JP2002314131A5 - - Google Patents

Download PDF

Info

Publication number
JP2002314131A5
JP2002314131A5 JP2001111621A JP2001111621A JP2002314131A5 JP 2002314131 A5 JP2002314131 A5 JP 2002314131A5 JP 2001111621 A JP2001111621 A JP 2001111621A JP 2001111621 A JP2001111621 A JP 2001111621A JP 2002314131 A5 JP2002314131 A5 JP 2002314131A5
Authority
JP
Japan
Prior art keywords
nitride semiconductor
group iii
iii nitride
thin film
translucent electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001111621A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002314131A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001111621A priority Critical patent/JP2002314131A/ja
Priority claimed from JP2001111621A external-priority patent/JP2002314131A/ja
Publication of JP2002314131A publication Critical patent/JP2002314131A/ja
Publication of JP2002314131A5 publication Critical patent/JP2002314131A5/ja
Pending legal-status Critical Current

Links

JP2001111621A 2001-04-10 2001-04-10 透光性電極及びその製造方法並びにそれを用いたiii族窒化物半導体発光素子 Pending JP2002314131A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001111621A JP2002314131A (ja) 2001-04-10 2001-04-10 透光性電極及びその製造方法並びにそれを用いたiii族窒化物半導体発光素子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001111621A JP2002314131A (ja) 2001-04-10 2001-04-10 透光性電極及びその製造方法並びにそれを用いたiii族窒化物半導体発光素子

Publications (2)

Publication Number Publication Date
JP2002314131A JP2002314131A (ja) 2002-10-25
JP2002314131A5 true JP2002314131A5 (enrdf_load_stackoverflow) 2005-01-20

Family

ID=18963191

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001111621A Pending JP2002314131A (ja) 2001-04-10 2001-04-10 透光性電極及びその製造方法並びにそれを用いたiii族窒化物半導体発光素子

Country Status (1)

Country Link
JP (1) JP2002314131A (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4411871B2 (ja) * 2003-06-17 2010-02-10 日亜化学工業株式会社 窒化物半導体発光素子
CN100428504C (zh) * 2003-11-06 2008-10-22 厦门市三安光电科技有限公司 一种半导体器件及其制备方法
TW200529464A (en) * 2004-02-27 2005-09-01 Super Nova Optoelectronics Corp Gallium nitride based light-emitting diode structure and manufacturing method thereof
JP2005327817A (ja) 2004-05-12 2005-11-24 Toshiba Corp 放射線検出器
JP2006100475A (ja) * 2004-09-29 2006-04-13 Toyoda Gosei Co Ltd 半導体発光素子
KR100703091B1 (ko) * 2005-09-08 2007-04-06 삼성전기주식회사 질화물 반도체 발광 소자 및 그 제조 방법
JP2007180326A (ja) * 2005-12-28 2007-07-12 Showa Denko Kk 発光装置
JP2007258376A (ja) * 2006-03-22 2007-10-04 Rohm Co Ltd 半導体素子の製造方法
US20080197378A1 (en) * 2007-02-20 2008-08-21 Hua-Shuang Kong Group III Nitride Diodes on Low Index Carrier Substrates
JP2008300421A (ja) * 2007-05-29 2008-12-11 Sumitomo Electric Ind Ltd Iii−v族窒化物半導体の製造方法およびiii−v族窒化物半導体
JP5474292B2 (ja) * 2007-11-06 2014-04-16 シャープ株式会社 窒化物半導体発光ダイオード素子
KR100960280B1 (ko) * 2008-12-02 2010-06-04 주식회사 에피밸리 3족 질화물 반도체 발광소자

Similar Documents

Publication Publication Date Title
TWI324401B (en) Fabrication method of high-brightness light emitting diode having reflective layer
JP5115425B2 (ja) Iii族窒化物半導体発光素子
US8648377B2 (en) Semiconductor light-emitting device
TWI248691B (en) Light emitting diode and method of fabricating thereof
JP2011066461A (ja) 半導体発光素子
JP2002314131A5 (enrdf_load_stackoverflow)
JP2006324685A5 (enrdf_load_stackoverflow)
US20070010035A1 (en) Light emitting diode and manufacturing method thereof
CN103125028A (zh) 用于制造第iii族氮化物半导体发光器件的方法
JP2011176093A (ja) 発光素子用基板および発光素子
JP2006066903A (ja) 半導体発光素子用正極
TW201242093A (en) Method for producing group III nitride semiconductor light emitting element
KR100571816B1 (ko) 질화물계 발광소자 및 그 제조방법
JP3498698B2 (ja) 窒化ガリウム系化合物半導体素子
JP2009094108A (ja) GaN系LED素子の製造方法
KR100886819B1 (ko) 반사막 전극, 이를 구비하는 화합물 반도체 발광소자 및그의 제조방법
JP2000012899A (ja) 窒化物半導体素子の製造方法
KR100945984B1 (ko) 반도체 발광 다이오드 제조 방법
JP2004297056A5 (enrdf_load_stackoverflow)
JP2000332293A5 (enrdf_load_stackoverflow)
JPH10242517A (ja) p型窒化ガリウム系化合物半導体用オーミック電極及びそれを用いた発光素子並びにその製造方法
CN100474641C (zh) 具有内陷电极的半导体发光元件
JP4004620B2 (ja) 光半導体素子
JP5646423B2 (ja) 半導体発光装置及びその製造方法
JP2003273401A5 (enrdf_load_stackoverflow)