AU4102100A - Oxime derivatives and the use thereof as photoinitiators - Google Patents

Oxime derivatives and the use thereof as photoinitiators

Info

Publication number
AU4102100A
AU4102100A AU41021/00A AU4102100A AU4102100A AU 4102100 A AU4102100 A AU 4102100A AU 41021/00 A AU41021/00 A AU 41021/00A AU 4102100 A AU4102100 A AU 4102100A AU 4102100 A AU4102100 A AU 4102100A
Authority
AU
Australia
Prior art keywords
inter alia
phenyl
photoinitiators
alkylsulfonyl
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU41021/00A
Other languages
English (en)
Inventor
Kurt Dr. Dietliker
Hisatoshi Kura
Masaki Ohwa
Hitoshi Yamato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of AU4102100A publication Critical patent/AU4102100A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/57—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being further substituted by nitrogen atoms, not being part of nitro or nitroso groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/56—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D307/66—Nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/30—Hetero atoms other than halogen
    • C07D333/36—Nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
    • C07D339/08—Six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/06—Phosphorus compounds without P—C bonds
    • C07F9/08—Esters of oxyacids of phosphorus
    • C07F9/09—Esters of phosphoric acids
    • C07F9/095—Compounds containing the structure P(=O)-O-acyl, P(=O)-O-heteroatom, P(=O)-O-CN
    • C07F9/097—Compounds containing the structure P(=O)-O-N
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/6553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having sulfur atoms, with or without selenium or tellurium atoms, as the only ring hetero atoms
    • C07F9/655345—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having sulfur atoms, with or without selenium or tellurium atoms, as the only ring hetero atoms the sulfur atom being part of a five-membered ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Graft Or Block Polymers (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Indole Compounds (AREA)
AU41021/00A 1999-03-03 2000-02-21 Oxime derivatives and the use thereof as photoinitiators Abandoned AU4102100A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP99810180 1999-03-03
EP99810180 1999-03-03
PCT/EP2000/001404 WO2000052530A1 (en) 1999-03-03 2000-02-21 Oxime derivatives and the use thereof as photoinitiators

Publications (1)

Publication Number Publication Date
AU4102100A true AU4102100A (en) 2000-09-21

Family

ID=8242704

Family Applications (1)

Application Number Title Priority Date Filing Date
AU41021/00A Abandoned AU4102100A (en) 1999-03-03 2000-02-21 Oxime derivatives and the use thereof as photoinitiators

Country Status (8)

Country Link
US (1) US6806024B1 (https=)
EP (2) EP1635220A2 (https=)
JP (1) JP2002538241A (https=)
KR (1) KR100591030B1 (https=)
AT (1) ATE330254T1 (https=)
AU (1) AU4102100A (https=)
DE (1) DE60028738T2 (https=)
WO (1) WO2000052530A1 (https=)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
KR100875612B1 (ko) 2001-06-01 2008-12-24 시바 홀딩 인크 치환된 옥심 유도체 및 이를 포함하는 조성물
EP1395615B1 (en) * 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
TWI225501B (en) * 2002-11-06 2004-12-21 Delta Optoelectronics Inc Packaging material used for a display device and method of forming thereof
JP4233853B2 (ja) * 2002-11-25 2009-03-04 株式会社メニコン 眼用レンズのマーキング方法
US20050215656A1 (en) * 2002-11-28 2005-09-29 Taiyo Ink Manufacturing Co., Ltd. Photocurable and thermosetting resin composition and printed circuit boards made by using the same
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
WO2004111143A2 (en) 2003-06-12 2004-12-23 Valspar Sourcing, Inc. Coating compositions containing reactive diluents and methods
WO2006008250A2 (en) * 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids
KR100763744B1 (ko) 2005-11-07 2007-10-04 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물
KR100814231B1 (ko) 2005-12-01 2008-03-17 주식회사 엘지화학 옥심 에스테르를 포함하는 트리아진계 광활성 화합물을포함하는 투명한 감광성 조성물
EP1914279A3 (en) * 2006-10-19 2008-05-07 Seiko Epson Corporation Photo curable ink composition set, and recording method and recordings employing ink compositon set
US20080132599A1 (en) 2006-11-30 2008-06-05 Seiko Epson Corporation. Ink composition, two-pack curing ink composition set, and recording method and recorded matter using these
JP5472670B2 (ja) 2007-01-29 2014-04-16 セイコーエプソン株式会社 インクセット、インクジェット記録方法及び記録物
US8894197B2 (en) 2007-03-01 2014-11-25 Seiko Epson Corporation Ink set, ink-jet recording method, and recorded material
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
EP2037323B1 (en) * 2007-07-17 2014-12-10 FUJIFILM Corporation Photosensitive compositions
JP5274132B2 (ja) * 2007-07-17 2013-08-28 富士フイルム株式会社 硬化性組成物、カラーフィルタ用硬化性組成物、パターン形成方法、カラーフィルタ、及びその製造方法
KR101007440B1 (ko) 2007-07-18 2011-01-12 주식회사 엘지화학 옥심 에스테르를 포함하는 수지상 광활성 화합물 및 이의제조방법
JP4766281B2 (ja) 2007-09-18 2011-09-07 セイコーエプソン株式会社 インクジェット記録用非水系インク組成物、インクジェット記録方法および記録物
JP2009269397A (ja) 2008-02-29 2009-11-19 Seiko Epson Corp 不透明層の形成方法、記録方法、インクセット、インクカートリッジ、記録装置
JP5507054B2 (ja) 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
KR101048329B1 (ko) 2008-10-06 2011-07-14 주식회사 엘지화학 우레탄계 다관능성 모노머, 그의 제조방법 및 이를 포함하는 감광성 수지 조성물
WO2010071956A1 (en) 2008-12-22 2010-07-01 Canadian Bank Note Company, Limited Improved printing of tactile marks for the visually impaired
JP5384929B2 (ja) * 2008-12-26 2014-01-08 東京応化工業株式会社 透明電極形成用光硬化性樹脂組成物及び透明電極の製造方法
JP5669386B2 (ja) 2009-01-15 2015-02-12 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
AU2010330044B2 (en) 2009-12-07 2014-08-28 Agfa Graphics N.V. Photoinitiators for UV-LED curable compositions and inks
US8569393B2 (en) 2009-12-07 2013-10-29 Agfa-Gevaert N.V. UV-LED curable compositions and inks
JP5692490B2 (ja) 2010-01-28 2015-04-01 セイコーエプソン株式会社 水性インク組成物、およびインクジェット記録方法ならびに記録物
JP2011152747A (ja) 2010-01-28 2011-08-11 Seiko Epson Corp 水性インク組成物、およびインクジェット記録方法ならびに記録物
US8513321B2 (en) 2010-11-05 2013-08-20 Ppg Industries Ohio, Inc. Dual cure coating compositions, methods of coating a substrate, and related coated substrates
KR101897842B1 (ko) * 2011-01-28 2018-09-12 바스프 에스이 열 경화제로서 옥심 술포네이트를 포함하는 중합성 조성물
CN102628971A (zh) * 2011-05-03 2012-08-08 京东方科技集团股份有限公司 一种彩色滤光片及其制作方法、装置
CN102344504B (zh) * 2011-07-29 2013-03-13 华中科技大学 一种制备高衍射效率全息光聚合物材料的可见光光引发体系
JP6046533B2 (ja) * 2012-03-26 2016-12-14 積水化学工業株式会社 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP5400917B2 (ja) * 2012-04-10 2014-01-29 積水化学工業株式会社 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
US9125829B2 (en) 2012-08-17 2015-09-08 Hallstar Innovations Corp. Method of photostabilizing UV absorbers, particularly dibenzyolmethane derivatives, e.g., Avobenzone, with cyano-containing fused tricyclic compounds
US9145383B2 (en) 2012-08-10 2015-09-29 Hallstar Innovations Corp. Compositions, apparatus, systems, and methods for resolving electronic excited states
WO2014025370A1 (en) 2012-08-10 2014-02-13 Hallstar Innovations Corp. Tricyclic energy quencher compounds for reducing singlet oxygen generation
JP6530410B2 (ja) 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ オキシムエステル光開始剤
JP5400985B1 (ja) * 2013-09-11 2014-01-29 積水化学工業株式会社 液晶滴下工法用シール剤、上下導通材料、及び、液晶表示素子
JP6333947B2 (ja) * 2014-02-20 2018-05-30 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、赤外線カットフィルター、並びに、固体撮像装置
US10487050B2 (en) 2014-08-29 2019-11-26 Basf Se Oxime sulfonate derivatives
JP6692637B2 (ja) * 2014-12-16 2020-05-13 理想科学工業株式会社 スクリーン印刷用版の作製方法及び作製材料
KR101831358B1 (ko) * 2016-06-02 2018-02-22 (주)켐이 광활성 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물
ES2831086T3 (es) 2016-09-02 2021-06-07 Igm Group B V Glioxilatos policíclicos como fotoiniciadores

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
FR2393345A1 (fr) 1977-06-01 1978-12-29 Agfa Gevaert Nv Fabrication d'elements modifies sous forme d'images
GB2029423A (en) 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
DE3160242D1 (en) 1980-02-29 1983-06-16 Akzo Nv Process for carrying out radical reactions and shaped articles of the reaction product
DE3166592D1 (en) 1980-07-14 1984-11-15 Akzo Nv Thermosetting coating composition containing a blocked acid catalyst
US4540598A (en) 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
US4590145A (en) 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
US5019482A (en) 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
DE59309494D1 (de) 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JP3830183B2 (ja) 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
MY117352A (en) 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3875271B2 (ja) * 1996-09-02 2007-01-31 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
MY121423A (en) 1998-06-26 2006-01-28 Ciba Sc Holding Ag Photopolymerizable thermosetting resin compositions
DK199901098A (da) 1998-08-18 2000-02-19 Ciba Sc Holding Ag Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse
TW575792B (en) 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids

Also Published As

Publication number Publication date
DE60028738D1 (de) 2006-07-27
ATE330254T1 (de) 2006-07-15
EP1163553A1 (en) 2001-12-19
EP1635220A2 (en) 2006-03-15
WO2000052530A1 (en) 2000-09-08
KR20010102461A (ko) 2001-11-15
JP2002538241A (ja) 2002-11-12
KR100591030B1 (ko) 2006-06-22
US6806024B1 (en) 2004-10-19
EP1163553B1 (en) 2006-06-14
DE60028738T2 (de) 2007-05-24

Similar Documents

Publication Publication Date Title
AU4102100A (en) Oxime derivatives and the use thereof as photoinitiators
MY123712A (en) Photosensitive resin composition
AU1376388A (en) Novel alpha-aminoacetophenones as photoinitiators
ES2126498A1 (es) Boratos estables al acido para fotopolimerizacion.
AU547674B2 (en) 1,2,6-thiadiazine-3,5-dione-1,1-dioxides
MY120488A (en) Oxime ester photoinitiators
EP0398692A3 (en) Alkoxyiminoacetamide derivatives and their use as fungicides
DE59209292D1 (de) Azol-Derivate, Verfahren zu ihrer Herstellung und ihre Verwendung
AU8599091A (en) Antimicrobial agents as well as substituted 2-cyclohexan-1-y1-amine derivatives and their preparation
ES8206543A1 (es) Procedimiento para la obtencion de compuestos de sulfuro de acilfosfina de efecto fotoiniciador
MY119467A (en) (alpha)-aminoacetophenone photoinitiators
AU647490B2 (en) Process for the enantioselective preparation of phenylisoserin derivatives
ATE209034T1 (de) Taxolderivate
AU650143B2 (en) 4a-substituted avermectin derivatives
DE69221563D1 (de) Polyfluoralkylthiopoly(ethylimidazolium)-Verbindungen, Verfahren zu ihrer Herstellung und ihre Verwendung als biozide Mittel
DE69115768D1 (de) Chalkonderivate, Verfahren zu ihrer Herstellung und pharmazeutische Zusammensetzungen, die sie enthalten
CA2017932A1 (en) Oxygen-containing titanocenes, and the use thereof
AU656466B2 (en) New benzimidazole compounds, a process for their preparation and pharmaceutical compositions containing them
CA2088692A1 (en) Fungicidal compositions
NO20002676D0 (no) Androgene steroidforbindelser og en fremgangsmÕte for fremstilling og anvendelse av samme
EP0996037A3 (en) Polyvinyl acetals having imido groups and use thereof in photosensitive compositions
TW349095B (en) Taxoids, their preparation and pharmaceutical compositions which contain them
AU1160800A (en) Bifunctional photoinitiators suitable for photopolymerization and photopolymerizable systems containing the same
AU6653286A (en) Insecticidal but-3-enyl arylmethyl ethers
CA2097383A1 (en) Bisdithiophosphoric acid derivatives as lubricant additives

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase