JP2002353226A5 - - Google Patents

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Publication number
JP2002353226A5
JP2002353226A5 JP2002073382A JP2002073382A JP2002353226A5 JP 2002353226 A5 JP2002353226 A5 JP 2002353226A5 JP 2002073382 A JP2002073382 A JP 2002073382A JP 2002073382 A JP2002073382 A JP 2002073382A JP 2002353226 A5 JP2002353226 A5 JP 2002353226A5
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JP
Japan
Prior art keywords
gas
reaction tube
heat
heating
heating means
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Application number
JP2002073382A
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English (en)
Japanese (ja)
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JP2002353226A (ja
JP4357786B2 (ja
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Priority to JP2002073382A priority Critical patent/JP4357786B2/ja
Priority claimed from JP2002073382A external-priority patent/JP4357786B2/ja
Publication of JP2002353226A publication Critical patent/JP2002353226A/ja
Publication of JP2002353226A5 publication Critical patent/JP2002353226A5/ja
Application granted granted Critical
Publication of JP4357786B2 publication Critical patent/JP4357786B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002073382A 2001-03-16 2002-03-15 熱処理装置及び熱処理方法 Expired - Fee Related JP4357786B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002073382A JP4357786B2 (ja) 2001-03-16 2002-03-15 熱処理装置及び熱処理方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001075756 2001-03-16
JP2001-84905 2001-03-23
JP2001084905 2001-03-23
JP2001-75756 2001-03-23
JP2002073382A JP4357786B2 (ja) 2001-03-16 2002-03-15 熱処理装置及び熱処理方法

Publications (3)

Publication Number Publication Date
JP2002353226A JP2002353226A (ja) 2002-12-06
JP2002353226A5 true JP2002353226A5 (enExample) 2005-09-08
JP4357786B2 JP4357786B2 (ja) 2009-11-04

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ID=27346265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002073382A Expired - Fee Related JP4357786B2 (ja) 2001-03-16 2002-03-15 熱処理装置及び熱処理方法

Country Status (1)

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JP (1) JP4357786B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3501768B2 (ja) * 2001-04-18 2004-03-02 株式会社ガソニックス 基板熱処理装置およびフラットパネルデバイスの製造方法
JP4939699B2 (ja) * 2001-05-31 2012-05-30 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2004263206A (ja) * 2003-02-10 2004-09-24 Fuyuutec Furness:Kk 熱処理装置
JP2007258452A (ja) * 2006-03-23 2007-10-04 Sumitomo Electric Ind Ltd 処理装置
US8826693B2 (en) * 2010-08-30 2014-09-09 Corning Incorporated Apparatus and method for heat treating a glass substrate
CN103201828B (zh) * 2010-11-05 2016-06-29 夏普株式会社 氧化退火处理装置和使用氧化退火处理的薄膜晶体管的制造方法
JP6010182B2 (ja) * 2015-05-20 2016-10-19 光洋サーモシステム株式会社 連続拡散処理装置
CN108780743B (zh) * 2016-03-22 2023-05-02 株式会社国际电气 基板处理装置、半导体装置的制造方法以及记录介质
KR102277992B1 (ko) * 2019-11-07 2021-07-15 세메스 주식회사 베이크 장치

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