JP2002314131A5 - - Google Patents
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- Publication number
- JP2002314131A5 JP2002314131A5 JP2001111621A JP2001111621A JP2002314131A5 JP 2002314131 A5 JP2002314131 A5 JP 2002314131A5 JP 2001111621 A JP2001111621 A JP 2001111621A JP 2001111621 A JP2001111621 A JP 2001111621A JP 2002314131 A5 JP2002314131 A5 JP 2002314131A5
- Authority
- JP
- Japan
- Prior art keywords
- nitride semiconductor
- group iii
- iii nitride
- thin film
- translucent electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001111621A JP2002314131A (ja) | 2001-04-10 | 2001-04-10 | 透光性電極及びその製造方法並びにそれを用いたiii族窒化物半導体発光素子 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001111621A JP2002314131A (ja) | 2001-04-10 | 2001-04-10 | 透光性電極及びその製造方法並びにそれを用いたiii族窒化物半導体発光素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002314131A JP2002314131A (ja) | 2002-10-25 |
JP2002314131A5 true JP2002314131A5 (enrdf_load_stackoverflow) | 2005-01-20 |
Family
ID=18963191
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001111621A Pending JP2002314131A (ja) | 2001-04-10 | 2001-04-10 | 透光性電極及びその製造方法並びにそれを用いたiii族窒化物半導体発光素子 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2002314131A (enrdf_load_stackoverflow) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4411871B2 (ja) * | 2003-06-17 | 2010-02-10 | 日亜化学工業株式会社 | 窒化物半導体発光素子 |
CN100428504C (zh) * | 2003-11-06 | 2008-10-22 | 厦门市三安光电科技有限公司 | 一种半导体器件及其制备方法 |
TW200529464A (en) * | 2004-02-27 | 2005-09-01 | Super Nova Optoelectronics Corp | Gallium nitride based light-emitting diode structure and manufacturing method thereof |
JP2005327817A (ja) | 2004-05-12 | 2005-11-24 | Toshiba Corp | 放射線検出器 |
JP2006100475A (ja) * | 2004-09-29 | 2006-04-13 | Toyoda Gosei Co Ltd | 半導体発光素子 |
KR100703091B1 (ko) * | 2005-09-08 | 2007-04-06 | 삼성전기주식회사 | 질화물 반도체 발광 소자 및 그 제조 방법 |
JP2007180326A (ja) * | 2005-12-28 | 2007-07-12 | Showa Denko Kk | 発光装置 |
JP2007258376A (ja) * | 2006-03-22 | 2007-10-04 | Rohm Co Ltd | 半導体素子の製造方法 |
US20080197378A1 (en) * | 2007-02-20 | 2008-08-21 | Hua-Shuang Kong | Group III Nitride Diodes on Low Index Carrier Substrates |
JP2008300421A (ja) * | 2007-05-29 | 2008-12-11 | Sumitomo Electric Ind Ltd | Iii−v族窒化物半導体の製造方法およびiii−v族窒化物半導体 |
JP5474292B2 (ja) * | 2007-11-06 | 2014-04-16 | シャープ株式会社 | 窒化物半導体発光ダイオード素子 |
KR100960280B1 (ko) * | 2008-12-02 | 2010-06-04 | 주식회사 에피밸리 | 3족 질화물 반도체 발광소자 |
-
2001
- 2001-04-10 JP JP2001111621A patent/JP2002314131A/ja active Pending
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