JP2001516139A5 - - Google Patents

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Publication number
JP2001516139A5
JP2001516139A5 JP2000511180A JP2000511180A JP2001516139A5 JP 2001516139 A5 JP2001516139 A5 JP 2001516139A5 JP 2000511180 A JP2000511180 A JP 2000511180A JP 2000511180 A JP2000511180 A JP 2000511180A JP 2001516139 A5 JP2001516139 A5 JP 2001516139A5
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JP
Japan
Prior art keywords
quadrupole
axis
optical axis
image
aberration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000511180A
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English (en)
Japanese (ja)
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JP2001516139A (ja
Filing date
Publication date
Priority claimed from DE19739290A external-priority patent/DE19739290A1/de
Application filed filed Critical
Publication of JP2001516139A publication Critical patent/JP2001516139A/ja
Publication of JP2001516139A5 publication Critical patent/JP2001516139A5/ja
Pending legal-status Critical Current

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JP2000511180A 1997-09-08 1998-08-29 電子光学系の三次球面収差の補正時に一次、二次および三次光軸の像の変形を除去する方法 Pending JP2001516139A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19739290A DE19739290A1 (de) 1997-09-08 1997-09-08 Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen
DE19739290.3 1997-09-08
PCT/DE1998/002596 WO1999013490A1 (de) 1997-09-08 1998-08-29 Verfahren zur beseitigung axialer bildfehler erster, zweiter und dritter ordnung bei korrektur des öffnungsfehlers dritter ordnung in elektronenoptischen systemen

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007182485A Division JP2007266008A (ja) 1997-09-08 2007-07-11 電子光学系の像収差の補正方法

Publications (2)

Publication Number Publication Date
JP2001516139A JP2001516139A (ja) 2001-09-25
JP2001516139A5 true JP2001516139A5 (enExample) 2007-08-30

Family

ID=7841589

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000511180A Pending JP2001516139A (ja) 1997-09-08 1998-08-29 電子光学系の三次球面収差の補正時に一次、二次および三次光軸の像の変形を除去する方法
JP2007182485A Pending JP2007266008A (ja) 1997-09-08 2007-07-11 電子光学系の像収差の補正方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2007182485A Pending JP2007266008A (ja) 1997-09-08 2007-07-11 電子光学系の像収差の補正方法

Country Status (5)

Country Link
US (1) US6646267B1 (enExample)
EP (1) EP1012866B1 (enExample)
JP (2) JP2001516139A (enExample)
DE (2) DE19739290A1 (enExample)
WO (1) WO1999013490A1 (enExample)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10001277A1 (de) * 2000-01-14 2001-07-19 Harald Rose Elektronenoptischer Korrektor zur Beseitigung der Bildfehler dritter Ordnung
DE10003127A1 (de) * 2000-01-26 2001-08-02 Ceos Gmbh Verfahren zur Ermittlung geometrisch optischer Abbildungsfehler
DE10262340B4 (de) * 2001-07-13 2012-02-02 Jeol Ltd. Korrektureinrichtung zur Korrektur der sphärischen Aberration
DE10136190A1 (de) * 2001-07-25 2003-02-06 Ceos Gmbh Schlitzlinsenanordnung für Teilchenstrahlen
JP3968334B2 (ja) * 2002-09-11 2007-08-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び荷電粒子線照射方法
JP4328192B2 (ja) * 2003-12-12 2009-09-09 日本電子株式会社 荷電粒子光学系における多極場発生装置および収差補正装置
JP4607558B2 (ja) * 2004-11-22 2011-01-05 日本電子株式会社 荷電粒子光学装置及び収差補正方法
DE102006017686A1 (de) * 2006-04-15 2007-10-18 Ceos Corrected Electron Optical Systems Gmbh Elektronenoptischer Korrektor für aplanatische Abbildungssysteme
JP4851268B2 (ja) 2006-08-31 2012-01-11 日本電子株式会社 収差補正方法および電子線装置
JP4922883B2 (ja) * 2006-10-20 2012-04-25 日本電子株式会社 荷電粒子線装置
EP1914786A3 (en) * 2006-10-20 2010-08-04 JEOL Ltd. Charged particle beam system
DE102007058443B4 (de) * 2007-12-05 2010-05-06 Ceos Corrected Electron Optical Systems Gmbh Korrektor für axialen und außeraxialen Strahlengang und TEM damit
US7659505B2 (en) * 2008-02-01 2010-02-09 Ionics Mass Spectrometry Group Inc. Ion source vessel and methods
JP5623719B2 (ja) * 2008-10-06 2014-11-12 日本電子株式会社 荷電粒子線装置の色収差補正装置及びその補正方法
DE102009052392A1 (de) * 2009-11-09 2011-12-15 Carl Zeiss Nts Gmbh SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens
EP2592641A4 (en) 2010-07-05 2016-02-17 Hitachi High Tech Corp TRANSMISSIONS scanning electron microscope
JP5743698B2 (ja) * 2011-05-09 2015-07-01 株式会社日立ハイテクノロジーズ ３次寄生収差の補正方法および荷電粒子線装置
JP5758728B2 (ja) 2011-07-26 2015-08-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US9275817B2 (en) 2012-04-09 2016-03-01 Frederick Wight Martin Particle-beam column corrected for both chromatic and spherical aberration
EP2722868B2 (en) 2012-10-16 2025-03-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Octopole device and method for spot size improvement
WO2015045468A1 (ja) 2013-09-30 2015-04-02 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
JP7017985B2 (ja) 2018-06-05 2022-02-09 株式会社日立製作所 システム及び処理条件の決定方法
CN112098438B (zh) * 2020-07-23 2021-11-19 西安交通大学 一种高分辨大扫描场系统的二阶像差补偿方法
JP2023107653A (ja) 2022-01-24 2023-08-03 富士フイルムビジネスイノベーション株式会社 画像形成装置
WO2024003987A1 (ja) * 2022-06-27 2024-01-04 株式会社日立ハイテク 収差補正装置および収差補正方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414474A (en) * 1982-02-17 1983-11-08 University Patents, Inc. Corrector for axial aberrations in electron optic instruments
EP0451370B1 (en) * 1990-04-12 1996-03-27 Koninklijke Philips Electronics N.V. Correction system for a charged-particle beam apparatus
JPH07220669A (ja) * 1994-01-31 1995-08-18 Jeol Ltd 非点・入射軸補正装置を備えた電子顕微鏡
WO1997044811A1 (en) * 1996-05-21 1997-11-27 Philips Electronics N.V. Correction device for the correction of lens aberrations in particle-optical apparatus
US5659083A (en) * 1996-05-30 1997-08-19 Sanofi Process of preparing 2,2'-(1-methyl-1,2-ethanediylidene) bis[hydrazinecarboximidamide]
JP2001511303A (ja) * 1997-12-11 2001-08-07 フィリップス エレクトロン オプティクス ビー ヴィ 粒子−光学装置における球面収差補正用の補正デバイス

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