JP2001509910A - 光学基材からの反射を抑制するためのコーティング、方法および装置 - Google Patents
光学基材からの反射を抑制するためのコーティング、方法および装置Info
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/68—Control of cameras or camera modules for stable pick-up of the scene, e.g. compensating for camera body vibrations
- H04N23/681—Motion detection
- H04N23/6812—Motion detection based on additional sensors, e.g. acceleration sensors
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/68—Control of cameras or camera modules for stable pick-up of the scene, e.g. compensating for camera body vibrations
- H04N23/681—Motion detection
- H04N23/6815—Motion detection by distinguishing pan or tilt from motion
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/68—Control of cameras or camera modules for stable pick-up of the scene, e.g. compensating for camera body vibrations
- H04N23/682—Vibration or motion blur correction
- H04N23/684—Vibration or motion blur correction performed by controlling the image sensor readout, e.g. by controlling the integration time
- H04N23/6845—Vibration or motion blur correction performed by controlling the image sensor readout, e.g. by controlling the integration time by combination of a plurality of images sequentially taken
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/14—Picture signal circuitry for video frequency region
- H04N5/144—Movement detection
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/30—Transforming light or analogous information into electric information
- H04N5/33—Transforming infrared radiation
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- C03C2217/00—Coatings on glass
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- C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
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- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
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- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
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Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.平均知覚反射率FARを示す透明もしくは半透明のコーティングされた製品 であって、 (a)コーティングの前に、平均知覚反射率F0を示す光学基材、および、 (b)光学基材の少なくとも一部をコーティングしている、抗反射性材料の1 層以上の層であって、各層がFARをF0の1/2以下とするような光学厚さであ る層、 を含む、製品。 2.光学基材がメガネレンズである、請求項1記載の製品。 3.メガネレンズはレンズ表面の片側もしくは両側および/またはその縁の少 なくとも一部が抗反射性材料によりコーティングされている、請求項2記載の製 品。 4.光学基材は窓である、請求項1記載の製品。 5.光学基材はテレビスクリーンまたはコンピュータモニターである、請求項 1記載の製品。 6.抗反射性材料のうちの少なくとも1層がフルオロカーボン膜を含む、請求 項1記載のコーティングされた製品。 7.フルオロカーボン膜は過フッ素化有機化合物のプラズマ付着生成物である 、請求項6記載の製品。 8.過フッ素化有機化合物はペルフルオロ脂肪族もしくはペルフルオロ脂環式 化合物である、請求項7記載の製品。 9.過フッ素化有機化合物はペルフルオロシクロブタン、ヘキサフルオロエタ ン、テトラフルオロエチレン、ペルフルオロプロペンおよびそれらの混合物から なる群より選ばれたものである、請求項8記載の製品。 10.フルオロカーボン膜はポリテトラフルオロエチレンを含む、請求項6記 載の製品。 11.抗反射性材料の少なくとも1層は有機もしくは有機珪素膜を含む、請求 項1記載のコーティングされた製品。 12.抗反射性材料のうちの少なくとも1層は、S1(CH3)4、HSi(C H3)3、チオフェン、フラン、ベンゼン、Ti(OC2H5)4、Ti(OC3H7 )4、Ti(N(C2H5)2)4および過フッ素化有機化合物からなる群より選ば れた少なくとも1種の前駆体のプラズマ改良化学蒸着の生成物を含む、請求項1 記載のコーティングされた製品。 13.抗反射性材料の各層は約5nmより厚く、約1ミクロンより薄い物理的 厚さである、請求項1記載の製品。 14.光学基材および/または反射性材料層の上に付着された光学的に薄い金 属層をさらに含む、請求項1記載の製品。 15.疎水性材料の層をさらに含む、請求項1記載の製品。 16.約1ミクロンより薄い物理的厚さの、少なくとも1種のポリマーフルオ ロカーボンの層を含む、光学基材上の抗反射性膜。 17.前記層は過フッ素化有機化合物のプラズマ付着生成物を含む、請求項1 6記載の膜。 18.過フッ素化有機化合物は、ペルフルオロシクロブタン、テトラフルオロ エチレン、ヘキサフルオロエタン、ペルフルオロプロペンおよびそれらの混合物 からなる群より選ばれたものである、請求項17記載の膜。 19.第二の抗反射性材料の層をさらに含む、請求項16記載の膜。 20.第二の材料は、Si(OC2H5)4、Si(CH3)4、HSi(CH3)3 、チオフェン、フラン、ベンゼン、Ti(O C2H5)4、Ti(OC3H7)4、Ti(N(C2H5)2)4および過フッ素化有機 化合物からなる群より選ばれた少なくとも1種の化合物のプラズマ付着生成物で ある、請求項19記載の膜。 21.抗反射性材料の1層以上の追加の層をさらに含む、請求項19記載の膜 。 22.光学基材を受け入れるためのリアクターチャンバー、 リアクターチャンバーと接続されており、そしてリアクターチャンバー中にプ ラズマを導入するようになっているプラズマジェネレーター、および、 抗反射性膜の膜厚さを制御するようになっている、リアクターチャンバー付近 にある光学モニター、 を含む、光学基材上に抗反射性膜を付着させるための装置。 23.プラズマジェネレーターのインレットに操作可能に接続された流量制御 バルブ、および、 リアクターチャンバー中の圧力を制御するための圧力制御バルブ、 をさらに含む、請求項22記載の装置。 24.選択された入射角において、選択された波長もしくはバンド幅の偏光光 線を基材に送るための偏光エミッター、 基材から送られる反射された部分の偏光光線の強度を測定するための光ディテ クター、および、 光ディテクター、1つ以上の流量制御バルブ、圧力制御バルブおよびパワーサ プライに接続されており、光ディテクターにより検知した反射された部分の偏光 の強度に応答して、前記1つ以上の流量制御バルブ、圧力制御バルブおよびパワ ーサプライを制御することができるマイクロプロセッサー、 を含む、請求項23記載の装置。 25.(A)反射された部分の偏光の強度から抗反射性膜の厚さを決定し、 (B)プラズマジェネレーターへの1種以上の前駆体材料の流れを選択的に可 能にしまたは抑制するための流量制御バルブを制御し、そして、 (C)1つ以上の流量制御バルブ、圧力制御バルブおよび電源を制御すること により、1種以上の前駆体材料の付着速度を制御するようにマイクロプロセッサ ーがプログラムされている、請求項24記載の装置。 26.エミッターはレーザーである、請求項24記載の装置。 27.エミッターは干渉フィルターおよび偏光フィルターの両方と組み合わさ れた光源を含む、請求項24記載の装置。 28.エミッターは偏光発光ダイオードである、請求項24記載の装置。 29.リアクターチャンバーは光学基材の体積の約2倍以下の体積である、請 求項22記載の装置。 30.基材上に少なくとも1種の抗反射性材料の層の付着を開始すること、 付着されている層の厚さを光学的にモニタリングすること、および、 層が所望の厚さに達したときに付着を停止すること、 を含む、光学基材上に抗反射性コーティングを付着させる方法。 31.選択された強度および選択された波長もしくはバンド幅の偏光光線を、 選択された入射角で材料層が付着されている基材の表面から反射させること、 反射された部分の偏光光線の強度を検知すること、および、 反射された部分の光線の強度から層の厚さを決定すること、 により層の厚さを光学的にモニタリングする、請求項30記載の方法。 32.層がプラズマ改良化学蒸着により付着される、請求項30記載の方法。 33.光学基材がレンズである、請求項30記載の方法。 34.基材に隣接してプラズマを発生させること、 基材上への付着のためにプラズマ中においてイオン化した第一の材料の流れを 開始して、第一の層を形成させること、 付着されている第一の層の厚さを光学的にモニタリングすること、 第一の層が第一の所望の厚さに到達したときに、第一の材料の流れを停止する こと、 基材上への付着のためにプラズマ中において第二の材料の流れを開始して、第 二の層を形成させること、 付着されている第二の層の厚さを光学的にモニタリングすること、および、 第二の層が第二の所望の厚さに到達したときに、第二の材料の流れを停止する こと、 をさらに含む、請求項30記載の方法。 35.第一の層が第一の所望の厚さに近づくとともに、第一の材料の流れを抑 制すること、および、 第二の層が第二の所望の厚さに近づくとともに、第二の材料の流れを抑制する こと、 をさらに含む、請求項34記載の方法。 36.抗反射性コーティングの上にポリマーフルオロカーボンの保護層を付着 させる工程をさらに含む、請求項30記載の方法。 37.基材上に少なくとも1種の抗反射性材料の層を付着させる 前に、プラズマにより基材を清浄化することをさらに含む、請求項30記載の方 法。 38.基材の清浄化を光学的にモニタリングすること、および、 基材の所望の表面状態が得られたときに、基材の清浄化を停止すること、 をさらに含む、請求項37記載の方法。 39.所望の表面状態はプラズマ中での基材からの不純物排出の所望の速度に 対応する、請求項38記載の方法。 40.基材の清浄化を光学的にモニタリングする工程は、プラズマ中の不純物 からの蛍光発光を観測することを含む、請求項39記載の方法。 41.基材の所望の表面状態は基材の所望の屈折率に対応する、請求項39記 載の方法。 42.所望の厚さは、知覚反射率F (式中、予め決められた範囲の波長λおよび角度θにわたり、S(λ,θ)は人 間の感度関数であり、そしてR(λ,θ)はp−偏光反射率およびs−偏光反射 率の平均値である) を最少化することにより計算される、請求項30記載の方法。 43.S(λ,θ)は統計的に決定される平均値である、請求項42記載の方 法。 44.光学基材はコーティングの前に知覚反射率F0を有し、抗反射性材料で コーティングした後に知覚反射率FARを有し、そしてFARはF0の約1/2以下 である、請求項42記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US3723997P | 1997-01-27 | 1997-01-27 | |
US60/037,239 | 1997-01-27 | ||
PCT/US1997/023231 WO1998033077A2 (en) | 1997-01-27 | 1997-12-12 | Coatings, methods and apparatus for reducing reflection from optical substrates |
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JP2001509910A true JP2001509910A (ja) | 2001-07-24 |
JP2001509910A5 JP2001509910A5 (ja) | 2005-09-08 |
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JP53196798A Ceased JP2001509910A (ja) | 1997-01-27 | 1997-12-12 | 光学基材からの反射を抑制するためのコーティング、方法および装置 |
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EP (1) | EP1012635B1 (ja) |
JP (1) | JP2001509910A (ja) |
KR (1) | KR100495338B1 (ja) |
CN (1) | CN1131441C (ja) |
AU (1) | AU733162B2 (ja) |
BR (1) | BR9714213A (ja) |
CA (1) | CA2279425A1 (ja) |
DE (1) | DE69735727T2 (ja) |
ES (1) | ES2263184T3 (ja) |
HK (1) | HK1025152A1 (ja) |
IL (1) | IL131090A (ja) |
RU (1) | RU2204153C2 (ja) |
TW (2) | TW400437B (ja) |
WO (1) | WO1998033077A2 (ja) |
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- 1997-12-12 JP JP53196798A patent/JP2001509910A/ja not_active Ceased
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- 1997-12-12 US US08/990,003 patent/US5991081A/en not_active Expired - Fee Related
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1998
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TW400437B (en) | 2000-08-01 |
CA2279425A1 (en) | 1998-07-30 |
DE69735727T2 (de) | 2007-01-04 |
US11606482B2 (en) | 2023-03-14 |
IL131090A (en) | 2003-05-29 |
AU5607598A (en) | 1998-08-18 |
EP1012635A2 (en) | 2000-06-28 |
WO1998033077A3 (en) | 1998-09-11 |
CN1131441C (zh) | 2003-12-17 |
KR20000070538A (ko) | 2000-11-25 |
WO1998033077A2 (en) | 1998-07-30 |
KR100495338B1 (ko) | 2005-06-14 |
TW400436B (en) | 2000-08-01 |
CN1249040A (zh) | 2000-03-29 |
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