JP2002529758A - 平らな加工物を製作するための装置及び方法 - Google Patents

平らな加工物を製作するための装置及び方法

Info

Publication number
JP2002529758A
JP2002529758A JP2000579975A JP2000579975A JP2002529758A JP 2002529758 A JP2002529758 A JP 2002529758A JP 2000579975 A JP2000579975 A JP 2000579975A JP 2000579975 A JP2000579975 A JP 2000579975A JP 2002529758 A JP2002529758 A JP 2002529758A
Authority
JP
Japan
Prior art keywords
illumination
substrate
article
optical array
panel display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000579975A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002529758A5 (https=
Inventor
エイデルマン，ドロン
フィッシュ，デーヴィッド
ノイ，アミール
グロス，アブラハム
Original Assignee
オーボテック リミテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by オーボテック リミテッド filed Critical オーボテック リミテッド
Publication of JP2002529758A publication Critical patent/JP2002529758A/ja
Publication of JP2002529758A5 publication Critical patent/JP2002529758A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing, Inspecting, Measuring Of Stereoscopic Televisions And Televisions (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2000579975A 1998-11-02 1999-11-02 平らな加工物を製作するための装置及び方法 Pending JP2002529758A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL12686698A IL126866A (en) 1998-11-02 1998-11-02 Apparatus and method for fabricating flat workpieces
IL126866 1998-11-02
PCT/IL1999/000583 WO2000026645A2 (en) 1998-11-02 1999-11-02 Apparatus and method for fabricating flat workpieces

Publications (2)

Publication Number Publication Date
JP2002529758A true JP2002529758A (ja) 2002-09-10
JP2002529758A5 JP2002529758A5 (https=) 2006-12-28

Family

ID=11072091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000579975A Pending JP2002529758A (ja) 1998-11-02 1999-11-02 平らな加工物を製作するための装置及び方法

Country Status (7)

Country Link
US (1) US6822734B1 (https=)
JP (1) JP2002529758A (https=)
KR (1) KR100756099B1 (https=)
AU (1) AU6487199A (https=)
IL (1) IL126866A (https=)
TW (1) TW548405B (https=)
WO (1) WO2000026645A2 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006268050A (ja) * 2005-03-23 2006-10-05 Samsung Electronics Co Ltd 画像検査装置、パネル検査方法及び表示パネルの製造方法
JP2007199066A (ja) * 2006-01-26 2007-08-09 Orbotech Ltd 微細導体を有するパターン化デバイスを検査するシステム及び方法
TWI381123B (https=) * 2010-01-06 2013-01-01
JP2020202508A (ja) * 2019-06-11 2020-12-17 株式会社岩佐画工舎 映像情報収集装置

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3948728B2 (ja) * 2003-03-17 2007-07-25 オルボテック リミテッド パターン検査装置
DE10319543B4 (de) * 2003-04-30 2011-03-03 Byk-Gardner Gmbh Vorrichtung und Verfahren zur Bestimmung von Oberflächeneigenschaften
US7355692B2 (en) 2004-03-05 2008-04-08 Orbotech Ltd System and method for inspecting electrical circuits utilizing reflective and fluorescent imagery
US20060033909A1 (en) * 2004-07-23 2006-02-16 Bowers Gerald M Reticle particle calibration standards
US8519945B2 (en) 2006-01-06 2013-08-27 Pixtronix, Inc. Circuits for controlling display apparatus
US8159428B2 (en) 2005-02-23 2012-04-17 Pixtronix, Inc. Display methods and apparatus
US9082353B2 (en) 2010-01-05 2015-07-14 Pixtronix, Inc. Circuits for controlling display apparatus
US7999994B2 (en) 2005-02-23 2011-08-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
US8310442B2 (en) 2005-02-23 2012-11-13 Pixtronix, Inc. Circuits for controlling display apparatus
US9229222B2 (en) 2005-02-23 2016-01-05 Pixtronix, Inc. Alignment methods in fluid-filled MEMS displays
US7616368B2 (en) 2005-02-23 2009-11-10 Pixtronix, Inc. Light concentrating reflective display methods and apparatus
US9158106B2 (en) 2005-02-23 2015-10-13 Pixtronix, Inc. Display methods and apparatus
US20070205969A1 (en) 2005-02-23 2007-09-06 Pixtronix, Incorporated Direct-view MEMS display devices and methods for generating images thereon
US8482496B2 (en) 2006-01-06 2013-07-09 Pixtronix, Inc. Circuits for controlling MEMS display apparatus on a transparent substrate
US9261694B2 (en) 2005-02-23 2016-02-16 Pixtronix, Inc. Display apparatus and methods for manufacture thereof
JP2007088518A (ja) * 2005-09-16 2007-04-05 Nec Corp 無線通信システム
JP2007220890A (ja) * 2006-02-16 2007-08-30 Toshiba Corp 塗布現像処理装置における基板周縁処理方法
US8526096B2 (en) 2006-02-23 2013-09-03 Pixtronix, Inc. Mechanical light modulators with stressed beams
US7567344B2 (en) * 2006-05-12 2009-07-28 Corning Incorporated Apparatus and method for characterizing defects in a transparent substrate
US9176318B2 (en) 2007-05-18 2015-11-03 Pixtronix, Inc. Methods for manufacturing fluid-filled MEMS displays
US8169679B2 (en) 2008-10-27 2012-05-01 Pixtronix, Inc. MEMS anchors
SG163442A1 (en) 2009-01-13 2010-08-30 Semiconductor Technologies & Instruments System and method for inspecting a wafer
US9035673B2 (en) 2010-01-25 2015-05-19 Palo Alto Research Center Incorporated Method of in-process intralayer yield detection, interlayer shunt detection and correction
WO2011097252A2 (en) 2010-02-02 2011-08-11 Pixtronix, Inc. Methods for manufacturing cold seal fluid-filled display apparatus
KR20120139854A (ko) 2010-02-02 2012-12-27 픽스트로닉스 인코포레이티드 디스플레이 장치를 제어하기 위한 회로
CA2872898A1 (en) 2012-05-09 2013-11-14 Seagate Technology Llc Surface features mapping
US9212900B2 (en) * 2012-08-11 2015-12-15 Seagate Technology Llc Surface features characterization
US9297759B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Classification of surface features using fluorescence
US9297751B2 (en) 2012-10-05 2016-03-29 Seagate Technology Llc Chemical characterization of surface features
CN103728314B (zh) * 2012-10-16 2017-01-04 希捷科技有限公司 区分原生表面特征与外来表面特征的方法
US9377394B2 (en) * 2012-10-16 2016-06-28 Seagate Technology Llc Distinguishing foreign surface features from native surface features
US9217714B2 (en) 2012-12-06 2015-12-22 Seagate Technology Llc Reflective surfaces for surface features of an article
US9134552B2 (en) 2013-03-13 2015-09-15 Pixtronix, Inc. Display apparatus with narrow gap electrostatic actuators
US9274064B2 (en) 2013-05-30 2016-03-01 Seagate Technology Llc Surface feature manager
US9217715B2 (en) 2013-05-30 2015-12-22 Seagate Technology Llc Apparatuses and methods for magnetic features of articles
US9513215B2 (en) 2013-05-30 2016-12-06 Seagate Technology Llc Surface features by azimuthal angle
US9201019B2 (en) 2013-05-30 2015-12-01 Seagate Technology Llc Article edge inspection
CN103995000B (zh) * 2014-05-15 2017-01-11 京东方科技集团股份有限公司 一种显示基板的检查装置及检查系统
US10042324B2 (en) * 2015-06-30 2018-08-07 Synaptics Incorporated Optical fingerprint imaging using holography
EP3710813B1 (en) 2017-11-13 2023-09-20 Illumina, Inc. System and method for large sample analysis of thin film
JP6709206B2 (ja) * 2017-11-30 2020-06-10 株式会社Ｓｕｂａｒｕ 製造補助装置
EP4249899A1 (en) * 2022-03-22 2023-09-27 Evonik Operations GmbH Method for inspecting a coated surface for coating defects

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6172947A (ja) * 1984-09-18 1986-04-15 Takasago Thermal Eng Co Ltd クリ−ンル−ムの形成法およびこの方法に使用する空気調和設備ユニツト
JPH01194753A (ja) 1988-01-29 1989-08-04 Konica Corp 画像形成装置
US5058982A (en) * 1989-06-21 1991-10-22 Orbot Systems Ltd. Illumination system and inspection apparatus including same
US5058491A (en) 1990-08-27 1991-10-22 Taiwan Semiconductor Manufacturing Company, Ltd. Building and method for manufacture of integrated circuits
US5401212A (en) * 1990-08-29 1995-03-28 Intelligent Enclosures Corporation Environmental control system
IL96483A (en) * 1990-11-27 1995-07-31 Orbotech Ltd Optical inspection method and apparatus
US5586058A (en) 1990-12-04 1996-12-17 Orbot Instruments Ltd. Apparatus and method for inspection of a patterned object by comparison thereof to a reference
KR100221983B1 (ko) * 1993-04-13 1999-09-15 히가시 데쓰로 처리장치
US5344365A (en) 1993-09-14 1994-09-06 Sematech, Inc. Integrated building and conveying structure for manufacturing under ultraclean conditions
IL108974A (en) * 1994-03-14 1999-11-30 Orbotech Ltd Device and method for testing a display panel
JP3258821B2 (ja) * 1994-06-02 2002-02-18 三菱電機株式会社 微小異物の位置決め方法、分析方法、これに用いる分析装置およびこれを用いた半導体素子もしくは液晶表示素子の製法
US5640237A (en) 1995-08-29 1997-06-17 Kla Instruments Corporation Method and apparatus for detecting non-uniformities in reflective surafaces
US5917588A (en) 1996-11-04 1999-06-29 Kla-Tencor Corporation Automated specimen inspection system for and method of distinguishing features or anomalies under either bright field or dark field illumination
JP4166340B2 (ja) 1997-09-24 2008-10-15 オリンパス株式会社 基板検査装置
JP4591802B2 (ja) * 2000-09-13 2010-12-01 株式会社ニコン 表面検査装置および方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006268050A (ja) * 2005-03-23 2006-10-05 Samsung Electronics Co Ltd 画像検査装置、パネル検査方法及び表示パネルの製造方法
JP2007199066A (ja) * 2006-01-26 2007-08-09 Orbotech Ltd 微細導体を有するパターン化デバイスを検査するシステム及び方法
TWI381123B (https=) * 2010-01-06 2013-01-01
JP2020202508A (ja) * 2019-06-11 2020-12-17 株式会社岩佐画工舎 映像情報収集装置
JP7161159B2 (ja) 2019-06-11 2022-10-26 株式会社岩佐画工舎 映像情報収集装置

Also Published As

Publication number Publication date
TW548405B (en) 2003-08-21
WO2000026645A3 (en) 2000-08-10
IL126866A0 (en) 1999-09-22
US6822734B1 (en) 2004-11-23
IL126866A (en) 2003-02-12
AU6487199A (en) 2000-05-22
KR20010082284A (ko) 2001-08-29
KR100756099B1 (ko) 2007-09-05
WO2000026645A2 (en) 2000-05-11

Similar Documents

Publication Publication Date Title
JP2002529758A (ja) 平らな加工物を製作するための装置及び方法
CN100419410C (zh) 缺陷检查数据处理系统
EP0935747B1 (en) Automated inspection system with bright field and dark field illumination
US5640237A (en) Method and apparatus for detecting non-uniformities in reflective surafaces
US7417724B1 (en) Wafer inspection systems and methods for analyzing inspection data
JP3668294B2 (ja) 表面欠陥検査装置
US6292260B1 (en) System and method of optically inspecting surface structures on an object
JP2000180371A (ja) 異物検査装置および半導体工程装置
WO1997013140A1 (en) Technique for determining defect positions in three dimensions in a transparent structure
WO1997013140A9 (en) Technique for determining defect positions in three dimensions in a transparent structure
KR102751649B1 (ko) 자동화된 광학 검사를 위한 광학 시스템
JP4385419B2 (ja) 外観検査方法及び外観検査装置
US7372557B2 (en) Surface defect inspection apparatus and surface defect inspection method
JPH09252035A (ja) 半導体ウェーハの外観検査方法および装置
JP3482425B2 (ja) 検査装置
JP5288672B2 (ja) 表面欠陥検査装置
JPS61201107A (ja) 透明な膜の表面検査方法
JP4529108B2 (ja) 欠陥検査装置
JP4736629B2 (ja) 表面欠陥検査装置
JP3078784B2 (ja) 欠陥検査装置
JP2000028535A (ja) 欠陥検査装置
JP2001091474A (ja) 欠陥検査システム
CN1809744A (zh) 用光学方法控制较佳的具有圆形边缘物件的质量的方法和装置
TW200401879A (en) Microscope arrangement for inspecting a substrate
JP2000088760A (ja) ワーク検査装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061031

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061031

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090512

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090811

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090818

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20090914

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20090924

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20100127