JP4313965B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP4313965B2
JP4313965B2 JP2001287112A JP2001287112A JP4313965B2 JP 4313965 B2 JP4313965 B2 JP 4313965B2 JP 2001287112 A JP2001287112 A JP 2001287112A JP 2001287112 A JP2001287112 A JP 2001287112A JP 4313965 B2 JP4313965 B2 JP 4313965B2
Authority
JP
Japan
Prior art keywords
group
alicyclic hydrocarbon
carbon atoms
general formula
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001287112A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003098672A5 (enExample
JP2003098672A (ja
Inventor
亨 藤森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2001287112A priority Critical patent/JP4313965B2/ja
Priority to US10/188,224 priority patent/US7192681B2/en
Priority to EP02014889A priority patent/EP1273970B1/en
Priority to KR1020020038932A priority patent/KR100890735B1/ko
Priority to TW091114923A priority patent/TW586052B/zh
Priority to EP10186997.2A priority patent/EP2296040B1/en
Priority to EP10186996.4A priority patent/EP2296039B1/en
Publication of JP2003098672A publication Critical patent/JP2003098672A/ja
Publication of JP2003098672A5 publication Critical patent/JP2003098672A5/ja
Priority to US11/698,114 priority patent/US7514201B2/en
Priority to US12/178,493 priority patent/US7977029B2/en
Application granted granted Critical
Publication of JP4313965B2 publication Critical patent/JP4313965B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2001287112A 2001-07-05 2001-09-20 ポジ型感光性組成物 Expired - Fee Related JP4313965B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2001287112A JP4313965B2 (ja) 2001-09-20 2001-09-20 ポジ型感光性組成物
US10/188,224 US7192681B2 (en) 2001-07-05 2002-07-03 Positive photosensitive composition
KR1020020038932A KR100890735B1 (ko) 2001-07-05 2002-07-05 포지티브 감광성 조성물
TW091114923A TW586052B (en) 2001-07-05 2002-07-05 Positive photosensitive composition
EP10186997.2A EP2296040B1 (en) 2001-07-05 2002-07-05 Positive photosensitive composition
EP10186996.4A EP2296039B1 (en) 2001-07-05 2002-07-05 Positive photosensitive composition
EP02014889A EP1273970B1 (en) 2001-07-05 2002-07-05 Positive photosensitive composition
US11/698,114 US7514201B2 (en) 2001-07-05 2007-01-26 Positive photosensitive composition
US12/178,493 US7977029B2 (en) 2001-07-05 2008-07-24 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001287112A JP4313965B2 (ja) 2001-09-20 2001-09-20 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2003098672A JP2003098672A (ja) 2003-04-04
JP2003098672A5 JP2003098672A5 (enExample) 2006-01-19
JP4313965B2 true JP4313965B2 (ja) 2009-08-12

Family

ID=19109974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001287112A Expired - Fee Related JP4313965B2 (ja) 2001-07-05 2001-09-20 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JP4313965B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4703674B2 (ja) 2008-03-14 2011-06-15 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP5433268B2 (ja) * 2009-03-19 2014-03-05 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途
WO2024168819A1 (en) * 2023-02-17 2024-08-22 Momentive Performance Materials Inc. Hydrophilic copolymer and coating composition comprising the same and antifog use thereof

Also Published As

Publication number Publication date
JP2003098672A (ja) 2003-04-04

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