JP2002113334A - 中空糸膜モジュール及び中空糸膜モジュールを用いた液体の処理方法 - Google Patents
中空糸膜モジュール及び中空糸膜モジュールを用いた液体の処理方法Info
- Publication number
- JP2002113334A JP2002113334A JP2000306739A JP2000306739A JP2002113334A JP 2002113334 A JP2002113334 A JP 2002113334A JP 2000306739 A JP2000306739 A JP 2000306739A JP 2000306739 A JP2000306739 A JP 2000306739A JP 2002113334 A JP2002113334 A JP 2002113334A
- Authority
- JP
- Japan
- Prior art keywords
- hollow fiber
- fiber membrane
- membrane module
- housing
- chemical solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012528 membrane Substances 0.000 title claims abstract description 170
- 239000012510 hollow fiber Substances 0.000 title claims abstract description 161
- 239000007788 liquid Substances 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims description 20
- 239000000463 material Substances 0.000 claims abstract description 84
- 239000000126 substance Substances 0.000 claims abstract description 76
- 229910052751 metal Inorganic materials 0.000 claims abstract description 50
- 239000002184 metal Substances 0.000 claims abstract description 48
- 238000007872 degassing Methods 0.000 claims description 32
- 238000001914 filtration Methods 0.000 claims description 21
- -1 polyethylene Polymers 0.000 claims description 11
- 238000007654 immersion Methods 0.000 claims description 7
- 229920000098 polyolefin Polymers 0.000 claims description 6
- 239000004698 Polyethylene Substances 0.000 claims description 5
- 229920003050 poly-cycloolefin Polymers 0.000 claims description 5
- 229920000573 polyethylene Polymers 0.000 claims description 5
- 238000011109 contamination Methods 0.000 abstract description 7
- 238000010828 elution Methods 0.000 abstract description 5
- 150000002739 metals Chemical class 0.000 abstract description 5
- 239000000243 solution Substances 0.000 description 69
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 27
- 239000004065 semiconductor Substances 0.000 description 23
- 239000000976 ink Substances 0.000 description 22
- 238000004382 potting Methods 0.000 description 16
- 229920002120 photoresistant polymer Polymers 0.000 description 15
- 239000010408 film Substances 0.000 description 12
- 239000000203 mixture Substances 0.000 description 10
- 239000004973 liquid crystal related substance Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920003355 Novatec® Polymers 0.000 description 1
- 101100219325 Phaseolus vulgaris BA13 gene Proteins 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- ZFSFDELZPURLKD-UHFFFAOYSA-N azanium;hydroxide;hydrate Chemical compound N.O.O ZFSFDELZPURLKD-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- OTVRYZXVVMZHHW-DPAQBDIFSA-N cholesteryl chloride Chemical compound C1C=C2C[C@@H](Cl)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2 OTVRYZXVVMZHHW-DPAQBDIFSA-N 0.000 description 1
- WCLNGBQPTVENHV-MKQVXYPISA-N cholesteryl nonanoate Chemical compound C([C@@H]12)C[C@]3(C)[C@@H]([C@H](C)CCCC(C)C)CC[C@H]3[C@@H]1CC=C1[C@]2(C)CC[C@H](OC(=O)CCCCCCCC)C1 WCLNGBQPTVENHV-MKQVXYPISA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- RLAWWYSOJDYHDC-BZSNNMDCSA-N lisinopril Chemical compound C([C@H](N[C@@H](CCCCN)C(=O)N1[C@@H](CCC1)C(O)=O)C(O)=O)CC1=CC=CC=C1 RLAWWYSOJDYHDC-BZSNNMDCSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Degasification And Air Bubble Elimination (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000306739A JP2002113334A (ja) | 2000-10-05 | 2000-10-05 | 中空糸膜モジュール及び中空糸膜モジュールを用いた液体の処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000306739A JP2002113334A (ja) | 2000-10-05 | 2000-10-05 | 中空糸膜モジュール及び中空糸膜モジュールを用いた液体の処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002113334A true JP2002113334A (ja) | 2002-04-16 |
| JP2002113334A5 JP2002113334A5 (enrdf_load_stackoverflow) | 2007-10-25 |
Family
ID=18787376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000306739A Pending JP2002113334A (ja) | 2000-10-05 | 2000-10-05 | 中空糸膜モジュール及び中空糸膜モジュールを用いた液体の処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002113334A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007010794A1 (ja) * | 2005-07-19 | 2007-01-25 | Tokyo Ohka Kogyo Co., Ltd. | レジスト組成物の製造方法、ろ過装置、レジスト組成物の塗布装置およびレジスト組成物 |
| JP2009247977A (ja) * | 2008-04-04 | 2009-10-29 | Asahi Kasei Chemicals Corp | 膜濾過システム及び膜濾過システムの運転方法 |
| JP2014104383A (ja) * | 2012-11-26 | 2014-06-09 | Nok Corp | 中空糸膜モジュール |
| WO2015118607A1 (ja) * | 2014-02-04 | 2015-08-13 | Nok株式会社 | 中空糸膜モジュール |
| WO2016084933A1 (ja) * | 2014-11-28 | 2016-06-02 | Dic株式会社 | 中空糸脱気モジュール及びインクジェットプリンタ |
| WO2018180735A1 (ja) * | 2017-03-31 | 2018-10-04 | 富士フイルム株式会社 | 薬液の精製方法、薬液の製造方法、及び、薬液 |
| WO2023085101A1 (ja) * | 2021-11-09 | 2023-05-19 | Dic株式会社 | 自動分析装置および自動分析方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05247324A (ja) * | 1992-03-03 | 1993-09-24 | Nippon Zeon Co Ltd | 樹脂組成物及びそれからなる光学材料 |
| JPH0655044A (ja) * | 1992-08-03 | 1994-03-01 | Mitsubishi Kasei Corp | フィルターエレメント |
| JPH06170177A (ja) * | 1992-12-03 | 1994-06-21 | Daicel Chem Ind Ltd | 中空糸膜モジュール |
| JPH0751507A (ja) * | 1993-08-17 | 1995-02-28 | Kobe Steel Ltd | 濾過板 |
| JPH09187629A (ja) * | 1995-10-31 | 1997-07-22 | Dainippon Ink & Chem Inc | 半導体現像液用脱気膜モジュール及びその製法 |
-
2000
- 2000-10-05 JP JP2000306739A patent/JP2002113334A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05247324A (ja) * | 1992-03-03 | 1993-09-24 | Nippon Zeon Co Ltd | 樹脂組成物及びそれからなる光学材料 |
| JPH0655044A (ja) * | 1992-08-03 | 1994-03-01 | Mitsubishi Kasei Corp | フィルターエレメント |
| JPH06170177A (ja) * | 1992-12-03 | 1994-06-21 | Daicel Chem Ind Ltd | 中空糸膜モジュール |
| JPH0751507A (ja) * | 1993-08-17 | 1995-02-28 | Kobe Steel Ltd | 濾過板 |
| JPH09187629A (ja) * | 1995-10-31 | 1997-07-22 | Dainippon Ink & Chem Inc | 半導体現像液用脱気膜モジュール及びその製法 |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007010794A1 (ja) * | 2005-07-19 | 2007-01-25 | Tokyo Ohka Kogyo Co., Ltd. | レジスト組成物の製造方法、ろ過装置、レジスト組成物の塗布装置およびレジスト組成物 |
| JP2007025341A (ja) * | 2005-07-19 | 2007-02-01 | Tokyo Ohka Kogyo Co Ltd | レジスト組成物の製造方法、ろ過装置、レジスト組成物の塗布装置およびレジスト組成物 |
| KR100982151B1 (ko) * | 2005-07-19 | 2010-09-14 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물의 제조 방법, 여과 장치, 레지스트조성물의 도포 장치 및 레지스트 조성물 |
| JP2009247977A (ja) * | 2008-04-04 | 2009-10-29 | Asahi Kasei Chemicals Corp | 膜濾過システム及び膜濾過システムの運転方法 |
| JP2014104383A (ja) * | 2012-11-26 | 2014-06-09 | Nok Corp | 中空糸膜モジュール |
| WO2015118607A1 (ja) * | 2014-02-04 | 2015-08-13 | Nok株式会社 | 中空糸膜モジュール |
| WO2016084933A1 (ja) * | 2014-11-28 | 2016-06-02 | Dic株式会社 | 中空糸脱気モジュール及びインクジェットプリンタ |
| WO2018180735A1 (ja) * | 2017-03-31 | 2018-10-04 | 富士フイルム株式会社 | 薬液の精製方法、薬液の製造方法、及び、薬液 |
| JPWO2018180735A1 (ja) * | 2017-03-31 | 2020-01-23 | 富士フイルム株式会社 | 薬液の精製方法、薬液の製造方法、及び、薬液 |
| US11465073B2 (en) | 2017-03-31 | 2022-10-11 | Fujifilm Corporation | Chemical liquid purification method, chemical liquid manufacturing method, and chemical liquid |
| WO2023085101A1 (ja) * | 2021-11-09 | 2023-05-19 | Dic株式会社 | 自動分析装置および自動分析方法 |
| JPWO2023085101A1 (enrdf_load_stackoverflow) * | 2021-11-09 | 2023-05-19 |
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