JP2003045618A5 - - Google Patents

Info

Publication number

JP2003045618A5

JP2003045618A5 JP2001230874A JP2001230874A JP2003045618A5 JP 2003045618 A5 JP2003045618 A5 JP 2003045618A5 JP 2001230874 A JP2001230874 A JP 2001230874A JP 2001230874 A JP2001230874 A JP 2001230874A JP 2003045618 A5 JP2003045618 A5 JP 2003045618A5

Authority

JP

Japan

Prior art keywords

glass

wafer

heating apparatus

wafer heating

resistor

Prior art date

2001-07-31

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Links

• Espacenet
• Global Dossier
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• 238000010438 heat treatment Methods 0.000 claims description 17
• 239000000919 ceramic Substances 0.000 claims description 2
• 239000000463 material Substances 0.000 claims description 2
• HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
• 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
• 239000011521 glass Substances 0.000 claims 7
• 239000013078 crystal Substances 0.000 claims 3
• 238000002441 X-ray diffraction Methods 0.000 claims 2
• 229910052661 anorthite Inorganic materials 0.000 claims 2
• GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical group [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 claims 2
• 230000009477 glass transition Effects 0.000 claims 2
• 239000002184 metal Substances 0.000 claims 2
• 229910052751 metal Inorganic materials 0.000 claims 2
• 229910004298 SiO 2 Inorganic materials 0.000 claims 1
• 230000020169 heat generation Effects 0.000 claims 1
• 229910052710 silicon Inorganic materials 0.000 claims 1
• 238000002791 soaking Methods 0.000 claims 1
• 230000003746 surface roughness Effects 0.000 claims 1
• 230000007704 transition Effects 0.000 claims 1