JP2003162051A

JP2003162051A - レジスト組成物

レジスト組成物

Info

Publication number: JP2003162051A
Authority: JP; Japan
Prior art keywords: group; acid; resin; substituted; compound
Prior art date: 2001-11-27
Legal status : Abandoned

Application number

JP2001360938A

Other languages

English (en)

Japanese (ja)

Other versions

JP2003162051A5 (enExample

Inventor

Koji Shirakawa

浩司白川

Kazuya Uenishi

一也上西

Kunihiko Kodama

邦彦児玉

Yutaka Adegawa

豊阿出川

Current Assignee

Fujifilm Holdings Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date

2001-11-27

Filing date

2001-11-27

Publication date

2003-06-06

2001-11-27 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

2001-11-27 Priority to JP2001360938A priority Critical patent/JP2003162051A/ja

2003-06-06 Publication of JP2003162051A publication Critical patent/JP2003162051A/ja

2005-04-07 Publication of JP2003162051A5 publication Critical patent/JP2003162051A5/ja

Status Abandoned legal-status Critical Current

Links

239000000203 mixture Substances 0.000 title claims abstract description 83
150000001875 compounds Chemical class 0.000 claims abstract description 89
239000002253 acid Substances 0.000 claims abstract description 62
238000010894 electron beam technology Methods 0.000 claims abstract description 62
150000003871 sulfonates Chemical class 0.000 claims abstract description 8
-1 sulfonium sulfonates Chemical class 0.000 claims description 94
150000003839 salts Chemical class 0.000 claims description 16
229920005989 resin Polymers 0.000 abstract description 84
239000011347 resin Substances 0.000 abstract description 84
230000035945 sensitivity Effects 0.000 abstract description 22
230000000694 effects Effects 0.000 abstract description 9
239000003513 alkali Substances 0.000 abstract description 8
239000007788 liquid Substances 0.000 abstract description 6
229920001577 copolymer Polymers 0.000 description 41
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 40
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 33
239000000243 solution Substances 0.000 description 31
125000004432 carbon atom Chemical group C* 0.000 description 27
230000015572 biosynthetic process Effects 0.000 description 26
238000003786 synthesis reaction Methods 0.000 description 24
125000003118 aryl group Chemical group 0.000 description 23
238000006243 chemical reaction Methods 0.000 description 23
125000001153 fluoro group Chemical group F* 0.000 description 23
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 20
229910052731 fluorine Inorganic materials 0.000 description 20
238000000034 method Methods 0.000 description 19
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
238000011156 evaluation Methods 0.000 description 18
239000000126 substance Substances 0.000 description 18
125000000217 alkyl group Chemical group 0.000 description 17
238000004090 dissolution Methods 0.000 description 17
125000002887 hydroxy group Chemical group [H]O* 0.000 description 17
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
125000001424 substituent group Chemical group 0.000 description 16
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
239000003431 cross linking reagent Substances 0.000 description 15
VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
125000003545 alkoxy group Chemical group 0.000 description 14
150000002989 phenols Chemical class 0.000 description 14
238000003756 stirring Methods 0.000 description 14
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 13
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 13
239000004094 surface-active agent Substances 0.000 description 13
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
239000007864 aqueous solution Substances 0.000 description 12
229910052757 nitrogen Inorganic materials 0.000 description 11
239000000047 product Substances 0.000 description 11
125000004429 atom Chemical group 0.000 description 10
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238000001914 filtration Methods 0.000 description 10
239000000178 monomer Substances 0.000 description 10
239000000843 powder Substances 0.000 description 10
239000007787 solid Substances 0.000 description 10
BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 10
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 9
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 9
239000010703 silicon Substances 0.000 description 9
LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 8
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
230000009471 action Effects 0.000 description 8
238000000354 decomposition reaction Methods 0.000 description 8
238000009826 distribution Methods 0.000 description 8
229920000642 polymer Polymers 0.000 description 8
230000002829 reductive effect Effects 0.000 description 8
229910052710 silicon Inorganic materials 0.000 description 8
ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 7
150000001450 anions Chemical class 0.000 description 7
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 7
125000004122 cyclic group Chemical group 0.000 description 7
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 7
239000011737 fluorine Substances 0.000 description 7
125000005843 halogen group Chemical group 0.000 description 7
125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 7
239000011541 reaction mixture Substances 0.000 description 7
239000000758 substrate Substances 0.000 description 7
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OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 6
125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
125000002252 acyl group Chemical group 0.000 description 6
125000003342 alkenyl group Chemical group 0.000 description 6
125000004453 alkoxycarbonyl group Chemical group 0.000 description 6
125000004849 alkoxymethyl group Chemical group 0.000 description 6
150000007514 bases Chemical class 0.000 description 6
238000011161 development Methods 0.000 description 6
230000018109 developmental process Effects 0.000 description 6
238000005227 gel permeation chromatography Methods 0.000 description 6
RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
230000002401 inhibitory effect Effects 0.000 description 6
JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 6
BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 6
WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
238000005406 washing Methods 0.000 description 6
SRBFZHDQGSBBOR-IOVATXLUSA-N D-xylopyranose Chemical group O[C@@H]1COC(O)[C@H](O)[C@H]1O SRBFZHDQGSBBOR-IOVATXLUSA-N 0.000 description 5
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 5
239000004793 Polystyrene Substances 0.000 description 5
125000004036 acetal group Chemical group 0.000 description 5
125000003710 aryl alkyl group Chemical group 0.000 description 5
125000006165 cyclic alkyl group Chemical group 0.000 description 5
238000001035 drying Methods 0.000 description 5
125000004185 ester group Chemical group 0.000 description 5
LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
238000004519 manufacturing process Methods 0.000 description 5
238000005259 measurement Methods 0.000 description 5
229920003986 novolac Polymers 0.000 description 5
229920002223 polystyrene Polymers 0.000 description 5
239000002904 solvent Substances 0.000 description 5
SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 4
RNIPJYFZGXJSDD-UHFFFAOYSA-N 2,4,5-triphenyl-1h-imidazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 RNIPJYFZGXJSDD-UHFFFAOYSA-N 0.000 description 4
XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
239000007983 Tris buffer Substances 0.000 description 4
125000004423 acyloxy group Chemical group 0.000 description 4
125000005910 alkyl carbonate group Chemical group 0.000 description 4
150000001491 aromatic compounds Chemical class 0.000 description 4
229910052799 carbon Inorganic materials 0.000 description 4
239000003795 chemical substances by application Substances 0.000 description 4
229910052801 chlorine Inorganic materials 0.000 description 4
230000000052 comparative effect Effects 0.000 description 4
239000012141 concentrate Substances 0.000 description 4
238000009833 condensation Methods 0.000 description 4
230000005494 condensation Effects 0.000 description 4
238000001816 cooling Methods 0.000 description 4
125000004093 cyano group Chemical group *C#N 0.000 description 4
230000007423 decrease Effects 0.000 description 4
238000000609 electron-beam lithography Methods 0.000 description 4
LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
UKJFVOWPUXSBOM-UHFFFAOYSA-N hexane;oxolane Chemical compound C1CCOC1.CCCCCC UKJFVOWPUXSBOM-UHFFFAOYSA-N 0.000 description 4
XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
239000003112 inhibitor Substances 0.000 description 4
239000000463 material Substances 0.000 description 4
125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
238000010992 reflux Methods 0.000 description 4
238000001226 reprecipitation Methods 0.000 description 4
239000004065 semiconductor Substances 0.000 description 4
125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 4
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IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 4
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QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
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JJHHIJFTHRNPIK-UHFFFAOYSA-N Diphenyl sulfoxide Chemical class C=1C=CC=CC=1S(=O)C1=CC=CC=C1 JJHHIJFTHRNPIK-UHFFFAOYSA-N 0.000 description 3
239000004593 Epoxy Substances 0.000 description 3
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229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
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125000004104 aryloxy group Chemical group 0.000 description 3
229940077388 benzenesulfonate Drugs 0.000 description 3
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IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
239000003054 catalyst Substances 0.000 description 3
238000000576 coating method Methods 0.000 description 3
238000007796 conventional method Methods 0.000 description 3
SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 description 3
125000001033 ether group Chemical group 0.000 description 3
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XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
239000004615 ingredient Substances 0.000 description 3
229910052740 iodine Inorganic materials 0.000 description 3
125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 3
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
125000002950 monocyclic group Chemical group 0.000 description 3
125000004433 nitrogen atom Chemical group N* 0.000 description 3
238000006116 polymerization reaction Methods 0.000 description 3
229910000027 potassium carbonate Inorganic materials 0.000 description 3
239000002244 precipitate Substances 0.000 description 3
239000002243 precursor Substances 0.000 description 3
230000008569 process Effects 0.000 description 3
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
238000003860 storage Methods 0.000 description 3
125000003107 substituted aryl group Chemical group 0.000 description 3
AIBKTSSWLZGMLQ-UHFFFAOYSA-N tert-butyl 2-(4-ethenylphenoxy)acetate Chemical compound CC(C)(C)OC(=O)COC1=CC=C(C=C)C=C1 AIBKTSSWLZGMLQ-UHFFFAOYSA-N 0.000 description 3
125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 3
QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 3
125000005409 triarylsulfonium group Chemical group 0.000 description 3
230000004304 visual acuity Effects 0.000 description 3
ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
IKMBXKGUMLSBOT-UHFFFAOYSA-N 2,3,4,5,6-pentafluorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=C(F)C(F)=C(F)C(F)=C1F IKMBXKGUMLSBOT-UHFFFAOYSA-N 0.000 description 2
GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
HUHXLHLWASNVDB-UHFFFAOYSA-N 2-(oxan-2-yloxy)oxane Chemical group O1CCCCC1OC1OCCCC1 HUHXLHLWASNVDB-UHFFFAOYSA-N 0.000 description 2
ICSNLGPSRYBMBD-UHFFFAOYSA-N 2-aminopyridine Chemical compound NC1=CC=CC=N1 ICSNLGPSRYBMBD-UHFFFAOYSA-N 0.000 description 2
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FBTSUTGMWBDAAC-UHFFFAOYSA-N 3,4-Dihydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1O FBTSUTGMWBDAAC-UHFFFAOYSA-N 0.000 description 2
CUYKNJBYIJFRCU-UHFFFAOYSA-N 3-aminopyridine Chemical compound NC1=CC=CN=C1 CUYKNJBYIJFRCU-UHFFFAOYSA-N 0.000 description 2
YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
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102100026291 Arf-GAP with SH3 domain, ANK repeat and PH domain-containing protein 2 Human genes 0.000 description 2
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VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
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IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
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LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
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QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
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239000005977 Ethylene Substances 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
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KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 2
239000004472 Lysine Substances 0.000 description 2
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AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
241001024304 Mino Species 0.000 description 2
OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 2
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WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical class C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
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CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
239000004115 Sodium Silicate Substances 0.000 description 2
239000004147 Sorbitan trioleate Substances 0.000 description 2
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DYHSDKLCOJIUFX-UHFFFAOYSA-N tert-butoxycarbonyl anhydride Chemical compound CC(C)(C)OC(=O)OC(=O)OC(C)(C)C DYHSDKLCOJIUFX-UHFFFAOYSA-N 0.000 description 1
PTVAFUMXLZLZEZ-UHFFFAOYSA-N tert-butyl 2-(3-ethenylphenoxy)acetate Chemical compound CC(C)(C)OC(=O)COC1=CC=CC(C=C)=C1 PTVAFUMXLZLZEZ-UHFFFAOYSA-N 0.000 description 1
KHEOWODWWPOGTJ-UHFFFAOYSA-N tert-butyl 2-(4-ethenyl-2-methylphenoxy)acetate Chemical compound CC1=CC(C=C)=CC=C1OCC(=O)OC(C)(C)C KHEOWODWWPOGTJ-UHFFFAOYSA-N 0.000 description 1
BNWCETAHAJSBFG-UHFFFAOYSA-N tert-butyl 2-bromoacetate Chemical compound CC(C)(C)OC(=O)CBr BNWCETAHAJSBFG-UHFFFAOYSA-N 0.000 description 1
HPBNICVODIHXKB-UHFFFAOYSA-N tert-butyl 4-ethenylbenzoate Chemical compound CC(C)(C)OC(=O)C1=CC=C(C=C)C=C1 HPBNICVODIHXKB-UHFFFAOYSA-N 0.000 description 1
150000003512 tertiary amines Chemical group 0.000 description 1
JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
NZJMPGDMLIPDBR-UHFFFAOYSA-M tetramethylazanium;hydroxide;hydrate Chemical compound O.[OH-].C[N+](C)(C)C NZJMPGDMLIPDBR-UHFFFAOYSA-M 0.000 description 1
125000005425 toluyl group Chemical group 0.000 description 1
125000003944 tolyl group Chemical group 0.000 description 1
125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
125000000876 trifluoromethoxy group Chemical group FC(F)(F)O* 0.000 description 1
125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
125000004953 trihalomethyl group Chemical group 0.000 description 1
ZFEAYIKULRXTAR-UHFFFAOYSA-M triphenylsulfanium;chloride Chemical compound [Cl-].C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 ZFEAYIKULRXTAR-UHFFFAOYSA-M 0.000 description 1
238000005292 vacuum distillation Methods 0.000 description 1
238000001291 vacuum drying Methods 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1
239000000052 vinegar Substances 0.000 description 1
235000021419 vinegar Nutrition 0.000 description 1
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
239000008096 xylene Substances 0.000 description 1
125000005023 xylyl group Chemical group 0.000 description 1