JP2002260595A5 - - Google Patents

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Publication number
JP2002260595A5
JP2002260595A5 JP2001334157A JP2001334157A JP2002260595A5 JP 2002260595 A5 JP2002260595 A5 JP 2002260595A5 JP 2001334157 A JP2001334157 A JP 2001334157A JP 2001334157 A JP2001334157 A JP 2001334157A JP 2002260595 A5 JP2002260595 A5 JP 2002260595A5
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JP
Japan
Prior art keywords
processing space
microwave
reflector
ultraviolet
plasma lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001334157A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002260595A (ja
Filing date
Publication date
Priority claimed from US09/702,519 external-priority patent/US6559460B1/en
Application filed filed Critical
Publication of JP2002260595A publication Critical patent/JP2002260595A/ja
Publication of JP2002260595A5 publication Critical patent/JP2002260595A5/ja
Pending legal-status Critical Current

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JP2001334157A 2000-10-31 2001-10-31 紫外線ランプシステムおよび方法 Pending JP2002260595A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/702519 2000-10-31
US09/702,519 US6559460B1 (en) 2000-10-31 2000-10-31 Ultraviolet lamp system and methods

Publications (2)

Publication Number Publication Date
JP2002260595A JP2002260595A (ja) 2002-09-13
JP2002260595A5 true JP2002260595A5 (enExample) 2005-06-30

Family

ID=24821534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001334157A Pending JP2002260595A (ja) 2000-10-31 2001-10-31 紫外線ランプシステムおよび方法

Country Status (4)

Country Link
US (2) US6559460B1 (enExample)
JP (1) JP2002260595A (enExample)
CN (1) CN1260013C (enExample)
DE (1) DE10153204A1 (enExample)

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US20020079796A1 (en) * 2000-12-22 2002-06-27 Okamitsu Jeffrey K. Wavelength selective optical reflector with integral light trap
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US20100242299A1 (en) * 2003-01-09 2010-09-30 Con-Trol-Cure, Inc. Uv curing system and process
US6933683B2 (en) * 2003-02-27 2005-08-23 Nordson Corporation Microwave powered lamphead having external shutter
CN1449872B (zh) * 2003-04-10 2010-05-12 上海复旦辰光科技有限公司 一种利用微波清洁材料表面的方法及其装置
JP2005193088A (ja) * 2003-12-26 2005-07-21 Japan Storage Battery Co Ltd エキシマランプ照射装置
US7109669B2 (en) * 2004-04-08 2006-09-19 Nordson Corporation Microwave lamp power supply that can withstand failure in high voltage circuit
FR2869719B1 (fr) * 2004-04-29 2007-03-30 Pascal Sortais Source lumineuse a resonance cyclotronique d'electrons
US20050250346A1 (en) * 2004-05-06 2005-11-10 Applied Materials, Inc. Process and apparatus for post deposition treatment of low k dielectric materials
US20050286263A1 (en) * 2004-06-23 2005-12-29 Champion David A Plasma lamp with light-transmissive waveguide
CN100435982C (zh) * 2004-07-09 2008-11-26 赫恩龙 物件涂装uv漆的固化方法及其设备
US8216061B2 (en) * 2005-03-31 2012-07-10 Wms Gaming Inc. Wagering games with unlockable bonus rounds
FR2884043A1 (fr) * 2005-04-01 2006-10-06 Pascal Sortais Source lumineuse alimentee par radiofrequence pour traitements de substances et procede d'utilisation d'une telle source
US20060251827A1 (en) * 2005-05-09 2006-11-09 Applied Materials, Inc. Tandem uv chamber for curing dielectric materials
US20060249175A1 (en) * 2005-05-09 2006-11-09 Applied Materials, Inc. High efficiency UV curing system
US7777198B2 (en) * 2005-05-09 2010-08-17 Applied Materials, Inc. Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation
US7372058B2 (en) 2005-09-27 2008-05-13 Asml Netherlands B.V. Ex-situ removal of deposition on an optical element
SG136078A1 (en) * 2006-03-17 2007-10-29 Applied Materials Inc Uv cure system
US7692171B2 (en) * 2006-03-17 2010-04-06 Andrzei Kaszuba Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors
US7435982B2 (en) 2006-03-31 2008-10-14 Energetiq Technology, Inc. Laser-driven light source
US7863834B2 (en) * 2007-06-29 2011-01-04 Nordson Corporation Ultraviolet lamp system and method for controlling emitted UV light
DE102007031628B4 (de) * 2007-07-06 2012-06-21 Eastman Kodak Co. UV-Strahlungsquelle
DE102007031629B3 (de) * 2007-07-06 2009-03-19 Eastman Kodak Co. Mit Mikrowellen angeregte Strahlungsquelle
US7923706B2 (en) * 2008-10-03 2011-04-12 Nordson Corporation Ultraviolet curing apparatus for continuous material
US20100096569A1 (en) * 2008-10-21 2010-04-22 Applied Materials, Inc. Ultraviolet-transmitting microwave reflector comprising a micromesh screen
WO2010077132A1 (en) 2008-12-31 2010-07-08 Draka Comteq B.V. Uvled apparatus for curing glass-fiber coatings
EP2388239B1 (en) 2010-05-20 2017-02-15 Draka Comteq B.V. Curing apparatus employing angled UV-LEDs
US8871311B2 (en) 2010-06-03 2014-10-28 Draka Comteq, B.V. Curing method employing UV sources that emit differing ranges of UV radiation
DE112011102371T5 (de) 2010-07-16 2013-04-25 Nordson Corporation Lampensysteme und Verfahren zum Erzeugen von ultraviolettem Licht
EP2418183B1 (en) 2010-08-10 2018-07-25 Draka Comteq B.V. Method for curing coated glass fibres providing increased UVLED intensitiy
EP2445313B1 (en) * 2010-10-21 2015-05-13 Electrolux Home Products Corporation N.V. Microwave oven cavity and microwave oven
WO2012138866A1 (en) 2011-04-08 2012-10-11 Applied Materials, Inc. Apparatus and method for uv treatment, chemical treatment, and deposition
US9750091B2 (en) * 2012-10-15 2017-08-29 Applied Materials, Inc. Apparatus and method for heat treatment of coatings on substrates
US20150123015A1 (en) * 2013-11-04 2015-05-07 Nordson Corporation Apparatus and methods for irradiating substrates with ultraviolet light
US9117619B2 (en) * 2013-11-07 2015-08-25 Electronics And Telecommunications Research Institute Device for generating heavy-ion beam and method thereof
KR102482671B1 (ko) * 2014-07-07 2022-12-29 노드슨 코포레이션 Uv 시스템에서 rf 소스의 적합성을 판정하기 위한 시스템 및 방법
US10520251B2 (en) * 2015-01-15 2019-12-31 Heraeus Noblelight America Llc UV light curing systems, and methods of designing and operating the same
JP6379118B2 (ja) 2016-01-10 2018-08-22 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 光照射装置
US11532328B2 (en) 2018-05-18 2022-12-20 Samsung Electronics Co., Ltd. Method for fabricating semiconductor chip by using multi-curing apparatus and multi-curing apparatus
JP7548297B2 (ja) * 2020-03-31 2024-09-10 Ａｇｃ株式会社 無線伝達システム
CN115090477A (zh) * 2022-08-05 2022-09-23 安徽艾雅伦新材料科技有限公司 一种pvc板材防静电镀膜设备及其镀膜方法

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JPS55152567A (en) * 1979-05-18 1980-11-27 Oak Seisakusho:Kk Coating and drying apparatus for wire and bar
JPS60191038A (ja) * 1984-03-07 1985-09-28 Oak Seisakusho:Kk 紫外線照射装置
US4535753A (en) 1984-04-12 1985-08-20 Leo Zayauskas Radiant heat collector
US4710638A (en) * 1986-02-10 1987-12-01 Fusion Systems Corporation Apparatus for treating coatings
US4800090A (en) * 1987-03-11 1989-01-24 Musser's Potato Chips, Inc. Infrared and microwave energy treatment of food
JPH0621167Y2 (ja) * 1987-08-07 1994-06-01 高橋 柾弘 マイクロ波励起による紫外線発生装置
JPH0637521Y2 (ja) * 1988-10-05 1994-09-28 高橋 柾弘 マイクロ波励起による紫外線発生装置
JPH072184Y2 (ja) * 1988-07-27 1995-01-25 ウシオ電機株式会社 紫外線による処理装置
DE3919334A1 (de) 1989-06-13 1990-12-20 Tetsuhiro Kano Reflektor fuer eine leuchte
FR2674526B1 (fr) 1991-03-29 2002-05-03 France Telecom Dispositif a source de rayonnement ultraviolet induit par des micro-ondes, pour la polymerisation d'objets photopolymerisables.
EP1232673A1 (en) * 1999-10-27 2002-08-21 Fusion Uv Systems, Inc. Uv oven for curing magnet wire coatings

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