KR100428225B1 - 온도 보상용 박막 콘덴서 및 전자 기기 - Google Patents

온도 보상용 박막 콘덴서 및 전자 기기 Download PDF

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Publication number
KR100428225B1
KR100428225B1 KR10-2001-0081832A KR20010081832A KR100428225B1 KR 100428225 B1 KR100428225 B1 KR 100428225B1 KR 20010081832 A KR20010081832 A KR 20010081832A KR 100428225 B1 KR100428225 B1 KR 100428225B1
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KR
South Korea
Prior art keywords
thin film
dielectric
dielectric thin
ppm
capacitance
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Expired - Fee Related
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KR10-2001-0081832A
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English (en)
Korean (ko)
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KR20020050734A (ko
Inventor
아오끼마사히로
사사끼마꼬또
기따가와히또시
후꾸이히로후미
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알프스 덴키 가부시키가이샤
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Publication of KR20020050734A publication Critical patent/KR20020050734A/ko
Application granted granted Critical
Publication of KR100428225B1 publication Critical patent/KR100428225B1/ko
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/14—Organic dielectrics
    • H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/33—Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Semiconductor Integrated Circuits (AREA)
KR10-2001-0081832A 2000-12-21 2001-12-20 온도 보상용 박막 콘덴서 및 전자 기기 Expired - Fee Related KR100428225B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2000-00389008 2000-12-21
JP2000389008 2000-12-21
JPJP-P-2001-00254927 2001-08-24
JP2001254927A JP2002252143A (ja) 2000-12-21 2001-08-24 温度補償用薄膜コンデンサ及び電子機器

Publications (2)

Publication Number Publication Date
KR20020050734A KR20020050734A (ko) 2002-06-27
KR100428225B1 true KR100428225B1 (ko) 2004-04-28

Family

ID=26606293

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2001-0081832A Expired - Fee Related KR100428225B1 (ko) 2000-12-21 2001-12-20 온도 보상용 박막 콘덴서 및 전자 기기

Country Status (5)

Country Link
US (1) US6556421B2 (enExample)
EP (1) EP1217637A3 (enExample)
JP (1) JP2002252143A (enExample)
KR (1) KR100428225B1 (enExample)
CN (1) CN1198297C (enExample)

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US6461886B1 (en) * 2000-05-13 2002-10-08 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device
UA77459C2 (en) * 2001-11-03 2006-12-15 Thin-film capacitor and a method for producing the capacitor
US20040061990A1 (en) * 2002-09-26 2004-04-01 Dougherty T. Kirk Temperature-compensated ferroelectric capacitor device, and its fabrication
DE102004005082B4 (de) 2004-02-02 2006-03-02 Infineon Technologies Ag Kondensator mit einem Dielektrikum aus einer selbstorganisierten Monoschicht einer organischen Verbindung und Verfahren zu dessen Herstellung
US7161795B1 (en) * 2005-09-26 2007-01-09 Ferro Corporation COG dielectric composition for use with copper electrodes
US20100067172A1 (en) * 2008-03-13 2010-03-18 Strategic Polymer Sciences, Inc. High electric energy density polymeric compositions, methods of the manufacture therefor, and articles comprising the same
US8223472B1 (en) * 2008-11-14 2012-07-17 Sandia Corporation Norbornylene-based polymer systems for dielectric applications
JP4905497B2 (ja) * 2009-04-22 2012-03-28 株式会社村田製作所 電子部品
TW201121786A (en) * 2009-10-22 2011-07-01 Chi Lin Technology Co Ltd Hybrid electret
US8315032B2 (en) 2010-07-16 2012-11-20 Ut-Battelle, Llc High power density capacitor and method of fabrication
JP5679167B2 (ja) * 2010-10-18 2015-03-04 信越ポリマー株式会社 フィルムキャパシタ用フィルム
GB201212487D0 (en) * 2012-07-13 2012-08-29 Secr Defence A device for measuring the hydration level of humans
CN103772783A (zh) * 2013-12-18 2014-05-07 芜湖万润机械有限责任公司 一种电容器用改性聚乙烯等规聚丙烯复合金属化薄膜及其制备方法
EP3132471A4 (en) 2014-04-16 2017-11-22 The Board of Trustees of The Leland Stanford Junior University Polar elastomers for high performance electronic and optoelectronic devices
TWI841902B (zh) * 2014-05-29 2024-05-11 美商西凱渥資訊處理科技公司 用於射頻裝置之溫度補償電路
JP6677357B2 (ja) * 2017-11-15 2020-04-08 株式会社村田製作所 フィルムコンデンサ、及び、金属化フィルム
CN109166730B (zh) * 2018-08-28 2020-05-22 西安交通大学 一种宽温高储能的无铅柔性的介电薄膜电容器及其制备方法
US12261596B1 (en) 2020-09-11 2025-03-25 Mixed-Signal Devices Inc. Systems and methods for low temperature coefficient capacitors
US11469761B1 (en) 2020-09-11 2022-10-11 Mixed-Signal Devices Inc. CMOS frequency reference circuit with temperature coefficient cancellation
US12085972B1 (en) 2021-04-01 2024-09-10 Mixed-Signal Devices Inc. Sampled band-gap reference voltage generators

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Publication number Priority date Publication date Assignee Title
US3949280A (en) * 1975-02-18 1976-04-06 Mitsumi Electric Co., Ltd. Miniature variable capacitor and method of manufacture
JPS5873908A (ja) * 1981-10-28 1983-05-04 ティーディーケイ株式会社 高周波用誘電体磁器組成物
EP0134249A4 (en) * 1983-01-31 1987-06-29 Nippon Soda Co PROCESS FOR PRODUCING A THIN FILM DIELECTRIC.
JPS63110618A (ja) 1986-10-28 1988-05-16 沖電気工業株式会社 積層型マイクロ波用誘電体磁器組成物
EP0393271A1 (en) * 1987-08-08 1990-10-24 The Standard Oil Company Fluoropolymer thin film coatings and method of preparation by plasma polymerization
EP0356212B1 (en) 1988-08-25 1993-04-28 Matsushita Electric Industrial Co., Ltd. Thin-film capacitor and method of manufacturing a hybrid microwave integrated circuit
US5088003A (en) * 1989-08-24 1992-02-11 Tosoh Corporation Laminated silicon oxide film capacitors and method for their production
JPH03252160A (ja) * 1990-02-28 1991-11-11 Nec Corp コンデンサ、コンデンサネットワーク及び抵抗―コンデンサネットワーク
US5311406A (en) * 1991-10-30 1994-05-10 Honeywell Inc. Microstrip printed wiring board and a method for making same
US5723171A (en) * 1992-10-23 1998-03-03 Symetrix Corporation Integrated circuit electrode structure and process for fabricating same
JPH08115851A (ja) * 1994-10-14 1996-05-07 Ngk Spark Plug Co Ltd 薄膜コンデンサ付きセラミック基板および その製造方法
JP3475976B2 (ja) * 1995-01-13 2003-12-10 出光石油化学株式会社 コンデンサ
EP0749134B1 (en) 1995-06-16 2002-10-02 AT&T IPM Corp. Dielectric material comprising Ta2O5 doped with TiO2 and devices employing same
WO1997039464A1 (en) * 1996-04-18 1997-10-23 California Institute Of Technology Thin film electret microphone
US5965273A (en) * 1997-01-31 1999-10-12 Hoechst Celanese Corporation Polymeric compositions having a temperature-stable dielectric constant
US6153525A (en) * 1997-03-13 2000-11-28 Alliedsignal Inc. Methods for chemical mechanical polish of organic polymer dielectric films
JPH11214250A (ja) * 1998-01-28 1999-08-06 Kuraray Co Ltd デバイスとこれを実装した実装回路基板
US6324048B1 (en) * 1998-03-04 2001-11-27 Avx Corporation Ultra-small capacitor array
US6154311A (en) * 1998-04-20 2000-11-28 Simtek Hardcoatings, Inc. UV reflective photocatalytic dielectric combiner having indices of refraction greater than 2.0

Also Published As

Publication number Publication date
US6556421B2 (en) 2003-04-29
CN1360323A (zh) 2002-07-24
EP1217637A2 (en) 2002-06-26
US20020122285A1 (en) 2002-09-05
JP2002252143A (ja) 2002-09-06
EP1217637A3 (en) 2005-01-26
CN1198297C (zh) 2005-04-20
KR20020050734A (ko) 2002-06-27

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