JP2003162051A5 - - Google Patents
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- Publication number
- JP2003162051A5 JP2003162051A5 JP2001360938A JP2001360938A JP2003162051A5 JP 2003162051 A5 JP2003162051 A5 JP 2003162051A5 JP 2001360938 A JP2001360938 A JP 2001360938A JP 2001360938 A JP2001360938 A JP 2001360938A JP 2003162051 A5 JP2003162051 A5 JP 2003162051A5
- Authority
- JP
- Japan
- Prior art keywords
- ray
- electron beam
- sulfonates
- resist composition
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000010894 electron beam technology Methods 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- -1 sulfonium sulfonates Chemical class 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 150000003871 sulfonates Chemical class 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001360938A JP2003162051A (ja) | 2001-11-27 | 2001-11-27 | レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001360938A JP2003162051A (ja) | 2001-11-27 | 2001-11-27 | レジスト組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003162051A JP2003162051A (ja) | 2003-06-06 |
| JP2003162051A5 true JP2003162051A5 (enExample) | 2005-04-07 |
Family
ID=19171677
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001360938A Abandoned JP2003162051A (ja) | 2001-11-27 | 2001-11-27 | レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003162051A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5096796B2 (ja) * | 2007-03-05 | 2012-12-12 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
| CN102781911B (zh) | 2010-02-24 | 2015-07-22 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| JP2014021249A (ja) * | 2012-07-18 | 2014-02-03 | Sumitomo Chemical Co Ltd | レジスト組成物及びレジストパターンの製造方法 |
-
2001
- 2001-11-27 JP JP2001360938A patent/JP2003162051A/ja not_active Abandoned
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