JP2002001240A - スピン処理装置 - Google Patents

スピン処理装置

Info

Publication number
JP2002001240A
JP2002001240A JP2000180193A JP2000180193A JP2002001240A JP 2002001240 A JP2002001240 A JP 2002001240A JP 2000180193 A JP2000180193 A JP 2000180193A JP 2000180193 A JP2000180193 A JP 2000180193A JP 2002001240 A JP2002001240 A JP 2002001240A
Authority
JP
Japan
Prior art keywords
substrate
spin
liquid
rotary table
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000180193A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002001240A5 (enExample
Inventor
Yasushi Chin
康 陳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP2000180193A priority Critical patent/JP2002001240A/ja
Publication of JP2002001240A publication Critical patent/JP2002001240A/ja
Publication of JP2002001240A5 publication Critical patent/JP2002001240A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2000180193A 2000-06-15 2000-06-15 スピン処理装置 Pending JP2002001240A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000180193A JP2002001240A (ja) 2000-06-15 2000-06-15 スピン処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000180193A JP2002001240A (ja) 2000-06-15 2000-06-15 スピン処理装置

Publications (2)

Publication Number Publication Date
JP2002001240A true JP2002001240A (ja) 2002-01-08
JP2002001240A5 JP2002001240A5 (enExample) 2007-08-16

Family

ID=18681339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000180193A Pending JP2002001240A (ja) 2000-06-15 2000-06-15 スピン処理装置

Country Status (1)

Country Link
JP (1) JP2002001240A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101206923B1 (ko) 2011-03-29 2012-11-30 주식회사 엘지실트론 매엽식 웨이퍼 세정 장치
JP2014027201A (ja) * 2012-07-30 2014-02-06 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2014175532A (ja) * 2013-03-11 2014-09-22 Tokyo Electron Ltd 基板処理装置及び基板処理方法
WO2017135542A1 (ko) * 2016-02-05 2017-08-10 (주)이오테크닉스 웨이퍼 세정 장치
CN110522272A (zh) * 2019-07-12 2019-12-03 永康市莱晶科技有限公司 一种新型多功能紫外消毒杀菌功能的杯盖
CN115780363A (zh) * 2022-11-25 2023-03-14 江化微(镇江)电子材料有限公司 一种电子化学品内衬设备的清洗装置及清洗方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04269820A (ja) * 1991-02-26 1992-09-25 Hitachi Ltd スピン塗布装置及びスピン塗布方法
JPH05259060A (ja) * 1992-03-16 1993-10-08 Tokyo Electron Ltd 塗布装置
JPH06126264A (ja) * 1992-10-19 1994-05-10 Shimada Phys & Chem Ind Co Ltd スピン洗浄乾燥装置
JPH06313603A (ja) * 1993-02-17 1994-11-08 Mitsubishi Electric Corp 送風機
JPH1133467A (ja) * 1997-07-22 1999-02-09 Dainippon Screen Mfg Co Ltd 飛散防止カップの洗浄方法及び塗布装置
JPH11329960A (ja) * 1998-02-23 1999-11-30 Toshiba Corp 基板処理方法及び基板処理装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04269820A (ja) * 1991-02-26 1992-09-25 Hitachi Ltd スピン塗布装置及びスピン塗布方法
JPH05259060A (ja) * 1992-03-16 1993-10-08 Tokyo Electron Ltd 塗布装置
JPH06126264A (ja) * 1992-10-19 1994-05-10 Shimada Phys & Chem Ind Co Ltd スピン洗浄乾燥装置
JPH06313603A (ja) * 1993-02-17 1994-11-08 Mitsubishi Electric Corp 送風機
JPH1133467A (ja) * 1997-07-22 1999-02-09 Dainippon Screen Mfg Co Ltd 飛散防止カップの洗浄方法及び塗布装置
JPH11329960A (ja) * 1998-02-23 1999-11-30 Toshiba Corp 基板処理方法及び基板処理装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101206923B1 (ko) 2011-03-29 2012-11-30 주식회사 엘지실트론 매엽식 웨이퍼 세정 장치
JP2014027201A (ja) * 2012-07-30 2014-02-06 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2014175532A (ja) * 2013-03-11 2014-09-22 Tokyo Electron Ltd 基板処理装置及び基板処理方法
WO2017135542A1 (ko) * 2016-02-05 2017-08-10 (주)이오테크닉스 웨이퍼 세정 장치
CN110522272A (zh) * 2019-07-12 2019-12-03 永康市莱晶科技有限公司 一种新型多功能紫外消毒杀菌功能的杯盖
CN110522272B (zh) * 2019-07-12 2020-11-20 永康市莱晶科技有限公司 一种新型多功能紫外消毒杀菌功能的杯盖
CN115780363A (zh) * 2022-11-25 2023-03-14 江化微(镇江)电子材料有限公司 一种电子化学品内衬设备的清洗装置及清洗方法
CN115780363B (zh) * 2022-11-25 2023-11-21 江化微(镇江)电子材料有限公司 一种电子化学品内衬设备的清洗装置及清洗方法

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