JP2002523398A5 - - Google Patents
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- Publication number
- JP2002523398A5 JP2002523398A5 JP2000566246A JP2000566246A JP2002523398A5 JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5 JP 2000566246 A JP2000566246 A JP 2000566246A JP 2000566246 A JP2000566246 A JP 2000566246A JP 2002523398 A5 JP2002523398 A5 JP 2002523398A5
- Authority
- JP
- Japan
- Prior art keywords
- phenyl
- alkyl
- substituted
- unsubstituted
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 anthracyl Chemical group 0.000 description 38
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 19
- 125000000217 alkyl group Chemical group 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 14
- 229910052736 halogen Inorganic materials 0.000 description 9
- 150000002367 halogens Chemical class 0.000 description 9
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 description 7
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 6
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 description 6
- 125000005561 phenanthryl group Chemical group 0.000 description 5
- 125000001589 carboacyl group Chemical group 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 description 3
- 125000001072 heteroaryl group Chemical group 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 125000004957 naphthylene group Chemical group 0.000 description 3
- 125000005146 naphthylsulfonyl group Chemical group C1(=CC=CC2=CC=CC=C12)S(=O)(=O)* 0.000 description 3
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 2
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 125000004769 (C1-C4) alkylsulfonyl group Chemical group 0.000 description 1
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 1
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000006331 halo benzoyl group Chemical group 0.000 description 1
- 125000004441 haloalkylsulfonyl group Chemical group 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP98810810 | 1998-08-19 | ||
| EP98810810.6 | 1998-08-19 | ||
| PCT/EP1999/005698 WO2000010972A1 (en) | 1998-08-19 | 1999-08-06 | New unsaturated oxime derivatives and the use thereof as latent acids |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002523398A JP2002523398A (ja) | 2002-07-30 |
| JP2002523398A5 true JP2002523398A5 (OSRAM) | 2006-09-14 |
| JP4489954B2 JP4489954B2 (ja) | 2010-06-23 |
Family
ID=8236266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000566246A Expired - Fee Related JP4489954B2 (ja) | 1998-08-19 | 1999-08-06 | 新規な不飽和オキシム誘導体及び潜在的な酸としてのその用途 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6703182B1 (OSRAM) |
| EP (1) | EP1105373B1 (OSRAM) |
| JP (1) | JP4489954B2 (OSRAM) |
| KR (1) | KR100640092B1 (OSRAM) |
| CN (1) | CN100340547C (OSRAM) |
| AU (1) | AU5373999A (OSRAM) |
| DE (1) | DE69903453T2 (OSRAM) |
| MY (1) | MY117695A (OSRAM) |
| TW (1) | TW575792B (OSRAM) |
| WO (1) | WO2000010972A1 (OSRAM) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000052530A1 (en) * | 1999-03-03 | 2000-09-08 | Ciba Specialty Chemicals Holding Inc. | Oxime derivatives and the use thereof as photoinitiators |
| US6482567B1 (en) * | 2000-08-25 | 2002-11-19 | Shipley Company, L.L.C. | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same |
| TWI272451B (en) * | 2000-09-25 | 2007-02-01 | Ciba Sc Holding Ag | Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition |
| JP4685265B2 (ja) * | 2001-05-10 | 2011-05-18 | コダック株式会社 | 感光性組成物、感光性平版印刷版および平版印刷版の作成方法 |
| JP4951827B2 (ja) * | 2001-08-17 | 2012-06-13 | Ｊｓｒ株式会社 | スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物 |
| CA2474532A1 (en) | 2002-02-06 | 2003-08-14 | Peter Murer | Sulfonate derivatives and the use therof as latent acids |
| CN100361815C (zh) * | 2002-04-24 | 2008-01-16 | 东芝泰格有限公司 | 喷墨记录设备 |
| AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
| MXPA05008118A (es) * | 2003-02-19 | 2005-09-30 | Ciba Sc Holding Ag | Derivados de oxima halogenados y el uso de los mismos como acidos latentes. |
| US8026296B2 (en) * | 2005-12-20 | 2011-09-27 | 3M Innovative Properties Company | Dental compositions including a thermally labile component, and the use thereof |
| JP4996870B2 (ja) * | 2006-03-28 | 2012-08-08 | 富士フイルム株式会社 | 光重合開始剤、感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板 |
| US8466096B2 (en) * | 2007-04-26 | 2013-06-18 | Afton Chemical Corporation | 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions |
| GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
| CN102617445B (zh) * | 2007-07-17 | 2015-02-18 | 富士胶片株式会社 | 感光性组合物、可固化组合物、新化合物、可光聚合组合物、滤色器和平版印刷版原版 |
| JP5507054B2 (ja) * | 2008-03-28 | 2014-05-28 | 富士フイルム株式会社 | 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子 |
| DE102008038943A1 (de) | 2008-08-11 | 2010-02-18 | Borealis Agrolinz Melamine Gmbh | Vernetzbare Acrylatharze |
| JP2012522084A (ja) | 2009-03-30 | 2012-09-20 | ビーエーエスエフ ソシエタス・ヨーロピア | Ｕｖ線量インジケータフィルム |
| BR112012013777A2 (pt) | 2009-12-07 | 2018-05-08 | Agfa Gevaert | composições e tintas curáveis por meio de led de uv. |
| US8957224B2 (en) | 2009-12-07 | 2015-02-17 | Agfa Graphics Nv | Photoinitiators for UV-LED curable compositions and inks |
| CN102781911B (zh) * | 2010-02-24 | 2015-07-22 | 巴斯夫欧洲公司 | 潜酸及其用途 |
| JP6599446B2 (ja) | 2014-05-30 | 2019-10-30 | アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ | 多官能性アシルホスフィンオキシド光重合開始剤 |
| TWI742165B (zh) * | 2017-09-27 | 2021-10-11 | 奇美實業股份有限公司 | 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置 |
| WO2020049378A1 (en) | 2018-09-07 | 2020-03-12 | Igm Resins Italia S.R.L. | Multifunctional bisacylphosphine oxide photoinitiators |
| CN113518805B (zh) | 2018-12-28 | 2023-08-08 | 意大利艾坚蒙树脂有限公司 | 光引发剂 |
| WO2021070152A1 (en) | 2019-10-11 | 2021-04-15 | Igm Resins Italia S.R.L. | Coumarin glyoxylates for led photocuring |
| IT202000023815A1 (it) | 2020-10-09 | 2022-04-09 | Igm Resins Italia Srl | Ketoquinolones as photonitiators |
| IT202100014885A1 (it) | 2021-06-08 | 2022-12-08 | Igm Resins Italia Srl | Fotoiniziatori a base di silicio bifunzionali |
| IT202100025868A1 (it) | 2021-10-08 | 2023-04-08 | Igm Resins Italia Srl | Nuovi fotoiniziatori |
| WO2023161049A1 (en) | 2022-02-24 | 2023-08-31 | Igm Resins Italia S.R.L. | Photoinitiators |
| EP4273200A1 (en) | 2022-05-06 | 2023-11-08 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers |
| EP4519377A1 (en) | 2022-05-06 | 2025-03-12 | IGM Group B.V. | Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives |
| CN119137224A (zh) | 2022-05-06 | 2024-12-13 | Igm集团公司 | 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包 |
| EP4598967A1 (en) | 2022-10-05 | 2025-08-13 | IGM Resins Italia S.r.l. | Polymeric (meth)acrylate photoinitiators |
| IT202300004737A1 (it) | 2023-03-14 | 2024-09-14 | Igm Resins Italia Srl | Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led |
| WO2025027517A1 (en) | 2023-08-03 | 2025-02-06 | Igm Resins Italia S.R.L. | 10,11 -dihydro-5h-dibenzo[b,f]azepine derivatives as photoinitiatiors in photopolymerisation for use in photocurable compositions |
| EP4534614A1 (en) | 2023-10-02 | 2025-04-09 | IGM Group B.V. | Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers |
| WO2025140854A2 (en) | 2023-12-28 | 2025-07-03 | Igm Resins Italia S.R.L. | NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE |
| EP4579344A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Thioalkylcoumarin photosensitizers for photopolymerization |
| EP4578918A1 (en) | 2023-12-29 | 2025-07-02 | IGM Group B.V. | Photosensitizers for photopolymerization |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4123255A (en) * | 1977-01-03 | 1978-10-31 | Chevron Research Company | O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes |
| US4347372A (en) * | 1978-09-01 | 1982-08-31 | Ciba-Geigy Corporation | Benzoxazolyl-glyoxylonitrile-2-oxime ether derivatives |
| US4346094A (en) * | 1980-09-22 | 1982-08-24 | Eli Lilly And Company | 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels |
| US4510294A (en) * | 1982-07-02 | 1985-04-09 | Polaroid Corporation | Polymerization of monomeric hydrogen-blocked oxime derivatives |
| US4540598A (en) * | 1983-08-17 | 1985-09-10 | Ciba-Geigy Corporation | Process for curing acid-curable finishes |
| GB8608528D0 (en) * | 1986-04-08 | 1986-05-14 | Ciba Geigy Ag | Production of positive images |
| US5019488A (en) * | 1988-09-29 | 1991-05-28 | Hoechst Celanese Corporation | Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
| KR900005226A (ko) * | 1988-09-29 | 1990-04-13 | 윌리엄 비이 해리스 | 감광성 조성물 및 양화 상과 음화 상의 생성방법 |
| DE59309494D1 (de) | 1992-05-22 | 1999-05-12 | Ciba Geigy Ag | Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit |
| JP3456808B2 (ja) * | 1995-09-29 | 2003-10-14 | 東京応化工業株式会社 | ホトレジスト組成物 |
| JP3830183B2 (ja) * | 1995-09-29 | 2006-10-04 | 東京応化工業株式会社 | オキシムスルホネート化合物及びレジスト用酸発生剤 |
| MY117352A (en) * | 1995-10-31 | 2004-06-30 | Ciba Sc Holding Ag | Oximesulfonic acid esters and the use thereof as latent sulfonic acids. |
| JP3587413B2 (ja) * | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
| DE69721019T2 (de) * | 1996-09-02 | 2003-12-24 | Ciba Speciality Chemicals Holding Inc., Basel | Alkylsulfonyloxime für i-line-photoresists hoher auflösung und empfindlichkeit |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
-
1999
- 1999-07-12 TW TW88111895A patent/TW575792B/zh not_active IP Right Cessation
- 1999-07-21 MY MYPI99003079A patent/MY117695A/en unknown
- 1999-08-06 US US09/763,016 patent/US6703182B1/en not_active Expired - Lifetime
- 1999-08-06 AU AU53739/99A patent/AU5373999A/en not_active Abandoned
- 1999-08-06 JP JP2000566246A patent/JP4489954B2/ja not_active Expired - Fee Related
- 1999-08-06 EP EP99939454A patent/EP1105373B1/en not_active Expired - Lifetime
- 1999-08-06 WO PCT/EP1999/005698 patent/WO2000010972A1/en not_active Ceased
- 1999-08-06 KR KR1020017002132A patent/KR100640092B1/ko not_active Expired - Fee Related
- 1999-08-06 CN CNB998098116A patent/CN100340547C/zh not_active Expired - Fee Related
- 1999-08-06 DE DE69903453T patent/DE69903453T2/de not_active Expired - Lifetime
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