JP2003282955A - Semiconductor light-emitting device having reflector case - Google Patents

Semiconductor light-emitting device having reflector case

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Publication number
JP2003282955A
JP2003282955A JP2002199555A JP2002199555A JP2003282955A JP 2003282955 A JP2003282955 A JP 2003282955A JP 2002199555 A JP2002199555 A JP 2002199555A JP 2002199555 A JP2002199555 A JP 2002199555A JP 2003282955 A JP2003282955 A JP 2003282955A
Authority
JP
Japan
Prior art keywords
semiconductor light
emitting device
light emitting
case
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002199555A
Other languages
Japanese (ja)
Inventor
Shinji Isokawa
慎二 磯川
Tadahiro Okazaki
忠宏 岡崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP2002199555A priority Critical patent/JP2003282955A/en
Publication of JP2003282955A publication Critical patent/JP2003282955A/en
Pending legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor light-emitting device having a reflector case, which effectively prevents separation of a translucent resin from the reflector case. <P>SOLUTION: The semiconductor light-emitting device is provided with an insulating substrate 1, an electrode 2 formed on the surface of the insulating substrate 1, a semiconductor light-emitting element 3 mounted on the electrode 2, and the reflector case 5, which is arranged on the substrate 1, for reflecting the light from the element 3, with its inside being sealed with the translucent resin 6. A crepe 51 is formed at least at one portion of the contact face between the case 5 and the resin 6. From the viewpoint of suppressing unevenness in luminous intensity of the light emitted from the semiconductor light-emitting device, the crepe 51 may preferably be formed at least on the opposite areas of the side faces of the element 3. In order to further ensure that the resin 6 is prevented from separating from the case 5, the concavo-convex level difference in the crepe 51 should desirably be 12 μm or more, or the pitch between the crimps should desirably be 20 μm or below. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は半導体発光装置に関
し、より詳細には絶縁性基板上に反射ケースを設けた半
導体発光装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor light emitting device, and more particularly to a semiconductor light emitting device having a reflective case provided on an insulating substrate.

【0002】[0002]

【従来の技術】発光ダイオード素子などの半導体発光素
子からの光を特定方向に出射させるため、半導体発光素
子の周囲に反射ケースを設けることがあった。図10
に、絶縁性基板1の上に反射ケース5を設けた従来の半
導体発光装置の一例を示す側断面図を示す。従来の半導
体発光装置では反射ケース5内を透光性樹脂6で封止し
ていた。透光性樹脂6としてエポキシ樹脂などの熱硬化
性樹脂が一般に用いられる。このため、反射ケース5内
に透光性樹脂6を流し込んだ後、百数十度に加熱して透
光性樹脂6を硬化させていた。
2. Description of the Related Art In order to emit light from a semiconductor light emitting element such as a light emitting diode element in a specific direction, a reflection case may be provided around the semiconductor light emitting element. Figure 10
FIG. 1 is a side sectional view showing an example of a conventional semiconductor light emitting device in which the reflective case 5 is provided on the insulating substrate 1. In the conventional semiconductor light emitting device, the inside of the reflection case 5 is sealed with the translucent resin 6. A thermosetting resin such as an epoxy resin is generally used as the translucent resin 6. For this reason, after the translucent resin 6 is poured into the reflective case 5, the translucent resin 6 is cured by being heated to a hundred and several tens of degrees.

【0003】[0003]

【発明が解決しようとする課題】ところが、透光性樹脂
6は反射ケース5の材質との馴染み性が悪いものが多
く、リフロー炉などで透光性樹脂6を加熱硬化させると
透光性樹脂6が反射ケース5から剥離し不良品となるこ
とがあった。
However, most of the translucent resin 6 is not well compatible with the material of the reflective case 5. Therefore, when the translucent resin 6 is heat-cured in a reflow oven or the like, the translucent resin 6 is not cured. 6 may be peeled off from the reflective case 5 to become a defective product.

【0004】また、一般に半導体発光素子3の角から出
射する光は側面から出射する光に比べて弱く、図11の
配向特性図に示すように平面視において装置からの出射
光には光度ムラあった。
Further, in general, the light emitted from the corner of the semiconductor light emitting element 3 is weaker than the light emitted from the side surface, and as shown in the alignment characteristic diagram of FIG. 11, the light emitted from the device has uneven light intensity in plan view. It was

【0005】本発明はこのような従来の問題に鑑みてな
されたものであり、透光性樹脂が反射ケースの材質と馴
染み性がよくない場合であっても、透光性樹脂が硬化後
に反射ケースから剥離することのない半導体発光装置を
提供することをその目的とするものである。
The present invention has been made in view of such conventional problems. Even when the translucent resin is not well compatible with the material of the reflective case, the translucent resin is reflected after being cured. It is an object of the present invention to provide a semiconductor light emitting device that does not peel off from the case.

【0006】また本発明の目的は、半導体発光装置から
出射される光の光度ムラを抑えることにある。
Another object of the present invention is to suppress unevenness in luminous intensity of light emitted from a semiconductor light emitting device.

【0007】[0007]

【課題を解決するための手段】前記目的を達成するため
本発明の半導体発光装置では、絶縁性基板の表面に形成
された電極部に半導体発光素子を実装し、この半導体発
光素子からの光を反射させるための反射ケースを前記絶
縁性基板上に設け、この反射ケース内部を透光性樹脂で
封止した半導体発光装置において、反射ケースの透光性
樹脂との接触面の少なくとも一部にシボを形成した構成
とした。
To achieve the above object, in a semiconductor light emitting device of the present invention, a semiconductor light emitting element is mounted on an electrode portion formed on the surface of an insulating substrate, and light from this semiconductor light emitting element is emitted. In a semiconductor light emitting device in which a reflective case for reflecting the light is provided on the insulating substrate and the inside of the reflective case is sealed with a transparent resin, at least a part of the contact surface of the reflective case with the transparent resin is textured. Is formed.

【0008】ここで透光性樹脂と反射ケースとの接着性
を向上させながら、装置からの出射光の光度ムラを抑え
るためには、反射ケースに形成するシボは、少なくとも
半導体発光素子側面の対向領域に形成するのが望まし
い。
Here, in order to suppress the unevenness of the luminous intensity of the light emitted from the device while improving the adhesion between the translucent resin and the reflective case, the wrinkles formed on the reflective case should at least face the side surface of the semiconductor light emitting element. It is desirable to form it in the region.

【0009】透光性樹脂の反射ケースからの剥離を一層
防止する観点から、シボの凹凸段差を12μm以上、あ
るいはシボ間のピッチを20μm以下とするのが好まし
い。なお、図5に示すように、本発明においてシボの凹
凸段差とは十点平均粗さいい、ピッチは凸部間距離をい
う。
From the viewpoint of further preventing the translucent resin from being peeled off from the reflection case, it is preferable that the unevenness of the unevenness is 12 μm or more, or the pitch between the unevenness is 20 μm or less. In addition, as shown in FIG. 5, in the present invention, the uneven surface step of the grain is a ten-point average roughness, and the pitch is a distance between the convex portions.

【0010】また装置の生産性を向上させる観点などか
ら、絶縁性基板と反射ケースとを一体成形してもよい。
From the viewpoint of improving the productivity of the device, the insulating substrate and the reflection case may be integrally formed.

【0011】また、反射ケースの材料としては耐熱性や
低熱膨張性などの点から液晶ポリマーが好ましく、透光
性樹脂としては透光性の点からエポキシ樹脂が好まし
い。
Further, as the material of the reflection case, liquid crystal polymer is preferable from the viewpoint of heat resistance and low thermal expansion, and as the translucent resin, epoxy resin is preferable from the viewpoint of translucency.

【0012】[0012]

【発明の実施の形態】本発明者は、半導体発光装置にお
いて透光性樹脂を加熱硬化させたときに生じる、透光性
樹脂の反射ケースからの剥離を防止できないか鋭意検討
を重ねた結果、反射ケースの透光性樹脂との接触面にシ
ボを形成して、反射ケースと透光性樹脂との接触面積を
大きくすると同時に、シボの凹部に透光性樹脂が入り込
むようにすれば、透光性樹脂の加熱硬化時の反射ケース
からの剥離を有効に防止できることを見出し本発明をな
すに至った。以下、図に基づいて本発明の半導体発光装
置を説明する。
BEST MODE FOR CARRYING OUT THE INVENTION As a result of extensive studies, the present inventor has made extensive studies as to whether or not peeling of a translucent resin from a reflective case, which occurs when a translucent resin is heated and cured in a semiconductor light emitting device, can be prevented. By forming a grain on the contact surface of the reflective case with the translucent resin to increase the contact area between the reflective case and the translucent resin and at the same time allowing the translucent resin to enter into the concave portion of the grain, The present invention has been completed by finding that it is possible to effectively prevent peeling of the light-sensitive resin from the reflective case during heat curing. The semiconductor light emitting device of the present invention will be described below with reference to the drawings.

【0013】図1は、本発明の半導体発光装置の一例を
示す断面図である。絶縁性基板1上に一対の電極部2,
2’が形成され、その一方の電極部2上に半導体発光素
子3が装着され、半導体発光素子3の上面電極ともう一
方の電極部2’とがボンディングワイヤ4で接続されて
いる。そして、上面に開口部を有する反射ケース5が半
導体発光素子3およびボンディングワイヤ4、電極部
2,2’の一部を覆うように絶縁性基板1の上に装着さ
れ、この反射ケース5の内部に透光性樹脂6が充填され
熱硬化される。
FIG. 1 is a sectional view showing an example of a semiconductor light emitting device of the present invention. A pair of electrode portions 2, on the insulating substrate 1.
2 ′ is formed, the semiconductor light emitting element 3 is mounted on one of the electrode portions 2, and the upper surface electrode of the semiconductor light emitting element 3 and the other electrode portion 2 ′ are connected by the bonding wire 4. Then, a reflection case 5 having an opening on the upper surface is mounted on the insulating substrate 1 so as to cover the semiconductor light emitting element 3, the bonding wire 4, and a part of the electrode portions 2 and 2 ′. The transparent resin 6 is filled in and heat-cured.

【0014】ここで用いる反射ケース5の内側壁にはシ
ボ51が形成されている。このシボ51は反射ケース5
の少なくとの一部に形成されていればよいが、半導体発
光装置から出射される光の光度ムラを抑えるためには、
少なくとも半導体発光素子側面の対向領域に形成するの
が望ましい。図2に、反射ケース5の半導体発光素子側
面の対向領域にシボ51を形成した半導体発光装置の平
面図を示す。そして、この装置の平面視における光度の
配向特性を図3に示す。図3と図11とを比較すれば明
らかなように、反射ケース5の半導体発光素子側面の対
向領域にシボ51を形成した図2の半導体発光装置で
は、図11の従来の半導体発光装置に比べて光度ムラが
抑えられている。もちろん、透光性樹脂6の反射ケース
5からの剥離を有効に防止するためには、反射ケース5
の透光性樹脂6との接触面の全域にシボ51が形成され
ているのが望ましい。
A wrinkle 51 is formed on the inner wall of the reflection case 5 used here. This grain 51 is a reflective case 5.
However, in order to suppress the unevenness of the luminous intensity of the light emitted from the semiconductor light emitting device,
It is desirable to form at least in the opposing region on the side surface of the semiconductor light emitting device. FIG. 2 shows a plan view of a semiconductor light emitting device in which the embossments 51 are formed in the opposing region of the side surface of the semiconductor light emitting element of the reflection case 5. Then, FIG. 3 shows the alignment characteristics of luminous intensity in a plan view of this device. As is clear from a comparison between FIG. 3 and FIG. 11, the semiconductor light emitting device of FIG. 2 in which the embossment 51 is formed in the opposing region of the side surface of the semiconductor light emitting element of the reflective case 5 is more difficult than the conventional semiconductor light emitting device of FIG. The uneven brightness is suppressed. Of course, in order to effectively prevent the translucent resin 6 from peeling off from the reflective case 5, the reflective case 5
It is desirable that the wrinkles 51 are formed on the entire area of the contact surface with the translucent resin 6.

【0015】シボ51の凹凸段差は12μm以上が好ま
しい。凹凸段差が12μmより小さいと、充分な接触面
積を確保できず透光性樹脂の剥離を完全に防止できない
おそれがあり、加えて半導体発光素子からの光を充分に
乱反射させることができず光度ムラを抑えられないおそ
れがあるからである。
The unevenness of the embossment 51 is preferably 12 μm or more. If the unevenness is smaller than 12 μm, a sufficient contact area cannot be secured and peeling of the translucent resin may not be completely prevented. In addition, light from the semiconductor light emitting element may not be sufficiently diffused to cause uneven light intensity. This is because there is a possibility that the

【0016】また、シボ間のピッチは20μm以下とす
るのが好ましい。ピッチが20μmより大きいと充分な
接触面積を確保できず透光性樹脂の剥離を完全に防止で
きないおそれがあり、加えて半導体発光素子からの光を
充分に乱反射させることができず光度ムラを抑えられな
いおそれがあるからである。また、シボ間のピッチの下
限値に特に制限はないが、12μm未満になると凸部が
鋭角になり透光性樹脂の剥離を招くおそれもあるので、
12μm以上が望ましい。
The pitch between the textures is preferably 20 μm or less. If the pitch is larger than 20 μm, a sufficient contact area cannot be secured and peeling of the translucent resin may not be completely prevented. In addition, the light from the semiconductor light emitting element may not be sufficiently diffused to suppress uneven light intensity. This is because there is a risk that it will not be possible. The lower limit of the pitch between the textures is not particularly limited, but if it is less than 12 μm, the convex portion may have an acute angle and peeling of the light-transmitting resin may be caused.
12 μm or more is desirable.

【0017】反射ケースの表面にシボを形成するには、
従来公知の方法を用いることができる。例えば、表面加
工により微小凹凸を施した射出成形用金型を用いて反射
ケースを成形する方法や、反射ケース成形後にブラスト
加工を行って反射ケース表面にシボを形成する方法など
が挙げられる。この中でも生産性などの観点から、表面
加工した射出成形用金型を用いて反射ケースを射出成形
する方法が望ましい。金型表面にシボを形成する表面加
工方法としては、例えばエッチング加工や電鋳加工など
の方法が挙げられる。
To form a grain on the surface of the reflective case,
A conventionally known method can be used. For example, a method of forming a reflection case by using an injection molding die having fine irregularities by surface processing, a method of blasting after forming the reflection case and forming a wrinkle on the surface of the reflection case, and the like can be mentioned. Among these, from the viewpoint of productivity and the like, a method of injection molding the reflection case using a surface-treated injection molding die is preferable. Examples of the surface processing method for forming the texture on the surface of the die include methods such as etching and electroforming.

【0018】本発明で使用する反射ケースの材料として
は、耐熱性、低熱膨張性および電気絶縁性を有するもの
であれば特に限定はなく従来公知の材料が用いられる。
中でも耐熱性、低熱膨張性および電気絶縁性の点で優れ
る液晶ポリマーが好ましい。このような液晶ポリマーと
しては、例えばポリエステル系、ポリエステルアミド、
ポリアゾメチン等が挙げられる。この中でも芳香族ポリ
エステル系の液晶ポリマーが好ましい。
The material of the reflection case used in the present invention is not particularly limited as long as it has heat resistance, low thermal expansion and electric insulation, and conventionally known materials can be used.
Among them, a liquid crystal polymer which is excellent in heat resistance, low thermal expansion property and electric insulation property is preferable. Examples of such liquid crystal polymers include polyester-based, polyester-amide,
Examples thereof include polyazomethine. Among these, aromatic polyester liquid crystal polymers are preferable.

【0019】図1の装置では上方向に光を出射させるた
め、反射ケース5として上面に開口部を有するものを使
用しているが、反射ケース5の形状に特に限定はなく、
光を出射させたい方向に開口部を設けた形状とすればよ
い。図4に、側面方向に光を出射する半導体発光装置の
一例を示す断面図を示す。図4の装置では、いずれも右
方向に光が出射される。この反射ケース5’、5”の透
光性樹脂6と接触する内周面の全域にはシボ51が形成
されている。
In the device of FIG. 1, in order to emit light in the upward direction, the reflection case 5 having an opening on the upper surface is used, but the shape of the reflection case 5 is not particularly limited.
The shape may be such that an opening is provided in the direction in which light is desired to be emitted. FIG. 4 is a sectional view showing an example of a semiconductor light emitting device that emits light in the side direction. In each of the devices of FIG. 4, light is emitted to the right. A wrinkle 51 is formed on the entire inner peripheral surface of the reflective case 5 ′, 5 ″, which is in contact with the translucent resin 6.

【0020】一方、本発明で使用する透光性樹脂として
は透光性であれば特に限定はなく、例えばエポキシ樹脂
や不飽和ポリエステル樹脂、シリコーン樹脂、ユリア・
メラミン樹脂などが挙げられる。この中でも透光性など
の点からエポキシ樹脂がより好適に使用できる。エポキ
シ樹脂としては、一分子中に2個以上のエポキシ基を有
するものでエポキシ樹脂成形材料として使用されるもの
であれば制限はなく、フェノールノボラック型エポキシ
樹脂、オルクレゾールノボラック型エポキシ樹脂を代表
するフェノール類とアルデヒド類のノボラック樹脂をエ
ポキシ化したもの、ビスフェノールA、ビスフェノール
F、ビスフェノールS、水添ビスフェノールAなどのジ
グリシジルエーテル、フタル酸、ダイマー酸などの多塩
基酸とエピクロルヒドリンの反応により得られるジグリ
シジルエステル型エポキシ樹脂、ジアミノジフェニルメ
タン、イソシアヌル酸などのポリアミンとエピクロルヒ
ドリンの反応により得られるグリシジルアミン型エポキ
シ樹脂、オレフィン結合を過酢酸などの過酸により、酸
化して得られる綿状脂肪族エポキシ樹脂、および脂環族
エポキシ樹脂などを挙げることができ、これらを単独で
あるいは2以上の混合物として使用することができる。
これらのエポキシ樹脂は十分に精製されたもので、常温
で液状であっても固形であってもよいが、液化時の外観
ができる限り透明なものを使用するのが好ましい。
On the other hand, the translucent resin used in the present invention is not particularly limited as long as it is translucent. For example, epoxy resin, unsaturated polyester resin, silicone resin, urea.
Melamine resin etc. are mentioned. Among these, an epoxy resin can be more preferably used in terms of translucency. The epoxy resin is not particularly limited as long as it has two or more epoxy groups in one molecule and is used as an epoxy resin molding material, and a phenol novolac type epoxy resin and an orcresol novolac type epoxy resin are represented. Epoxidized novolak resin of phenols and aldehydes, diglycidyl ethers such as bisphenol A, bisphenol F, bisphenol S, hydrogenated bisphenol A, polybasic acids such as phthalic acid and dimer acid, and epichlorohydrin Diglycidyl ester type epoxy resin, diaminodiphenylmethane, glycidyl amine type epoxy resin obtained by reaction of polyamine such as isocyanuric acid with epichlorohydrin, obtained by oxidizing olefin bond with peracid such as peracetic acid. That flocculent aliphatic epoxy resins, and alicyclic epoxy resins and the like can be mentioned, and these can be used alone or as a mixture of two or more.
These epoxy resins are sufficiently purified and may be liquid or solid at room temperature, but it is preferable to use those which are as transparent as possible in appearance when liquefied.

【0021】本発明の装置は例えば次のようにして作製
される。まず次のようにして絶縁性基板を作製する。銅
箔を両面に貼着した絶縁性基板に金型やルータで複数本
のスリット8(図6に図示)を設けて複数本の桟7(図
6に図示)を形成した後、フォトレジストの塗布・露光
・現像を行って、電極部2,2’(図6に図示)の上面
部と下面部となる電極パターン部分をフォトレジストで
被覆し、このレジストパターンをエッチレジストとして
不要部分の銅箔をエッチングにより除去する。そして、
無電解メッキにより電極部の側面部となる桟7の側面に
Cu層を形成した後、桟7の側面を含む電極パターン部
分にCu,Ni,Auの各層を電解メッキにより積層形
成して絶縁性基板1とする。
The device of the present invention is manufactured, for example, as follows. First, an insulating substrate is manufactured as follows. After forming a plurality of slits 8 (shown in FIG. 6) with a die or a router on an insulating substrate having copper foil adhered on both sides to form a plurality of crosspieces 7 (shown in FIG. 6), a photoresist By performing coating, exposure, and development, the electrode pattern portions serving as the upper surface portion and the lower surface portion of the electrode portions 2 and 2 '(shown in FIG. 6) are covered with a photoresist, and this resist pattern is used as an etch resist for unnecessary portions of copper. The foil is removed by etching. And
After the Cu layer is formed on the side surface of the crosspiece 7 which is the side surface of the electrode portion by electroless plating, each layer of Cu, Ni, and Au is laminated on the electrode pattern portion including the side surface of the crosspiece 7 by electrolytic plating to insulate. Substrate 1 is used.

【0022】次に、図6の平面図に示すように、前記作
製された絶縁性基板1に対し、各桟7における一方の電
極部2の上面部上に、それぞれ半導体発光素子3をボン
ディングする。そして、各半導体発光素子3の上面電極
ともう一方の電極部2’の上面部との間をボンディング
ワイヤによって結線する。
Next, as shown in the plan view of FIG. 6, the semiconductor light emitting element 3 is bonded to the produced insulating substrate 1 on the upper surface of one electrode portion 2 of each crosspiece 7. . Then, the upper surface electrode of each semiconductor light emitting element 3 and the upper surface portion of the other electrode portion 2 ′ are connected by a bonding wire.

【0023】そして、反射ケースの装着および透光性樹
脂による封止は例えば次のようにして行われる。図6の
桟7の長手方向の断面図(A−A線断面図)を図7に示
す。半導体発光素子3の上面に固着されたボンディング
ワイヤを完全に内包できる程度の深さの孔53が、半導
体発光素子3に対応して形成された反射ケース連続体5
2を、絶縁性基板1上に接着剤で固着する(図7
(a))。次に、反射ケース連続体52の孔53に透光
性樹脂であるエポキシ樹脂を注ぎ込む(同図(b))。
そしてエポキシ樹脂を所定温度で硬化させた後(同図
(c))、破線で示す部分をダイシングなどで切断し本
発明の半導体発光装置を得る(同図(d))。
The mounting of the reflection case and the sealing with the translucent resin are carried out, for example, as follows. FIG. 7 shows a cross-sectional view (cross-sectional view taken along the line AA) of the crosspiece 7 in FIG. 6 in the longitudinal direction. The reflection case continuum 5 in which the hole 53 having a depth sufficient to completely include the bonding wire fixed to the upper surface of the semiconductor light emitting element 3 is formed corresponding to the semiconductor light emitting element 3
2 is fixed on the insulating substrate 1 with an adhesive (FIG. 7).
(A)). Next, an epoxy resin, which is a translucent resin, is poured into the hole 53 of the continuous reflective case body 52 (FIG. 2B).
Then, after the epoxy resin is cured at a predetermined temperature ((c) in the figure), the portion indicated by the broken line is cut by dicing or the like to obtain the semiconductor light emitting device of the present invention ((d) in the figure).

【0024】図1の半導体発光装置では絶縁性基板と反
射ケースとをそれぞれ作製し、エポキシ系接着剤などで
両者を固着していたが、生産効率の向上などの考慮して
絶縁性基板と反射ケースを一体に成形してもよい。図8
に、絶縁性基板と反射ケースとを一体成形した半導体発
光装置の一例を示し、図9に、この半導体発光装置の製
造工程図の一例を示す。
In the semiconductor light emitting device of FIG. 1, an insulating substrate and a reflective case were prepared respectively and fixed to each other with an epoxy adhesive or the like. The case may be integrally molded. Figure 8
FIG. 9 shows an example of a semiconductor light emitting device in which an insulating substrate and a reflection case are integrally molded, and FIG. 9 shows an example of a manufacturing process diagram of this semiconductor light emitting device.

【0025】図9において、まず電極部となる断面コ字
状の金属部材91,91’を、基板部分となる矩形状の
凹部92が形成された下型M2に配置する(同図
(a))。そして、矩形状の凹部93の中心に下方向に
連続に縮径した突部94が形成された上型M1を下型M2
合わせる(同図(b))。このとき、突部94の外周の
所定位置にはシボに対応する凹凸が形成されている。そ
して上型M1と下型M2と形成された空間に樹脂注入孔9
5から樹脂を注入する(同図(c))。そして冷却後、
金型から反射ケースが一体に形成された絶縁性基板を取
り出す(同図(d))。次に、すり鉢状の凹部96の底
面に露出している一方の金属部材91に半導体発光素子
3をボンディングし、半導体発光素子3の上面電極とも
う一方の金属部材91’とをボンディングワイヤ4で接
続する(同図(e))。そして、すり鉢状の凹部96に
エポキシ樹脂などの透光性樹脂6を注ぎ込み加熱硬化さ
せる(同図(f))。
In FIG. 9, first, metal members 91, 91 'having U-shaped cross-sections serving as electrode portions are placed in a lower mold M 2 having a rectangular recess 92 serving as a substrate portion (see FIG. )). Then, the upper mold M 1 in which the projection 94 having a diameter continuously reduced in the downward direction is formed at the center of the rectangular recess 93 is formed into the lower mold M 2.
(See FIG. 2B). At this time, irregularities corresponding to the wrinkles are formed at predetermined positions on the outer periphery of the protrusion 94. The resin injection hole 9 is provided in the space formed by the upper mold M 1 and the lower mold M 2.
Resin is injected from 5 ((c) in the same figure). And after cooling,
The insulative substrate integrally formed with the reflection case is taken out from the mold ((d) in the figure). Next, the semiconductor light emitting element 3 is bonded to one metal member 91 exposed on the bottom surface of the mortar-shaped recess 96, and the upper electrode of the semiconductor light emitting element 3 and the other metal member 91 ′ are bonded by the bonding wire 4. Connect ((e) in the figure). Then, the translucent resin 6 such as an epoxy resin is poured into the mortar-shaped recess 96 and cured by heating ((f) in the same figure).

【0026】本発明の半導体発光装置の用途としては、
液晶表示装置のバックライト、光ファイバ通信用やフォ
トカプラ用などの装置内の点光源、家電機器における表
示器などが挙げられる。
Applications of the semiconductor light emitting device of the present invention include:
Examples thereof include a backlight of a liquid crystal display device, a point light source in a device for optical fiber communication, a photocoupler, etc., and a display in a home electric appliance.

【0027】[0027]

【発明の効果】本発明の半導体発光装置では、反射ケー
スの透光性樹脂との接触面の少なくとも一部にシボを形
成したので、透光性樹脂の反射ケースからの剥離を有効
に防止できる。
In the semiconductor light emitting device of the present invention, since the wrinkles are formed on at least a part of the contact surface of the reflective case with the translucent resin, peeling of the translucent resin from the reflective case can be effectively prevented. .

【0028】反射ケースに形成するシボを少なくとも半
導体発光素子側面の対向領域に形成すると、透光性樹脂
と反射ケースとの接着性を向上させながら装置からの出
射光の光度ムラを抑えることができる。
By forming the embossments formed in the reflective case at least in the opposing region of the side surface of the semiconductor light emitting element, it is possible to suppress the unevenness of the luminous intensity of the light emitted from the device while improving the adhesiveness between the translucent resin and the reflective case. .

【0029】シボの凹凸段差を12μm以上、あるいは
シボ間のピッチを20μm以下とすると、透光性樹脂の
反射ケースからの剥離を一層防止できる。
When the unevenness of the texture is 12 μm or more or the pitch between the textures is 20 μm or less, the translucent resin can be further prevented from peeling from the reflection case.

【0030】また絶縁性基板と反射ケースとを一体成形
すると、装置の生産性を向上させることができる。
Further, if the insulating substrate and the reflection case are integrally formed, the productivity of the device can be improved.

【0031】また、反射ケースの材料として液晶ポリマ
ーを用い、透光性樹脂としてエポキシ樹脂を用いると、
優れた耐熱性および低熱膨張性が得られ、さらに高い透
光性が得られる。
If a liquid crystal polymer is used as the material of the reflective case and an epoxy resin is used as the translucent resin,
Excellent heat resistance and low thermal expansion are obtained, and further high translucency is obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の半導体発光装置の一例を示す側断面
図である。
FIG. 1 is a side sectional view showing an example of a semiconductor light emitting device of the present invention.

【図2】 本発明の半導体発光装置の他の例を示す平面
図である。
FIG. 2 is a plan view showing another example of the semiconductor light emitting device of the present invention.

【図3】 図2の半導体発光装置の平面視における光度
の配向特性を示す図である。
FIG. 3 is a diagram showing an alignment characteristic of luminous intensity in a plan view of the semiconductor light emitting device of FIG.

【図4】 本発明の半導体発光装置の他の例を示す側断
面図である。
FIG. 4 is a side sectional view showing another example of the semiconductor light emitting device of the present invention.

【図5】 シボの凹凸段差およびピッチを示す図であ
る。
FIG. 5 is a diagram showing uneven steps and pitches of grain.

【図6】 製造工程の中間体を示す平面図である。FIG. 6 is a plan view showing an intermediate body in the manufacturing process.

【図7】 反射ケースの装着および透光性樹脂による封
止を示す工程図である。
FIG. 7 is a process diagram showing mounting of a reflection case and sealing with a translucent resin.

【図8】 絶縁性基板と反射ケースとを一体成形した半
導体発光装置の一例を示す斜視図である。
FIG. 8 is a perspective view showing an example of a semiconductor light emitting device in which an insulating substrate and a reflection case are integrally molded.

【図9】 図8の半導体発光装置の製造工程図例であ
る。
FIG. 9 is an example of a manufacturing process diagram of the semiconductor light emitting device of FIG.

【図10】 従来の半導体発光装置の一例を示す側断面
図である。
FIG. 10 is a side sectional view showing an example of a conventional semiconductor light emitting device.

【図11】 図10の半導体発光装置の平面視における
光度の配向特性を示す図である。
FIG. 11 is a diagram showing an alignment characteristic of luminous intensity in a plan view of the semiconductor light emitting device of FIG.

【符号の説明】[Explanation of symbols]

1 絶縁性基板 2,2’ 電極部 3 半導体発光素子 4 ボンディングワイヤ 5,5’,5” 反射ケース 6 透光性樹脂 51 シボ 1 Insulating substrate 2,2 'electrode part 3 Semiconductor light emitting device 4 Bonding wire 5,5 ', 5 "reflective case 6 Translucent resin 51 grain

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性基板の表面に形成された電極部に
半導体発光素子を実装し、この半導体発光素子からの光
を反射させるための反射ケースを前記絶縁性基板上に設
け、この反射ケース内部を透光性樹脂で封止した半導体
発光装置において、 前記反射ケースの透光性樹脂との接触面の少なくとも一
部にシボを形成したことを特徴とする半導体発光装置。
1. A semiconductor light emitting device is mounted on an electrode portion formed on a surface of an insulating substrate, and a reflection case for reflecting light from the semiconductor light emitting device is provided on the insulating substrate. A semiconductor light-emitting device having an inside sealed with a translucent resin, wherein a wrinkle is formed on at least a part of a contact surface of the reflective case with the translucent resin.
【請求項2】 前記シボが、前記反射ケースの少なくと
も半導体発光素子側面の対向領域に形成された請求項1
記載の半導体発光装置。
2. The embossment is formed in at least a facing region of a side surface of the semiconductor light emitting element of the reflective case.
The semiconductor light-emitting device described.
【請求項3】 前記シボの凹凸段差が12μm以上であ
る請求項1又は2記載の半導体発光装置。
3. The semiconductor light emitting device according to claim 1, wherein the unevenness of the unevenness is 12 μm or more.
【請求項4】 前記シボ間のピッチが20μm以下であ
る請求項1〜3のいずれかに記載の半導体発光装置。
4. The semiconductor light emitting device according to claim 1, wherein the pitch between the textures is 20 μm or less.
【請求項5】 前記絶縁性基板と前記反射ケースとを一
体成形した請求項1〜4のいずれかに記載の半導体発光
装置。
5. The semiconductor light emitting device according to claim 1, wherein the insulating substrate and the reflection case are integrally molded.
【請求項6】 前記反射ケースの材料として液晶ポリマ
ーを用い、前記透光性樹脂としてエポキシ樹脂を用いた
請求項1〜5のいずれかに記載の半導体発光装置。
6. The semiconductor light emitting device according to claim 1, wherein a liquid crystal polymer is used as a material of the reflective case, and an epoxy resin is used as the translucent resin.
JP2002199555A 2001-07-19 2002-07-09 Semiconductor light-emitting device having reflector case Pending JP2003282955A (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
JP2001219079 2001-07-19
JP2001-219079 2001-07-19
JP2002005547 2002-01-15
JP2002-5547 2002-01-15
JP2002199555A JP2003282955A (en) 2001-07-19 2002-07-09 Semiconductor light-emitting device having reflector case

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