JP2002198357A5 - - Google Patents
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- Publication number
- JP2002198357A5 JP2002198357A5 JP2000397269A JP2000397269A JP2002198357A5 JP 2002198357 A5 JP2002198357 A5 JP 2002198357A5 JP 2000397269 A JP2000397269 A JP 2000397269A JP 2000397269 A JP2000397269 A JP 2000397269A JP 2002198357 A5 JP2002198357 A5 JP 2002198357A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- cleaning
- semiconductor manufacturing
- manufacturing apparatus
- inert gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims 21
- 239000007789 gas Substances 0.000 claims 19
- 238000004519 manufacturing process Methods 0.000 claims 16
- 239000004065 semiconductor Substances 0.000 claims 16
- 239000011261 inert gas Substances 0.000 claims 10
- 238000000034 method Methods 0.000 claims 6
- 229920001774 Perfluoroether Polymers 0.000 claims 3
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 claims 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims 3
- 229910052786 argon Inorganic materials 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 150000002222 fluorine compounds Chemical class 0.000 claims 2
- -1 hydrofluorocarbon Chemical compound 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000000354 decomposition reaction Methods 0.000 claims 1
- 230000005284 excitation Effects 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- 229910052743 krypton Inorganic materials 0.000 claims 1
- 229910052754 neon Inorganic materials 0.000 claims 1
- 229910052724 xenon Inorganic materials 0.000 claims 1
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000397269A JP2002198357A (ja) | 2000-12-27 | 2000-12-27 | 半導体製造装置のクリーニングガス及びクリーニング方法 |
| KR10-2002-7003222A KR100485743B1 (ko) | 2000-07-18 | 2001-07-17 | 반도체 생산 설비용 세정 가스 |
| AU2001271063A AU2001271063A1 (en) | 2000-07-18 | 2001-07-17 | Cleaning gas for semiconductor production equipment |
| US10/088,306 US20030056388A1 (en) | 2000-07-18 | 2001-07-17 | Cleaning gas for semiconductor production equipment |
| TW090117438A TWI291201B (en) | 2000-07-18 | 2001-07-17 | Cleaning gas for semiconductor production equipment |
| PCT/JP2001/006164 WO2002007194A2 (en) | 2000-07-18 | 2001-07-17 | Cleaning gas for semiconductor production equipment |
| CNB018020372A CN1214444C (zh) | 2000-07-18 | 2001-07-17 | 用于半导体生产设备的净化气 |
| HK03104036.5A HK1051934B (en) | 2000-07-18 | 2001-07-17 | Cleaning gas for semiconductor production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000397269A JP2002198357A (ja) | 2000-12-27 | 2000-12-27 | 半導体製造装置のクリーニングガス及びクリーニング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002198357A JP2002198357A (ja) | 2002-07-12 |
| JP2002198357A5 true JP2002198357A5 (OSRAM) | 2004-08-05 |
Family
ID=18862413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000397269A Pending JP2002198357A (ja) | 2000-07-18 | 2000-12-27 | 半導体製造装置のクリーニングガス及びクリーニング方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002198357A (OSRAM) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60237380D1 (de) * | 2001-08-30 | 2010-09-30 | Anelva Corp | Plasmareinigungsverfahren |
| WO2017159511A1 (ja) * | 2016-03-16 | 2017-09-21 | 日本ゼオン株式会社 | プラズマエッチング方法 |
| TW202315966A (zh) * | 2021-07-06 | 2023-04-16 | 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 | 化學氣相沉積爐、及沉積氮化矽層之方法 |
-
2000
- 2000-12-27 JP JP2000397269A patent/JP2002198357A/ja active Pending
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