JP2002512655A - 官能化されたポリ(アルキレンカーボネート)およびその使用 - Google Patents
官能化されたポリ(アルキレンカーボネート)およびその使用Info
- Publication number
- JP2002512655A JP2002512655A JP50591899A JP50591899A JP2002512655A JP 2002512655 A JP2002512655 A JP 2002512655A JP 50591899 A JP50591899 A JP 50591899A JP 50591899 A JP50591899 A JP 50591899A JP 2002512655 A JP2002512655 A JP 2002512655A
- Authority
- JP
- Japan
- Prior art keywords
- poly
- alkylene carbonate
- carbonate
- crosslinked
- functionalized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/02—Aliphatic polycarbonates
- C08G64/0291—Aliphatic polycarbonates unsaturated
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G64/00—Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
- C08G64/02—Aliphatic polycarbonates
- C08G64/0208—Aliphatic polycarbonates saturated
- C08G64/0225—Aliphatic polycarbonates saturated containing atoms other than carbon, hydrogen or oxygen
- C08G64/0266—Aliphatic polycarbonates saturated containing atoms other than carbon, hydrogen or oxygen containing silicon
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.トリアルコキシシラン部分のある置換基を有する架橋可能なポリ(アルキレ ンカーボネート)。 2.20〜25℃でメチレンクロリド中に不溶である架橋された、官能化ポリ(アル キレンカーボネート)。 3.架橋される前、末端にあるアルケニル部分およびトリアルコキシシラン部分 からなる群から選択される末端部分を有する置換基を特徴とする請求項2記載の ポリ(アルキレンカーボネート)。 4.置換基が側基である請求項3記載のポリ(アルキレンカーボネート)。 5.置換基がポリ(アルキレンカーボネート)の鎖の両方の末端にある請求項3記 載のポリ(アルキレンカーボネート)。 6.末端アルケニル部分が、アルケニル、オキソアルケニルおよびオキソカルボ ニルアルケニルからなる群から選択され、これらの各部分中のアルケニルが2〜 12個の炭素原子を有する請求項3記載のポリ(アルキレンカーボネート)。 7.(a)架橋されておらず、架橋が可能な官能化されたポリ(アルキレンカーボ ネート)から本質的になるポリマー物質、および(b)この官能化されたポリ(ア ルキレンカーボネート)の架橋を開始するように開始用物質が活性化される時に 有効である濃度の開始用物質からなるフォトレジスト組成物。 8.架橋された、官能化ポリ(アルキレンカーボネート)から本質的になるフォト レジスト組成物。 9.架橋される時に常態で固体であるようになる、常態で粘稠な液体である、架 橋されておらず、鎖の末端が官能化されているポリ(アルキレン カーボネート)。 10.触媒物質を用いて、(a)ポリオール物質と(b)常態で固体であるポリ(アル キレンカーボネート)物質を反応させることからなる常態で液体である、ヒドロ キシを末端とするポリ(アルキレンカーボネート)の製造方法。 11.触媒物質を用いて、(a)ポリオール物質と(b)常態で固体であるポリ(アル キレンカーボネート)物質を反応させて常態で液体である、ヒドロキシを末端と するポリ(アルキレンカーボネート)を生成し、そしてこのヒドロキシを末端とす るポリ(アルキレンカーボネート)をアルケニルアシルハライドまたはアルケニル カルボン酸と反応させて、所望とする常態で粘稠な液体であり、架橋されていな い、鎖の末端が官能化されているポリ(アルキレンカーボネート)を生成すること からなる、常態で粘稠な液体であり、架橋されておらず、鎖の末端が官能化され ており、架橋された時に常態で固体となるポリ(アルキレンカーボネート)の製造 方法。 12.触媒物質がトランスエステル触媒から本質的になる請求項10または11記載の 方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5126797P | 1997-06-30 | 1997-06-30 | |
US60/051,267 | 1997-06-30 | ||
PCT/US1998/013927 WO1999000444A1 (en) | 1997-06-30 | 1998-06-29 | Functionalized poly(alkylene carbonate), and use thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002512655A true JP2002512655A (ja) | 2002-04-23 |
Family
ID=21970260
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50591899A Ceased JP2002512655A (ja) | 1997-06-30 | 1998-06-29 | 官能化されたポリ(アルキレンカーボネート)およびその使用 |
Country Status (4)
Country | Link |
---|---|
US (1) | US6248860B1 (ja) |
EP (1) | EP0991697A4 (ja) |
JP (1) | JP2002512655A (ja) |
WO (1) | WO1999000444A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE44343E1 (en) | 2002-07-24 | 2013-07-09 | Lucas-Milhaupt, Inc. | Flux cored preforms for brazing |
US9095937B2 (en) | 2006-05-25 | 2015-08-04 | Bellman-Melcor Development, Llc | Filler metal with flux for brazing and soldering and method of making and using same |
US9731383B2 (en) | 2014-07-09 | 2017-08-15 | Bellman-Melcor Development, Llc | Filler metal with flux for brazing and soldering and method of using same |
WO2021002278A1 (ja) * | 2019-07-03 | 2021-01-07 | 国立大学法人東京農工大学 | 脂肪族ポリカーボネート及びその製造方法、並びに導電性ペースト組成物 |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0918061B1 (en) * | 1997-11-21 | 2007-10-31 | Orient Chemical Industries, Ltd. | Organic-inorganic hybrid polymer material and process for preparing the same |
US6565920B1 (en) * | 2000-06-08 | 2003-05-20 | Honeywell International Inc. | Edge bead removal for spin-on materials containing low volatility solvents fusing carbon dioxide cleaning |
DE10113550A1 (de) * | 2001-03-20 | 2002-10-02 | Infineon Technologies Ag | Verfahren zum Erfassen von makromolekularen Biopolymeren mittels einer Elektrodenanordnung |
BRPI0618466A2 (pt) * | 2005-11-10 | 2011-08-30 | Wolverine Tube Inc | composição de fluxo, material de solda forte com camada de comprimento contìnuo de elastÈmero contendo um fluxo, bem como métodos para a fabricação do material de solda forte e para soldagem à solda forte |
WO2007140236A1 (en) | 2006-05-25 | 2007-12-06 | Bellman-Melcor Development, Llc | Filler metal with flux for brazing and soldering and method of making and using same |
PL2091686T3 (pl) * | 2006-12-11 | 2017-06-30 | Lucas-Milhaupt, Inc. | Nisko- i bezsrebrowe spoiwa i stopy oraz odpowiadające systemy i sposoby łączenia |
WO2008148088A1 (en) * | 2007-05-25 | 2008-12-04 | Lucas Milhaupt, Inc. | Brazing material |
KR20200028511A (ko) | 2008-09-08 | 2020-03-16 | 사우디 아람코 테크놀로지스 컴퍼니 | 폴리카보네이트 폴리올 조성물 |
WO2011053506A1 (en) | 2009-10-26 | 2011-05-05 | Lucas-Milhaupt, Inc. | Low silver, low nickel brazing material |
CA2687926A1 (en) | 2009-11-25 | 2011-05-25 | Lucas Milhaupt, Inc. | Brazing material |
WO2013163442A1 (en) * | 2012-04-25 | 2013-10-31 | Novomer, Inc. | Aliphatic polycarbonate polyols containing silyl groups |
EP2808114A3 (en) | 2013-05-30 | 2015-09-02 | Lucas-Milhaupt, Inc. | Process for flux coating braze preforms and discrete parts |
US10744601B2 (en) | 2015-08-07 | 2020-08-18 | Bellman-Melcor Development, Llc | Bonded brazing ring system and method for adhering a brazing ring to a tube |
GB201709287D0 (en) | 2017-06-12 | 2017-07-26 | Univ Warwick | Polymer resin composition and uses thereof |
US11230625B2 (en) | 2018-04-18 | 2022-01-25 | Saudi Aramco Technologies Company | End-group isomerization of poly(alkylene carbonate) polymers |
US11180609B2 (en) | 2018-08-02 | 2021-11-23 | Saudi Aramco Technologies Company | Sustainable polymer compositions and methods |
JP2022502536A (ja) | 2018-09-24 | 2022-01-11 | サウジ アラムコ テクノロジーズ カンパニー | ポリカーボネートブロックコポリマーおよびその方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3248415A (en) | 1963-01-16 | 1966-04-26 | Pittsburgh Plate Glass Co | Method of preparing high molecular weight polycarbonates |
US3248416A (en) | 1963-01-16 | 1966-04-26 | Pittsburgh Plate Glass Co | Method of preparing high molecular weight polycarbonates |
US3248414A (en) | 1963-01-16 | 1966-04-26 | Pittsburgh Plate Glass Co | Method of preparing high molecular weight polycarbonates |
US4066630A (en) * | 1977-01-10 | 1978-01-03 | Air Products And Chemicals, Inc. | End capped polyalkylene carbonates having improved thermal stability |
US4104264A (en) * | 1977-05-05 | 1978-08-01 | Air Products & Chemicals, Inc. | End capped polyalkylene carbonates having improved thermal stablity |
US4145525A (en) * | 1977-10-03 | 1979-03-20 | Air Products And Chemicals, Inc. | End capped polyalkylene carbonates |
US4301231A (en) * | 1980-02-15 | 1981-11-17 | Toray Industries, Incorporated | Negative resist for high energy radiation |
US4303759A (en) * | 1980-09-12 | 1981-12-01 | Air Products And Chemicals, Inc. | Polyalkylenecarbonate compositions with improved thermal stability and method for making same |
US5418099A (en) * | 1992-05-19 | 1995-05-23 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, and electrophotographic apparatus and device unit employing the same |
-
1998
- 1998-06-29 WO PCT/US1998/013927 patent/WO1999000444A1/en not_active Application Discontinuation
- 1998-06-29 JP JP50591899A patent/JP2002512655A/ja not_active Ceased
- 1998-06-29 EP EP98933163A patent/EP0991697A4/en not_active Withdrawn
-
1999
- 1999-12-27 US US09/446,780 patent/US6248860B1/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE44343E1 (en) | 2002-07-24 | 2013-07-09 | Lucas-Milhaupt, Inc. | Flux cored preforms for brazing |
US9095937B2 (en) | 2006-05-25 | 2015-08-04 | Bellman-Melcor Development, Llc | Filler metal with flux for brazing and soldering and method of making and using same |
US9731383B2 (en) | 2014-07-09 | 2017-08-15 | Bellman-Melcor Development, Llc | Filler metal with flux for brazing and soldering and method of using same |
WO2021002278A1 (ja) * | 2019-07-03 | 2021-01-07 | 国立大学法人東京農工大学 | 脂肪族ポリカーボネート及びその製造方法、並びに導電性ペースト組成物 |
Also Published As
Publication number | Publication date |
---|---|
WO1999000444A1 (en) | 1999-01-07 |
EP0991697A4 (en) | 2000-10-25 |
EP0991697A1 (en) | 2000-04-12 |
US6248860B1 (en) | 2001-06-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2002512655A (ja) | 官能化されたポリ(アルキレンカーボネート)およびその使用 | |
US5998092A (en) | Water soluble negative-working photoresist composition | |
JP2839159B2 (ja) | 高感度ポジ型フオトレジスト組成物 | |
US5929176A (en) | Vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and preparation methods thereof | |
JP2003513310A (ja) | 超臨界液体現像性フォトレジストとしてのブロックコポリマーの使用 | |
JP3495503B2 (ja) | 架橋されたポリマー | |
US3884696A (en) | Positive photoresist comprising polysulfones formed by reacting vinyl aromatic hydrocarbons with sulfur dioxide | |
JP3573358B2 (ja) | 放射線感応性組成物 | |
CA1330498C (en) | Photostencils for screenprinting | |
JP5520440B2 (ja) | 有機反射防止膜形成用単量体、重合体及びこれを含む有機組成物 | |
JP2666852B2 (ja) | ポジ型感放射線混合物、ポジ型感放射線記録材料及びその製法 | |
US4150989A (en) | Photosensitive article having polyaldehydes and its use in photoimaging | |
US4247624A (en) | Photopolymerizable elastomeric compositions with carbamated poly(vinyl alcohol) binder | |
JP2826237B2 (ja) | 高分子量ポリマー被膜形成方法 | |
US4340686A (en) | Carbamated poly(vinyl alcohol) useful as a binder in elastomeric photopolymer compositions | |
KR20010052724A (ko) | 193 nm 포지티브 작용성 포토레지스트 조성물 | |
JPH02161444A (ja) | 光不安定性ブロックトイミドを有する画像反転ネガ型フォトレジストの製法 | |
JP4000407B2 (ja) | 酸に不安定な保護基を有するフェノール樹脂 | |
JPS60133445A (ja) | ホトレジスト組成物 | |
JPH0234380B2 (ja) | ||
JPH0635195A (ja) | レジスト組成物 | |
XiongáCai et al. | Evaluation of bis (perfluorophenyl azide) s as cross-linkers for a soluble polyimide | |
US3493380A (en) | Photoresist composition | |
Kamenosono et al. | Three‐component photopolymer based on a novel mechanism: acid‐catalyzed polymerization and decoupling of crosslinks | |
JPS6311932A (ja) | 自己現像する放射レジスト |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050629 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080520 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20080515 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20080815 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20080929 |
|
A313 | Final decision of rejection without a dissenting response from the applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A313 Effective date: 20081230 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20090303 |