JP2002538241A5 - - Google Patents
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- Publication number
- JP2002538241A5 JP2002538241A5 JP2000602686A JP2000602686A JP2002538241A5 JP 2002538241 A5 JP2002538241 A5 JP 2002538241A5 JP 2000602686 A JP2000602686 A JP 2000602686A JP 2000602686 A JP2000602686 A JP 2000602686A JP 2002538241 A5 JP2002538241 A5 JP 2002538241A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- substituted
- phenyl
- unsubstituted
- halogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- -1 anthracyl Chemical group 0.000 description 69
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 41
- 125000000217 alkyl group Chemical group 0.000 description 39
- 229910052736 halogen Inorganic materials 0.000 description 27
- 150000002367 halogens Chemical class 0.000 description 27
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 12
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 12
- 125000003118 aryl group Chemical group 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 150000002431 hydrogen Chemical class 0.000 description 8
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 8
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 description 7
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 7
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 125000001624 naphthyl group Chemical group 0.000 description 6
- 125000005146 naphthylsulfonyl group Chemical group C1(=CC=CC2=CC=CC=C12)S(=O)(=O)* 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 125000005561 phenanthryl group Chemical group 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 125000001589 carboacyl group Chemical group 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000004957 naphthylene group Chemical group 0.000 description 3
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 3
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 2
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 2
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 2
- 125000004414 alkyl thio group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 125000006331 halo benzoyl group Chemical group 0.000 description 2
- 125000004441 haloalkylsulfonyl group Chemical group 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 description 1
- 125000002941 2-furyl group Chemical group O1C([*])=C([H])C([H])=C1[H] 0.000 description 1
- JTWVWDXNPRQQMW-UHFFFAOYSA-N 2-methoxyethyl 2-(4-methylphenyl)sulfonyloxyimino-2-phenylacetate Chemical compound C=1C=CC=CC=1C(C(=O)OCCOC)=NOS(=O)(=O)C1=CC=C(C)C=C1 JTWVWDXNPRQQMW-UHFFFAOYSA-N 0.000 description 1
- VWBYXJRDIQCSLW-UHFFFAOYSA-N O=[P](c1ccccc1)c1ccccc1 Chemical group O=[P](c1ccccc1)c1ccccc1 VWBYXJRDIQCSLW-UHFFFAOYSA-N 0.000 description 1
- RBFIMUWJSPHWMC-UHFFFAOYSA-N [(2-amino-2-oxo-1-phenylethylidene)amino] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)ON=C(C(N)=O)C1=CC=CC=C1 RBFIMUWJSPHWMC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99810180 | 1999-03-03 | ||
| EP99810180.2 | 1999-03-03 | ||
| PCT/EP2000/001404 WO2000052530A1 (en) | 1999-03-03 | 2000-02-21 | Oxime derivatives and the use thereof as photoinitiators |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002538241A JP2002538241A (ja) | 2002-11-12 |
| JP2002538241A5 true JP2002538241A5 (https=) | 2007-04-05 |
Family
ID=8242704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000602686A Withdrawn JP2002538241A (ja) | 1999-03-03 | 2000-02-21 | オキシム誘導体及び光開始剤としてのその使用 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6806024B1 (https=) |
| EP (2) | EP1635220A2 (https=) |
| JP (1) | JP2002538241A (https=) |
| KR (1) | KR100591030B1 (https=) |
| AT (1) | ATE330254T1 (https=) |
| AU (1) | AU4102100A (https=) |
| DE (1) | DE60028738T2 (https=) |
| WO (1) | WO2000052530A1 (https=) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| KR100875612B1 (ko) | 2001-06-01 | 2008-12-24 | 시바 홀딩 인크 | 치환된 옥심 유도체 및 이를 포함하는 조성물 |
| EP1395615B1 (en) * | 2001-06-11 | 2009-10-21 | Basf Se | Oxime ester photoinitiators having a combined structure |
| TWI225501B (en) * | 2002-11-06 | 2004-12-21 | Delta Optoelectronics Inc | Packaging material used for a display device and method of forming thereof |
| JP4233853B2 (ja) * | 2002-11-25 | 2009-03-04 | 株式会社メニコン | 眼用レンズのマーキング方法 |
| US20050215656A1 (en) * | 2002-11-28 | 2005-09-29 | Taiyo Ink Manufacturing Co., Ltd. | Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
| WO2004074242A2 (en) * | 2003-02-19 | 2004-09-02 | Ciba Specialty Chemicals Holding Inc. | Halogenated oxime derivatives and the use thereof as latent acids |
| WO2004111143A2 (en) | 2003-06-12 | 2004-12-23 | Valspar Sourcing, Inc. | Coating compositions containing reactive diluents and methods |
| WO2006008250A2 (en) * | 2004-07-20 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use therof as latent acids |
| KR100763744B1 (ko) | 2005-11-07 | 2007-10-04 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물 |
| KR100814231B1 (ko) | 2005-12-01 | 2008-03-17 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을포함하는 투명한 감광성 조성물 |
| EP1914279A3 (en) * | 2006-10-19 | 2008-05-07 | Seiko Epson Corporation | Photo curable ink composition set, and recording method and recordings employing ink compositon set |
| US20080132599A1 (en) | 2006-11-30 | 2008-06-05 | Seiko Epson Corporation. | Ink composition, two-pack curing ink composition set, and recording method and recorded matter using these |
| JP5472670B2 (ja) | 2007-01-29 | 2014-04-16 | セイコーエプソン株式会社 | インクセット、インクジェット記録方法及び記録物 |
| US8894197B2 (en) | 2007-03-01 | 2014-11-25 | Seiko Epson Corporation | Ink set, ink-jet recording method, and recorded material |
| US8466096B2 (en) * | 2007-04-26 | 2013-06-18 | Afton Chemical Corporation | 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions |
| EP2037323B1 (en) * | 2007-07-17 | 2014-12-10 | FUJIFILM Corporation | Photosensitive compositions |
| JP5274132B2 (ja) * | 2007-07-17 | 2013-08-28 | 富士フイルム株式会社 | 硬化性組成物、カラーフィルタ用硬化性組成物、パターン形成方法、カラーフィルタ、及びその製造方法 |
| KR101007440B1 (ko) | 2007-07-18 | 2011-01-12 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 수지상 광활성 화합물 및 이의제조방법 |
| JP4766281B2 (ja) | 2007-09-18 | 2011-09-07 | セイコーエプソン株式会社 | インクジェット記録用非水系インク組成物、インクジェット記録方法および記録物 |
| JP2009269397A (ja) | 2008-02-29 | 2009-11-19 | Seiko Epson Corp | 不透明層の形成方法、記録方法、インクセット、インクカートリッジ、記録装置 |
| JP5507054B2 (ja) | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子 |
| KR101048329B1 (ko) | 2008-10-06 | 2011-07-14 | 주식회사 엘지화학 | 우레탄계 다관능성 모노머, 그의 제조방법 및 이를 포함하는 감광성 수지 조성물 |
| WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| JP5384929B2 (ja) * | 2008-12-26 | 2014-01-08 | 東京応化工業株式会社 | 透明電極形成用光硬化性樹脂組成物及び透明電極の製造方法 |
| JP5669386B2 (ja) | 2009-01-15 | 2015-02-12 | 富士フイルム株式会社 | 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版 |
| AU2010330044B2 (en) | 2009-12-07 | 2014-08-28 | Agfa Graphics N.V. | Photoinitiators for UV-LED curable compositions and inks |
| US8569393B2 (en) | 2009-12-07 | 2013-10-29 | Agfa-Gevaert N.V. | UV-LED curable compositions and inks |
| JP5692490B2 (ja) | 2010-01-28 | 2015-04-01 | セイコーエプソン株式会社 | 水性インク組成物、およびインクジェット記録方法ならびに記録物 |
| JP2011152747A (ja) | 2010-01-28 | 2011-08-11 | Seiko Epson Corp | 水性インク組成物、およびインクジェット記録方法ならびに記録物 |
| US8513321B2 (en) | 2010-11-05 | 2013-08-20 | Ppg Industries Ohio, Inc. | Dual cure coating compositions, methods of coating a substrate, and related coated substrates |
| KR101897842B1 (ko) * | 2011-01-28 | 2018-09-12 | 바스프 에스이 | 열 경화제로서 옥심 술포네이트를 포함하는 중합성 조성물 |
| CN102628971A (zh) * | 2011-05-03 | 2012-08-08 | 京东方科技集团股份有限公司 | 一种彩色滤光片及其制作方法、装置 |
| CN102344504B (zh) * | 2011-07-29 | 2013-03-13 | 华中科技大学 | 一种制备高衍射效率全息光聚合物材料的可见光光引发体系 |
| JP6046533B2 (ja) * | 2012-03-26 | 2016-12-14 | 積水化学工業株式会社 | 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子 |
| JP5400917B2 (ja) * | 2012-04-10 | 2014-01-29 | 積水化学工業株式会社 | 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子 |
| US9125829B2 (en) | 2012-08-17 | 2015-09-08 | Hallstar Innovations Corp. | Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds |
| US9145383B2 (en) | 2012-08-10 | 2015-09-29 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
| WO2014025370A1 (en) | 2012-08-10 | 2014-02-13 | Hallstar Innovations Corp. | Tricyclic energy quencher compounds for reducing singlet oxygen generation |
| JP6530410B2 (ja) | 2013-09-10 | 2019-06-12 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | オキシムエステル光開始剤 |
| JP5400985B1 (ja) * | 2013-09-11 | 2014-01-29 | 積水化学工業株式会社 | 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子 |
| JP6333947B2 (ja) * | 2014-02-20 | 2018-05-30 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、赤外線カットフィルター、並びに、固体撮像装置 |
| US10487050B2 (en) | 2014-08-29 | 2019-11-26 | Basf Se | Oxime sulfonate derivatives |
| JP6692637B2 (ja) * | 2014-12-16 | 2020-05-13 | 理想科学工業株式会社 | スクリーン印刷用版の作製方法及び作製材料 |
| KR101831358B1 (ko) * | 2016-06-02 | 2018-02-22 | (주)켐이 | 광활성 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| ES2831086T3 (es) | 2016-09-02 | 2021-06-07 | Igm Group B V | Glioxilatos policíclicos como fotoiniciadores |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1180846A (en) | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
| FR2393345A1 (fr) | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| DE3160242D1 (en) | 1980-02-29 | 1983-06-16 | Akzo Nv | Process for carrying out radical reactions and shaped articles of the reaction product |
| DE3166592D1 (en) | 1980-07-14 | 1984-11-15 | Akzo Nv | Thermosetting coating composition containing a blocked acid catalyst |
| US4540598A (en) | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
| US4590145A (en) | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
| US5019482A (en) | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
| DE59309494D1 (de) | 1992-05-22 | 1999-05-12 | Ciba Geigy Ag | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| JP3830183B2 (ja) | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
| MY117352A (en) | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| JP3875271B2 (ja) * | 1996-09-02 | 2007-01-31 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類 |
| TW550439B (en) * | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
| SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| MY121423A (en) | 1998-06-26 | 2006-01-28 | Ciba Sc Holding Ag | Photopolymerizable thermosetting resin compositions |
| DK199901098A (da) | 1998-08-18 | 2000-02-19 | Ciba Sc Holding Ag | Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse |
| TW575792B (en) | 1998-08-19 | 2004-02-11 | Ciba Sc Holding Ag | New unsaturated oxime derivatives and the use thereof as latent acids |
-
2000
- 2000-02-21 US US09/914,433 patent/US6806024B1/en not_active Expired - Lifetime
- 2000-02-21 AU AU41021/00A patent/AU4102100A/en not_active Abandoned
- 2000-02-21 DE DE60028738T patent/DE60028738T2/de not_active Expired - Fee Related
- 2000-02-21 EP EP05111899A patent/EP1635220A2/en not_active Withdrawn
- 2000-02-21 EP EP00920439A patent/EP1163553B1/en not_active Expired - Lifetime
- 2000-02-21 WO PCT/EP2000/001404 patent/WO2000052530A1/en not_active Ceased
- 2000-02-21 JP JP2000602686A patent/JP2002538241A/ja not_active Withdrawn
- 2000-02-21 KR KR1020017011105A patent/KR100591030B1/ko not_active Expired - Fee Related
- 2000-02-21 AT AT00920439T patent/ATE330254T1/de not_active IP Right Cessation
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