JP2001516139A - 電子光学系の三次球面収差の補正時に一次、二次および三次光軸の像の変形を除去する方法 - Google Patents

電子光学系の三次球面収差の補正時に一次、二次および三次光軸の像の変形を除去する方法

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Publication number
JP2001516139A
JP2001516139A JP2000511180A JP2000511180A JP2001516139A JP 2001516139 A JP2001516139 A JP 2001516139A JP 2000511180 A JP2000511180 A JP 2000511180A JP 2000511180 A JP2000511180 A JP 2000511180A JP 2001516139 A JP2001516139 A JP 2001516139A
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JP
Japan
Prior art keywords
optical axis
image
deformation
tertiary
hexapole
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JP2000511180A
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English (en)
Japanese (ja)
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JP2001516139A5 (enExample
Inventor
マキシミリアン ハイダー
ステハン ウヘレマン
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CEOS Corrected Electron Optical Systems GmbH
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CEOS Corrected Electron Optical Systems GmbH
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Application filed by CEOS Corrected Electron Optical Systems GmbH filed Critical CEOS Corrected Electron Optical Systems GmbH
Publication of JP2001516139A publication Critical patent/JP2001516139A/ja
Publication of JP2001516139A5 publication Critical patent/JP2001516139A5/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2000511180A 1997-09-08 1998-08-29 電子光学系の三次球面収差の補正時に一次、二次および三次光軸の像の変形を除去する方法 Pending JP2001516139A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19739290.3 1997-09-08
DE19739290A DE19739290A1 (de) 1997-09-08 1997-09-08 Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen
PCT/DE1998/002596 WO1999013490A1 (de) 1997-09-08 1998-08-29 Verfahren zur beseitigung axialer bildfehler erster, zweiter und dritter ordnung bei korrektur des öffnungsfehlers dritter ordnung in elektronenoptischen systemen

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007182485A Division JP2007266008A (ja) 1997-09-08 2007-07-11 電子光学系の像収差の補正方法

Publications (2)

Publication Number Publication Date
JP2001516139A true JP2001516139A (ja) 2001-09-25
JP2001516139A5 JP2001516139A5 (enExample) 2007-08-30

Family

ID=7841589

Family Applications (2)

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JP2000511180A Pending JP2001516139A (ja) 1997-09-08 1998-08-29 電子光学系の三次球面収差の補正時に一次、二次および三次光軸の像の変形を除去する方法
JP2007182485A Pending JP2007266008A (ja) 1997-09-08 2007-07-11 電子光学系の像収差の補正方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2007182485A Pending JP2007266008A (ja) 1997-09-08 2007-07-11 電子光学系の像収差の補正方法

Country Status (5)

Country Link
US (1) US6646267B1 (enExample)
EP (1) EP1012866B1 (enExample)
JP (2) JP2001516139A (enExample)
DE (2) DE19739290A1 (enExample)
WO (1) WO1999013490A1 (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003520427A (ja) * 2000-01-14 2003-07-02 レオ イレクトロネンミクロスコピィ ゲーエムベーハー ３次収差を除く電子光学補正器
JP2003521801A (ja) * 2000-01-26 2003-07-15 ツェーエーオーエス コレクテッド エレクトロン オプチカル システムズ ゲーエムベーハー 幾何光学収差を決定する方法
JP2006147381A (ja) * 2004-11-22 2006-06-08 Jeol Ltd 荷電粒子光学装置及び収差補正方法
JP2008059881A (ja) * 2006-08-31 2008-03-13 Jeol Ltd 収差補正方法および電子線装置
JP2008124001A (ja) * 2006-10-20 2008-05-29 Jeol Ltd 荷電粒子線装置
JP2009516338A (ja) * 2006-04-15 2009-04-16 ツェーエーオーエス コレクテッド エレクトロン オプチカル システムズ ゲーエムベーハー 粒子光学補正器
US7598496B2 (en) 2006-10-20 2009-10-06 Jeol Ltd. Charged-particle beam system
JP2010114068A (ja) * 2008-10-06 2010-05-20 Jeol Ltd 荷電粒子線装置の色収差補正装置及びその補正方法
JP2012234755A (ja) * 2011-05-09 2012-11-29 Hitachi High-Technologies Corp ３次寄生収差の補正方法および荷電粒子線装置

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10262340B4 (de) * 2001-07-13 2012-02-02 Jeol Ltd. Korrektureinrichtung zur Korrektur der sphärischen Aberration
DE10136190A1 (de) * 2001-07-25 2003-02-06 Ceos Gmbh Schlitzlinsenanordnung für Teilchenstrahlen
JP3968334B2 (ja) 2002-09-11 2007-08-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び荷電粒子線照射方法
JP4328192B2 (ja) * 2003-12-12 2009-09-09 日本電子株式会社 荷電粒子光学系における多極場発生装置および収差補正装置
DE102007058443B4 (de) * 2007-12-05 2010-05-06 Ceos Corrected Electron Optical Systems Gmbh Korrektor für axialen und außeraxialen Strahlengang und TEM damit
US7659505B2 (en) 2008-02-01 2010-02-09 Ionics Mass Spectrometry Group Inc. Ion source vessel and methods
DE102009052392A1 (de) * 2009-11-09 2011-12-15 Carl Zeiss Nts Gmbh SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens
JP5469246B2 (ja) 2010-07-05 2014-04-16 株式会社日立ハイテクノロジーズ 走査透過電子顕微鏡
JP5758728B2 (ja) 2011-07-26 2015-08-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9275817B2 (en) 2012-04-09 2016-03-01 Frederick Wight Martin Particle-beam column corrected for both chromatic and spherical aberration
EP2722868B2 (en) * 2012-10-16 2025-03-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Octopole device and method for spot size improvement
JP6224717B2 (ja) 2013-09-30 2017-11-01 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
JP7017985B2 (ja) 2018-06-05 2022-02-09 株式会社日立製作所 システム及び処理条件の決定方法
CN112098438B (zh) * 2020-07-23 2021-11-19 西安交通大学 一种高分辨大扫描场系统的二阶像差补偿方法
JP2023107653A (ja) 2022-01-24 2023-08-03 富士フイルムビジネスイノベーション株式会社 画像形成装置
US20250299903A1 (en) * 2022-06-27 2025-09-25 Hitachi High-Tech Corporation Aberration Correction Device and Aberration Correction Method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414474A (en) * 1982-02-17 1983-11-08 University Patents, Inc. Corrector for axial aberrations in electron optic instruments
JPH03295140A (ja) * 1990-04-12 1991-12-26 Philips Gloeilampenfab:Nv 高解像度荷電粒子線装置用の補正装置
JPH07220669A (ja) * 1994-01-31 1995-08-18 Jeol Ltd 非点・入射軸補正装置を備えた電子顕微鏡

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69733873T2 (de) * 1996-05-21 2006-04-06 Fei Co., Hillsboro Vorrichtung zur korrektur von linsenfehlern in teilchen-optischer geräte
US5659083A (en) * 1996-05-30 1997-08-19 Sanofi Process of preparing 2,2'-(1-methyl-1,2-ethanediylidene) bis[hydrazinecarboximidamide]
EP0960429A1 (en) * 1997-12-11 1999-12-01 Philips Electron Optics B.V. Correction device for correcting the spherical aberration in particle-optical apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414474A (en) * 1982-02-17 1983-11-08 University Patents, Inc. Corrector for axial aberrations in electron optic instruments
JPH03295140A (ja) * 1990-04-12 1991-12-26 Philips Gloeilampenfab:Nv 高解像度荷電粒子線装置用の補正装置
JPH07220669A (ja) * 1994-01-31 1995-08-18 Jeol Ltd 非点・入射軸補正装置を備えた電子顕微鏡

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
F.ZEMLIN, ET.AL.: "Coma-free alignment of high resolution electron microscopes with the aid of optical diffractograms", ULTRAMICROSCOPY, vol. 3, JPNX006020468, 1978, pages 49 - 60, XP024740457, ISSN: 0000735253, DOI: 10.1016/S0304-3991(78)80006-0 *
J.ZACH AND M.HAIDER: "Aberration correction in a low voltage SEM by a multipole corrector", NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, vol. 363, JPNX006020471, 1995, pages 316 - 325, ISSN: 0000735256 *
O.L.KRIVANEK, ET.AL.: "Effect of three-fold astigmatism on high resolution electron micrographs", ULTRAMICROSCOPY, vol. 60, JPNX006020470, 1995, pages 103 - 113, ISSN: 0000735255 *
裏 克己: "5.11 軸非対称性による寄生収差、 15.4 高次収差と寄生収差の計算", 電子・イオンビーム光学, JPNX006020469, 1994, JP, pages 77 - 228, ISSN: 0000735254 *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003520427A (ja) * 2000-01-14 2003-07-02 レオ イレクトロネンミクロスコピィ ゲーエムベーハー ３次収差を除く電子光学補正器
JP2003521801A (ja) * 2000-01-26 2003-07-15 ツェーエーオーエス コレクテッド エレクトロン オプチカル システムズ ゲーエムベーハー 幾何光学収差を決定する方法
JP2006147381A (ja) * 2004-11-22 2006-06-08 Jeol Ltd 荷電粒子光学装置及び収差補正方法
JP2009516338A (ja) * 2006-04-15 2009-04-16 ツェーエーオーエス コレクテッド エレクトロン オプチカル システムズ ゲーエムベーハー 粒子光学補正器
JP2008059881A (ja) * 2006-08-31 2008-03-13 Jeol Ltd 収差補正方法および電子線装置
JP2008124001A (ja) * 2006-10-20 2008-05-29 Jeol Ltd 荷電粒子線装置
US7598496B2 (en) 2006-10-20 2009-10-06 Jeol Ltd. Charged-particle beam system
JP2010114068A (ja) * 2008-10-06 2010-05-20 Jeol Ltd 荷電粒子線装置の色収差補正装置及びその補正方法
JP2012234755A (ja) * 2011-05-09 2012-11-29 Hitachi High-Technologies Corp ３次寄生収差の補正方法および荷電粒子線装置

Also Published As

Publication number Publication date
DE59814013D1 (de) 2007-07-05
EP1012866B1 (de) 2007-05-23
EP1012866A1 (de) 2000-06-28
WO1999013490A1 (de) 1999-03-18
JP2007266008A (ja) 2007-10-11
DE19739290A1 (de) 1999-03-11
US6646267B1 (en) 2003-11-11

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