JP2002043289A - プラズマ処理方法及び装置 - Google Patents

プラズマ処理方法及び装置

Info

Publication number
JP2002043289A
JP2002043289A JP2000222507A JP2000222507A JP2002043289A JP 2002043289 A JP2002043289 A JP 2002043289A JP 2000222507 A JP2000222507 A JP 2000222507A JP 2000222507 A JP2000222507 A JP 2000222507A JP 2002043289 A JP2002043289 A JP 2002043289A
Authority
JP
Japan
Prior art keywords
dielectric plate
vacuum vessel
plasma processing
gas
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000222507A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002043289A5 (enrdf_load_stackoverflow
Inventor
Mamoru Watanabe
衛 渡邉
Hideo Haraguchi
秀夫 原口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2000222507A priority Critical patent/JP2002043289A/ja
Publication of JP2002043289A publication Critical patent/JP2002043289A/ja
Publication of JP2002043289A5 publication Critical patent/JP2002043289A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
JP2000222507A 2000-07-24 2000-07-24 プラズマ処理方法及び装置 Pending JP2002043289A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000222507A JP2002043289A (ja) 2000-07-24 2000-07-24 プラズマ処理方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000222507A JP2002043289A (ja) 2000-07-24 2000-07-24 プラズマ処理方法及び装置

Publications (2)

Publication Number Publication Date
JP2002043289A true JP2002043289A (ja) 2002-02-08
JP2002043289A5 JP2002043289A5 (enrdf_load_stackoverflow) 2005-07-21

Family

ID=18716739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000222507A Pending JP2002043289A (ja) 2000-07-24 2000-07-24 プラズマ処理方法及び装置

Country Status (1)

Country Link
JP (1) JP2002043289A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007052711A1 (ja) * 2005-11-02 2007-05-10 Matsushita Electric Industrial Co., Ltd. プラズマ処理装置
JP2007150281A (ja) * 2005-11-02 2007-06-14 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2007165849A (ja) * 2005-11-15 2007-06-28 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2008515163A (ja) * 2004-09-30 2008-05-08 東京エレクトロン株式会社 表面波プラズマ処理システム及び使用方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008515163A (ja) * 2004-09-30 2008-05-08 東京エレクトロン株式会社 表面波プラズマ処理システム及び使用方法
WO2007052711A1 (ja) * 2005-11-02 2007-05-10 Matsushita Electric Industrial Co., Ltd. プラズマ処理装置
JP2007150281A (ja) * 2005-11-02 2007-06-14 Matsushita Electric Ind Co Ltd プラズマ処理装置
KR101242248B1 (ko) * 2005-11-02 2013-03-12 파나소닉 주식회사 플라즈마 처리 장치
JP2007165849A (ja) * 2005-11-15 2007-06-28 Matsushita Electric Ind Co Ltd プラズマ処理装置

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