ATE330254T1 - Oximderivate und ihre verwendung als photoinitiatoren - Google Patents
Oximderivate und ihre verwendung als photoinitiatorenInfo
- Publication number
- ATE330254T1 ATE330254T1 AT00920439T AT00920439T ATE330254T1 AT E330254 T1 ATE330254 T1 AT E330254T1 AT 00920439 T AT00920439 T AT 00920439T AT 00920439 T AT00920439 T AT 00920439T AT E330254 T1 ATE330254 T1 AT E330254T1
- Authority
- AT
- Austria
- Prior art keywords
- inter alia
- phenyl
- photoinitiators
- alkylsulfonyl
- hydrogen
- Prior art date
Links
- 150000002923 oximes Chemical class 0.000 title 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 2
- 150000002431 hydrogen Chemical class 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 abstract 1
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- -1 anthracyl Chemical group 0.000 abstract 1
- 125000000392 cycloalkenyl group Chemical group 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
- 125000005561 phenanthryl group Chemical group 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
- C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
- C07C309/66—Methanesulfonates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/57—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being further substituted by nitrogen atoms, not being part of nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/56—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/66—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D333/30—Hetero atoms other than halogen
- C07D333/36—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
- C07D339/08—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/06—Phosphorus compounds without P—C bonds
- C07F9/08—Esters of oxyacids of phosphorus
- C07F9/09—Esters of phosphoric acids
- C07F9/095—Compounds containing the structure P(=O)-O-acyl, P(=O)-O-heteroatom, P(=O)-O-CN
- C07F9/097—Compounds containing the structure P(=O)-O-N
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/6553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having sulfur atoms, with or without selenium or tellurium atoms, as the only ring hetero atoms
- C07F9/655345—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having sulfur atoms, with or without selenium or tellurium atoms, as the only ring hetero atoms the sulfur atom being part of a five-membered ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Indole Compounds (AREA)
- Graft Or Block Polymers (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99810180 | 1999-03-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE330254T1 true ATE330254T1 (de) | 2006-07-15 |
Family
ID=8242704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00920439T ATE330254T1 (de) | 1999-03-03 | 2000-02-21 | Oximderivate und ihre verwendung als photoinitiatoren |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6806024B1 (https=) |
| EP (2) | EP1635220A2 (https=) |
| JP (1) | JP2002538241A (https=) |
| KR (1) | KR100591030B1 (https=) |
| AT (1) | ATE330254T1 (https=) |
| AU (1) | AU4102100A (https=) |
| DE (1) | DE60028738T2 (https=) |
| WO (1) | WO2000052530A1 (https=) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG97168A1 (en) | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| DK1392675T3 (da) * | 2001-06-01 | 2005-04-04 | Ciba Sc Holding Ag | Substituerede oximderivater og anvendelsen deraf som latente syrer |
| US7189489B2 (en) * | 2001-06-11 | 2007-03-13 | Ciba Specialty Chemicals Corporation | Oxime ester photoiniators having a combined structure |
| TWI225501B (en) * | 2002-11-06 | 2004-12-21 | Delta Optoelectronics Inc | Packaging material used for a display device and method of forming thereof |
| JP4233853B2 (ja) * | 2002-11-25 | 2009-03-04 | 株式会社メニコン | 眼用レンズのマーキング方法 |
| US20050215656A1 (en) * | 2002-11-28 | 2005-09-29 | Taiyo Ink Manufacturing Co., Ltd. | Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
| EP1595182B1 (en) * | 2003-02-19 | 2015-09-30 | Basf Se | Halogenated oxime derivatives and the use thereof as latent acids |
| CN1805989A (zh) | 2003-06-12 | 2006-07-19 | 瓦尔斯帕供应公司 | 含有反应性稀释剂的涂料组合物和方法 |
| WO2006008250A2 (en) * | 2004-07-20 | 2006-01-26 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use therof as latent acids |
| KR100763744B1 (ko) | 2005-11-07 | 2007-10-04 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물 |
| KR100814231B1 (ko) | 2005-12-01 | 2008-03-17 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을포함하는 투명한 감광성 조성물 |
| EP1914279A3 (en) | 2006-10-19 | 2008-05-07 | Seiko Epson Corporation | Photo curable ink composition set, and recording method and recordings employing ink compositon set |
| EP1927633A1 (en) | 2006-11-30 | 2008-06-04 | Seiko Epson Corporation | Ink composition, two-pack curing ink composition set, and recording method and recorded matter using these |
| JP5472670B2 (ja) | 2007-01-29 | 2014-04-16 | セイコーエプソン株式会社 | インクセット、インクジェット記録方法及び記録物 |
| US8894197B2 (en) | 2007-03-01 | 2014-11-25 | Seiko Epson Corporation | Ink set, ink-jet recording method, and recorded material |
| US8466096B2 (en) * | 2007-04-26 | 2013-06-18 | Afton Chemical Corporation | 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions |
| TWI436163B (zh) | 2007-07-17 | 2014-05-01 | Fujifilm Corp | 混合物、可光聚合的組成物、彩色濾鏡以及平版印刷的印刷板前驅物 |
| CN101349865B (zh) * | 2007-07-17 | 2012-10-03 | 富士胶片株式会社 | 感光性组合物、可固化组合物、滤色器和制备滤色器的方法 |
| KR101007440B1 (ko) | 2007-07-18 | 2011-01-12 | 주식회사 엘지화학 | 옥심 에스테르를 포함하는 수지상 광활성 화합물 및 이의제조방법 |
| JP4766281B2 (ja) | 2007-09-18 | 2011-09-07 | セイコーエプソン株式会社 | インクジェット記録用非水系インク組成物、インクジェット記録方法および記録物 |
| JP2009269397A (ja) | 2008-02-29 | 2009-11-19 | Seiko Epson Corp | 不透明層の形成方法、記録方法、インクセット、インクカートリッジ、記録装置 |
| JP5507054B2 (ja) | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子 |
| KR101048329B1 (ko) | 2008-10-06 | 2011-07-14 | 주식회사 엘지화학 | 우레탄계 다관능성 모노머, 그의 제조방법 및 이를 포함하는 감광성 수지 조성물 |
| WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| JP5384929B2 (ja) * | 2008-12-26 | 2014-01-08 | 東京応化工業株式会社 | 透明電極形成用光硬化性樹脂組成物及び透明電極の製造方法 |
| JP5669386B2 (ja) * | 2009-01-15 | 2015-02-12 | 富士フイルム株式会社 | 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版 |
| CN102639501B (zh) * | 2009-12-07 | 2015-04-29 | 爱克发印艺公司 | 用于uv-led可固化组合物和墨水的光引发剂 |
| AU2010330040B2 (en) | 2009-12-07 | 2013-12-19 | Agfa Nv | UV-LED curable compositions and inks |
| JP2011152747A (ja) | 2010-01-28 | 2011-08-11 | Seiko Epson Corp | 水性インク組成物、およびインクジェット記録方法ならびに記録物 |
| JP5692490B2 (ja) | 2010-01-28 | 2015-04-01 | セイコーエプソン株式会社 | 水性インク組成物、およびインクジェット記録方法ならびに記録物 |
| US8513321B2 (en) | 2010-11-05 | 2013-08-20 | Ppg Industries Ohio, Inc. | Dual cure coating compositions, methods of coating a substrate, and related coated substrates |
| CN103443072B (zh) | 2011-01-28 | 2016-05-18 | 巴斯夫欧洲公司 | 包含肟磺酸酯作为热固化剂的可聚合组合物 |
| CN102628971A (zh) * | 2011-05-03 | 2012-08-08 | 京东方科技集团股份有限公司 | 一种彩色滤光片及其制作方法、装置 |
| CN102344504B (zh) * | 2011-07-29 | 2013-03-13 | 华中科技大学 | 一种制备高衍射效率全息光聚合物材料的可见光光引发体系 |
| JP6046533B2 (ja) * | 2012-03-26 | 2016-12-14 | 積水化学工業株式会社 | 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子 |
| JP5400917B2 (ja) * | 2012-04-10 | 2014-01-29 | 積水化学工業株式会社 | 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子 |
| US9145383B2 (en) | 2012-08-10 | 2015-09-29 | Hallstar Innovations Corp. | Compositions, apparatus, systems, and methods for resolving electronic excited states |
| US9125829B2 (en) | 2012-08-17 | 2015-09-08 | Hallstar Innovations Corp. | Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds |
| WO2014025370A1 (en) | 2012-08-10 | 2014-02-13 | Hallstar Innovations Corp. | Tricyclic energy quencher compounds for reducing singlet oxygen generation |
| CN105531260B (zh) | 2013-09-10 | 2019-05-31 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| JP5400985B1 (ja) * | 2013-09-11 | 2014-01-29 | 積水化学工業株式会社 | 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子 |
| KR101848331B1 (ko) * | 2014-02-20 | 2018-04-12 | 후지필름 가부시키가이샤 | 감광성 수지 조성물, 경화물 및 그 제조 방법, 수지 패턴 제조 방법, 경화막, 액정 표시 장치, 유기 el 표시 장치, 적외선 차단 필터, 또한 고체 촬상 장치 |
| EP3186226B1 (en) * | 2014-08-29 | 2020-06-17 | Basf Se | Oxime sulfonate derivatives |
| JP6692637B2 (ja) * | 2014-12-16 | 2020-05-13 | 理想科学工業株式会社 | スクリーン印刷用版の作製方法及び作製材料 |
| KR101831358B1 (ko) * | 2016-06-02 | 2018-02-22 | (주)켐이 | 광활성 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| JP6633814B2 (ja) | 2016-09-02 | 2020-01-22 | アイジーエム グループ ビー．ヴィ． | 光開始剤としての多環式グリオキシレート |
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| FR2393345A1 (fr) | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
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| EP0571330B1 (de) | 1992-05-22 | 1999-04-07 | Ciba SC Holding AG | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
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| MY117352A (en) | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| JP3875271B2 (ja) * | 1996-09-02 | 2007-01-31 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類 |
| TW550439B (en) * | 1997-07-01 | 2003-09-01 | Ciba Sc Holding Ag | New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates |
| SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| MY121423A (en) * | 1998-06-26 | 2006-01-28 | Ciba Sc Holding Ag | Photopolymerizable thermosetting resin compositions |
| DK199901098A (da) * | 1998-08-18 | 2000-02-19 | Ciba Sc Holding Ag | Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse |
| TW575792B (en) | 1998-08-19 | 2004-02-11 | Ciba Sc Holding Ag | New unsaturated oxime derivatives and the use thereof as latent acids |
-
2000
- 2000-02-21 AU AU41021/00A patent/AU4102100A/en not_active Abandoned
- 2000-02-21 EP EP05111899A patent/EP1635220A2/en not_active Withdrawn
- 2000-02-21 DE DE60028738T patent/DE60028738T2/de not_active Expired - Fee Related
- 2000-02-21 AT AT00920439T patent/ATE330254T1/de not_active IP Right Cessation
- 2000-02-21 JP JP2000602686A patent/JP2002538241A/ja not_active Withdrawn
- 2000-02-21 WO PCT/EP2000/001404 patent/WO2000052530A1/en not_active Ceased
- 2000-02-21 EP EP00920439A patent/EP1163553B1/en not_active Expired - Lifetime
- 2000-02-21 US US09/914,433 patent/US6806024B1/en not_active Expired - Lifetime
- 2000-02-21 KR KR1020017011105A patent/KR100591030B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR100591030B1 (ko) | 2006-06-22 |
| WO2000052530A1 (en) | 2000-09-08 |
| AU4102100A (en) | 2000-09-21 |
| EP1163553B1 (en) | 2006-06-14 |
| US6806024B1 (en) | 2004-10-19 |
| DE60028738T2 (de) | 2007-05-24 |
| KR20010102461A (ko) | 2001-11-15 |
| JP2002538241A (ja) | 2002-11-12 |
| EP1163553A1 (en) | 2001-12-19 |
| DE60028738D1 (de) | 2006-07-27 |
| EP1635220A2 (en) | 2006-03-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |