JP4719337B2 - 可動シールド機構を備えたエッチングチャンバー - Google Patents

可動シールド機構を備えたエッチングチャンバー Download PDF

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Publication number
JP4719337B2
JP4719337B2 JP2000203765A JP2000203765A JP4719337B2 JP 4719337 B2 JP4719337 B2 JP 4719337B2 JP 2000203765 A JP2000203765 A JP 2000203765A JP 2000203765 A JP2000203765 A JP 2000203765A JP 4719337 B2 JP4719337 B2 JP 4719337B2
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Japan
Prior art keywords
shield part
etching
etching chamber
movable shield
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000203765A
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English (en)
Japanese (ja)
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JP2002025983A5 (enExample
JP2002025983A (ja
Inventor
大介 江口
和人 渡邊
俊明 小口
信行 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Tokyo Electron Ltd
Original Assignee
Canon Anelva Corp
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Anelva Corp, Tokyo Electron Ltd filed Critical Canon Anelva Corp
Priority to JP2000203765A priority Critical patent/JP4719337B2/ja
Publication of JP2002025983A publication Critical patent/JP2002025983A/ja
Publication of JP2002025983A5 publication Critical patent/JP2002025983A5/ja
Application granted granted Critical
Publication of JP4719337B2 publication Critical patent/JP4719337B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP2000203765A 2000-07-05 2000-07-05 可動シールド機構を備えたエッチングチャンバー Expired - Lifetime JP4719337B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000203765A JP4719337B2 (ja) 2000-07-05 2000-07-05 可動シールド機構を備えたエッチングチャンバー

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000203765A JP4719337B2 (ja) 2000-07-05 2000-07-05 可動シールド機構を備えたエッチングチャンバー

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010047323A Division JP4918147B2 (ja) 2010-03-04 2010-03-04 エッチング方法

Publications (3)

Publication Number Publication Date
JP2002025983A JP2002025983A (ja) 2002-01-25
JP2002025983A5 JP2002025983A5 (enExample) 2007-07-12
JP4719337B2 true JP4719337B2 (ja) 2011-07-06

Family

ID=18701133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000203765A Expired - Lifetime JP4719337B2 (ja) 2000-07-05 2000-07-05 可動シールド機構を備えたエッチングチャンバー

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JP (1) JP4719337B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9184072B2 (en) * 2007-07-27 2015-11-10 Mattson Technology, Inc. Advanced multi-workpiece processing chamber
US10319982B2 (en) 2013-02-01 2019-06-11 Encell Technology, Inc. Coated iron electrode and method of making same
CN109314034B (zh) 2016-06-15 2021-11-16 瑞士艾发科技 真空处理室及制造真空处理的板形基底的方法
US12354847B2 (en) 2020-03-12 2025-07-08 Applied Materials, Inc. Methods and apparatus for conductance liners in semiconductor process chambers

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3210207B2 (ja) * 1994-04-20 2001-09-17 東京エレクトロン株式会社 プラズマ処理装置
JPH0820879A (ja) * 1994-07-08 1996-01-23 Nissin Electric Co Ltd プラズマ処理装置
JP3453223B2 (ja) * 1994-08-19 2003-10-06 東京エレクトロン株式会社 処理装置
JPH10107009A (ja) * 1996-09-27 1998-04-24 Nec Corp ドライエッチング装置
JPH11111679A (ja) * 1997-10-07 1999-04-23 Mitsui Chem Inc 反応性イオンエッチング装置および反応性イオンエッチング方法

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Publication number Publication date
JP2002025983A (ja) 2002-01-25

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