JP2002001865A5 - - Google Patents
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- Publication number
- JP2002001865A5 JP2002001865A5 JP2000376151A JP2000376151A JP2002001865A5 JP 2002001865 A5 JP2002001865 A5 JP 2002001865A5 JP 2000376151 A JP2000376151 A JP 2000376151A JP 2000376151 A JP2000376151 A JP 2000376151A JP 2002001865 A5 JP2002001865 A5 JP 2002001865A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- adhesive
- yttrium compound
- stud pin
- compound film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000376151A JP4540221B2 (ja) | 2000-04-21 | 2000-12-11 | 積層体、耐蝕性部材および耐ハロゲンガスプラズマ用部材 |
TW90108412A TW503449B (en) | 2000-04-18 | 2001-04-09 | Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members |
US09/835,857 US6783875B2 (en) | 2000-04-18 | 2001-04-16 | Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members |
EP20070017724 EP1892318B1 (en) | 2000-04-18 | 2001-04-17 | Halogen gas plasma-resistive members, laminates, and corrosion-resistant members |
EP20010303504 EP1158072B1 (en) | 2000-04-18 | 2001-04-17 | Halogen gas plasma-resistive member and method for producing the same |
KR10-2001-0020358A KR100429058B1 (ko) | 2000-04-18 | 2001-04-17 | 내할로겐 가스 플라즈마용 부재 및 그 제조 방법과,적층체, 내식성 부재 및 내할로겐 가스 플라즈마용 부재 |
DE60137885T DE60137885D1 (de) | 2000-04-18 | 2001-04-17 | Halogenplasma beständiger Teil und Herstellungsverfahren dafür |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-121112 | 2000-04-21 | ||
JP2000121112 | 2000-04-21 | ||
JP2000376151A JP4540221B2 (ja) | 2000-04-21 | 2000-12-11 | 積層体、耐蝕性部材および耐ハロゲンガスプラズマ用部材 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002001865A JP2002001865A (ja) | 2002-01-08 |
JP2002001865A5 true JP2002001865A5 (ko) | 2006-09-14 |
JP4540221B2 JP4540221B2 (ja) | 2010-09-08 |
Family
ID=26590563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000376151A Expired - Lifetime JP4540221B2 (ja) | 2000-04-18 | 2000-12-11 | 積層体、耐蝕性部材および耐ハロゲンガスプラズマ用部材 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4540221B2 (ko) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4651166B2 (ja) * | 2000-06-30 | 2011-03-16 | 京セラ株式会社 | 耐食性部材 |
JP2002356387A (ja) * | 2001-03-30 | 2002-12-13 | Toshiba Ceramics Co Ltd | 耐プラズマ性部材 |
KR100443772B1 (ko) * | 2002-01-16 | 2004-08-09 | 삼성전자주식회사 | 코팅 처리된 기재 |
US7026009B2 (en) * | 2002-03-27 | 2006-04-11 | Applied Materials, Inc. | Evaluation of chamber components having textured coatings |
JP2004162147A (ja) * | 2002-11-15 | 2004-06-10 | Plasma Giken Kogyo Kk | 溶射被膜を有する窒化アルミニウム焼結体 |
US7932202B2 (en) * | 2003-07-29 | 2011-04-26 | Kyocera Corporation | Y2O3 sintered body and corrosion resistant member for semiconductor/liquid crystal producing apparatus |
US7220497B2 (en) * | 2003-12-18 | 2007-05-22 | Lam Research Corporation | Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
JP4991093B2 (ja) * | 2004-03-12 | 2012-08-01 | 京セラ株式会社 | 焼成用部材およびそれを用いた焼結体の製造方法 |
JP4780932B2 (ja) * | 2004-05-25 | 2011-09-28 | 京セラ株式会社 | 耐食性部材とその製造方法および半導体・液晶製造装置用部材 |
JP5089874B2 (ja) * | 2005-09-12 | 2012-12-05 | トーカロ株式会社 | プラズマ処理装置用部材およびその製造方法 |
US8097105B2 (en) * | 2007-01-11 | 2012-01-17 | Lam Research Corporation | Extending lifetime of yttrium oxide as a plasma chamber material |
JP2008205415A (ja) * | 2007-02-16 | 2008-09-04 | Creative Technology:Kk | 静電チャック |
JP5274508B2 (ja) * | 2010-04-26 | 2013-08-28 | 京セラ株式会社 | 耐食性部材とその製造方法および半導体・液晶製造装置用部材 |
WO2013118354A1 (ja) | 2012-02-09 | 2013-08-15 | トーカロ株式会社 | フッ化物溶射皮膜の形成方法およびフッ化物溶射皮膜被覆部材 |
US9212099B2 (en) * | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
US9865434B2 (en) * | 2013-06-05 | 2018-01-09 | Applied Materials, Inc. | Rare-earth oxide based erosion resistant coatings for semiconductor application |
EP3377318A1 (en) | 2015-11-16 | 2018-09-26 | Coorstek Inc. | Corrosion-resistant components and methods of making |
US11572617B2 (en) * | 2016-05-03 | 2023-02-07 | Applied Materials, Inc. | Protective metal oxy-fluoride coatings |
WO2018093414A1 (en) * | 2016-11-16 | 2018-05-24 | Coorstek, Inc. | Corrosion-resistant components and methods of making |
TWI714965B (zh) * | 2018-02-15 | 2021-01-01 | 日商京瓷股份有限公司 | 電漿處理裝置用構件及具備其之電漿處理裝置 |
TWI715004B (zh) * | 2018-04-03 | 2021-01-01 | 日商京瓷股份有限公司 | 電漿處理裝置用構件及具備其之電漿處理裝置以及電漿處理裝置用構件之製造方法 |
KR102227909B1 (ko) | 2019-07-16 | 2021-03-16 | 주식회사 유진테크 | 배치식 기판처리장치 및 그 운용방법 |
TWI829316B (zh) * | 2021-08-31 | 2024-01-11 | 日商京瓷股份有限公司 | 耐電漿積層體、其製造方法及電漿處理裝置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6294333A (ja) * | 1985-10-21 | 1987-04-30 | 科学技術庁金属材料技術研究所長 | 金属強化型セラミツクス複合材料及びその製造方法 |
JPS62207774A (ja) * | 1986-03-05 | 1987-09-12 | 三菱重工業株式会社 | セラミツクスの接合法 |
JP2816439B2 (ja) * | 1989-02-20 | 1998-10-27 | スズキ株式会社 | 傾斜機能材料の製造方法 |
JPH0387357A (ja) * | 1989-06-13 | 1991-04-12 | Nippon Mining Co Ltd | 薄膜形成装置 |
JPH08337487A (ja) * | 1995-06-13 | 1996-12-24 | Fujiki Kosan Kk | セラミック皮膜形成方法及びその方法を用いて作製したセラミック部材 |
JPH104083A (ja) * | 1996-06-17 | 1998-01-06 | Kyocera Corp | 半導体製造用耐食性部材 |
JP3362113B2 (ja) * | 1997-07-15 | 2003-01-07 | 日本碍子株式会社 | 耐蝕性部材、ウエハー設置部材および耐蝕性部材の製造方法 |
JP4370624B2 (ja) * | 1997-09-22 | 2009-11-25 | 嘉信 本橋 | アルミナ部材の接合方法 |
JP4161423B2 (ja) * | 1997-10-30 | 2008-10-08 | 住友電気工業株式会社 | 窒化アルミニウム焼結体及びそのメタライズ基板 |
JP3202670B2 (ja) * | 1997-11-07 | 2001-08-27 | 株式会社東芝 | 積層セラミックスの製造方法 |
-
2000
- 2000-12-11 JP JP2000376151A patent/JP4540221B2/ja not_active Expired - Lifetime
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