JP2002025983A5 - - Google Patents
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- Publication number
- JP2002025983A5 JP2002025983A5 JP2000203765A JP2000203765A JP2002025983A5 JP 2002025983 A5 JP2002025983 A5 JP 2002025983A5 JP 2000203765 A JP2000203765 A JP 2000203765A JP 2000203765 A JP2000203765 A JP 2000203765A JP 2002025983 A5 JP2002025983 A5 JP 2002025983A5
- Authority
- JP
- Japan
- Prior art keywords
- shield part
- etching chamber
- opening
- movable shield
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 description 19
- 239000000758 substrate Substances 0.000 description 16
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000203765A JP4719337B2 (ja) | 2000-07-05 | 2000-07-05 | 可動シールド機構を備えたエッチングチャンバー |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000203765A JP4719337B2 (ja) | 2000-07-05 | 2000-07-05 | 可動シールド機構を備えたエッチングチャンバー |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010047323A Division JP4918147B2 (ja) | 2010-03-04 | 2010-03-04 | エッチング方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002025983A JP2002025983A (ja) | 2002-01-25 |
| JP2002025983A5 true JP2002025983A5 (enExample) | 2007-07-12 |
| JP4719337B2 JP4719337B2 (ja) | 2011-07-06 |
Family
ID=18701133
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000203765A Expired - Lifetime JP4719337B2 (ja) | 2000-07-05 | 2000-07-05 | 可動シールド機構を備えたエッチングチャンバー |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4719337B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9184072B2 (en) * | 2007-07-27 | 2015-11-10 | Mattson Technology, Inc. | Advanced multi-workpiece processing chamber |
| US10319982B2 (en) | 2013-02-01 | 2019-06-11 | Encell Technology, Inc. | Coated iron electrode and method of making same |
| CN109314034B (zh) | 2016-06-15 | 2021-11-16 | 瑞士艾发科技 | 真空处理室及制造真空处理的板形基底的方法 |
| US12354847B2 (en) * | 2020-03-12 | 2025-07-08 | Applied Materials, Inc. | Methods and apparatus for conductance liners in semiconductor process chambers |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3210207B2 (ja) * | 1994-04-20 | 2001-09-17 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| JPH0820879A (ja) * | 1994-07-08 | 1996-01-23 | Nissin Electric Co Ltd | プラズマ処理装置 |
| JP3453223B2 (ja) * | 1994-08-19 | 2003-10-06 | 東京エレクトロン株式会社 | 処理装置 |
| JPH10107009A (ja) * | 1996-09-27 | 1998-04-24 | Nec Corp | ドライエッチング装置 |
| JPH11111679A (ja) * | 1997-10-07 | 1999-04-23 | Mitsui Chem Inc | 反応性イオンエッチング装置および反応性イオンエッチング方法 |
-
2000
- 2000-07-05 JP JP2000203765A patent/JP4719337B2/ja not_active Expired - Lifetime
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