JP2002252143A - 温度補償用薄膜コンデンサ及び電子機器 - Google Patents

温度補償用薄膜コンデンサ及び電子機器

Info

Publication number
JP2002252143A
JP2002252143A JP2001254927A JP2001254927A JP2002252143A JP 2002252143 A JP2002252143 A JP 2002252143A JP 2001254927 A JP2001254927 A JP 2001254927A JP 2001254927 A JP2001254927 A JP 2001254927A JP 2002252143 A JP2002252143 A JP 2002252143A
Authority
JP
Japan
Prior art keywords
thin film
dielectric thin
dielectric
temperature
capacitance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001254927A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002252143A5 (enExample
Inventor
Masahiro Aoki
政博 青木
Makoto Sasaki
真 佐々木
Hitoshi Kitagawa
均 北川
Hirofumi Fukui
洋文 福井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP2001254927A priority Critical patent/JP2002252143A/ja
Priority to EP01125397A priority patent/EP1217637A3/en
Priority to US10/028,543 priority patent/US6556421B2/en
Priority to KR10-2001-0081832A priority patent/KR100428225B1/ko
Priority to CNB011449012A priority patent/CN1198297C/zh
Publication of JP2002252143A publication Critical patent/JP2002252143A/ja
Publication of JP2002252143A5 publication Critical patent/JP2002252143A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/14—Organic dielectrics
    • H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/33—Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Semiconductor Integrated Circuits (AREA)
JP2001254927A 2000-12-21 2001-08-24 温度補償用薄膜コンデンサ及び電子機器 Withdrawn JP2002252143A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2001254927A JP2002252143A (ja) 2000-12-21 2001-08-24 温度補償用薄膜コンデンサ及び電子機器
EP01125397A EP1217637A3 (en) 2000-12-21 2001-10-31 Temperature-compensating thin-film capacitor and electronic device
US10/028,543 US6556421B2 (en) 2000-12-21 2001-12-19 Temperature-compensating thin-film capacitor and electronic device
KR10-2001-0081832A KR100428225B1 (ko) 2000-12-21 2001-12-20 온도 보상용 박막 콘덴서 및 전자 기기
CNB011449012A CN1198297C (zh) 2000-12-21 2001-12-21 温度补偿用薄膜电容器

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000389008 2000-12-21
JP2000-389008 2000-12-21
JP2001254927A JP2002252143A (ja) 2000-12-21 2001-08-24 温度補償用薄膜コンデンサ及び電子機器

Publications (2)

Publication Number Publication Date
JP2002252143A true JP2002252143A (ja) 2002-09-06
JP2002252143A5 JP2002252143A5 (enExample) 2005-04-14

Family

ID=26606293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001254927A Withdrawn JP2002252143A (ja) 2000-12-21 2001-08-24 温度補償用薄膜コンデンサ及び電子機器

Country Status (5)

Country Link
US (1) US6556421B2 (enExample)
EP (1) EP1217637A3 (enExample)
JP (1) JP2002252143A (enExample)
KR (1) KR100428225B1 (enExample)
CN (1) CN1198297C (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104619475A (zh) * 2012-07-13 2015-05-13 英国国防部 制造包含分散的纳米颗粒的连续电介质膜的方法

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TW497269B (en) * 2000-05-13 2002-08-01 Semiconductor Energy Lab Manufacturing method of semiconductor device
UA77459C2 (en) * 2001-11-03 2006-12-15 Thin-film capacitor and a method for producing the capacitor
US20040061990A1 (en) * 2002-09-26 2004-04-01 Dougherty T. Kirk Temperature-compensated ferroelectric capacitor device, and its fabrication
DE102004005082B4 (de) 2004-02-02 2006-03-02 Infineon Technologies Ag Kondensator mit einem Dielektrikum aus einer selbstorganisierten Monoschicht einer organischen Verbindung und Verfahren zu dessen Herstellung
US7161795B1 (en) * 2005-09-26 2007-01-09 Ferro Corporation COG dielectric composition for use with copper electrodes
US20100067172A1 (en) * 2008-03-13 2010-03-18 Strategic Polymer Sciences, Inc. High electric energy density polymeric compositions, methods of the manufacture therefor, and articles comprising the same
US8223472B1 (en) * 2008-11-14 2012-07-17 Sandia Corporation Norbornylene-based polymer systems for dielectric applications
JP4905497B2 (ja) * 2009-04-22 2012-03-28 株式会社村田製作所 電子部品
TW201121786A (en) * 2009-10-22 2011-07-01 Chi Lin Technology Co Ltd Hybrid electret
US8315032B2 (en) 2010-07-16 2012-11-20 Ut-Battelle, Llc High power density capacitor and method of fabrication
JP5679167B2 (ja) * 2010-10-18 2015-03-04 信越ポリマー株式会社 フィルムキャパシタ用フィルム
CN103772783A (zh) * 2013-12-18 2014-05-07 芜湖万润机械有限责任公司 一种电容器用改性聚乙烯等规聚丙烯复合金属化薄膜及其制备方法
WO2016003523A2 (en) * 2014-04-16 2016-01-07 Board Of Trustees Of The Leland Stanford Junior University Polar elastomers for high performance electronic and optoelectronic devices
WO2015184233A1 (en) * 2014-05-29 2015-12-03 Skyworks Solutions, Inc. Temperature compensated circuits for radio-frequency devices
JP6677357B2 (ja) * 2017-11-15 2020-04-08 株式会社村田製作所 フィルムコンデンサ、及び、金属化フィルム
CN109166730B (zh) * 2018-08-28 2020-05-22 西安交通大学 一种宽温高储能的无铅柔性的介电薄膜电容器及其制备方法
US12261596B1 (en) 2020-09-11 2025-03-25 Mixed-Signal Devices Inc. Systems and methods for low temperature coefficient capacitors
US11469761B1 (en) 2020-09-11 2022-10-11 Mixed-Signal Devices Inc. CMOS frequency reference circuit with temperature coefficient cancellation
US12085972B1 (en) 2021-04-01 2024-09-10 Mixed-Signal Devices Inc. Sampled band-gap reference voltage generators

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US3949280A (en) * 1975-02-18 1976-04-06 Mitsumi Electric Co., Ltd. Miniature variable capacitor and method of manufacture
JPS5873908A (ja) * 1981-10-28 1983-05-04 ティーディーケイ株式会社 高周波用誘電体磁器組成物
EP0134249A4 (en) * 1983-01-31 1987-06-29 Nippon Soda Co PROCESS FOR PRODUCING A THIN FILM DIELECTRIC.
JPS63110618A (ja) 1986-10-28 1988-05-16 沖電気工業株式会社 積層型マイクロ波用誘電体磁器組成物
EP0393271A1 (en) * 1987-08-08 1990-10-24 The Standard Oil Company Fluoropolymer thin film coatings and method of preparation by plasma polymerization
DE68906219T2 (de) 1988-08-25 1993-08-05 Matsushita Electric Ind Co Ltd Duennfilmkapazitaet und verfahren zur herstellung einer integrierten hybridmikrowellenschaltung.
US5088003A (en) * 1989-08-24 1992-02-11 Tosoh Corporation Laminated silicon oxide film capacitors and method for their production
JPH03252160A (ja) * 1990-02-28 1991-11-11 Nec Corp コンデンサ、コンデンサネットワーク及び抵抗―コンデンサネットワーク
US5311406A (en) * 1991-10-30 1994-05-10 Honeywell Inc. Microstrip printed wiring board and a method for making same
US5723171A (en) * 1992-10-23 1998-03-03 Symetrix Corporation Integrated circuit electrode structure and process for fabricating same
JPH08115851A (ja) * 1994-10-14 1996-05-07 Ngk Spark Plug Co Ltd 薄膜コンデンサ付きセラミック基板および その製造方法
JP3475976B2 (ja) * 1995-01-13 2003-12-10 出光石油化学株式会社 コンデンサ
DE69624042T2 (de) 1995-06-16 2003-06-05 At&T Ipm Corp., Coral Gables TiO2 dotiertes, Ta2O5 enthaltendes dielektrisches Material und dieses enthaltende Bauteile
US6243474B1 (en) * 1996-04-18 2001-06-05 California Institute Of Technology Thin film electret microphone
US5965273A (en) * 1997-01-31 1999-10-12 Hoechst Celanese Corporation Polymeric compositions having a temperature-stable dielectric constant
US6153525A (en) * 1997-03-13 2000-11-28 Alliedsignal Inc. Methods for chemical mechanical polish of organic polymer dielectric films
JPH11214250A (ja) * 1998-01-28 1999-08-06 Kuraray Co Ltd デバイスとこれを実装した実装回路基板
US6324048B1 (en) * 1998-03-04 2001-11-27 Avx Corporation Ultra-small capacitor array
US6154311A (en) * 1998-04-20 2000-11-28 Simtek Hardcoatings, Inc. UV reflective photocatalytic dielectric combiner having indices of refraction greater than 2.0

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104619475A (zh) * 2012-07-13 2015-05-13 英国国防部 制造包含分散的纳米颗粒的连续电介质膜的方法
CN104619475B (zh) * 2012-07-13 2016-09-14 英国国防部 制造包含分散的纳米颗粒的连续电介质膜的方法
US9518162B2 (en) 2012-07-13 2016-12-13 The Secretary Of State For Defence Process of making a continuous dielectric film comprising dispersed nanoparticles

Also Published As

Publication number Publication date
EP1217637A3 (en) 2005-01-26
US20020122285A1 (en) 2002-09-05
KR20020050734A (ko) 2002-06-27
EP1217637A2 (en) 2002-06-26
CN1360323A (zh) 2002-07-24
KR100428225B1 (ko) 2004-04-28
US6556421B2 (en) 2003-04-29
CN1198297C (zh) 2005-04-20

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