳香族ジアミン化合物などで
置き換えて、前記ジ(アミノフェノキシ)ベンゼン類と
共に使用することができる。前述の「その他の芳香族ジ
アミン化合物」の使用量の割合は、全芳香族ジアミン成
分に対して約20モル%未満、特に10モル%未満であ
ることが、好ましい。
The aromatic diamine component includes a portion of the di(aminophenoxy)benzenes, such as paraphenylenediamine, metaphenylenediamine, 2,4-diaminotoluene, 4,4''-diaminodiphenyl ether, 4,4
゛-Diaminodiphenylmethane, 0-)lysine, 1.4
-Bis(4-aminophenoxy)benzene, other aromatic diamine compounds such as 0-)lysine sulfone, etc. can be substituted and used together with the di(aminophenoxy)benzenes. The proportion of the above-mentioned "other aromatic diamine compound" to be used is preferably less than about 20 mol%, particularly less than 10 mol%, based on the total aromatic diamine component.

前記の重合に使用される有機極性溶媒としては、例えば
、N、N−ジメチルスルホキシド、N、N−ジエチルス
ルホキシドなどのスルホキシド系溶媒、N、N−ジメチ
ルホルムアミド、N、N−ジエチルホルムアミドなどの
ホルムアミド系溶媒、N、N−ジメチルアセトアミド、
N、N−ジエチルホルムアミドなどのホルムアミド系溶
媒、N−メチル−2−とロリドン、N−ビニル−2−ピ
ロリドンなどのピロリドン系溶媒、ヘキサメチレンスル
ホキシド、T−ブチロラクトン等、あるいは、フェノー
ル、0−lm−又はp−クレゾール、キシレノール、ハ
ロゲン化フェノール(パラクロルフェノール、オルトク
ロルフェノール、パラブロムフェノールなど)、カテコ
ール等のフェノール系溶媒などを挙げることができる。
Examples of the organic polar solvent used in the polymerization include sulfoxide solvents such as N,N-dimethylsulfoxide and N,N-diethylsulfoxide, and formamides such as N,N-dimethylformamide and N,N-diethylformamide. system solvent, N,N-dimethylacetamide,
Formamide solvents such as N,N-diethylformamide, N-methyl-2- and lolidone, pyrrolidone solvents such as N-vinyl-2-pyrrolidone, hexamethylene sulfoxide, T-butyrolactone, etc., or phenol, 0-lm Examples include phenolic solvents such as - or p-cresol, xylenol, halogenated phenols (parachlorophenol, orthochlorophenol, parabromophenol, etc.), and catechol.

本発明の芳香族ポリイミドは、高分子量のポリマーであ
り、例えば、濃度; 0.5 g /100鴎!溶媒(
N−メチル−2−ピロリドン)である溶液で、30℃の
測定温度で測定した対数粘度(ポリマーの重合度の程度
を示す)が、0.2〜5.0であること、特に0.3〜
3.0程度であることが好ましい。
The aromatic polyimide of the present invention is a polymer with a high molecular weight, for example, a concentration of 0.5 g/100 gu! solvent(
The logarithmic viscosity (indicating the degree of polymerization of the polymer) measured at a measurement temperature of 30°C in a solution of N-methyl-2-pyrrolidone) is from 0.2 to 5.0, in particular 0.3 ~
It is preferably about 3.0.

本発明の芳香族ポリイミドは、前述の重合で使用された
有機極性溶媒と同様の有機極性溶媒、または、それらの
有機極性溶媒にキシレン、エチルセロソルブ、ジグライ
ム、ジオキサンなどを一部配合されている混合溶媒に極
めて容易に短時間で溶解するので、芳香族ポリイミドが
有機極性溶媒中に濃度約1〜30重量%、特に3〜25
重量%で、均一に溶解しており、25℃の回転粘度が約
0、1〜100000ボイス、特に1〜10000ボイ
スである芳香族ポリイミドの溶液(ワニスまたは製膜用
のドープ液となる)、すなわち、r本発明の芳香族ポリ
イミド組成物jを調製することができる。
The aromatic polyimide of the present invention can be produced using an organic polar solvent similar to the organic polar solvent used in the above-mentioned polymerization, or a mixture of these organic polar solvents partially containing xylene, ethyl cellosolve, diglyme, dioxane, etc. Since aromatic polyimides dissolve very easily in solvents in a short time, aromatic polyimides can be dissolved in organic polar solvents at concentrations of about 1 to 30% by weight, especially 3 to 25% by weight.
A solution of an aromatic polyimide that is uniformly dissolved in weight% and has a rotational viscosity of about 0.1 to 100,000 voices at 25°C, particularly 1 to 10,000 voices (to be used as a varnish or a dope solution for film formation); That is, the aromatic polyimide composition j of the present invention can be prepared.

本発明の芳香族ポリイミド組成物は、前述のようにして
モノマー成分を有機極性溶媒中で一段で重合およびイミ
ド化して得られた芳香族ポリイミドの重合液であっても
よく、またその重合液をその重合溶媒と同様の有機極性
溶媒で適当な濃度に希釈したものであってもよい。ある
いは、本発明の芳香族ポリイミド組成物は、前述の重合
液から一旦粉末状の析出物として単離された芳香族ポリ
イミド粉末を前記の有機極性溶媒に溶解して調製するこ
ともできる。
The aromatic polyimide composition of the present invention may be a polymerization solution of an aromatic polyimide obtained by polymerizing and imidizing monomer components in one step in an organic polar solvent as described above, or It may be diluted to an appropriate concentration with the same organic polar solvent as the polymerization solvent. Alternatively, the aromatic polyimide composition of the present invention can also be prepared by dissolving the aromatic polyimide powder, which has been isolated as a powdery precipitate from the above-mentioned polymerization solution, in the above-mentioned organic polar solvent.

本発明の芳香族ポリイミド組成物は、例えば、被覆すべ
き対象物(回路基板、光センサーなど)の表面に、常温
または加温下、回転塗布機または印刷機などを使用する
適当な方法で、均一な厚さに塗布し、前記組成物(芳香
族ポリイミド溶液)の塗布膜を形成し、次いで、その塗
布膜を約50°C以上、特に60〜250℃の温度で乾
燥させることによって、透明な芳香族ポリイミドの固化
膜を製造することができる。
The aromatic polyimide composition of the present invention can be coated, for example, on the surface of an object to be coated (circuit board, optical sensor, etc.) by an appropriate method using a spin coating machine or a printing machine at room temperature or under heating. By applying the composition to a uniform thickness to form a coating film of the composition (aromatic polyimide solution), and then drying the coating film at a temperature of about 50°C or higher, particularly 60 to 250°C, transparent A solidified film of aromatic polyimide can be produced.

本発明の芳香族ポリイミド組成物では、前記の有機極性
溶媒として、特にスルホキシド系溶媒、ホルムアミド系
溶媒、アセトアミド系溶媒、ピロリドン系溶媒、または
ヘキサメチレンホスホアミドなどのアミド系溶媒が使用
されている場合には、前記の乾燥温度を約60〜200
℃、特に80〜180°Cの比較的低温とすることがで
きるので、適当である。
In the aromatic polyimide composition of the present invention, especially when a sulfoxide solvent, a formamide solvent, an acetamide solvent, a pyrrolidone solvent, or an amide solvent such as hexamethylene phosphoamide is used as the organic polar solvent. For this, the drying temperature is set to about 60-200℃.
It is suitable because it can be carried out at a relatively low temperature, particularly 80 to 180°C.

〔実施例〕〔Example〕

実施例1 N−メチル−2−ピロリドン(NMP)18.0m l
 ニ、2,3.3’ 、4’−ヒフェニルテトラカルボ
ン酸二無水物1.64gおよび14−ジ(4−アミノフ
ェノキシ)ベンゼン1.64gを加え、窒素ガスを流通
し攪拌しながら、その反応液を20°Cの反応温度で、
5時間保持して、重合を行い、芳香族ポリアミック酸を
生成した。
Example 1 N-methyl-2-pyrrolidone (NMP) 18.0ml
1.64 g of d,2,3.3',4'-hyphenyltetracarboxylic dianhydride and 1.64 g of 14-di(4-aminophenoxy)benzene were added, and the mixture was stirred while flowing nitrogen gas. The reaction solution was heated at a reaction temperature of 20°C.
The mixture was held for 5 hours to perform polymerization and produce aromatic polyamic acid.

次に、この芳香族ポリアミック酸の溶液にさらにNMP
55.8mI!、を加えて希釈した後、無水酢酸11.
14gおよびピリジン4.26 gを加え、50℃で3
時間イミド化反応させて、芳香族ポリイミドを生成させ
、さらにこの溶液にメタノールを添加して、生成してい
る芳香族ポリイミドを析出させ、濾過して、芳香族ポリ
イミド粉末を得た。
Next, add NMP to this aromatic polyamic acid solution.
55.8mI! , and then acetic anhydride 11.
14 g and 4.26 g of pyridine were added and heated at 50°C.
Aromatic polyimide was produced by a time imidization reaction, and methanol was added to this solution to precipitate the produced aromatic polyimide, which was filtered to obtain aromatic polyimide powder.

この芳香族ポリイミド粉末について、NMPに約30℃
で溶解して、対数粘度(濃度;0.5g/100m l
溶媒、測定温度;30℃)を測定した。
About this aromatic polyimide powder, about 30 ° C.
Logarithmic viscosity (concentration; 0.5 g/100 ml)
Solvent and measurement temperature: 30°C) were measured.

また、前述のようにして得られた芳香族ポリイミド粉末
をNMPに約30℃で溶解して、濃度約14重量%の均
一な芳香族ポリイミド溶液を調製した。
Further, the aromatic polyimide powder obtained as described above was dissolved in NMP at about 30° C. to prepare a uniform aromatic polyimide solution having a concentration of about 14% by weight.

次いで、この芳香族ポリイミド溶液をSiO□がコーテ
ィングされているガラス上に、回転塗布機(1000〜
3000rpm )を使用して塗布し、80℃で60分
間加熱し乾燥させ、10μの厚さの芳香族ポリイミド製
の薄膜を形成させた。
Next, this aromatic polyimide solution was applied onto the glass coated with SiO□ using a spin coating machine (1000 ~
3000 rpm) and heated and dried at 80° C. for 60 minutes to form a thin film made of aromatic polyimide with a thickness of 10 μm.

この薄膜の1 ciを切出し50mj!のNMP中で2
5℃での溶解性(この試験片が溶は終わる迄の時間)を
測定した。
Cut out 1 ci of this thin film and get 50mj! 2 in NMP of
The solubility at 5°C (time taken until the test piece stops dissolving) was measured.

また、この薄膜を空気中で350℃で30分間熱処理し
た膜について、熱重量分析器(デュポン社製、951型
)を使用して、熱分解開始温度を測定した。
Further, the thermal decomposition onset temperature of the thin film heat-treated in air at 350° C. for 30 minutes was measured using a thermogravimetric analyzer (manufactured by DuPont, Model 951).

これらの測定結果(対数粘度、溶解性及び熱分解開始l
L度)を後記第1表に示す。
These measurement results (logarithmic viscosity, solubility and onset of thermal decomposition)
L degrees) are shown in Table 1 below.

また、前述のようにして得られた芳香族ポリイミドにつ
いて、その機械的性質(引張強度及び伸び率)及び電気
的性質(誘電率、誘電正接、体積抵抗率及び絶縁破壊電
圧)を測定した。引張強度及び伸び率の測定は、長さ2
0mmx幅2+11111X厚さ10μの大きさの試験
片を作成し、この試験片を用いて通常の引張試験機によ
り引張速度51/分で行った。また、誘電率、誘電正接
及び体積抵抗率の測定は、JIS C−6481に準し
て行い、また絶縁破壊電圧の測定は、J!S C−21
10に準じて行った。
Furthermore, the mechanical properties (tensile strength and elongation) and electrical properties (dielectric constant, dielectric loss tangent, volume resistivity, and dielectric breakdown voltage) of the aromatic polyimide obtained as described above were measured. Measurements of tensile strength and elongation are made at length 2
A test piece with a size of 0 mm x width 2 + 11111 x thickness 10 μm was prepared, and this test piece was used in a normal tensile tester at a tensile rate of 51/min. In addition, measurements of dielectric constant, dielectric loss tangent, and volume resistivity were performed according to JIS C-6481, and measurements of dielectric breakdown voltage were performed according to J! SC-21
The procedure was carried out according to 10.

これらの測定結果は下記の通りであった。The results of these measurements were as follows.

機械的性質 引張り強度   11.0 Kg/mm”伸び率 15
% 電気的性質 誘 電 率6 2.8 誘電正接tanδ 0.005 体積抵抗率   lXl0’Ω/ cm絶縁破壊電圧 
 250 KV/ mm実施例2 N−メチル−2−ピロリドン(NMP)22.0mll
に、3.3’、4.4’−ビフェニルテトラカルボン酸
二無水物2.OOgおよび1.4−ジ(4−アミノフェ
ノキシ)ベンゼン1.99 gを加え、窒素雰囲気、2
0℃の反応温度で、5時間攪拌して重合を行い、芳香族
ポリアミック酸を生成した。
Mechanical properties Tensile strength 11.0 Kg/mm” Elongation rate 15
% Electrical properties Dielectric constant 6 2.8 Dissipation tangent tan δ 0.005 Volume resistivity lXl0'Ω/cm Breakdown voltage
250 KV/mm Example 2 N-methyl-2-pyrrolidone (NMP) 22.0ml
3.3',4.4'-biphenyltetracarboxylic dianhydride2. Add OOg and 1.99 g of 1,4-di(4-aminophenoxy)benzene, add nitrogen atmosphere,
Polymerization was carried out by stirring at a reaction temperature of 0° C. for 5 hours to produce an aromatic polyamic acid.

次に、この芳香族ポリアミック酸の溶液にさらにNMP
68.OmAを加えて希釈した後、無水酢酸13.59
 gおよびピリジン5.20 gを加え、50℃で3時
間イミド化反応させて、芳香族ポリイミドを生成させ、
さらにこの溶液にメタノールを添加して、生成している
芳香族ポリイミドを析出させ、濾過して、芳香族ポリイ
ミド粉末を得た。
Next, add NMP to this aromatic polyamic acid solution.
68. After dilution by adding OmA, acetic anhydride 13.59
g and 5.20 g of pyridine were added, and an imidization reaction was carried out at 50°C for 3 hours to produce an aromatic polyimide,
Furthermore, methanol was added to this solution to precipitate the produced aromatic polyimide, which was filtered to obtain aromatic polyimide powder.

この芳香族ポリイミド粉末について、対数粘度を実施例
1と同様にして測定した。
The logarithmic viscosity of this aromatic polyimide powder was measured in the same manner as in Example 1.

また、前述のようにして得られた芳香族ポリイミドをN
MPに約30℃で溶解して、濃度14重量%の均一な芳
香族ポリイミド溶液を調製した。
In addition, the aromatic polyimide obtained as described above was
A homogeneous aromatic polyimide solution having a concentration of 14% by weight was prepared by dissolving it in MP at about 30°C.

この芳香族ポリイミド溶液を使用したほかは、実施例1
と同様にして、芳香族ポリイミド製の薄膜を製造した。
Example 1 except that this aromatic polyimide solution was used.
A thin film made of aromatic polyimide was produced in the same manner as above.

この薄膜について、実施例1と同様にして、溶解性およ
び熱分解開始温度を測定した。
Regarding this thin film, the solubility and thermal decomposition onset temperature were measured in the same manner as in Example 1.

これらの測定結果(対数粘度、溶解性及び熱分解開始温
度)を後記第1表に示す。
The results of these measurements (logarithmic viscosity, solubility, and thermal decomposition initiation temperature) are shown in Table 1 below.

実施例3 N−メチル−2−ピロリドン(NMP)24.0m1l
に、2,3.3’ 、4°−ビフェニルテトラカルボン
酸二無水物2. OOgおよび1.3−ジ(4−アミノ
フェノキシ)ベンゼン2. OOgを加え、窒素雰囲気
で180℃の重合反応温度で、5時間撹拌し、重合およ
びイミド化を一段で行い、回転粘度(25℃)が110
ポイズである芳香族ポリイミド溶液を得た。
Example 3 N-methyl-2-pyrrolidone (NMP) 24.0ml
2,3.3′,4°-biphenyltetracarboxylic dianhydride. OOg and 1.3-di(4-aminophenoxy)benzene2. OOg was added and stirred for 5 hours at a polymerization reaction temperature of 180°C in a nitrogen atmosphere to perform polymerization and imidization in one step, and the rotational viscosity (25°C) was 110.
A poise aromatic polyimide solution was obtained.

この芳香族ポリイミド溶液から、含有されている芳香族
ポリイミドを回収し、その芳香族ポリイミドの対数粘度
を、実施例1と同様にして測定した。
The aromatic polyimide contained therein was recovered from this aromatic polyimide solution, and the logarithmic viscosity of the aromatic polyimide was measured in the same manner as in Example 1.

また、前記の芳香族ポリイミド溶液を使用したほかは、
実施例1と同様にして、芳香族ポリイミド製の薄膜を製
造した。
In addition to using the aromatic polyimide solution mentioned above,
A thin film made of aromatic polyimide was produced in the same manner as in Example 1.

この薄膜について、実施例1と同様にして、溶解性およ
び熱分解開始温度を測定した。
Regarding this thin film, the solubility and thermal decomposition onset temperature were measured in the same manner as in Example 1.

これらの測定結果(対数粘度、溶解性及び熱分解開始温
度)を後記第1表に示す。
The results of these measurements (logarithmic viscosity, solubility, and thermal decomposition initiation temperature) are shown in Table 1 below.

比較例1〜3 1.4−ジ(4−アミノフェノキシ)ベンゼン1.99
gを第1表に示すジアミンに代えたほかは実施例2と同
様にして芳香族ポリイミド粉末を得た。
Comparative Examples 1 to 3 1.4-di(4-aminophenoxy)benzene 1.99
An aromatic polyimide powder was obtained in the same manner as in Example 2 except that g was replaced with the diamine shown in Table 1.

この芳香族ポリイミド粉末について対数粘度を実施例2
と同様にして測定した。
Example 2: Logarithmic viscosity of this aromatic polyimide powder
It was measured in the same manner.

また、前述のようにして得られた芳香族ポリイミド粉末
を用いて、芳香族ポリイミド濃度約5重量%のNMP溶
液を調製した。この溶液を使用したほかは実施例2と同
様にして芳香族ポリイミド製の薄膜を製造した。この薄
膜について、実施例2と同様にして、溶解性および熱分
解開始温度を測定した。
Further, an NMP solution having an aromatic polyimide concentration of about 5% by weight was prepared using the aromatic polyimide powder obtained as described above. A thin film made of aromatic polyimide was produced in the same manner as in Example 2 except that this solution was used. Regarding this thin film, the solubility and thermal decomposition onset temperature were measured in the same manner as in Example 2.

これらの測定結果(対数粘度、溶解性及び熱分解開始温
度)を下記第1表に示す。
The results of these measurements (logarithmic viscosity, solubility, and thermal decomposition onset temperature) are shown in Table 1 below.

第1表 註1:BPDA;ビフェニルテトラカルボン酸二無水物
註2:A;1.4−ジ(4−7ミノフエノキシ)ベンゼ
ンB;t、3−ジ(4−アミノフェノキシ)ベンゼンC
;4,4°−ジアミノジフエニルエーテルD;3,4“
−ジアミノジフェニルエーテルE;2.4−ジ7ミノト
ルエン 〔発明の効果〕 本発明の芳香族ポリイミドは、例えば、フェノール系溶
媒、アミド系溶媒(ピロリドン系溶媒、ホルムアミド系
溶媒、アセトアミド系溶媒など)等の有機極性溶媒に対
して溶解性能を充分に有しており、そのため、芳香族ポ
リイミドと前記溶媒とからなり且つ比較的低粘度である
本発明の芳香族ポリイミド組成物(フェス)を容易に調
製することができる。
Table 1 Note 1: BPDA; Biphenyltetracarboxylic dianhydride Note 2: A; 1,4-di(4-7minophenoxy)benzene B; t,3-di(4-aminophenoxy)benzene C
;4,4°-diaminodiphenyl ether D;3,4"
-Diaminodiphenyl ether E; 2,4-di7minotoluene [Effects of the invention] The aromatic polyimide of the present invention can be used, for example, in phenol-based solvents, amide-based solvents (pyrrolidone-based solvents, formamide-based solvents, acetamide-based solvents, etc.). The aromatic polyimide composition (faith) of the present invention, which has sufficient dissolution performance in organic polar solvents and is therefore composed of an aromatic polyimide and the above-mentioned solvent and has a relatively low viscosity, is easily prepared. be able to.

したがって、本発明の芳香族ポリイミド組成物は、種々
の電気または電子部材などの表面に塗布し、次いで比較
的低温で乾燥・加熱処理して優れた保護膜(厚さ;約0
.1〜500μ程度)を容易に形成することができる。
Therefore, the aromatic polyimide composition of the present invention is applied to the surfaces of various electrical or electronic components, and then dried and heat-treated at a relatively low temperature to form an excellent protective film (thickness: approximately 0.
.. (approximately 1 to 500 μm) can be easily formed.

また、本発明の芳香族ポリイミドは、掻めて優れた耐熱
性を有しているため、従来、使用することができなかっ
たような種々の製品、例えば、IC,LSIなどの層間
絶縁膜、回路形成のためのマスク、薄膜抵抗体保護膜な
どに使用することができるのである。
Furthermore, since the aromatic polyimide of the present invention has extremely excellent heat resistance, it can be used in various products that could not be used conventionally, such as interlayer insulating films such as ICs and LSIs. It can be used as a mask for circuit formation, a protective film for thin film resistors, etc.

さらに、本発明の芳香族ポリイミドは、従来公知の芳香
族ポリイミドと同様に、機械的強度、電気絶縁性などに
おいて優れた性能を保持しており、種々の電気または電
子材料の表面保護、層間絶縁膜などとして好適に使用す
ることができるのである。
Furthermore, the aromatic polyimide of the present invention, like conventionally known aromatic polyimides, maintains excellent performance in terms of mechanical strength, electrical insulation, etc., and is useful for surface protection and interlayer insulation of various electrical or electronic materials. It can be suitably used as a membrane or the like.

特許出願人  宇部興産株式会社 −。Patent applicant: Ube Industries Co., Ltd. −.

代理人弁理士 羽 鳥   修1 −−−iRepresentative Patent Attorney Shu 1 Hatori ---i

Claims (2)

【特許請求の範囲】[Claims] (1)ビフェニルテトラカルボン酸類を主成分とする芳
香族テトラカルボン酸成分と、 一般式 ▲数式、化学式、表等があります▼ で示されるジ(アミノフェノキシ)ベンゼン類を主成分
とする芳香族ジアミン成分とから、重合およびイミド化
によって得られた可溶性芳香族ポリイミド。
(1) An aromatic tetracarboxylic acid component whose main component is biphenyltetracarboxylic acids, and an aromatic diamine whose main component is di(aminophenoxy)benzene represented by the general formula ▲There are mathematical formulas, chemical formulas, tables, etc.▼ A soluble aromatic polyimide obtained by polymerization and imidization from the components.
(2)ビフェニルテトラカルボン酸類を主成分とする芳
香族テトラカルボン酸成分と、 一般式 ▲数式、化学式、表等があります▼ で示されるジ(アミノフェノキシ)ベンゼン類を主成分
とする芳香族ジアミン成分とから、重合およびイミド化
によって得られた可溶性芳香族ポリイミドが、有機極性
溶媒中に均一に溶解されている芳香族ポリイミド組成物
(2) An aromatic tetracarboxylic acid component whose main component is biphenyltetracarboxylic acids, and an aromatic diamine whose main component is di(aminophenoxy)benzene represented by the general formula ▲There are mathematical formulas, chemical formulas, tables, etc.▼ An aromatic polyimide composition in which a soluble aromatic polyimide obtained by polymerization and imidization is uniformly dissolved in an organic polar solvent.
JP15043885A 1985-07-09 1985-07-09 Aromatic polyimide and composition thereof Granted JPS6211727A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15043885A JPS6211727A (en) 1985-07-09 1985-07-09 Aromatic polyimide and composition thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15043885A JPS6211727A (en) 1985-07-09 1985-07-09 Aromatic polyimide and composition thereof

Publications (2)

Publication Number Publication Date
JPS6211727A true JPS6211727A (en) 1987-01-20
JPH0374702B2 JPH0374702B2 (en) 1991-11-27

Family

ID=15496930

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15043885A Granted JPS6211727A (en) 1985-07-09 1985-07-09 Aromatic polyimide and composition thereof

Country Status (1)

Country Link
JP (1) JPS6211727A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS627733A (en) * 1985-03-10 1987-01-14 Nitto Electric Ind Co Ltd Colorless clear polyimide formed body and its production
JPH0196246A (en) * 1987-10-09 1989-04-14 Ube Ind Ltd Production of copper paste composition and electrically conductive wired material
JPH01121364A (en) * 1987-11-04 1989-05-15 Ube Ind Ltd Polyimide composition for printing
JPH01121325A (en) * 1987-11-04 1989-05-15 Ube Ind Ltd Polyimidesiloxane and composition containing same
JPH02191630A (en) * 1989-01-20 1990-07-27 Ube Ind Ltd Hydroxyl group-terminated modified imide oligomer
JPH0370736A (en) * 1989-08-11 1991-03-26 Ube Ind Ltd Thermoplastic aromatic polyimide
WO1991010699A1 (en) * 1990-01-18 1991-07-25 Nippon Steel Chemical Co., Ltd. Resin for protecting semiconductors
JPH08225645A (en) * 1995-12-18 1996-09-03 Nitto Denko Corp Colorless clear polyimide molding and production thereof
JP2016027085A (en) * 2014-06-26 2016-02-18 デクセリアルズ株式会社 Polyimide, polyamide acid, and methods for producing the polyimide and the polyamide acid, and photosensitive resin composition

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS491796A (en) * 1972-04-26 1974-01-09
JPS57180633A (en) * 1981-04-30 1982-11-06 Hitachi Ltd Curable polyimide resin composition
JPS6040131A (en) * 1983-08-13 1985-03-02 Nitto Electric Ind Co Ltd Molded article of polyimide having high humidity resistance and its preparation
JPS61143433A (en) * 1984-12-15 1986-07-01 Nitto Electric Ind Co Ltd Moisture-resistant polyimide
JPS61143477A (en) * 1984-12-18 1986-07-01 Mitsui Toatsu Chem Inc Heat-resistant adhesive
JPS61143435A (en) * 1984-12-15 1986-07-01 Nitto Electric Ind Co Ltd Moisture-resistant polyimide

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS491796A (en) * 1972-04-26 1974-01-09
JPS57180633A (en) * 1981-04-30 1982-11-06 Hitachi Ltd Curable polyimide resin composition
JPS6040131A (en) * 1983-08-13 1985-03-02 Nitto Electric Ind Co Ltd Molded article of polyimide having high humidity resistance and its preparation
JPS61143433A (en) * 1984-12-15 1986-07-01 Nitto Electric Ind Co Ltd Moisture-resistant polyimide
JPS61143435A (en) * 1984-12-15 1986-07-01 Nitto Electric Ind Co Ltd Moisture-resistant polyimide
JPS61143477A (en) * 1984-12-18 1986-07-01 Mitsui Toatsu Chem Inc Heat-resistant adhesive

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS627733A (en) * 1985-03-10 1987-01-14 Nitto Electric Ind Co Ltd Colorless clear polyimide formed body and its production
JPH0196246A (en) * 1987-10-09 1989-04-14 Ube Ind Ltd Production of copper paste composition and electrically conductive wired material
JPH01121364A (en) * 1987-11-04 1989-05-15 Ube Ind Ltd Polyimide composition for printing
JPH01121325A (en) * 1987-11-04 1989-05-15 Ube Ind Ltd Polyimidesiloxane and composition containing same
JPH02191630A (en) * 1989-01-20 1990-07-27 Ube Ind Ltd Hydroxyl group-terminated modified imide oligomer
JPH0370736A (en) * 1989-08-11 1991-03-26 Ube Ind Ltd Thermoplastic aromatic polyimide
WO1991010699A1 (en) * 1990-01-18 1991-07-25 Nippon Steel Chemical Co., Ltd. Resin for protecting semiconductors
JPH08225645A (en) * 1995-12-18 1996-09-03 Nitto Denko Corp Colorless clear polyimide molding and production thereof
JP2016027085A (en) * 2014-06-26 2016-02-18 デクセリアルズ株式会社 Polyimide, polyamide acid, and methods for producing the polyimide and the polyamide acid, and photosensitive resin composition

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