JP2002036079A - 被研磨物の研磨方法及び研磨装置 - Google Patents
被研磨物の研磨方法及び研磨装置Info
- Publication number
- JP2002036079A JP2002036079A JP2000225441A JP2000225441A JP2002036079A JP 2002036079 A JP2002036079 A JP 2002036079A JP 2000225441 A JP2000225441 A JP 2000225441A JP 2000225441 A JP2000225441 A JP 2000225441A JP 2002036079 A JP2002036079 A JP 2002036079A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- polished
- holding
- workpiece
- surface side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 326
- 238000000034 method Methods 0.000 title claims abstract description 18
- 230000002093 peripheral effect Effects 0.000 description 57
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000002002 slurry Substances 0.000 description 9
- 239000012530 fluid Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000004745 nonwoven fabric Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/065—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of thin, brittle parts, e.g. semiconductors, wafers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000225441A JP2002036079A (ja) | 2000-07-26 | 2000-07-26 | 被研磨物の研磨方法及び研磨装置 |
| DE2001136281 DE10136281B4 (de) | 2000-07-26 | 2001-07-25 | Vorrichtung zum Polieren abgeschrägter Umfangsteile eines Wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000225441A JP2002036079A (ja) | 2000-07-26 | 2000-07-26 | 被研磨物の研磨方法及び研磨装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002036079A true JP2002036079A (ja) | 2002-02-05 |
| JP2002036079A5 JP2002036079A5 (https=) | 2005-02-03 |
Family
ID=18719212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000225441A Pending JP2002036079A (ja) | 2000-07-26 | 2000-07-26 | 被研磨物の研磨方法及び研磨装置 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2002036079A (https=) |
| DE (1) | DE10136281B4 (https=) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002049802A1 (fr) * | 2000-12-21 | 2002-06-27 | Nikon Corporation | Dispositif et procede de polissage, et procede et dispositif pour produire un dispositif a semiconducteurs |
| JP2002187050A (ja) * | 2000-12-21 | 2002-07-02 | Nikon Corp | 研磨装置、半導体ウェハの研磨方法、半導体デバイスの製造方法及び製造装置 |
| JP2002192446A (ja) * | 2000-12-25 | 2002-07-10 | Nikon Corp | 研磨装置、研磨方法及び半導体デバイスの製造方法 |
| JP2009297842A (ja) * | 2008-06-13 | 2009-12-24 | Bbs Kinmei:Kk | ワーク外周部の研磨装置および研磨方法 |
| CN115229602A (zh) * | 2022-09-22 | 2022-10-25 | 苏州恒嘉晶体材料有限公司 | 一种圆片倒角磨削机构及使用方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR0185234B1 (ko) * | 1991-11-28 | 1999-04-15 | 가부시키 가이샤 토쿄 세이미쯔 | 반도체 웨이퍼의 모떼기 방법 |
| JPH07205001A (ja) * | 1993-11-16 | 1995-08-08 | Tokyo Seimitsu Co Ltd | ウェーハ面取り機 |
| DE19809697C2 (de) * | 1998-03-06 | 1999-12-23 | Thuringia Netzsch Feinkeramik | Werkzeug zum Schleifen und Polieren rotationssymmetrischer Ränder hohler keramischer Gegenstände wie Tassen und dergl. |
-
2000
- 2000-07-26 JP JP2000225441A patent/JP2002036079A/ja active Pending
-
2001
- 2001-07-25 DE DE2001136281 patent/DE10136281B4/de not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002049802A1 (fr) * | 2000-12-21 | 2002-06-27 | Nikon Corporation | Dispositif et procede de polissage, et procede et dispositif pour produire un dispositif a semiconducteurs |
| JP2002187050A (ja) * | 2000-12-21 | 2002-07-02 | Nikon Corp | 研磨装置、半導体ウェハの研磨方法、半導体デバイスの製造方法及び製造装置 |
| JP2002192446A (ja) * | 2000-12-25 | 2002-07-10 | Nikon Corp | 研磨装置、研磨方法及び半導体デバイスの製造方法 |
| JP2009297842A (ja) * | 2008-06-13 | 2009-12-24 | Bbs Kinmei:Kk | ワーク外周部の研磨装置および研磨方法 |
| CN115229602A (zh) * | 2022-09-22 | 2022-10-25 | 苏州恒嘉晶体材料有限公司 | 一种圆片倒角磨削机构及使用方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE10136281A1 (de) | 2002-04-25 |
| DE10136281B4 (de) | 2007-06-28 |
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Legal Events
| Date | Code | Title | Description |
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| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040226 |
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