JP2002258263A - デバイス基板製造におけるデータ管理システム及びこれを用いた製造方法 - Google Patents

デバイス基板製造におけるデータ管理システム及びこれを用いた製造方法

Info

Publication number
JP2002258263A
JP2002258263A JP2001054054A JP2001054054A JP2002258263A JP 2002258263 A JP2002258263 A JP 2002258263A JP 2001054054 A JP2001054054 A JP 2001054054A JP 2001054054 A JP2001054054 A JP 2001054054A JP 2002258263 A JP2002258263 A JP 2002258263A
Authority
JP
Japan
Prior art keywords
cutting
substrate
manufacturing
device substrate
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001054054A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002258263A5 (https=
Inventor
Mamoru Kawashita
守 川下
Shunji Takahashi
俊二 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP2001054054A priority Critical patent/JP2002258263A/ja
Publication of JP2002258263A publication Critical patent/JP2002258263A/ja
Publication of JP2002258263A5 publication Critical patent/JP2002258263A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Liquid Crystal (AREA)
  • General Factory Administration (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2001054054A 2001-02-28 2001-02-28 デバイス基板製造におけるデータ管理システム及びこれを用いた製造方法 Withdrawn JP2002258263A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001054054A JP2002258263A (ja) 2001-02-28 2001-02-28 デバイス基板製造におけるデータ管理システム及びこれを用いた製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001054054A JP2002258263A (ja) 2001-02-28 2001-02-28 デバイス基板製造におけるデータ管理システム及びこれを用いた製造方法

Publications (2)

Publication Number Publication Date
JP2002258263A true JP2002258263A (ja) 2002-09-11
JP2002258263A5 JP2002258263A5 (https=) 2008-04-17

Family

ID=18914441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001054054A Withdrawn JP2002258263A (ja) 2001-02-28 2001-02-28 デバイス基板製造におけるデータ管理システム及びこれを用いた製造方法

Country Status (1)

Country Link
JP (1) JP2002258263A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023188711A1 (ja) * 2022-03-30 2023-10-05 日東電工株式会社 欠点の発生傾向解析方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023188711A1 (ja) * 2022-03-30 2023-10-05 日東電工株式会社 欠点の発生傾向解析方法
JP2023148609A (ja) * 2022-03-30 2023-10-13 日東電工株式会社 欠点の発生傾向解析方法
JP7844221B2 (ja) 2022-03-30 2026-04-13 日東電工株式会社 欠点の発生傾向解析方法

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