JP2002222758A - ステージ装置およびそれを用いた露光装置 - Google Patents

ステージ装置およびそれを用いた露光装置

Info

Publication number
JP2002222758A
JP2002222758A JP2001019522A JP2001019522A JP2002222758A JP 2002222758 A JP2002222758 A JP 2002222758A JP 2001019522 A JP2001019522 A JP 2001019522A JP 2001019522 A JP2001019522 A JP 2001019522A JP 2002222758 A JP2002222758 A JP 2002222758A
Authority
JP
Japan
Prior art keywords
stage
suction
gap
exposure apparatus
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001019522A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002222758A5 (enExample
Inventor
Giichi Miyajima
義一 宮島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001019522A priority Critical patent/JP2002222758A/ja
Publication of JP2002222758A publication Critical patent/JP2002222758A/ja
Publication of JP2002222758A5 publication Critical patent/JP2002222758A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2001019522A 2001-01-29 2001-01-29 ステージ装置およびそれを用いた露光装置 Withdrawn JP2002222758A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001019522A JP2002222758A (ja) 2001-01-29 2001-01-29 ステージ装置およびそれを用いた露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001019522A JP2002222758A (ja) 2001-01-29 2001-01-29 ステージ装置およびそれを用いた露光装置

Publications (2)

Publication Number Publication Date
JP2002222758A true JP2002222758A (ja) 2002-08-09
JP2002222758A5 JP2002222758A5 (enExample) 2008-02-14

Family

ID=18885383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001019522A Withdrawn JP2002222758A (ja) 2001-01-29 2001-01-29 ステージ装置およびそれを用いた露光装置

Country Status (1)

Country Link
JP (1) JP2002222758A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6885117B2 (en) 2002-11-29 2005-04-26 Asml Netherlands B.V. Magnetic actuator under piezoelectric control
EP1424767A3 (en) * 2002-11-29 2006-06-21 ASML Netherlands B.V. Magnetic actuator under piezoelectric control
JP2010197538A (ja) * 2009-02-24 2010-09-09 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP2017073501A (ja) * 2015-10-08 2017-04-13 株式会社ニューフレアテクノロジー ステージ装置および荷電粒子ビーム描画装置
JP2018041811A (ja) * 2016-09-06 2018-03-15 キヤノン株式会社 インプリント装置、及び物品製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6885117B2 (en) 2002-11-29 2005-04-26 Asml Netherlands B.V. Magnetic actuator under piezoelectric control
EP1424767A3 (en) * 2002-11-29 2006-06-21 ASML Netherlands B.V. Magnetic actuator under piezoelectric control
JP2010197538A (ja) * 2009-02-24 2010-09-09 Canon Inc ステージ装置、露光装置及びデバイス製造方法
JP2017073501A (ja) * 2015-10-08 2017-04-13 株式会社ニューフレアテクノロジー ステージ装置および荷電粒子ビーム描画装置
JP2018041811A (ja) * 2016-09-06 2018-03-15 キヤノン株式会社 インプリント装置、及び物品製造方法

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