JP2003098672A5 - - Google Patents

Download PDF

Info

Publication number
JP2003098672A5
JP2003098672A5 JP2001287112A JP2001287112A JP2003098672A5 JP 2003098672 A5 JP2003098672 A5 JP 2003098672A5 JP 2001287112 A JP2001287112 A JP 2001287112A JP 2001287112 A JP2001287112 A JP 2001287112A JP 2003098672 A5 JP2003098672 A5 JP 2003098672A5
Authority
JP
Japan
Prior art keywords
oxygen
photosensitive composition
positive photosensitive
composition according
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001287112A
Other languages
English (en)
Japanese (ja)
Other versions
JP4313965B2 (ja
JP2003098672A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2001287112A external-priority patent/JP4313965B2/ja
Priority to JP2001287112A priority Critical patent/JP4313965B2/ja
Priority to US10/188,224 priority patent/US7192681B2/en
Priority to EP02014889A priority patent/EP1273970B1/en
Priority to TW091114923A priority patent/TW586052B/zh
Priority to EP10186997.2A priority patent/EP2296040B1/en
Priority to EP10186996.4A priority patent/EP2296039B1/en
Priority to KR1020020038932A priority patent/KR100890735B1/ko
Publication of JP2003098672A publication Critical patent/JP2003098672A/ja
Publication of JP2003098672A5 publication Critical patent/JP2003098672A5/ja
Priority to US11/698,114 priority patent/US7514201B2/en
Priority to US12/178,493 priority patent/US7977029B2/en
Publication of JP4313965B2 publication Critical patent/JP4313965B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001287112A 2001-07-05 2001-09-20 ポジ型感光性組成物 Expired - Fee Related JP4313965B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2001287112A JP4313965B2 (ja) 2001-09-20 2001-09-20 ポジ型感光性組成物
US10/188,224 US7192681B2 (en) 2001-07-05 2002-07-03 Positive photosensitive composition
KR1020020038932A KR100890735B1 (ko) 2001-07-05 2002-07-05 포지티브 감광성 조성물
TW091114923A TW586052B (en) 2001-07-05 2002-07-05 Positive photosensitive composition
EP10186997.2A EP2296040B1 (en) 2001-07-05 2002-07-05 Positive photosensitive composition
EP10186996.4A EP2296039B1 (en) 2001-07-05 2002-07-05 Positive photosensitive composition
EP02014889A EP1273970B1 (en) 2001-07-05 2002-07-05 Positive photosensitive composition
US11/698,114 US7514201B2 (en) 2001-07-05 2007-01-26 Positive photosensitive composition
US12/178,493 US7977029B2 (en) 2001-07-05 2008-07-24 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001287112A JP4313965B2 (ja) 2001-09-20 2001-09-20 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2003098672A JP2003098672A (ja) 2003-04-04
JP2003098672A5 true JP2003098672A5 (enExample) 2006-01-19
JP4313965B2 JP4313965B2 (ja) 2009-08-12

Family

ID=19109974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001287112A Expired - Fee Related JP4313965B2 (ja) 2001-07-05 2001-09-20 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP4313965B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4703674B2 (ja) 2008-03-14 2011-06-15 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP5433268B2 (ja) * 2009-03-19 2014-03-05 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
WO2024168819A1 (en) * 2023-02-17 2024-08-22 Momentive Performance Materials Inc. Hydrophilic copolymer and coating composition comprising the same and antifog use thereof

Similar Documents

Publication Publication Date Title
EP1273970A3 (en) Positive photosensitive composition
TW200606589A (en) Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
EP1764652A3 (en) Positive resist composition and pattern-forming method using the same
EP1480079A3 (en) Photosensitive resin composition
JP2003241379A5 (enExample)
JP2002082440A (ja) フォトレジスト組成物、フォトレジストパターン形成方法、及び、半導体素子
TW200728922A (en) Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
EP1367440A3 (en) Positive-working resist composition
JP2003167333A5 (enExample)
EP1319981A3 (en) Positive resist composition
EP1300727A3 (en) Positive photosensitive composition
JP2001183837A5 (enExample)
TW200510938A (en) Positive resist composition and method of forming pattern using the same
JP2004004557A5 (enExample)
JP2003280202A5 (enExample)
JP2000231194A5 (enExample)
JPH0425847A (ja) ポジ型感光性樹脂組成物
JP2002278053A5 (enExample)
JP2004287262A5 (enExample)
JP2003098672A5 (enExample)
EP2031445A3 (en) Chemical amplification resist composition and pattern-forming method using the same
JP2003270791A5 (enExample)
TW200632557A (en) Positive resist composition for immersion exposure and pattern-forming method using the same
EP1243968A3 (en) Positive resist composition
JPH11327145A5 (enExample)